JPS6347497B2 - - Google Patents
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- Publication number
- JPS6347497B2 JPS6347497B2 JP60297598A JP29759885A JPS6347497B2 JP S6347497 B2 JPS6347497 B2 JP S6347497B2 JP 60297598 A JP60297598 A JP 60297598A JP 29759885 A JP29759885 A JP 29759885A JP S6347497 B2 JPS6347497 B2 JP S6347497B2
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- Prior art keywords
- gas
- waste gas
- halogen
- soda lime
- raw material
- Prior art date
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Description
【発明の詳細な説明】
≪産業上の利用分野≫
本発明は、ハロゲン系の有毒ガスを含む廃ガス
を乾式処理して有毒ガスを除去する方法に関し、
(1) 廃ガスと固形処理剤との接触面積を増して有
毒ガスの除去効率を向上し、廃ガス中の有毒ガ
スの濃度を安全な許容限界以下に確実に低減で
きる、
(2) 固形処理剤中の水分を低減して有毒ガスとの
反応による酸性度の高いガスの発生を抑え、腐
食による処理装置の劣化を阻止できる、
ものを提供する。[Detailed Description of the Invention] <<Industrial Application Field>> The present invention relates to a method for removing toxic gas by dry processing waste gas containing halogen-based toxic gas, including: (1) waste gas and a solid processing agent; (2) Reduce the moisture in the solid processing agent to improve the removal efficiency of toxic gases and reliably reduce the concentration of toxic gases in the waste gas to below the safe permissible limit. To provide a product that can suppress the generation of highly acidic gas due to reaction with a chemical and prevent deterioration of processing equipment due to corrosion.
≪従来技術≫
現在、ハロゲン系ガスはドライエツチング、ド
ーピング等の半導体用を初めとして、光フアイバ
ー、エキシマレーザー等にも拡く使用されてい
る。<<Prior Art>> At present, halogen-based gases are widely used not only for semiconductor applications such as dry etching and doping, but also for optical fibers, excimer lasers, and the like.
しかしながら、このハロゲン系ガスは毒性が強
いので、使用後には不活性ガスやガス状フツ化物
で希釈したうえで、中に含まれる有毒ガスが安全
な低濃度になるように当該ハロゲン系廃ガスを処
理する必要がある。 However, this halogen-based gas is highly toxic, so after use, it must be diluted with an inert gas or gaseous fluoride, and the halogen-based waste gas must be diluted to a safe low concentration of toxic gases. need to be processed.
ハロゲン系有毒ガスを含む廃ガスの乾式処理方
法としては、例えば、F2含有廃ガスをソーダ石
灰、活性アルミナ等で常温処理する方法が知られ
ているのを初め、より具体的には、F2含有廃ガ
スを炭酸石灰若しくは消石灰で処理することが特
公昭54−35191号公報に、HF含有廃ガスを活性
アルミナで処理することが特公昭57−92号公報
に、また、HCl含有ガスを粒状焼成ドロマイトで
処理することが特開昭59−150526号公報に各々開
示されている。 As a dry treatment method for waste gas containing halogen-based toxic gases, for example, a method of treating F2- containing waste gas with soda lime, activated alumina, etc. at room temperature is known. Japanese Patent Publication No. 54-35191 states that 2- containing waste gas is treated with carbonate lime or slaked lime, and Japanese Patent Publication No. 1987-92 states that HF-containing waste gas is treated with activated alumina. Treatment with granular calcined dolomite is disclosed in JP-A-59-150526.
≪発明が解決しようとする問題点≫
そこで、一例として、F2ガスを含む廃ガスを
ソーダ石灰を用いて常温処理する従来法について
検討すると、廃ガス中のF2ガスの濃度が比較的
高濃度の場合にはF2ガスを許容濃度以下にまで
除去できるが、
(1) 低濃度の場合には希釈ガスの増加に伴つて十
分にF2ガスを除去することができず除去効率
は低い、
(2) 装置の腐食が進行し、長期処理に耐え得な
い、などの実情がある。≪Problems to be solved by the invention≫ Therefore, as an example, when examining the conventional method of treating waste gas containing F 2 gas at room temperature using soda lime, it is found that the concentration of F 2 gas in the waste gas is relatively high. In the case of high concentration, F2 gas can be removed to below the allowable concentration; (1) In the case of low concentration, F2 gas cannot be removed sufficiently as the dilution gas increases, and the removal efficiency is low. (2) The actual situation is that the equipment has progressed to corrosion and cannot withstand long-term treatment.
≪問題点を解決するための手段≫
本発明者等は、
(1) 乾式処理の効率に影響を与える因子のうち、
処理温度がきわめて重要であり、ガス流速、ガ
ス濃度はほぼ無関係であること
(2) 固形処理剤に含まれる水分、即ち、自由水、
結晶水は有毒ガスの除去反応においては、接触
面積を減らす作用をし、もつて除去効率を低減
させること
(3) 固形処理剤中の上記水分はハロゲン系ガスと
反応して酸性度の高いガス、例えば、HCl、
HFを生成せしめ、これらが装置の腐食を促進
すること
を新たに見い出し、この発見に基いて本発明を完
成した。≪Means for solving the problems≫ The present inventors have identified (1) among the factors that affect the efficiency of dry processing:
Processing temperature is extremely important, and gas flow rate and gas concentration are almost unrelated. (2) Moisture contained in the solid processing agent, that is, free water,
Crystal water has the effect of reducing the contact area in the toxic gas removal reaction, thereby reducing the removal efficiency (3) The above water in the solid processing agent reacts with the halogen gas to form a highly acidic gas , for example, HCl,
We have newly discovered that HF is generated and promotes corrosion of equipment, and based on this discovery, we have completed the present invention.
即ち、本発明は、ハロゲン系の有毒ガスを含む
廃ガスを固形処理剤の充填された処理装置に通し
て有毒ガスの濃度を低減するハロゲン系廃ガスの
乾式処理方法において、固形処理剤をソーダ石灰
とし、予めソーダ石灰を脱水乾燥させたのち、
200〜300℃でハロゲン系ガスを含む廃ガスを当該
ソーダ石灰に接触させることを特徴とするもので
ある。 That is, the present invention provides a dry treatment method for halogen-based waste gas in which waste gas containing halogen-based toxic gas is passed through a processing device filled with a solid processing agent to reduce the concentration of the toxic gas. After dehydrating and drying the soda lime in advance,
This method is characterized by bringing waste gas containing halogen gas into contact with the soda lime at 200 to 300°C.
本発明の処理対象となる廃ガスは、Cl2、HCl、
BCl3、SiCl4、SiH2Cl2等の塩素系有毒ガス若し
くはF2、HF、BF3、SiF4、GeF4、MoF6、WF6
等のフツ素系有毒ガスを少なくとも一種以上含む
ものである。 The waste gas to be treated by the present invention includes Cl 2 , HCl,
Chlorine-based toxic gases such as BCl 3 , SiCl 4 , SiH 2 Cl 2 or F 2 , HF, BF 3 , SiF 4 , GeF 4 , MoF 6 , WF 6
It contains at least one type of fluorine-based toxic gas such as.
固形処理剤となるソーダ石灰はか粒状若しくは
粉末とする。 Soda lime, which serves as a solid treatment agent, is in the form of granules or powder.
当該ソーダ石灰は、廃ガスに接触させる場合の
前処理として、予め脱水乾燥処理を施されるが、
この処理は常温で真空乾燥しても良いが、300℃
で5時間程度加熱乾燥するのが好ましい。 The soda lime is subjected to dehydration and drying treatment in advance as a pretreatment when it is brought into contact with waste gas.
This process can be done by vacuum drying at room temperature, but
It is preferable to heat and dry for about 5 hours.
尚、廃ガスは冒述したように半導体工場等から
出る上記有毒ハロゲン系ガスをN2、CO2、He、
Ar、Ne等の不活性ガス或いはCF4、C2F6、SF6
等の不括性なガス状フツ化物で希釈したものであ
る。 In addition, as mentioned above, the waste gas is the toxic halogen gas emitted from semiconductor factories, etc., and is converted into N 2 , CO 2 , He,
Inert gas such as Ar, Ne or CF 4 , C 2 F 6 , SF 6
It is diluted with a gaseous fluoride such as.
除去処理は、廃ガスを予め加熱して反応筒に通
しても良いし、反応筒に加熱器をセツトして所定
温度に加熱するようにしても差し支えない。 In the removal process, the waste gas may be heated in advance and passed through the reaction tube, or a heater may be set in the reaction tube to heat it to a predetermined temperature.
除去処理の温度は200℃より低いと除去効率が
低下し、300℃より高いとランニングコストが大
きくなるので、200〜300℃が良好である。 If the temperature of the removal treatment is lower than 200°C, the removal efficiency will decrease, and if it is higher than 300°C, the running cost will increase, so a temperature of 200 to 300°C is preferable.
≪作用≫
先ず、ソーダ石灰は脱水乾燥の前処理を施され
るので、内部に含まれる水分、主に自由水を予め
低くできるうえ、廃ガスをソーダ石灰に接触させ
る本段階の除去処理を200〜300℃の高温に保つの
で、ソーダ石灰中の残留水分、主に結晶水を遊離
して蒸発させることができる。≪Operation≫ First, the soda lime is subjected to a pretreatment of dehydration and drying, so that the moisture contained inside, mainly free water, can be lowered in advance. Since the temperature is kept at a high temperature of ~300℃, residual moisture in soda lime, mainly crystallization water, can be liberated and evaporated.
従つて、ソーダ石灰の表面が水分で覆われるこ
とを阻止して、廃ガスと接触し得るソーダ石灰の
表面積を大きく確保できる。 Therefore, the surface of soda lime can be prevented from being covered with moisture, and a large surface area of soda lime that can come into contact with waste gas can be secured.
また、上述のように、廃ガスがソーダ石灰に接
触する段階では、ソーダ石灰中の水分はほとんど
排除されるので、廃ガス中の有害ガス、例えば、
Cl2、F2等がこの水分と反応して酸性度の高い
HCl、HFガスを生ぜしめ、これが処理装置を腐
食させることもなくせる。 In addition, as mentioned above, at the stage where the waste gas comes into contact with soda lime, most of the moisture in the soda lime is removed, so harmful gases in the waste gas, for example,
Cl 2 , F 2, etc. react with this moisture and become highly acidic.
It also eliminates the generation of HCl and HF gases that corrode processing equipment.
≪発明の効果≫
(1) 廃ガスと接触し得るソーダ石灰の表面積を大
きく確保できるので、有害ガスの除去効率を増
し、低濃度の有害ガスを含む廃ガスの場合で
も、十分にこれを許容限界以下の濃度に除去処
理できる。≪Effects of the invention≫ (1) Since a large surface area of soda lime that can come into contact with waste gas can be secured, the removal efficiency of harmful gases is increased, and even in the case of waste gas containing a low concentration of harmful gases, this can be sufficiently tolerated. Can be removed to a concentration below the limit.
(2) ソーダ石灰に廃ガスが接触しても酸性度の高
いガスの発生を未然に防止できるので、処理装
置の腐触をなくして劣化を阻止し、もつて、装
置の長期使用を可能にする。(2) Even if waste gas comes into contact with soda lime, the generation of highly acidic gas can be prevented, eliminating corrosion of the processing equipment and preventing deterioration, thereby enabling long-term use of the equipment. do.
≪実施例≫
下記の実験装置を用いて、ソーダ石灰を脱水乾
燥する前処理を行なつた場合と行なわない場合並
びに廃ガスをソーダ石灰に接触させる際の温度、
ガス流速及び廃ガスの種類を各々変化させた場合
に、廃ガス中の有害ガスが除去される割合を順次
実験した。≪Example≫ Using the following experimental equipment, the pretreatment for dehydrating and drying soda lime was performed and was not performed, and the temperature when bringing the waste gas into contact with soda lime,
Experiments were conducted to determine the rate of removal of harmful gases from waste gas when the gas flow rate and type of waste gas were varied.
実験装置は、第1図に示すように、反応筒1、
希釈ガス供給源2、処理対象となるハロゲン系ガ
ス供給源3、原料ガス供給ライン4及びガスクロ
ライン5から成り、反応筒1はSUS316を材質と
する長さ495mm、内径53mmの円筒体の中央寄りに
か粒状ソーダ石灰20を充填し、その両端に各々
フイルター6を介して吸気室7及び浄気室8を形
成した垂直固定床式反応器である。 As shown in Fig. 1, the experimental apparatus consists of a reaction column 1,
Consisting of a dilution gas supply source 2, a halogen gas supply source 3 to be treated, a raw material gas supply line 4, and a gas chlorine line 5, the reaction tube 1 is a cylindrical body made of SUS316 with a length of 495 mm and an inner diameter of 53 mm, near the center. This is a vertical fixed bed type reactor filled with granular soda lime 20 and having an intake chamber 7 and a clean air chamber 8 formed at both ends through filters 6, respectively.
希釈ガス供給源2とハロゲン系ガス供給源3か
ら各々ガス供給ライン10,11を並列状に導出
し、これらに可変流量弁、流量計等を介装したの
ち、一本の原料ガス供給ライン4に統合して、こ
れを反応筒1の吸気室7で連結し、反応筒2に不
活性ガス、例えばN2ガスで希釈したハロゲン系
ガス(以下、原料廃ガスという)を供給可能に構
成する。 Gas supply lines 10 and 11 are led out in parallel from the dilution gas supply source 2 and the halogen-based gas supply source 3, and a variable flow rate valve, a flow meter, etc. are interposed in these lines, and then a single raw material gas supply line 4 is connected. are integrated and connected through the intake chamber 7 of the reaction tube 1, so that an inert gas such as a halogen gas diluted with N2 gas (hereinafter referred to as raw material waste gas) can be supplied to the reaction tube 2. .
また、反応筒1の浄気室8にガスクロライン5
を連結し、ガスクロライン5にガスクロマトグラ
フ12及び流量計14を接続して、ソーダ石灰層
20を経て浄気室4に透過する原料廃ガスの流量
及びガス中のハロゲン系ガスの濃度を各々測定、
算出する。 In addition, a gas chlorine line 5 is installed in the clean air chamber 8 of the reaction tube 1.
A gas chromatograph 12 and a flow meter 14 are connected to the gas chromatograph line 5, and the flow rate of the raw material waste gas permeating into the clean air chamber 4 through the soda lime layer 20 and the concentration of halogen-based gas in the gas are measured respectively. ,
calculate.
尚、符号15は反応筒1を加熱するためのヒー
タである。 Incidentally, reference numeral 15 is a heater for heating the reaction tube 1.
実験例 1
予め、300℃で5時間加熱真空乾燥したか粒状
ソーダ石灰600gを反応筒に充填し、反応筒を300
℃に加熱し、N2ガスで14%に希釈したCl2ガスを
当該反応筒に0.6m/minの流速で流し続けて、廃
ガス中のCl2ガスの濃度が0.5ppm(ACGIHのTLV
による自主基準を参照)に達するまでの原料廃ガ
スの供給量を測定した(以下の実験例における原
料廃ガスの供給量も各有害ガスに対応する自主基
準濃度を基準として規定されている)。Experimental example 1 A reaction tube was filled with 600g of granulated soda lime that had been heated and vacuum dried at 300℃ for 5 hours, and the reaction tube was heated to 300℃.
Cl 2 gas heated to ℃ and diluted to 14% with N 2 gas is continuously flowed into the reaction column at a flow rate of 0.6 m/min, and the concentration of Cl 2 gas in the waste gas is 0.5 ppm (ACGIH TLV
The amount of raw material waste gas supplied was measured until reaching the voluntary standards (see the voluntary standards by the Institute of Health and Welfare, Inc.).
また、比較例では、脱水乾燥の処理を施さない
ままでソーダ石灰600gを反応筒に充填したのち、
上記と同様の処理を行なつた。 In addition, in a comparative example, 600 g of soda lime was filled into the reaction column without dehydration and drying, and then
The same treatment as above was performed.
尚、原料廃ガスの供給量は、ソーダ石灰を1Kg
使用した場合に換算し直した数値を示す(以下の
実験例も同様である)。 The amount of raw material waste gas supplied is 1 kg of soda lime.
The reconverted numerical values are shown when used (the same applies to the following experimental examples).
第2図はその結果を示す図表であつて、本発明
の供給量は比較例の略6倍の数値を示し、前処理
が除去効率に与える影響は予想外に大きいことが
判る。 FIG. 2 is a chart showing the results, and shows that the supply amount of the present invention is approximately six times that of the comparative example, and it can be seen that the influence of pretreatment on removal efficiency is unexpectedly large.
実験例 2
前処理を実験例1と同様に行ない、ガス流速を
0.5m/minに設定し、N2ガスで2%に希釈した
BCl3ガスを原料廃ガスとして、反応筒の温度を
150℃、200℃、250℃及び300℃の4段階に変化さ
せて、原料廃ガスの供給量を各々測定した。Experimental example 2 Pretreatment was performed in the same manner as in experimental example 1, and the gas flow rate was
Set at 0.5 m/min and diluted to 2% with N2 gas.
Using BCl 3 gas as raw material waste gas, the temperature of the reaction column is
The amount of raw material waste gas supplied was measured at four stages: 150°C, 200°C, 250°C, and 300°C.
第3図はその結果を示す図表であつて、処理温
度の上昇に伴つて原料廃ガスの供給量は増加する
ことが判る。 FIG. 3 is a chart showing the results, and it can be seen that the amount of raw material waste gas supplied increases as the processing temperature increases.
150℃〜300℃における原料廃ガスの供給量の変
化をみると、200℃→250℃→300℃では処理能力
は漸次増加するが、150℃→200℃では急激な増加
を示す。 Looking at the change in the supply amount of raw material waste gas from 150°C to 300°C, the processing capacity gradually increases from 200°C to 250°C to 300°C, but shows a rapid increase from 150°C to 200°C.
従つて、150℃では未だ処理能力は実質的に充
分ではなく、処理温度は200℃以上に設定すべき
である。 Therefore, the processing capacity is still not substantially sufficient at 150°C, and the processing temperature should be set at 200°C or higher.
尚、処理温度を300℃より高くすると、前述の
如くランニングコストが大きくなつて経済的に好
ましくない。 Incidentally, if the treatment temperature is higher than 300° C., the running cost increases as described above, which is not economically preferable.
実験例 3
前処理を実験例1と同様に施し、反応筒の温度
を300℃に設定し、N2ガスで14%に希釈したCl2
ガスを原料廃ガスとして、0.2m/min、0.6m/mi
n、1.0m/minの3段階にガス流速を変化させて
反応筒に供給し、各流速における原料廃ガスの供
給量を測定した。Experimental Example 3 Pretreatment was performed in the same manner as in Experimental Example 1, the temperature of the reaction column was set at 300°C, and Cl 2 diluted to 14% with N 2 gas was used.
Gas is used as raw material waste gas, 0.2m/min, 0.6m/mi
The gas flow rate was varied in three stages of n and 1.0 m/min, and the gas was supplied to the reaction column, and the amount of raw material waste gas supplied at each flow rate was measured.
第4図はその結果を示す図表であつて、原料廃
ガスの供給量はガス流速によつてほとんど変化せ
ず、実際の廃ガス処理においては単位時間当たり
の処理量及び原料廃ガスの希釈濃度の大小に適合
させてガス流速を変化させても、その廃ガスの処
理能力は変わらないことが判る。 Figure 4 is a chart showing the results, and shows that the feed rate of raw material waste gas hardly changes depending on the gas flow rate, and in actual waste gas treatment, the amount of treatment per unit time and the dilution concentration of raw material waste gas are It can be seen that even if the gas flow rate is changed to match the size of the gas, the waste gas treatment capacity remains the same.
実験例 4
前処理、ガス流速を0.5m/min、反応筒の温度
を300℃に各々設定し、反応筒に流す原料廃ガス
の種類を変化させた場合の浄気室への供給量を
各々測定した。Experimental example 4 The pretreatment and gas flow rate were set to 0.5 m/min, and the temperature of the reaction tube was set to 300℃, and the amount supplied to the clean air chamber was determined by changing the type of raw material waste gas flowing into the reaction tube. It was measured.
原料廃ガスは、F2、HF、BF3、SiF4、GeF4、
WF6、MoF6、Cl2、HCl、BCl3、SiCl2、SiH2Cl2
を各々単一種類のガスとしてN2ガスで2%に希
釈したものを用いた。 The raw material waste gas is F 2 , HF, BF 3 , SiF 4 , GeF 4 ,
WF6 , MoF6 , Cl2 , HCl, BCl3 , SiCl2 , SiH2Cl2
Each of these was diluted to 2% with N 2 gas as a single type of gas.
第5図はその結果を示す図表であつて、固形処
理剤としてソーダ石灰を用い、ソーダ石灰に脱水
乾燥の前処理を施し、且つ、300℃で除去処理す
れば、有害ガスを許容濃度以下に継続処理できる
原料廃ガスの供給量は、全種類の有毒ハロゲン系
ガスを通じて700リツトルを越えることが判る。 Figure 5 is a diagram showing the results, and shows that if soda lime is used as a solid treatment agent, the soda lime is pretreated by dehydration and drying, and the removal treatment is performed at 300℃, the harmful gases can be reduced to below the allowable concentration. It can be seen that the supply amount of raw material waste gas that can be continuously processed exceeds 700 liters, including all types of toxic halogen gases.
特に、有毒ガスがHF、F2若しくはHClである
場合には、廃ガスの供給量は10000リツトル以上
の数値を示す。 In particular, when the toxic gas is HF, F2 or HCl, the amount of waste gas supplied is greater than 10,000 liters.
従つて、本発明の処理方法を採れば、有毒ハロ
ゲン系ガスの種類を問わず原料廃ガスを効率よく
安全な低濃度まで除去処理できる。 Therefore, by employing the treatment method of the present invention, raw material waste gas can be efficiently removed to a safe low concentration regardless of the type of toxic halogen gas.
実験例 5
予め、300℃で5時間脱水乾燥したソーダ石灰
を反応筒に充填し、反応筒を300℃に加熱し、N2
ガスで5%に希釈したSiF4ガスを当該反応筒に供
給して、浄気室内のSiF4ガスの濃度が許容濃度に
達するまで継続した。Experimental Example 5 A reaction tube was filled with soda lime that had been dehydrated and dried at 300°C for 5 hours, heated to 300°C, and N 2
SiF 4 gas diluted to 5% with gas was supplied to the reaction column until the concentration of SiF 4 gas in the clean air chamber reached the allowable concentration.
また、比較例として、予め150℃で5時間脱水
乾燥したソーダ石灰を反応筒に充填し、反応筒を
150℃に加熱したのち、上述と同様の処理を施し
たものを用いた。 In addition, as a comparative example, soda lime that had been dehydrated and dried at 150°C for 5 hours was filled into the reaction tube, and the reaction tube was opened.
After heating to 150°C, the same treatment as above was used.
その結果、300℃で前処理及び除去処理を行な
つた場合には反応筒内に異状は認められなかつた
が、150℃で前処理及び除去処理を行なつた場合
には、反応筒内に白色粉末状の付着物の発生が認
められた。 As a result, no abnormality was observed inside the reaction column when pretreatment and removal treatment were performed at 300℃, but when pretreatment and removal treatment were performed at 150℃, there was no abnormality observed inside the reaction column. Occurrence of white powdery deposits was observed.
第6図は、当該付着物のX線回折図(ターゲツ
トとしてCuを使用)であつて、同図によれば回
折角18度、22度及び34度等に顕著な吸収ピークが
認められる。 FIG. 6 is an X-ray diffraction diagram of the deposit (Cu is used as a target), and according to the diagram, remarkable absorption peaks are observed at diffraction angles of 18 degrees, 22 degrees, and 34 degrees.
一方、ターゲツトにCuを使用してFeSiF6・
6H2OのX線回折実験を行なうと、回折角18.5度、
21.3度及び33.9度等に明瞭な吸収ピークが現われ
るので、上記付着物はFeSiF6・6H2Oに固定でき
る。 On the other hand, using Cu as the target, FeSiF6・
When performing an X-ray diffraction experiment on 6H 2 O, the diffraction angle was 18.5 degrees,
Since clear absorption peaks appear at 21.3 degrees and 33.9 degrees, the deposits can be fixed on FeSiF 6 6H 2 O.
このことから、前処理及び除去処理の温度条件
が150℃の低温である場合には、下記の反応が進
行するものと推定できる。 From this, it can be estimated that the following reaction will proceed when the temperature conditions for the pretreatment and removal treatment are as low as 150°C.
SiF4+2H2O→SiO2+4HF ……(1)
Fe+2HF→FeF2+H2 ……(2)
FeF2+SiF4+6H2O→
FeSiF6・6H2O ……(3)
即ち、ソーダ石灰の加熱が充分に行なわれない
場合には、かなりの割合で水分、具体的には自由
水と結晶水がソーダ石灰内に残留し、この水分が
原料廃ガス中のSiF4と反応してHFを生じ(反応
式(1)参照)、処理装置の材質であるFeが当該HF
で腐食されてフツ化鉄になり(反応式(2)参照)、
次いでSiF4との間でFeSiF6・6H2Oなる付着物を
生成せしめた(反応式(3)参照)ものと考えられ
る。 SiF 4 +2H 2 O→SiO 2 +4HF ...(1) Fe+2HF→FeF 2 +H 2 ...(2) FeF 2 +SiF 4 +6H 2 O→ FeSiF 6・6H 2 O ...(3) That is, heating of soda lime If this is not carried out sufficiently, a considerable proportion of moisture, specifically free water and crystallized water, will remain in the soda lime, and this moisture will react with SiF 4 in the raw material waste gas to produce HF. (See reaction formula (1)), Fe, which is the material of the processing equipment, is
is corroded and becomes iron fluoride (see reaction formula (2)),
It is thought that a deposit called FeSiF 6 .6H 2 O was then formed with SiF 4 (see reaction formula (3)).
従つて、FeSiF6・6H2Oを成分とする当該付着
物の発生は、なによりも処理装置の腐食が進行し
ている証左となる。 Therefore, the occurrence of such deposits containing FeSiF 6 .6H 2 O as a component is evidence that corrosion of the processing equipment is proceeding above all else.
これに対し、前処理を行ない除去処理を300℃
の高温で行なえば、当該付着物の発生は認められ
ず、従つて処理装置の腐食を阻止できることが判
る。 On the other hand, pre-treatment is performed and removal treatment is carried out at 300℃.
It can be seen that if the treatment is carried out at a high temperature of 1, no occurrence of the deposits is observed, and therefore corrosion of the processing equipment can be prevented.
第1図は本発明方法についての実験装置の概略
説明図、第2図は前処理の有無による除去処理能
力の差異を示す図表、第3図は除去処理温度を変
化させた場合の除去処理能力を示す図表、第4図
はガス流速を変化させた場合の除去処理能力を示
す図表、第5図は原料廃ガスの種類を変化させた
場合の除去処理能力を示す図表、第6図は実験で
得られた付着物のX線回折図である。
1…反応筒、2…希釈ガス供給源、3…ハロゲ
ン系ガス供給源、4…原料ガス供給ライン、20
…ソーダ石灰。
Figure 1 is a schematic explanatory diagram of the experimental equipment for the method of the present invention, Figure 2 is a chart showing the difference in removal processing capacity depending on the presence or absence of pretreatment, and Figure 3 is the removal processing capacity when the removal processing temperature is changed. Figure 4 is a diagram showing the removal capacity when changing the gas flow rate, Figure 5 is a diagram showing the removal capacity when the type of raw material waste gas is changed, and Figure 6 is a graph showing the experimental results. It is an X-ray diffraction diagram of the deposit obtained in . DESCRIPTION OF SYMBOLS 1... Reaction column, 2... Dilution gas supply source, 3... Halogen gas supply source, 4... Raw material gas supply line, 20
...soda lime.
Claims (1)
理剤の充填された処理装置に通して有毒ガスの濃
度を低減するハロゲン系廃ガスの乾式処理方法に
おいて、固形処理剤をソーダ石灰とし、予めソー
ダ石灰を脱水乾燥させたのち、200〜300℃でハロ
ゲン系ガスを含む廃ガスを当該ソーダ石灰に接触
させることを特徴とするハロゲン系廃ガスの乾式
処理方法。 2 ソーダ石灰を300℃で脱水乾燥させることを
特徴とする特許請求の範囲第1項に記載のハロゲ
ン系廃ガスの乾式処理方法。 3 ハロゲン系の有毒ガスがCl2、HCl、BCl3、
SiCl4、SiH2Cl2、F2、HF、BF3、SiF4、GeF4、
MoF6及びWF6の少なくとも一種であることを特
徴とする特許請求の範囲第1項又は第2項に記載
のハロゲン系廃ガスの乾式処理方法。[Scope of Claims] 1. In a dry treatment method for halogen-based waste gas in which waste gas containing halogen-based toxic gas is passed through a processing device filled with a solid processing agent to reduce the concentration of the toxic gas, A dry treatment method for halogen-based waste gas, which comprises using soda lime, dehydrating and drying the soda lime in advance, and then bringing the waste gas containing halogen-based gas into contact with the soda lime at 200 to 300°C. 2. The method for dry treatment of halogen-based waste gas according to claim 1, characterized in that soda lime is dehydrated and dried at 300°C. 3 Halogen-based toxic gases include Cl 2 , HCl, BCl 3 ,
SiCl4 , SiH2Cl2 , F2 , HF, BF3 , SiF4 , GeF4 ,
The method for dry treatment of halogen-based waste gas according to claim 1 or 2, characterized in that the method is at least one of MoF 6 and WF 6 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60297598A JPS62152519A (en) | 1985-12-26 | 1985-12-26 | Dry treatment of halogen type waste gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60297598A JPS62152519A (en) | 1985-12-26 | 1985-12-26 | Dry treatment of halogen type waste gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62152519A JPS62152519A (en) | 1987-07-07 |
| JPS6347497B2 true JPS6347497B2 (en) | 1988-09-22 |
Family
ID=17848631
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60297598A Granted JPS62152519A (en) | 1985-12-26 | 1985-12-26 | Dry treatment of halogen type waste gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62152519A (en) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5417934A (en) * | 1988-06-04 | 1995-05-23 | Boc Limited | Dry exhaust gas conditioning |
| GB8813270D0 (en) * | 1988-06-04 | 1988-07-06 | Plasma Products Ltd | Dry exhaust gas conditioning |
| US5110580A (en) * | 1989-09-14 | 1992-05-05 | Iolab Corporation | Method and apparatus for chlorine dioxide manufacture |
| JPH06177B2 (en) * | 1990-02-05 | 1994-01-05 | 株式会社荏原総合研究所 | Method for treating exhaust gas containing C1F (bottom 3) |
| JPH09267027A (en) * | 1996-03-29 | 1997-10-14 | Japan Pionics Co Ltd | Hazardous gas purifier |
| KR100731836B1 (en) * | 1998-04-09 | 2007-06-25 | 허니웰 인터내셔널 인코포레이티드 | Preparation and purification of diborane |
| US6060034A (en) * | 1998-06-02 | 2000-05-09 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Abatement system for ClF3 containing exhaust gases |
| US6309618B1 (en) | 1999-03-12 | 2001-10-30 | Showa Denko K. K. | Method for treating exhaust gas containing fluorine-containing interhalogen compound, and treating agent and treating apparatus |
| JP5238299B2 (en) * | 2008-03-10 | 2013-07-17 | 東洋炭素株式会社 | Fluorine gas generator |
| JP5170040B2 (en) * | 2009-09-01 | 2013-03-27 | 株式会社日立製作所 | HF-containing gas dry processing apparatus and processing method |
| JP2018103156A (en) * | 2016-12-28 | 2018-07-05 | 大陽日酸株式会社 | Exhaust gas treatment column, exhaust gas treatment device and exhaust gas treatment method |
| JP7164992B2 (en) * | 2018-08-21 | 2022-11-02 | 株式会社荏原製作所 | Rare gas recovery device |
-
1985
- 1985-12-26 JP JP60297598A patent/JPS62152519A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62152519A (en) | 1987-07-07 |
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