JPS5568623A - Transferring device for mask pattern - Google Patents

Transferring device for mask pattern

Info

Publication number
JPS5568623A
JPS5568623A JP14116078A JP14116078A JPS5568623A JP S5568623 A JPS5568623 A JP S5568623A JP 14116078 A JP14116078 A JP 14116078A JP 14116078 A JP14116078 A JP 14116078A JP S5568623 A JPS5568623 A JP S5568623A
Authority
JP
Japan
Prior art keywords
mask
wafer
mask pattern
pattern
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14116078A
Other languages
Japanese (ja)
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP14116078A priority Critical patent/JPS5568623A/en
Publication of JPS5568623A publication Critical patent/JPS5568623A/en
Pending legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To reduce the time for producing a mask by using a mask pattern smaller than a sample to be exposed and transferring such mask pattern on the entire area of the sample.
CONSTITUTION: A mask pattern transfer is made by projecting X-ray 2 radiated from synchrotron-accelerated electrons 1. The mask 5 has a square shape to meet the X-ray 2 projection angles a and b. The wafer 3 is set to close to the mask 5 which is fixed. Then, the wafer 3 is sent stepwisely in the direction of the mask's short side to permit the mask pattern to be formed on the wafer 3. To have a more precise pattern, the mask 3 and the wafer 5 are preferably curved to meet the expanded angle of X ray. This method of producing devided masks greatly reduces the time for making fine pattern drawing by electron beam exposure.
COPYRIGHT: (C)1980,JPO&Japio
JP14116078A 1978-11-17 1978-11-17 Transferring device for mask pattern Pending JPS5568623A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14116078A JPS5568623A (en) 1978-11-17 1978-11-17 Transferring device for mask pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14116078A JPS5568623A (en) 1978-11-17 1978-11-17 Transferring device for mask pattern

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP60118839A Division JPS6122344A (en) 1985-06-03 1985-06-03 Transfer method of mask pattern

Publications (1)

Publication Number Publication Date
JPS5568623A true JPS5568623A (en) 1980-05-23

Family

ID=15285519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14116078A Pending JPS5568623A (en) 1978-11-17 1978-11-17 Transferring device for mask pattern

Country Status (1)

Country Link
JP (1) JPS5568623A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187334A (en) * 1985-10-18 1986-05-02 Tokyo Erekutoron Kk Method of exposing wafer
WO2014206014A1 (en) * 2013-06-26 2014-12-31 京东方科技集团股份有限公司 Exposure apparatus, exposure system, and exposure method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6187334A (en) * 1985-10-18 1986-05-02 Tokyo Erekutoron Kk Method of exposing wafer
WO2014206014A1 (en) * 2013-06-26 2014-12-31 京东方科技集团股份有限公司 Exposure apparatus, exposure system, and exposure method

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