JPS5529170A - Both-side exposing apparatus for semiconductor wafer - Google Patents

Both-side exposing apparatus for semiconductor wafer

Info

Publication number
JPS5529170A
JPS5529170A JP10306578A JP10306578A JPS5529170A JP S5529170 A JPS5529170 A JP S5529170A JP 10306578 A JP10306578 A JP 10306578A JP 10306578 A JP10306578 A JP 10306578A JP S5529170 A JPS5529170 A JP S5529170A
Authority
JP
Japan
Prior art keywords
masks
wafer
vertical
space
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10306578A
Other languages
English (en)
Inventor
Seiji Imanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10306578A priority Critical patent/JPS5529170A/ja
Publication of JPS5529170A publication Critical patent/JPS5529170A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP10306578A 1978-08-23 1978-08-23 Both-side exposing apparatus for semiconductor wafer Pending JPS5529170A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10306578A JPS5529170A (en) 1978-08-23 1978-08-23 Both-side exposing apparatus for semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10306578A JPS5529170A (en) 1978-08-23 1978-08-23 Both-side exposing apparatus for semiconductor wafer

Publications (1)

Publication Number Publication Date
JPS5529170A true JPS5529170A (en) 1980-03-01

Family

ID=14344259

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10306578A Pending JPS5529170A (en) 1978-08-23 1978-08-23 Both-side exposing apparatus for semiconductor wafer

Country Status (1)

Country Link
JP (1) JPS5529170A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214530A (ja) * 1984-04-10 1985-10-26 Matsushita Electric Ind Co Ltd 二面露光方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60214530A (ja) * 1984-04-10 1985-10-26 Matsushita Electric Ind Co Ltd 二面露光方法

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