JPS6260478B2 - - Google Patents

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Publication number
JPS6260478B2
JPS6260478B2 JP2195784A JP2195784A JPS6260478B2 JP S6260478 B2 JPS6260478 B2 JP S6260478B2 JP 2195784 A JP2195784 A JP 2195784A JP 2195784 A JP2195784 A JP 2195784A JP S6260478 B2 JPS6260478 B2 JP S6260478B2
Authority
JP
Japan
Prior art keywords
alumite
chromic acid
aluminum
film
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2195784A
Other languages
Japanese (ja)
Other versions
JPS60169593A (en
Inventor
Koichi Yoshida
Yoshio Hirayama
Takashi Kajama
Yasuo Oka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Light Metal Co Ltd
Original Assignee
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Light Metal Co Ltd filed Critical Nippon Light Metal Co Ltd
Priority to JP2195784A priority Critical patent/JPS60169593A/en
Publication of JPS60169593A publication Critical patent/JPS60169593A/en
Publication of JPS6260478B2 publication Critical patent/JPS6260478B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、クロム酸アルマイト法によつて電流
密度の低下を防止し得て黒点欠陥がなく、平滑
度、耐熱性などがすぐれている高密度磁気記録材
用アルマイト基板の製法に関するものである。 磁気デイスクなどのような磁気記録材基板とし
て要望されている耐摩耗性がすぐれ、研摩性も良
好で高精度の平滑面が得られ易く、容易にその表
面に薄膜の磁性層が形成できるといつた諸性質を
具備しているものとしてアルマイト処理を施行し
たアルミニウム又はアルミニウム合金材が用いら
れている。しかしながら、このアルマイト基板に
は、アルミニウム又はアルミニウム合金素材中に
存在する鉄、ケイ素などの不純物が金属間化合物
として晶出し、これが素材表面に点在してアルマ
イト処理に際してこの部分がごく微小なアルマイ
ト皮膜欠落部となるいわゆる黒点欠陥が生じ、こ
の欠落部は当初はサブミクロン単位のごく微小な
ものであるが、アルマイト皮膜の成長とともに拡
大し、5μm以上の皮膜厚のアルマイト層では、
5〜10μmのピツト状微小欠陥となるものであつ
て、この数が多いほど磁気記録材における信号エ
ラーが多くなるものであつて好しくない問題であ
る。又、高密度磁気記録材とする場合、アルマイ
ト基板上にα−Fe3O4をスパツタリングその他の
方法によつて被着させ、これを300〜400℃に加熱
してγ−Fe2O3化する必要があるが、このような
高温加熱を行なつた場合、アルマイト皮膜に亀裂
が生じ、このために製品不良をおこし易いという
問題があり、そのためにアルマイト層の被膜厚を
1〜3μm程度といつた極端に薄い皮膜厚にしな
ければならずアルマイト基板の耐ヘツドクラツシ
ユ性低下の原因となるといつた問題もあつた。 これらの問題を解決する手段として、さきに、
アルミニウム又はアルミニウム合金材をクロム酸
溶液浴中で定電圧法によつて通常使用される電圧
より高い電解電圧でアルマイト処理する方法を提
案した。(特願昭58−44364)しかしながら、この
方法において、同一浴を長時間使用していると次
第に電流密度が低下し、電解時間が長くなり、皮
膜の性状も悪化させる傾向があることが認められ
た。 本発明者らは、この原因を究明し、解決手段を
得べく研究を重ねた結果、その原因は、アルマイ
ト処理中に、生成したアルマイト皮膜の一部が溶
解していくためにクロム酸浴中のアルミニウムイ
オン量が増加し、このために電流密度が低下し、
電解時間が延びることによることを認め、クロム
酸浴中のアルミニウムイオン量を一定値以下に維
持しながらアルマイト処理することによつて解決
し得ることを認めて本発明をなしたものである。
すなわち、本発明は、アルミニウム又はアルミニ
ウム合金材をクロム酸溶液浴中へ溶解しているア
ルミニウムイオン量をクロム酸濃度の1/20以下に
維持しながら1.5〜15重量%のクロム酸溶液浴中
で定電圧法により60Vより高い電圧でアルマイト
処理する高密度磁気記録材用アルマイト基板の製
法である。 本発明において使用するアルミニウム又はアル
ミニウム合金材としては、通常の素材を使用し得
るが、黒点欠陥の点からは、鉄、ケイ素などの含
有量の少ないものの方が好ましい。 又、本発明においてアルマイト用電解浴として
使用するクロム酸溶液の濃度は、1.5〜15重量%
であつて、この範囲外の濃度では効果を十分に発
揮し得ないものであつて、浴温度は、従来のブツ
サード法と呼ばれる定電圧クロム酸アルマイト法
における条件とほぼ同様な35〜50℃であるが、電
圧は、ブツサード法の40Vよりも高く、60V以
上、好ましくは70〜100Vの範囲で処理するもの
である。 しかして、アルマイト処理中のクロム酸浴中に
溶存するアルミニウムイオン量を、そのクロム酸
濃度の1/20以下に維持するものであつて、1/20以
上になると電流密度が低下し、電解時間が長くな
り、皮膜の性状を悪化させるものである。アルミ
ニウムイオン濃度をクロム酸濃度の1/2以下に保
つためには、たとえば、イオン交換樹脂法、イオ
ン透析膜法などによつてこれらのいずれかを電解
槽に直列あるいは並列に設置し所望のアルミニウ
ムイオン濃度に管理することができる。 次に、アルミニウム合金板(Al−3%Mg合
金)を40℃に保持した3重量%クロム酸溶液浴中
で溶存するアルミニウム量を変化させて、80Vの
直流定電圧によつてアルマイト処理した場合の電
流密度及び電解時間並びに高密度磁気記録材用ア
ルマイト基板に要求される黒点、クラツク及び硬
度について評価した結果を次表に示す。なお、ア
ルマイト皮膜厚はいずれも10μmとした。 黒点の評価は、顕微鏡視野(0.36mm2)におい
て、〇は2.5μm以下、△は3.5μm以下、×は5
μm以下の黒点が1ケ以下であることを示し、
又、クラツクの評価は、加熱処理後のアルマイト
基板を顕微鏡観察し、〇がクラツクが全くないも
の、△は部分的にクラツクを生じたもの、×は全
面的にクラツクが生じたことを示し、さらに、硬
度の評価は、微小硬度計を使用して測定した結果
で、〇は250Hv以上、△は200〜250Hv、×は
200Hv以下であることを示す。
The present invention relates to a method for producing an alumite substrate for a high-density magnetic recording material, which can prevent a decrease in current density using a chromic acid alumite method, has no black spot defects, and has excellent smoothness, heat resistance, etc. It is easy to obtain a highly precise smooth surface with excellent abrasion resistance and good abrasiveness, which is required for magnetic recording material substrates such as magnetic disks, and it is possible to easily form a thin magnetic layer on the surface. Aluminum or aluminum alloy materials that have been subjected to alumite treatment are used as materials that have the following properties. However, in this alumite substrate, impurities such as iron and silicon that are present in the aluminum or aluminum alloy material crystallize as intermetallic compounds, and these are dotted on the surface of the material, and during alumite treatment, this part becomes a very small alumite film. A so-called black spot defect occurs, which is a missing part. Initially, this missing part is very small on the submicron scale, but it expands as the alumite film grows, and in an alumite layer with a film thickness of 5 μm or more,
These are pit-like minute defects of 5 to 10 μm in size, and the larger the number, the more signal errors occur in the magnetic recording material, which is an undesirable problem. In addition, when making a high-density magnetic recording material, α-Fe 3 O 4 is deposited on an alumite substrate by sputtering or other methods, and then heated to 300 to 400°C to convert it into γ-Fe 2 O 3 . However, when such high-temperature heating is performed, there is a problem that cracks occur in the alumite film, which can easily cause product defects. Therefore, the thickness of the alumite layer is set to about 1 to 3 μm. There was also the problem that the coating had to be extremely thin, resulting in a decrease in the head crushing resistance of the alumite substrate. As a means of solving these problems,
We proposed a method for alumite treatment of aluminum or aluminum alloy materials in a chromic acid solution bath using a constant voltage method at an electrolytic voltage higher than the voltage normally used. (Patent Application No. 58-44364) However, in this method, it has been recognized that if the same bath is used for a long time, the current density gradually decreases, the electrolysis time increases, and the properties of the film tend to deteriorate. Ta. The inventors of the present invention investigated the cause of this problem and conducted repeated research to find a solution. As a result, the cause was found to be due to the fact that part of the alumite film formed during the alumite treatment was dissolved in the chromic acid bath. The amount of aluminum ions increases, which causes the current density to decrease,
The present invention was created by recognizing that this problem is caused by a prolonged electrolysis time, and that the problem can be solved by carrying out alumite treatment while maintaining the amount of aluminum ions in the chromic acid bath below a certain value.
That is, the present invention allows aluminum or aluminum alloy materials to be treated in a 1.5 to 15% by weight chromic acid solution bath while maintaining the amount of aluminum ions dissolved in the chromic acid solution bath at 1/20 or less of the chromic acid concentration. This is a method for manufacturing an alumite substrate for high-density magnetic recording materials, which is anodized using a constant voltage method at a voltage higher than 60V. As the aluminum or aluminum alloy material used in the present invention, ordinary materials can be used, but from the viewpoint of black spot defects, materials containing less iron, silicon, etc. are preferable. In addition, the concentration of the chromic acid solution used as the electrolytic bath for alumite in the present invention is 1.5 to 15% by weight.
However, the effect cannot be fully exhibited at concentrations outside this range, and the bath temperature is 35 to 50°C, which is almost the same as the conditions in the conventional constant voltage chromate alumite method called the Butssard method. However, the voltage is higher than the 40V of the Butssard method, and is 60V or more, preferably in the range of 70 to 100V. Therefore, the amount of aluminum ions dissolved in the chromic acid bath during alumite treatment is maintained at 1/20 or less of the chromic acid concentration, and when it becomes 1/20 or more, the current density decreases and the electrolysis time This increases the length of the film and deteriorates the properties of the film. In order to keep the aluminum ion concentration at 1/2 or less of the chromic acid concentration, for example, one of these can be installed in series or parallel in an electrolytic cell using the ion exchange resin method, ion dialysis membrane method, etc. to obtain the desired amount of aluminum. Ion concentration can be controlled. Next, when an aluminum alloy plate (Al-3%Mg alloy) was alumite-treated with a constant DC voltage of 80V while varying the amount of dissolved aluminum in a 3% by weight chromic acid solution bath held at 40℃. The following table shows the results of evaluating the current density and electrolysis time, as well as black spots, cracks, and hardness required for an alumite substrate for high-density magnetic recording materials. Note that the alumite film thickness was 10 μm in all cases. Evaluation of sunspots is in the microscope field (0.36 mm 2 ), 〇 is 2.5 μm or less, △ is 3.5 μm or less, × is 5
Indicates that there is no more than 1 black spot of μm or less,
In addition, to evaluate the cracks, the alumite substrate after heat treatment was observed under a microscope, and 〇 indicates that there were no cracks at all, △ indicates that cracks occurred partially, and × indicates that cracks occurred all over. Furthermore, the hardness evaluation is the result of measurement using a microhardness meter, 〇 is 250Hv or more, △ is 200-250Hv, × is
Indicates that it is 200Hv or less.

【表】 上表にみられるように、クロム酸溶液浴中のア
ルミニウムイオン量がクロム酸濃度の1/20以下で
アルマイト処理した場合には、電流密度の低下及
び電解時間の延長はそれほど大きくなく、かつア
ルマイト基板に要求される皮膜性状も十分満足し
ているものが得られている。これに対して、クロ
ム酸濃度に対して1/20以上になると電流密度は急
激に低下し、これに伴ない電解時間も大巾に長く
なり、得られたアルマイト基板の皮膜性状もクラ
ツクが発生し、硬度も低下するために高密度磁気
記録材用として不適当であることが認められる。 本発明は、クロム酸アルマイト法におけるクロ
ム溶液浴中のアルミニウムイオン量がクロム酸濃
度の1/20以下になるように維持して電解するよう
にしたので、電流密度の低下にしたがつて電解時
間が長くなることを防止し得て、黒点欠陥がな
く、平滑度、耐熱性などがすぐれているアルマイ
ト基板を製造し得たものであつてすぐれた効果が
認められる。 次に、本発明方法の実施例を述べる。 実施例 高密度磁気記録材用アルミニウム合金材(AL
−3%Mg合金、内径75mm、外径200mm、厚さ2
mm)を所定の表面研摩を施した後、非侵食性洗浄
剤によつて洗浄した後、40℃に加熱保持した3重
量%のクロム酸溶液浴中の溶存アルミニウムイオ
ン量を0.9g/になるように維持し、前記アル
ミニウム合金材を浸漬し、アノードとして直流電
圧を80V一定としてアルマイト処理を行ない、10
μmの乳白色の平滑なアルマイト皮膜を形成させ
た。 このときの電流密度は0.45A/dm2であり、電
解時間は107分間であつた。 得られた皮膜を顕微鏡で観察したが、黒点欠陥
は認められなかつた。又、この皮膜をさらに350
℃に2時間加熱した後、顕微鏡で観察したがクラ
ツクは皆無であつた。さらに、皮膜のビツカース
硬度は280Hvであつた。 比較例 長時間連続使用することによつて、3重量%の
クロム酸溶液浴中のアルミニウムイオン量が1.7
g/になつた浴を使用して他は実施例と同様条
件で同様にアルマイト処理を行なつた結果、電流
密度は0.31A/dm2であり、電解時間は175分間
であつた。得られたアルマイト皮膜は、黒点欠陥
及びクラツクの発生が認められ、ビツカース硬度
は220Hvであつた。
[Table] As shown in the table above, when alumite treatment is performed with the amount of aluminum ions in the chromic acid solution bath being 1/20 or less of the chromic acid concentration, the decrease in current density and the extension of electrolysis time are not so large. In addition, a film that satisfies the film properties required for an alumite substrate was obtained. On the other hand, when the current density becomes 1/20 or more of the chromic acid concentration, the current density decreases rapidly, the electrolysis time increases considerably, and the film properties of the obtained alumite substrate also crack. However, it is recognized that it is unsuitable for use in high-density magnetic recording materials because the hardness also decreases. In the present invention, the amount of aluminum ions in the chromium solution bath in the chromic acid alumite method is maintained at 1/20 or less of the chromic acid concentration during electrolysis, so the electrolysis time is adjusted as the current density decreases. It is possible to produce an alumite substrate which can prevent the wafer from becoming long, has no black spot defects, and has excellent smoothness, heat resistance, etc., and excellent effects are recognized. Next, examples of the method of the present invention will be described. Example Aluminum alloy material for high-density magnetic recording material (AL
-3% Mg alloy, inner diameter 75mm, outer diameter 200mm, thickness 2
mm) was subjected to specified surface polishing, washed with a non-erosive cleaning agent, and the amount of dissolved aluminum ions in a 3% by weight chromic acid solution bath heated and maintained at 40℃ was reduced to 0.9g/mm). The aluminum alloy material was immersed and anodized at a constant DC voltage of 80V as an anode.
A milky white smooth alumite film of μm size was formed. The current density at this time was 0.45 A/dm 2 and the electrolysis time was 107 minutes. The obtained film was observed under a microscope, but no black spot defects were observed. In addition, this film is further added to 350
After heating at ℃ for 2 hours, observation under a microscope showed that there were no cracks. Furthermore, the film had a Vickers hardness of 280 Hv. Comparative example: After continuous use for a long time, the amount of aluminum ions in a 3% by weight chromic acid solution bath decreased to 1.7
Alumite treatment was carried out in the same manner as in the example using a bath with a temperature of 1.5 g/g/g/g/g/dm, except that the current density was 0.31 A/dm 2 and the electrolysis time was 175 minutes. The resulting alumite film had black spot defects and cracks, and had a Vickers hardness of 220 Hv.

Claims (1)

【特許請求の範囲】[Claims] 1 アルミニウム又はアルミニウム合金材をクロ
ム酸溶液浴中へ溶解しているアルミニウムイオン
量をクロム酸濃度の1/20以下に維持しながら1.5
〜15重量%のクロム酸溶液浴中で定電圧法により
60Vより高い電圧でアルマイト処理することを特
徴とする高密度磁気記録材用アルマイト基板の製
法。
1.1.5 while maintaining the amount of aluminum ions dissolved in the chromic acid solution bath of aluminum or aluminum alloy material to 1/20 or less of the chromic acid concentration.
by constant voltage method in ~15 wt% chromic acid solution bath
A method for producing an alumite substrate for high-density magnetic recording materials, which is characterized by alumite treatment at a voltage higher than 60V.
JP2195784A 1984-02-10 1984-02-10 Manufacturing method of alumite substrate for high-density magnetic recording material Granted JPS60169593A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2195784A JPS60169593A (en) 1984-02-10 1984-02-10 Manufacturing method of alumite substrate for high-density magnetic recording material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2195784A JPS60169593A (en) 1984-02-10 1984-02-10 Manufacturing method of alumite substrate for high-density magnetic recording material

Publications (2)

Publication Number Publication Date
JPS60169593A JPS60169593A (en) 1985-09-03
JPS6260478B2 true JPS6260478B2 (en) 1987-12-16

Family

ID=12069541

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2195784A Granted JPS60169593A (en) 1984-02-10 1984-02-10 Manufacturing method of alumite substrate for high-density magnetic recording material

Country Status (1)

Country Link
JP (1) JPS60169593A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4559188B2 (en) * 2003-12-26 2010-10-06 東洋製罐株式会社 Oxide coating method and apparatus

Also Published As

Publication number Publication date
JPS60169593A (en) 1985-09-03

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