JPS61215527A - Method for manufacturing electrode plate for liquid crystal display device - Google Patents

Abstract

PURPOSE:To obtain high-level display quality by incorporating at least nickel in the metal of a metallic conductor pattern and allowing the metallic conductor pattern to have both patterns of a terminal part for conduction and a positioning mark. CONSTITUTION:The metallic thin-film pattern is formed on a glass substrate as a transparent substrate 46 by patterning nickel firstly and then matching patterns 41-43 for CF are used to perform patterning successively in the order of an R pattern, a G pattern, and a B pattern. A positioning mark 44 for a connector is used for positioning during connection with an FPC and a PC board, etc., corresponding to the final process of a color liquid-crystal display. IN addition to said matching marks, a rough mark for seal part printing for sealing, positioning marks for a display and a scanning side substrate before the charging of liquid crystal, numbers and symbols for article number identification, etc., may be patterned simultaneously with the nickel patterning.

Description

[Detailed description of the invention] <Industrial application field> Regarding manufacturing method @ <Prior art> Conventional technology - a conventional example and its schematic cross-sectional view? This will be explained using FIG. 3 shown in FIG.

A glass plate with a thickness of 1 to 1.1 m called float mounting (
1) Above (downward in this figure), the transparent electrode (2) and the red I
Color filters (hereinafter abbreviated as "CF") having color filter patterns of each color (R), green (0, blue) are mounted in order. Transparent polarization is formed between this and the liquid crystal (5). (2) are arranged perpendicularly to the transparent electrode (2). At this time, a voltage is applied to each intersection point in a time-division manner to drive the liquid crystal and perform a transmissive type color display.

<Problems to be Solved by the Invention> In a normal monochrome dot matrix liquid crystal display, the thickness of the liquid crystal (5) is 8.5 cm due to driving conditions and the above-mentioned transmittance.
It is optimized around μm. but.

It is shown in Figure 1. In the color liquid crystal structure with CF[R), (C1, (B)) on the inner surface, CFIR, which is also an insulator,
J.

fGl and fBl themselves become inclusions that lower the effective thickness between the upper and lower electrodes, and also increase the error in the thickness of the liquid crystal (5), making it difficult to set the appropriate thickness. If it is superimposed on the transparent electrodes F# and rxcF, the effective resolution will not decrease and the error in setting the thickness of the liquid crystal (5) will also be reduced, which is ideal. However, forming transparent electrodes on CF is extremely difficult. The reason for this will be explained below.

Practical CF materials include gelatin and greens □
Since each RGB color is colored with a dye, it is difficult for both the resin and the dye to maintain heat resistance exceeding 200C and provide the desired coloring effect. On the other hand, a transparent electrode called ITO or Nesa film is heated at about 250C to 480C during or after film formation to obtain the desired conductivity and transmittance.

Therefore, it has been difficult to form a transparent conductor on CF which does not have heat resistance. However, the patent announcement in Showa 5
ITO (in this example, from around room temperature to around 2ooc) at low temperatures (in this example, from around room temperature to around 2ooc) using the ion plating method as seen in Publication No. 40450 of 2006, and other plasma assisted methods such as sputtering and plasma CVD. 1
! It has been confirmed that it is possible to synthesize gold tetraoxide using indium oxide and tin oxide. However, due to such low-temperature formation, ITO deteriorates significantly due to changes over time and heat, making it unreliable as a transparent electrode for color liquid crystals and not being put to practical use.

In order to compensate for these shortcomings, ITO is placed on CF instead of the conventional ITO model. There was an idea to put the e-setting method into practical use, but this method also had problems, which will be explained below.

For one thing, in order to obtain a display comparable to that of a color LCD CRT (color TV), it is necessary to miniaturize the dot size and, accordingly, to miniaturize the pitch of the transparent Ti in X and Y. In particular, it is necessary to miniaturize the pitch of the transparent Ti in X and Y. It was difficult to connect with conventional technology.Also, transparent terminals such as ITO are not suitable for soldering or wire bonding because they have low adhesive strength.In addition, CF is red ( season, green n, blue IB) black as necessary (
A registration mark for positioning the color of the pattern (Black) is essential, and a similar positioning mark is also necessary for connecting the connector to the terminal.

Furthermore, in order to increase the information density displayed on a color liquid crystal display, it is necessary to refine the pattern as described above. Such miniaturization increases the number of scanning lines and requires high-duty driving.

In color liquid crystal displays using CF, unevenness and steps of the CF itself, which is 1 to 2 μm thick in some cases, may cause display unevenness and shorten the life of the liquid crystal. For this reason, it has been difficult to obtain higher display quality.

Is there a problem? Means for Solving> Specifically, the present invention is a color filter in which a metal conductor pattern, a color filter pattern, a transparent electrode pattern, and an alignment film pattern are laminated in this order on a transparent substrate, and metal conductor pattern on a substrate,
color filter pattern, overcoat pattern,
This is a method of manufacturing an electrode plate for a liquid crystal display, which is characterized by sequentially laminating a transparent electrode pattern and an alignment film pattern. Moreover, the present invention requires that the transparent electrode pattern overlap at least a portion of the metal conductor pattern. In addition, the transparent polarization pattern is a conductive thin film made of metal oxide,
It is characterized in that the film is formed in an oxygen-deficient state in advance so that the desired resistance value is obtained by heat treatment after film formation, and in addition, the metal conductor pattern contains a small amount of metal (contains at least nickel, and the metal conductor pattern This is 11!! method of using an electrode plate for a liquid crystal display characterized by having both patterns of a terminal portion for establishing conductivity and a positioning mark.

Function> In the conventional configuration of CF for color liquid crystal, as shown in Fig. 6, the transparent electrode (2) is connected to the CF with a thickness of about 1 to 2 μm and 0.0 μm thick.
Whereas voltage was applied to the liquid crystal (5) through an alignment film (4) of about 5 to 0.1 μm in the middle, the present invention has changed the method shown in FIG. Since the transparent electrode is in direct contact with the liquid crystal 12Sl only through a thin alignment film, the transparent electrode is in almost direct contact with the liquid crystal 12Sl.

Therefore, the effective voltage applied to the liquid crystal is the same as in the monochrome case, improving efficiency, and at the same time, display quality can be improved compared to that using conventional CF.

<Detailed Description of the Invention> The present invention will be described in detail with reference to FIGS. 1 and 2. First, FIG. 6 shows the CF register mark t+u1. t4B.

t43) and connector alignment mark (44)
, and a terminal part for establishing continuity (for example, use nickel or the like for 451).
Patterns fR), fGl, and (B) are each schematically shown. However, on the transparent glass substrate 14f9, nickel was first patterned to form a metal thin film pattern, and then CF alignment marks (4υ143i
43' to sequentially pattern an R pattern, a G pattern, and a B pattern. Alignment marks for connectors (used for alignment on FPC (when connecting to flexible printed circuit connectors, PC boards, etc.), which corresponds to the final process of color liquid crystal displays).Alignment on the tail when connecting nickel patterns. In addition to the marks, there are also patterns such as registration marks printed on the seal for inclusion, alignment marks for the two substrates on the display side (CF side) and scanning side before liquid crystal inclusion, numbers and symbols for product number identification, etc. You can also ning. Again.

In order to increase the adhesive strength between the glass transparent substrate and the metal thin film, a 5in2 (silicon dioxide) undercoat may be provided on the transparent substrate as necessary, and a metal thin film pattern, CF, etc. may be formed on top of that. good.

Furthermore, in the dyeing method, a level difference of 0.5 to 2 μm occurs, and in printing, a maximum unevenness of 5 μm and 8 degrees occurs.

Transparent ITO etc. 0.2-2μm for extreme lamination
Is the overcoat layer of 1afL on the surface? Smoothing results in less variation in the resistance value of the transparent electrode.

It is also advantageous for driving liquid crystals.

However, in the present invention, in consideration of the heat treatment conditions to be applied in the later steps (particularly the formation of the alignment film and the sealing (encapsulation) treatment), the reduction side of the ITO film is prepared in advance so that it will have the best characteristics after these heat treatments. It is necessary to maintain a slightly oxygen-deficient state. In this case, a slightly oxygen-deficient condition means that when the ITO film thickness is in the range of 800 to 3,000, the transmittance is approximately 83 to 60% (measured wavelength 55 (if
III refers to a film in the range of 100 to 250 cm when air is used as a reference, and heat treatment after film formation of 100 to 250 c is expected to improve the transmittance to 90 to 78% and also improve the per-area resistance value. The film properties during film formation of the transparent electrode according to the present invention need to be adjusted in various ways depending on the heat treatment conditions (degree and time) during hardening of the alignment film, as well as the curing conditions of the epoxy resin used to encapsulate the liquid crystal. However, it is not determined uniquely depending on the specifications of the liquid crystal encapsulation manufacturer, electrical manufacturer, etc., but any film whose properties can be improved by post-process heat treatment may be used.However, as will be explained in the examples below, transparent
'By adjusting the atmosphere (particularly the oxygen partial pressure) in the electrode film forming apparatus, it is possible to form a film having the desired characteristics in a sufficiently stable manner. Finally, the desired characteristics can be obtained, and the voltage drop when driving the liquid crystal is small, resulting in extremely good display quality.Also, since the terminals are made of nickel, there is no need for soldering or wires. Bonding is now possible.

1. It is possible to connect five or more wires within the cover, and it is also possible to place a flat package or IC pair chip directly on the board. As mentioned earlier, by using each alignment mark in the gold/veneer conductor pattern, CF, IT
This method has the advantage that tasks such as liquid crystal encapsulation can be easily carried out.

A more detailed explanation will be given below based on examples.

[Example 1] Size: 250 m x 200 ram, thickness: 1.1
! Chromium f by vacuum evaporation on the oI float glass plate.
f: 500mm nickel 74ooo & film attached, after patterning,
Resist patterning and etching using known photorin were performed to form a metal thin film pattern.

Next, a total of 7 R, G, and B CFs in a stripe pattern with a line width of 290 m and a pitch of 300 μm are applied in the direction of the X electrode.
20 lines were patterned. Further, the CF is made of a green material and is formed by a known method. Next, our CF
A transparent electrode of 9999% indium and tin is used on the substrate using a binary evaporation method at room temperature and oxygen partial pressure of 4X.
10 torr.

Film thickness 1100N, transmittance 81% at high frequency voltage 3 kV
.

An ITO film having a sheet resistance value of 65Ω/hole was formed. The amount of tin oxide in the ITO sample thus formed was approximately 10 mol %. Next, ITO was patterned in stripes on the CF with a line width of 270 μm and a pitch of 300 μm. Etching was carried out using the same photo-IJ method as above for 6 minutes in a 5% aqueous hydrochloric acid solution.

The terminal end surface was made of nickel as it is. After drying the board,
Hitachi Chemical's polyimide alignment film material HL-1100
7 Apply 1 socr except for the nickel terminals and seals.
The hair was dried for 600 hours and oriented hair was formed on 600 people.

Furthermore, assuming that the seal is made of epoxy resin □
Heat treatment was performed at 180C for hr. ITC after heat treatment)
What is the area resistance value of the model? At 12Ω/hole, the transmittance was 86% in the area where the alignment film was not formed, so a good one was prepared.
When pressurized for 10 seconds using a hot press with a tip temperature of 220 C, the nickel terminal on the CF board and the FPC could be connected via solder.

[Example 2] 50% of 5iO2 (silicon oxide) was sputtered onto a float glass plate with a size of 5 inches square and a thickness of 1.1 ag.
A nickel film was deposited by 3000 people, and nickel was patterned in the same manner as in Example 1 to form a metal conductor pattern. Also, using the same material as in Example 1, dot size 1 was
90μ@×590μm CF&X direction (190μm direction) 2ooμ@pits competition R, G, B alternately 480 pieces,
A CF film pattern was formed by arranging 128 pieces in the Y direction using a 600 μm hitch. The same material was coated to a thickness of 0.5 μm to form an overcoat pattern. Next, a sputtering device, 5
Indium oxide target with wt% tin oxide? Argon flow rate 80SCCM, high frequency effective power 300
A film of ITO [k] having a thickness of 12 mm was formed by sputtering with W and an oxygen partial pressure of 1 x 10 torr. At this time, the substrate temperature is room temperature. The transmittance of the ITO film formed in this way is 8
3%, and the resistance value was 42Ω/mouth.

Next, ITO stripes with a line width of 170 μm and a pitch of 200 μm were patterned using the same photolithography method as in Example 1 to form a transparent electrode pattern. However, the stripes were divided into upper and lower parts in the center.

After heat treatment in the same manner as in Example 1, the ITO film had a transmittance of 88% and an area resistance of 27 Ω/hole, which is good for a transparent electrode for color liquid crystal.

<Effects of the Invention> As described above, the present invention is advantageous in that the first step and subsequent steps can be carried out in a manner that is easier to see than the conventional process in which a transparent electrode pattern is formed in advance because the metal thin film pattern is formed. There are great advantages in comparison with traditional LCD display configurations.

Since the transparent electrode is positioned closer to the liquid crystal, it is possible to provide a method for manufacturing a battery plate for a liquid crystal display device, which is more advantageous for driving the liquid crystal.

Furthermore, it becomes possible to easily carry out the process 8 when bonding IC chips or when making electrical connections 2 using connectors when the pitch becomes finer.

[Brief explanation of the drawing]

FIG. 1 shows a method for manufacturing an electrode plate for a liquid crystal display device according to the present invention.
A schematic cross-sectional view schematically showing the liquid crystal display device w used,
Figure 2 is the Ti plate for the liquid crystal display device shown in Figure 1. 1 of the present invention of a liquid crystal display device including! FIG. 3 is a schematic plan view showing the planar positional relationship during manufacturing. Figure 3 shows a conventional manufacturing method for electrode plates for liquid crystal display devices.
FIG. 2 is a schematic cross-sectional view schematically showing the liquid crystal display device used. +l), t211, t46)...Transparent substrate +3+, (231.!lighttW f4n. c!4)...Alignment film (451...Metal thin film pattern (5), (to)...Liquid crystal

Claims (5)

[Claims] (1) A method for manufacturing an electrode plate for a liquid crystal display device, which comprises sequentially stacking a metal conductor pattern, a color filter pattern, a transparent electrode pattern, and, if necessary, an alignment film pattern on a transparent substrate. (2) The method for manufacturing an electrode plate for a liquid crystal display device according to claim 1, characterized in that an overcoat pattern is laminated between the color filter pattern and the transparent electrode. (3) The method for manufacturing an electrode plate for a liquid crystal display device according to claims 1 and 2, wherein the transparent electrode pattern overlaps at least a portion of the metal conductor pattern. (4) A patent characterized in that the transparent electrode pattern is a conductive thin film made of a metal oxide, and the thin film is formed in advance in an oxygen-deficient state so that a desired resistance value is obtained by heat treatment after film formation. A method for manufacturing an electrode plate for a liquid crystal display device according to claims 1 and 2. (5) At least a part of the constituent material of the metal conductor pattern is nickel, and the metal conductor pattern includes at least a terminal pattern for taking out the electrode and an alignment pattern for each pattern to be laminated in a subsequent process. A method for manufacturing an electrode plate for a liquid crystal display device according to claims 1 and 2, characterized in that: