JPS6057442B2 - 光重合性組成物 - Google Patents
光重合性組成物Info
- Publication number
- JPS6057442B2 JPS6057442B2 JP50113094A JP11309475A JPS6057442B2 JP S6057442 B2 JPS6057442 B2 JP S6057442B2 JP 50113094 A JP50113094 A JP 50113094A JP 11309475 A JP11309475 A JP 11309475A JP S6057442 B2 JPS6057442 B2 JP S6057442B2
- Authority
- JP
- Japan
- Prior art keywords
- composition
- photosensitizer
- acid
- radiation
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Epoxy Resins (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB40682/74A GB1526923A (en) | 1974-09-18 | 1974-09-18 | Photopolymerisable compositions |
| GB4068274 | 1974-09-18 | ||
| GB759875 | 1975-02-24 | ||
| GB759875 | 1975-02-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5156885A JPS5156885A (en) | 1976-05-18 |
| JPS6057442B2 true JPS6057442B2 (ja) | 1985-12-14 |
Family
ID=26241548
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50113094A Expired JPS6057442B2 (ja) | 1974-09-18 | 1975-09-18 | 光重合性組成物 |
Country Status (9)
| Country | Link |
|---|---|
| JP (1) | JPS6057442B2 (it) |
| DE (1) | DE2541709C2 (it) |
| DK (1) | DK415875A (it) |
| FR (1) | FR2285423A1 (it) |
| IE (1) | IE42085B1 (it) |
| IT (1) | IT1042624B (it) |
| NL (1) | NL179654C (it) |
| NZ (1) | NZ178699A (it) |
| SE (1) | SE425399B (it) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
| US4108747A (en) * | 1976-07-14 | 1978-08-22 | General Electric Company | Curable compositions and method for curing such compositions |
| US4102687A (en) * | 1977-02-14 | 1978-07-25 | General Electric Company | UV Curable composition of a thermosetting condensation resin and Group VIa onium salt |
| GB1604954A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| GB1604953A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| GB1596000A (en) * | 1977-09-14 | 1981-08-19 | Gen Electric | Heterocyclic onium salts their preparation and their use for photopolymerisable organic materials |
| US4273668A (en) * | 1977-09-14 | 1981-06-16 | General Electric Company | Arylsulfonium salt-solvent mixtures |
| US4218531A (en) * | 1978-02-08 | 1980-08-19 | Minnesota Mining And Manufacturing Company | Addition of ethylenically unsaturated materials to control odor in photopolymerizable epoxy compositions |
| US4186108A (en) * | 1978-02-08 | 1980-01-29 | Minnesota Mining And Manufacturing Company | Liquid compositions containing triarylsulfonium complex salts and oxyethylene material |
| DE2966764D1 (en) * | 1978-10-27 | 1984-04-12 | Ici Plc | Polymerisable compositions, derived coatings and other polymerised products |
| US4231886A (en) * | 1979-01-29 | 1980-11-04 | Minnesota Mining And Manufacturing Company | Ester solutions of complex salts |
| EP0014785B1 (en) * | 1979-02-12 | 1985-06-12 | General Electric Company | Coating method and curable compositions |
| DE3909688A1 (de) * | 1989-03-23 | 1990-09-27 | Espe Stiftung | Verfahren zum kleben oder vergiessen von substraten und vorrichtung zur seiner durchfuehrung |
| SE8901048D0 (sv) * | 1989-03-23 | 1989-03-23 | Becker Wilhelm Ab | Polymerisationsinitiator |
| DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
| US6723483B1 (en) * | 1999-12-27 | 2004-04-20 | Wako Pure Chemical Industries, Ltd. | Sulfonium salt compounds |
| WO2002018332A1 (fr) * | 2000-08-30 | 2002-03-07 | Wako Pure Chemical Industries, Ltd. | Compose de sel de sulfonium |
| JP4448730B2 (ja) * | 2004-04-20 | 2010-04-14 | 富士フイルム株式会社 | 感光性組成物、該感光性組成物に用いられる化合物及び該感光性組成物を用いたパターン形成方法 |
| EP3064996B1 (en) * | 2010-02-05 | 2020-07-22 | Canon Kabushiki Kaisha | Liquid discharge head |
| WO2011096458A1 (en) | 2010-02-05 | 2011-08-11 | Canon Kabushiki Kaisha | Negative photosensitive resin composition, pattern formation method, and liquid discharge head |
| CN119241596B (zh) * | 2024-11-05 | 2025-10-17 | 南京邮电大学 | 硫配位锰卤配合物及其制备方法和应用 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3412046A (en) * | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
-
1975
- 1975-09-11 IE IE1980/75A patent/IE42085B1/en unknown
- 1975-09-16 NZ NZ178699A patent/NZ178699A/xx unknown
- 1975-09-17 SE SE7510390A patent/SE425399B/xx not_active IP Right Cessation
- 1975-09-17 IT IT27334/75A patent/IT1042624B/it active
- 1975-09-17 DK DK415875A patent/DK415875A/da not_active Application Discontinuation
- 1975-09-17 FR FR7528525A patent/FR2285423A1/fr active Granted
- 1975-09-17 NL NLAANVRAGE7510920,A patent/NL179654C/xx not_active IP Right Cessation
- 1975-09-18 DE DE2541709A patent/DE2541709C2/de not_active Expired
- 1975-09-18 JP JP50113094A patent/JPS6057442B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NZ178699A (en) | 1978-03-06 |
| IE42085B1 (en) | 1980-06-04 |
| DK415875A (da) | 1976-03-19 |
| AU8489975A (en) | 1977-03-24 |
| FR2285423A1 (fr) | 1976-04-16 |
| DE2541709A1 (de) | 1976-04-01 |
| FR2285423B1 (it) | 1979-08-31 |
| NL7510920A (nl) | 1976-03-22 |
| IE42085L (en) | 1976-03-18 |
| IT1042624B (it) | 1980-01-30 |
| NL179654C (nl) | 1986-10-16 |
| DE2541709C2 (de) | 1985-02-21 |
| SE425399B (sv) | 1982-09-27 |
| SE7510390L (it) | 1976-03-19 |
| NL179654B (nl) | 1986-05-16 |
| JPS5156885A (en) | 1976-05-18 |
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| Yamamura et al. | Photosensitization of Carbazole Derivatives and Application to Photofabrication in Cationic System |