JPS6242104A - Manufacture of color filter - Google Patents

Abstract

PURPOSE:To make a gap between dyed parts, a defect, etc., inconspicuous by providing a chromatophilia resin layer on a substrate and forming a red and a green dyed part, applying resist and exposing and developing the layer except the red and green dyed parts, and dipping the substrate in a blue dye bath and dyeing it. CONSTITUTION:The chromatophilia resin layer 2 is formed on the substrate, the photoresist 3 is applied thereupon, and a photomask 4 is used for pattern exposure; and development is carried out and the part where the photoresist is removed is dyed in red to form the red dyed part R. Similarly, the green dyed part G is formed. The chromatophilia resin layer 2 is dyed in red and green and then the entire surface is coated with the positive photoresist 5, which is dried. Then, the substrate is exposed to light from a high-voltage mercury vapor lamp from the reverse side and developed to leave the resist 5 on the red dyed part R and green dyed part G, and the resist at other parts is removed. This is dipped in the blue dye bath and dyed to form a blue dyed part B and also dye a gap part 6 and a fine defect in blue. Lastly, the remaining resist 5 is removed.

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method of manufacturing a color filter used in liquid crystal color televisions, solid-state image pickup tubes, and the like.

(Prior Art) As a conventional method for producing color filters, a method is known in which a dyeable resin such as gelatin is applied to a glass substrate and the resin is partially dyed through a photoresist window (equity 52- 1737.

6, Japanese Patent Publication No. 57-139712).

(Problems to be Solved by the Invention) In color filters manufactured by the above conventional method, undyed gaps are created between adjacent dyed parts due to alignment errors, and gaps are intentionally created to prevent color mixing. In some cases. Furthermore, defects that cannot be dyed may occur in the dyed area due to dirt, dust, development residue, etc. These gaps and imperfections were not dyed, so light passed through them well, making them appear shiny and noticeable. Furthermore, since the transmitted light is white light, there is also a problem in that the chromaticity of the color filter is reduced.

(Means for Solving the Problems) In order to solve the drawbacks of the above-mentioned conventional example, the present invention
All parts other than the red and green stained areas are dyed blue, which has low visibility for humans, to make gaps, defects, etc. between the stained areas less noticeable.

[Example] In FIG. 2, a dyeable resin layer 2 made of gelatin or the like is formed on a substrate such as glass, a photoresist 3 is further applied thereon, and this is pattern-exposed using a photomask 4. After development, the removed portion of the photoresist is dyed red to form a red dyed area R (FIG. 3).

Then, using the same photolithography technique, the green-stained area G
(Figure 4). After dyeing the dyeable resin layer 2 in red and green in this way, a positive photoresist 5 is applied to the entire surface.
Coat and dry (Figure 5). This photoresist 5 is
It must not be sensitive to the light that passes through the red dyed part R and the green dyed part G.

In FIG. 7, for example, a material with photosensitive characteristics as indicated by the dotted line (trade name: Nagase 809) may be used. In this case, a rise is seen in the red transmitted light at around 300 mm, but there is no practical problem because the wavelength around this is absorbed by the glass substrate.

Next, when the back side of the glass substrate is exposed to light using a high-pressure mercury lamp of a mask aligner and developed, the resist 5 remains on the red dyed part R1 and the green dyed part G, and the resist in other parts is removed. Dip this in a blue dye bath and dye it.
A blue dyed area B is formed.

At the same time, the gap 6 and small defects (not shown in the drawing) are also dyed blue (FIG. 6). Finally, the remaining resist 5 is removed. (Figure 1).

In the above embodiments, a special photoresist is used, but if such a photoresist is not available, light in the wavelength range that passes through the red and green dyed areas of the light that the photoresist is sensitive to is used. The light may be exposed through a cutting filter.

(Effects of the Invention) According to the present invention, there is no white part in the color filter, and since that part is dyed with blue color, which has the lowest visibility, it becomes less noticeable, and a decrease in chromaticity can be suppressed. Also, since the process of using a mask for blue is no longer necessary, there is no blue alignment error and the process is simplified.

[Brief explanation of the drawing]

The drawings show embodiments of the present invention; FIG. 1 is a cross-sectional view of a color filter manufactured according to the present invention, FIGS. 2 to 6 are cross-sectional views showing the manufacturing method of the present invention step by step, and FIG. It is a graph showing the spectral transmittance of a red-stained area and a green-stained area and the spectral sensitivity of a photoresist. 1...Substrate 2...Dyeable resin layer R...Red dyed portion G...Green dyed portion. that's all

Claims (1)

[Claims] A dyeable resin layer is provided on the substrate, red dyed areas and green dyed areas are formed on this dyeable resin layer using photolithography technology, and then a positive photoresist is applied over the entire surface of the dyeable resin layer. A method for manufacturing a color filter, which comprises exposing the positive photoresist to a portion other than the red dyed portion and the green dyed portion, and dyeing the positive photoresist by immersing it in a blue dyeing bath after development.