JPS6357644A - Production of dimethylsiloxane block copolymer - Google Patents
Production of dimethylsiloxane block copolymerInfo
- Publication number
- JPS6357644A JPS6357644A JP20012686A JP20012686A JPS6357644A JP S6357644 A JPS6357644 A JP S6357644A JP 20012686 A JP20012686 A JP 20012686A JP 20012686 A JP20012686 A JP 20012686A JP S6357644 A JPS6357644 A JP S6357644A
- Authority
- JP
- Japan
- Prior art keywords
- group
- parts
- block copolymer
- formula
- dimethylsiloxane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- -1 dimethylsiloxane Chemical class 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 229920001400 block copolymer Polymers 0.000 title abstract description 30
- 239000004205 dimethyl polysiloxane Substances 0.000 claims abstract description 25
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims abstract description 25
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 15
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 15
- 239000000178 monomer Substances 0.000 claims abstract description 12
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 4
- 125000003118 aryl group Chemical group 0.000 claims abstract description 3
- 229920001577 copolymer Polymers 0.000 claims abstract description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 3
- 230000000379 polymerizing effect Effects 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 20
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 125000000864 peroxy group Chemical group O(O*)* 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims 2
- 239000007870 radical polymerization initiator Substances 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 14
- 239000003999 initiator Substances 0.000 abstract description 4
- 239000012933 diacyl peroxide Substances 0.000 abstract 1
- 125000002081 peroxide group Chemical group 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 description 28
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 238000000034 method Methods 0.000 description 21
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 16
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- 238000010526 radical polymerization reaction Methods 0.000 description 8
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 7
- 238000010992 reflux Methods 0.000 description 7
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 6
- 238000005481 NMR spectroscopy Methods 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 238000010539 anionic addition polymerization reaction Methods 0.000 description 3
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 229920001519 homopolymer Polymers 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920001296 polysiloxane Polymers 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- BTOVVHWKPVSLBI-UHFFFAOYSA-N 2-methylprop-1-enylbenzene Chemical compound CC(C)=CC1=CC=CC=C1 BTOVVHWKPVSLBI-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 125000004492 methyl ester group Chemical group 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical group C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 1
- ZWKNLRXFUTWSOY-QPJJXVBHSA-N (e)-3-phenylprop-2-enenitrile Chemical compound N#C\C=C\C1=CC=CC=C1 ZWKNLRXFUTWSOY-QPJJXVBHSA-N 0.000 description 1
- SUTQSIHGGHVXFK-UHFFFAOYSA-N 1,2,2-trifluoroethenylbenzene Chemical compound FC(F)=C(F)C1=CC=CC=C1 SUTQSIHGGHVXFK-UHFFFAOYSA-N 0.000 description 1
- LFSHREXVLSTLFB-UHFFFAOYSA-N 1-cyanoethenyl acetate Chemical compound CC(=O)OC(=C)C#N LFSHREXVLSTLFB-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- UGMRKNAZEKUAQS-UHFFFAOYSA-N 1-ethenylphenanthrene Chemical compound C1=CC2=CC=CC=C2C2=C1C(C=C)=CC=C2 UGMRKNAZEKUAQS-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- CISIJYCKDJSTMX-UHFFFAOYSA-N 2,2-dichloroethenylbenzene Chemical compound ClC(Cl)=CC1=CC=CC=C1 CISIJYCKDJSTMX-UHFFFAOYSA-N 0.000 description 1
- SXZSFWHOSHAKMN-UHFFFAOYSA-N 2,3,4,4',5-Pentachlorobiphenyl Chemical compound C1=CC(Cl)=CC=C1C1=CC(Cl)=C(Cl)C(Cl)=C1Cl SXZSFWHOSHAKMN-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- PDELBHCVXBSVPJ-UHFFFAOYSA-N 2-ethenyl-1,3,5-trimethylbenzene Chemical group CC1=CC(C)=C(C=C)C(C)=C1 PDELBHCVXBSVPJ-UHFFFAOYSA-N 0.000 description 1
- JDCUKFVNOWJNBU-UHFFFAOYSA-N 2-ethenyl-1,3-thiazole Chemical compound C=CC1=NC=CS1 JDCUKFVNOWJNBU-UHFFFAOYSA-N 0.000 description 1
- HVFZVIHIJNLIED-UHFFFAOYSA-N 2-ethenyl-1-benzofuran Chemical compound C1=CC=C2OC(C=C)=CC2=C1 HVFZVIHIJNLIED-UHFFFAOYSA-N 0.000 description 1
- QQBUHYQVKJQAOB-UHFFFAOYSA-N 2-ethenylfuran Chemical compound C=CC1=CC=CO1 QQBUHYQVKJQAOB-UHFFFAOYSA-N 0.000 description 1
- XUGNJOCQALIQFG-UHFFFAOYSA-N 2-ethenylquinoline Chemical compound C1=CC=CC2=NC(C=C)=CC=C21 XUGNJOCQALIQFG-UHFFFAOYSA-N 0.000 description 1
- KBKNKFIRGXQLDB-UHFFFAOYSA-N 2-fluoroethenylbenzene Chemical compound FC=CC1=CC=CC=C1 KBKNKFIRGXQLDB-UHFFFAOYSA-N 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- FCYVWWWTHPPJII-UHFFFAOYSA-N 2-methylidenepropanedinitrile Chemical compound N#CC(=C)C#N FCYVWWWTHPPJII-UHFFFAOYSA-N 0.000 description 1
- PIAOLBVUVDXHHL-UHFFFAOYSA-N 2-nitroethenylbenzene Chemical compound [O-][N+](=O)C=CC1=CC=CC=C1 PIAOLBVUVDXHHL-UHFFFAOYSA-N 0.000 description 1
- UWRZIZXBOLBCON-UHFFFAOYSA-N 2-phenylethenamine Chemical compound NC=CC1=CC=CC=C1 UWRZIZXBOLBCON-UHFFFAOYSA-N 0.000 description 1
- SMTDFMMXJHYDDE-UHFFFAOYSA-N 2-prop-1-enylpyridine Chemical compound CC=CC1=CC=CC=N1 SMTDFMMXJHYDDE-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- ORNUPNRNNSVZTC-UHFFFAOYSA-N 2-vinylthiophene Chemical compound C=CC1=CC=CS1 ORNUPNRNNSVZTC-UHFFFAOYSA-N 0.000 description 1
- HKADMMFLLPJEAG-UHFFFAOYSA-N 3,3,3-trifluoroprop-1-enylbenzene Chemical compound FC(F)(F)C=CC1=CC=CC=C1 HKADMMFLLPJEAG-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical class ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- YPIINMAYDTYYSQ-UHFFFAOYSA-N 5-ethenyl-1h-pyrazole Chemical compound C=CC=1C=CNN=1 YPIINMAYDTYYSQ-UHFFFAOYSA-N 0.000 description 1
- YEYMTOQDNGGXRS-UHFFFAOYSA-N 5-ethenyl-2H-1,3-oxazol-2-id-4-one Chemical compound C(=C)C1C(N=[C-]O1)=O YEYMTOQDNGGXRS-UHFFFAOYSA-N 0.000 description 1
- VTQMJCSAHXYXPJ-UHFFFAOYSA-N 5-ethenyl-2h-tetrazole Chemical compound C=CC1=NN=NN1 VTQMJCSAHXYXPJ-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- SKBUTIDCIMIMFQ-UHFFFAOYSA-N CN1NC(=CC(=N1)C)C=C Chemical compound CN1NC(=CC(=N1)C)C=C SKBUTIDCIMIMFQ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- MPMBRWOOISTHJV-UHFFFAOYSA-N but-1-enylbenzene Chemical compound CCC=CC1=CC=CC=C1 MPMBRWOOISTHJV-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- KMKLIOQYUUPLMA-UHFFFAOYSA-N chloromethyl prop-2-enoate Chemical compound ClCOC(=O)C=C KMKLIOQYUUPLMA-UHFFFAOYSA-N 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010556 emulsion polymerization method Methods 0.000 description 1
- MEGHWIAOTJPCHQ-UHFFFAOYSA-N ethenyl butanoate Chemical compound CCCC(=O)OC=C MEGHWIAOTJPCHQ-UHFFFAOYSA-N 0.000 description 1
- CMDXMIHZUJPRHG-UHFFFAOYSA-N ethenyl decanoate Chemical compound CCCCCCCCCC(=O)OC=C CMDXMIHZUJPRHG-UHFFFAOYSA-N 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- CTQAODRCOVPAEH-SNAWJCMRSA-N ethyl (e)-3-acetyloxyprop-2-enoate Chemical compound CCOC(=O)\C=C\OC(C)=O CTQAODRCOVPAEH-SNAWJCMRSA-N 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- BYSRUWKGUGERFI-UHFFFAOYSA-N hex-1-en-3-yne Chemical group CCC#CC=C BYSRUWKGUGERFI-UHFFFAOYSA-N 0.000 description 1
- 238000004128 high performance liquid chromatography Methods 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- SDYRIBONPHEWCT-UHFFFAOYSA-N n,n-dimethyl-2-phenylethenamine Chemical compound CN(C)C=CC1=CC=CC=C1 SDYRIBONPHEWCT-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 1
- WDQKICIMIPUDBL-UHFFFAOYSA-N n-[2-(dimethylamino)ethyl]prop-2-enamide Chemical compound CN(C)CCNC(=O)C=C WDQKICIMIPUDBL-UHFFFAOYSA-N 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PMJHHCWVYXUKFD-UHFFFAOYSA-N piperylene Natural products CC=CC=C PMJHHCWVYXUKFD-UHFFFAOYSA-N 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical group C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Polymerization Catalysts (AREA)
- Graft Or Block Polymers (AREA)
- Silicon Polymers (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、高分子化合物の製造方法に関し、特にジメチ
ルシロキサン系ブロック共重合体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for producing a polymer compound, and particularly to a method for producing a dimethylsiloxane block copolymer.
(従来の技術)
ジメチルシロキサン系ブロック共重合体は従来よりいく
つかの方法により合成されてきた。(Prior Art) Dimethylsiloxane block copolymers have been synthesized by several methods.
例えば、ジエー・シー・サーム(J、 C,Saam)
らはマクロモレキュルズ(Macromolecule
s) 3巻、1頁(1970年)において、アニオン重
合法によりスチレン−ジメチルシロキサンブロック共重
合体を得たことを報告している(以下、この方法をアニ
オン重合法と呼ぶ)。For example, J.C.Saam
Macromolecules
s) Vol. 3, page 1 (1970), reports that a styrene-dimethylsiloxane block copolymer was obtained by an anionic polymerization method (hereinafter, this method will be referred to as an anionic polymerization method).
また、手塚育志らはマクロモレキュラ・ヘミ−・ラピッ
ド・コミュニケーション(Makromol 。In addition, Ikushi Tezuka et al.
Chew、、 Rapid Commun、) 5巻、
559頁(1984年)ニオイて、官能基を有するプレ
ポリマーのカップリング反応により酢酸ビニルージメチ
ルシロキサンプロツク共重合体を得たことを報告してい
る(以下、この方法をプレポリマー法と呼ぶ)。Chew, Rapid Commun,) 5 volumes,
p. 559 (1984) reported that a vinyl acetate-dimethylsiloxane block copolymer was obtained by a coupling reaction of a prepolymer having a functional group (hereinafter, this method is referred to as the prepolymer method). ).
さらに、井上弘らは高分子学会予稿集、34巻、293
頁(1984年)において、ラジカル重合活性をもつア
ゾ基含有ポリシロキサンアミドによるラジカル重合によ
りメチルメタクリレート−ジメチルシロキサンブロック
共重合体を得たことを報告している(以下、この方法を
アゾ基含有ポリシロキサンアミドを用いる方法と呼ぶ)
。Furthermore, Hiroshi Inoue et al., Proceedings of the Society of Polymer Science, Vol. 34, 293.
(1984) reported that a methyl methacrylate-dimethylsiloxane block copolymer was obtained by radical polymerization using an azo group-containing polysiloxane amide having radical polymerization activity (hereinafter, this method will be applied to an azo group-containing polysiloxane amide). (referred to as the method using siloxane amide)
.
(発明が解決しようとする問題点)
しかしながら従来の合成法は次に示すようないくつかの
問題点を有している。(Problems to be Solved by the Invention) However, conventional synthesis methods have several problems as shown below.
l)前記アニオン重合法やプレポリマー法を用いる方法
では、反応に適用できるビニル型単量体が限られており
、反応工程が多段階になったり、反応条件が工業的に利
用するには困難であったりする。l) In the methods using the anionic polymerization method and prepolymer method, the vinyl monomers that can be used in the reaction are limited, the reaction process is multi-step, and the reaction conditions are difficult to use industrially. Or so.
2)前記アゾ基含有ポリシロキサンアミドを用いる方法
では、高分子開始剤の半減期10時間を得る温度が約6
5℃に限定され、幅広い温度での使用には適さない。2) In the method using the azo group-containing polysiloxane amide, the temperature at which the polymer initiator has a half-life of 10 hours is about 6
It is limited to 5°C and is not suitable for use in a wide range of temperatures.
工業的にブロック共重合体を製造するためには、ラジカ
ル重合を用いて合成することが可能で、かつ低温から高
温にわたって幅広い温度で合成できることが必要な条件
である。In order to industrially produce a block copolymer, it is necessary to be able to synthesize it using radical polymerization and to be able to synthesize it at a wide range of temperatures from low to high temperatures.
本発明の目的はこれらの問題点を解消し、多くのビニル
型単量体に適用でき、反応工程が少なく、幅広い温度で
合成できるラジカル重合によるジメチルシロキサン系ブ
ロック共重合体の製造方法を提供することにある。The purpose of the present invention is to solve these problems and provide a method for producing a dimethylsiloxane block copolymer by radical polymerization, which can be applied to many vinyl monomers, requires few reaction steps, and can be synthesized at a wide range of temperatures. There is a particular thing.
(問題点を解決するための手段)
前記本発明の目的は、以下に述べるジメチルシロキサン
系ブロック共重合体の製造方法によって達成される。(Means for Solving the Problems) The object of the present invention is achieved by the method for producing a dimethylsiloxane block copolymer described below.
本発明のジメチルシロキサン系ブロック共重合体の製造
方法は、ビニル型単量体を重合させるにあたり、下記構
造式(A)で示される分子中にジアシル型ペルオキシ基
を有するポリジメチルシロキサン化合物をラジカル重合
開始剤として使用することを特徴とするジメチルシロキ
サン系ブロック共重合体の製造方法である。The method for producing a dimethylsiloxane block copolymer of the present invention involves radical polymerization of a polydimethylsiloxane compound having a diacyl peroxy group in the molecule represented by the following structural formula (A) in polymerizing a vinyl monomer. This is a method for producing a dimethylsiloxane block copolymer, which is characterized in that it is used as an initiator.
−・・−・・・・(A)
(式中R1は炭素数1〜15のアルキル基またはアリー
ル基を表す。また、Rは炭素数3〜1oのアルキレン基
または−RgCORs−基を表し、R2は炭素数1〜1
5のアルキレン基またはフェニレン基を表し、R5は炭
素数3〜10のアルキレン基または−(CHz) to
(CHg) !−基を表す。また、mはlO〜200
で、Xは2〜10である)。-・・・・・(A) (In the formula, R1 represents an alkyl group or an aryl group having 1 to 15 carbon atoms. Also, R represents an alkylene group having 3 to 1 o carbon atoms or a -RgCORs- group, R2 has 1 to 1 carbon atoms
5 represents an alkylene group or a phenylene group, R5 is an alkylene group having 3 to 10 carbon atoms or -(CHz) to
(CHg)! -Represents a group. Also, m is lO~200
and X is 2 to 10).
以下本発明につきさらに詳細に説明する。The present invention will be explained in more detail below.
本発明に使用する分子中にジアシル型ペルオキシ基を有
するポリジメチルシロキサン化合物は、上記構造式(A
)で示される。式中のR9は炭素数1〜15のアルキル
基またはフェニル基である。The polydimethylsiloxane compound having a diacyl peroxy group in the molecule used in the present invention has the above structural formula (A
). R9 in the formula is an alkyl group having 1 to 15 carbon atoms or a phenyl group.
炭素数が16個以上の場合は反応性が悪くなり合成困難
となる。RおよびR1について前記条件以外では、原料
入手が難しく合成困難である。また、mは10〜200
で、Xは2〜1oである。m>200では分子量が大き
くなりすぎて合成が困難であり、m〈10ではジメチル
シロキサン成分が少なくなりその特性が発現できない。When the number of carbon atoms is 16 or more, the reactivity becomes poor and synthesis becomes difficult. With respect to R and R1, it is difficult to obtain raw materials and synthesis is difficult under conditions other than those described above. Also, m is 10 to 200
and X is 2 to 1o. When m>200, the molecular weight becomes too large and synthesis is difficult, and when m<10, the dimethylsiloxane component is so small that its properties cannot be expressed.
Xが11以上になると合成は困難となる。When X is 11 or more, synthesis becomes difficult.
この構造式(A)で示される化合物は、約60〜80℃
の範囲の温度で半減期10時間を得ることができ、共重
合体の一成分として使用できるラジカル重合特性を有す
る。また、このポリジメチルシロキサン化合物は、通常
のポリジメチルシロキサンと同等の溶解性を有し、ベン
ゼン、トルエン、キシレン、ヘキサン等に容易に溶解す
る。The compound represented by this structural formula (A) is about 60 to 80°C
It can obtain a half-life of 10 hours at a temperature in the range of , and has radical polymerization properties that allow it to be used as a component of copolymers. Further, this polydimethylsiloxane compound has a solubility equivalent to that of ordinary polydimethylsiloxane, and easily dissolves in benzene, toluene, xylene, hexane, and the like.
次に本発明で用い得るビニル型単量体としては、スチレ
ン、メチルスチレン、ジフェニルエチレン、エチルスチ
レン、ジメチルスチレン、ビニルナフタリン、ビニルフ
ェナントレン、ビニルメシチレン、3.4.6−)ジメ
チルスチレン、1−ビニルー2−エチルアセチレン、ブ
タジェン、イソプレン、ピペリレン等の炭化水素化合物
;クロルスチレン、メトキシスチレン、ブロムスチレン
、シアノスチレン、フルオルスチレン、ジクロルスチレ
ン、N、N−ジメチルアミノスチレン、ニトロスチレン
、クロルメチルスチレン、トリフルオルスチレン、トリ
フルオルメチルスチレン、アミノスチレン等のスチレン
誘導体;アクリロニトリル、メタシクロニトリル、α−
アセトキシアクリロニトリル等の7シクロニトリル誘導
体ニアクリル酸、メタクリル酸;アクリル酸メチル、ア
クリル酸ラウリル、アクリル酸クロルメチル、アセトキ
シアクリル酸エチル等のアクリル酸エステル;メタクリ
ル酸シクロヘキシル、メタクリル酸ジメチルアミノエチ
ル、メタクリル酸グリシジル1.メタクリル酸テトラヒ
ドロフルフリル、メタクリル酸ヒドロキシエチル等のメ
タクリル酸エステル;塩化ビニリチン、臭化ビニリデン
、シアン化ビニリデン等のビニリデン化合物;アクリル
アミド、メタクリルアミド、N−ブトキシメチルアクリ
ルアミド、N−フェニルアクリルアミド、ジアセトンア
クリルアミド、N、N−ジメチルアミノエチルアクリル
アミド等のアクリルアミド誘導体;酢酸ビニル、酪酸ビ
ニル、カプリン酸ビニル等の脂肪酸ビニル誘導体;さら
に、N−ビニルスクシンイミド、N−ビニルビロリドン
、N−ビニルフタルイミド、N−ビニルカルバゾール、
ビニルフラン、2−ビニルベンゾフラン、ビニルチオフ
ェン、ビニルイミダゾール、メチルビニルイ・ミダゾー
ル、ビニルピラゾール、ビニルオキサゾリドン、ビニル
チアゾール、ビニルテトラゾール、ビニルピリジン、メ
チルビニルピリジン、2,4−ジメチル−6−ビニルト
リアジン、ビニルキノリン等の異部環状ビニル化合物が
ある。Next, examples of vinyl monomers that can be used in the present invention include styrene, methylstyrene, diphenylethylene, ethylstyrene, dimethylstyrene, vinylnaphthalene, vinylphenanthrene, vinylmesitylene, 3.4.6-) dimethylstyrene, 1- Hydrocarbon compounds such as vinyl-2-ethylacetylene, butadiene, isoprene, piperylene; chlorstyrene, methoxystyrene, bromustyrene, cyanostyrene, fluorostyrene, dichlorostyrene, N,N-dimethylaminostyrene, nitrostyrene, chloromethyl Styrene derivatives such as styrene, trifluorostyrene, trifluoromethylstyrene, and aminostyrene; acrylonitrile, metacyclonitrile, α-
7 Cyclonitrile derivatives such as acetoxyacrylonitrile Niacrylic acid, methacrylic acid; Acrylic acid esters such as methyl acrylate, lauryl acrylate, chloromethyl acrylate, ethyl acetoxyacrylate; cyclohexyl methacrylate, dimethylaminoethyl methacrylate, glycidyl methacrylate 1 .. Methacrylic acid esters such as tetrahydrofurfuryl methacrylate and hydroxyethyl methacrylate; Vinylidene compounds such as vinylitine chloride, vinylidene bromide, and vinylidene cyanide; Acrylamide, methacrylamide, N-butoxymethylacrylamide, N-phenylacrylamide, diacetone acrylamide , N,N-dimethylaminoethyl acrylamide and other acrylamide derivatives; fatty acid vinyl derivatives such as vinyl acetate, vinyl butyrate, and vinyl caprate;
Vinylfuran, 2-vinylbenzofuran, vinylthiophene, vinylimidazole, methylvinymidazole, vinylpyrazole, vinyloxazolidone, vinylthiazole, vinyltetrazole, vinylpyridine, methylvinylpyridine, 2,4-dimethyl-6-vinyltriazine, vinylquinoline There are heterocyclic vinyl compounds such as
ビニル型単量体は単独または2種類以上のビニル型単量
体を組み合わせて使用できる。The vinyl monomer can be used alone or in combination of two or more types.
分子中にジアシル型ペルオキシ基を有するポリジメチル
シロキサン化合物とビニル型単量体との組成割合は、一
般に分子中にジアシル型ペルオキシ基を有するポリジメ
チルシロキサン化合物10〜90重量部に対し、ビニル
型単量体90〜10重量部が好ましく、目的とする用途
に応じて割合を広範囲に選ぶことができる。ポリジメチ
ルシロキサン化合物が10重量部より少ない場合及び9
0重量部より多い場合では、ブロック共重合体としての
特徴が発現できない。Generally, the composition ratio of the polydimethylsiloxane compound having a diacyl type peroxy group in the molecule and the vinyl type monomer is 10 to 90 parts by weight of the polydimethylsiloxane compound having a diacyl type peroxy group in the molecule. The amount is preferably 90 to 10 parts by weight, and the proportion can be selected over a wide range depending on the intended use. When the polydimethylsiloxane compound is less than 10 parts by weight and 9
If the amount is more than 0 parts by weight, the characteristics as a block copolymer cannot be expressed.
また、ラジカル重合方法としては、溶液重合法、塊状重
合法、乳化重合法、Q濁重合法等いずれの方法も行うこ
とができる。Further, as the radical polymerization method, any method such as a solution polymerization method, a bulk polymerization method, an emulsion polymerization method, a Q-turbidity polymerization method, etc. can be performed.
ラジカル重合の反応温度としては30〜120℃、好ま
しくは50〜100℃である。反応温度が30℃より低
いと反応時間が長くなりすぎて、工業的に不適当である
。また、120℃より高いとペルオキシ基が瞬時に分解
してしまい、反応がうまく進まない。The reaction temperature for radical polymerization is 30 to 120°C, preferably 50 to 100°C. If the reaction temperature is lower than 30°C, the reaction time will be too long, making it industrially unsuitable. Furthermore, if the temperature is higher than 120°C, the peroxy group will instantly decompose and the reaction will not proceed well.
反応時間は一般に0.5〜100時間、好ましくは1〜
30時間である。反応時間が0.5時間より短いと反応
が十分に進行しない。また、100時間より長いと工業
的に不適当である。The reaction time is generally 0.5 to 100 hours, preferably 1 to 100 hours.
It is 30 hours. If the reaction time is shorter than 0.5 hours, the reaction will not proceed sufficiently. Moreover, if it is longer than 100 hours, it is industrially inappropriate.
以上述べたように本発明によるジメチルシロキサン系ブ
ロック共重合体の製造方法を用いると、−段階の反応で
ジメチルシロキサン系ブロック共重合体を得ることがで
きる。なお、得られるジメチルシロキサン系ブロック共
重合体にはビニル型単量体のホモポリマーが含まれるが
、適当な溶媒を用いて再沈や溶媒抽出等を行うことによ
り、純度の高いブロック共重合体を分離することができ
る。As described above, when the method for producing a dimethylsiloxane block copolymer according to the present invention is used, a dimethylsiloxane block copolymer can be obtained through a -step reaction. Note that the obtained dimethylsiloxane block copolymer contains a homopolymer of vinyl monomers, but by performing reprecipitation or solvent extraction using an appropriate solvent, a highly pure block copolymer can be obtained. can be separated.
(発明の効果)
本発明によるジメチルシロキサン系ブロック共重合体の
製造方法は、多くのビニル型単量体に適用でき、きわめ
て簡単な操作により、幅広い温度にわたって一工程で反
応を行うことができる。これにより、種々のジメチルシ
ロキサン系ブロック共重合体を製造することができ、工
業的価値はきわめて高い。さらに、本発明により得られ
るジメチルシロキサン系ブロック共重合体は、シーリン
グ剤、各種プラスチックフィルムや成形品、繊維、ゴム
、塗料、接着剤等の原料や表面改質剤として使用でき、
耐水性、耐熱性、耐候性などポリジメチルシロキサンの
もつ特性を付与することができる。(Effects of the Invention) The method for producing a dimethylsiloxane block copolymer according to the present invention can be applied to many vinyl monomers, and the reaction can be carried out in one step over a wide range of temperatures with extremely simple operations. As a result, various dimethylsiloxane-based block copolymers can be produced, and the industrial value is extremely high. Furthermore, the dimethylsiloxane block copolymer obtained by the present invention can be used as a raw material or surface modifier for sealing agents, various plastic films and molded products, fibers, rubber, paints, adhesives, etc.
It can provide the properties of polydimethylsiloxane, such as water resistance, heat resistance, and weather resistance.
(実施例) 次に実施例および比較例により本発明を説明する。(Example) Next, the present invention will be explained with reference to Examples and Comparative Examples.
実施例1
平均分子l 10000および活性酸素量0.99%の
次の構造式(1):
%式%(1)
で示される分子中にジアシル型ペルオキシ基を有するポ
リジメチルシロキサン化合物60部、スチレン40部、
およびトルエン200部を還流冷却器および攪拌機を備
えたフラスコに導入し、窒素雰囲気中80℃で20時間
反応させた。Example 1 60 parts of a polydimethylsiloxane compound having a diacyl type peroxy group in the molecule represented by the following structural formula (1) with an average molecular l of 10,000 and an active oxygen content of 0.99%, styrene 40 copies,
and 200 parts of toluene were introduced into a flask equipped with a reflux condenser and a stirrer, and reacted at 80° C. for 20 hours in a nitrogen atmosphere.
反応終了後フラスコ内容物を約15倍量のn−ヘキサン
中に投入し、スチレンホモポリマーを析出させ、これを
濾過により除去した。次いで濾液を約3分の1になるま
で濃縮した後、約10倍量のメタノール中に投入し、ポ
リマーを析出させ、濾過し、減圧乾燥させると淡黄色の
ポリマー80部を得た。After the reaction was completed, the contents of the flask were poured into about 15 times the amount of n-hexane to precipitate styrene homopolymer, which was removed by filtration. Next, the filtrate was concentrated to about one third, poured into about 10 times the volume of methanol to precipitate a polymer, filtered, and dried under reduced pressure to obtain 80 parts of a pale yellow polymer.
かくして得られた淡黄色ポリマーについて、平均分子量
〔東洋曹達工業製高速液体クロマトグラフィー(PUM
P:HLC−802A、 DETECTOR:RI−8
000)で測定〕および核磁気共鳴吸収スペクトル(日
本電子類FX−90Q FT−NMR装置で測定)を測
定したところ下記に示す特性値を示し、スチレン−ジメ
チルシロキサンブロック共重合体と確認された。The average molecular weight of the light yellow polymer thus obtained was determined by high performance liquid chromatography (PUM) manufactured by Toyo Soda Kogyo Co., Ltd.
P: HLC-802A, DETECTOR: RI-8
000)] and a nuclear magnetic resonance absorption spectrum (measured with a JEOL Ltd. FX-90Q FT-NMR apparatus), it showed the following characteristic values and was confirmed to be a styrene-dimethylsiloxane block copolymer.
数平均分子量(以下■7と表す)6.01X10’重量
平均分子!(以下M、と表す) 1.33X10’分散
比(以下M、/M、と表す> 2.22核磁気共鳴
吸収スペクトル:
0.08ppn+ (ジメチルシロキサンのメチル基
(以下5i−C10と表す)〕
6.56ppmおよび7.O3ppm (スチレンの
ベンゼン環(以下−C4H6と表す)〕
ポリマー中に占めるジメチルシロキサンセグメントの重
量割合(以下Si−重量比と表す):61%実施例2
実施例1で使用したものと同じポリジメチルシロキサン
化合物60部、メチルメタクリレート40部、およびト
ルエン200部を還流冷却器および攪拌機を備えたフラ
スコに導入し、窒素雰囲気中80℃で20時間反応させ
た。Number average molecular weight (hereinafter referred to as ■7) 6.01X10' weight average molecule! (hereinafter referred to as M) 1.33X10' dispersion ratio (hereinafter referred to as M, /M)> 2.22 Nuclear magnetic resonance absorption spectrum: 0.08 ppn+ (methyl group of dimethylsiloxane (hereinafter referred to as 5i-C10)] 6.56 ppm and 7.03 ppm (benzene ring of styrene (hereinafter referred to as -C4H6)) Weight proportion of dimethylsiloxane segment in the polymer (hereinafter referred to as Si-weight ratio): 61% Example 2 Used in Example 1 60 parts of the same polydimethylsiloxane compound, 40 parts of methyl methacrylate, and 200 parts of toluene were introduced into a flask equipped with a reflux condenser and a stirrer, and reacted in a nitrogen atmosphere at 80° C. for 20 hours.
反応終了後フラスコ内容物を約15倍量のn−ヘキサン
中に投入し、メチルメタクリレートホモポリマーを析出
させ、濾過により除去した。次いで濾液を約3分の1に
なるまで濃縮後、約10倍量のメタノール中に投入し、
ポリマーを析出させ、濾過し、減圧乾燥させると淡黄色
のポリマー70部を得た。After the reaction was completed, the contents of the flask were poured into about 15 times the amount of n-hexane to precipitate methyl methacrylate homopolymer, which was removed by filtration. Next, the filtrate was concentrated to about one third, and then poured into about 10 times the amount of methanol.
The polymer was precipitated, filtered, and dried under reduced pressure to obtain 70 parts of a pale yellow polymer.
かくして得られた淡黄色ポリマーについて実施例1と同
様の物性を測定したところ、下記に示す特性値を示し、
メチルメタクリレート−ジメチルシロキサンブロック共
重合体と確認された。When the physical properties of the pale yellow polymer thus obtained were measured in the same manner as in Example 1, it showed the following characteristic values,
It was confirmed to be a methyl methacrylate-dimethylsiloxane block copolymer.
πm 9.23 x 10z
πM2.24X10’
M、 /M、 2.43
核磁気共鳴スペクトル:
0、O8ppm (St−CL)
3.67ppn+ (メチルメタクリレートのメチル
エステル基(以下−COOCHs基と表す)〕〕Si−
重量比:64
%施例3
平均分子量12000および活性酸素量0.61%の次
の構造式(2):
%式%(2)
で示される分子中にジアシル型ペルオキシ基を有するポ
リジメチルシロキサン化合物50部、スチレン50部、
およびトルエン200部を還流冷却器および攪拌機を備
えたフラスコに導入した。πm 9.23 x 10z πM2.24X10' M, /M, 2.43 Nuclear magnetic resonance spectrum: 0, O8ppm (St-CL) 3.67ppn+ (Methyl ester group of methyl methacrylate (hereinafter referred to as -COOCHs group))] ]Si-
Weight ratio: 64% Example 3 Polydimethylsiloxane compound having a diacyl type peroxy group in the molecule represented by the following structural formula (2): % formula (2) with an average molecular weight of 12,000 and an active oxygen content of 0.61% 50 parts, 50 parts of styrene,
and 200 parts of toluene were introduced into a flask equipped with a reflux condenser and a stirrer.
以下、実施例1に述べた製造方法と同様の方法で操作し
て淡黄色のポリマー84部を得た。Thereafter, 84 parts of a pale yellow polymer was obtained using the same manufacturing method as described in Example 1.
かくして得られた淡黄色ポリマーについて実施例1と同
様の物性を測定したところ、下記に示す特性値を示し、
スチレン−ジメチルシロキサンブロック共重合体と確認
された。When the physical properties of the pale yellow polymer thus obtained were measured in the same manner as in Example 1, it showed the following characteristic values,
It was confirmed to be a styrene-dimethylsiloxane block copolymer.
M、 1.12X10’
Ml、、2.61 X 10’
■w/π、12.33
核磁気共鳴スペクトル:
0、O8ppm (Si−CHi)
6.56ppmおよび7.O3ppm (−CJs)S
i−重量比:52%
実施例4
実施例3で使用したものと同じポリジメチルシロキサン
化合物50部、メチルメタクリレート50部、およびト
ルエン200部を還流冷却器および撹拌機を備えたフラ
スコに導入した。M, 1.12X10' Ml,, 2.61 X 10' ■w/π, 12.33 Nuclear magnetic resonance spectrum: 0, O8ppm (Si-CHi) 6.56ppm and 7. O3ppm (-CJs)S
i-weight ratio: 52% Example 4 50 parts of the same polydimethylsiloxane compound used in Example 3, 50 parts of methyl methacrylate and 200 parts of toluene were introduced into a flask equipped with a reflux condenser and a stirrer.
以下、実施例2に述べた製造方法と同様の方法で操作し
て淡黄色のポリマー73部を得た。Thereafter, 73 parts of a pale yellow polymer was obtained using the same method as described in Example 2.
かくして得られた淡黄色ポリマーについて実施例1と同
様の物性を測定したところ、下記に示す特性値を示し、
メチルメタクリレート−ジメチルシロキサンブロック共
重合体と確認された。When the physical properties of the pale yellow polymer thus obtained were measured in the same manner as in Example 1, it showed the following characteristic values,
It was confirmed to be a methyl methacrylate-dimethylsiloxane block copolymer.
■fi2.58X10’
M、 6.58X10’
■、 /M、 2.55
核磁気共鳴スペクトル:
0、O8ppm (Si−CHz)
3.67ppm (−COOCHs)
Si−重量比:54%
実施例5
平均分子ii 15100および活性酸素10.37%
の下記構造式(3)で示される分子中にジアシル型ペル
オキシ基を有するポリジメチルシロキサン化合物30部
、スチレン70部、およびトルエン200部を還流冷却
器および攪拌機を備えたフラスコに導入し、窒素雰囲気
中90℃で20時間反応させた。■fi2.58X10' M, 6.58X10' ■, /M, 2.55 Nuclear magnetic resonance spectrum: 0, O8ppm (Si-CHz) 3.67ppm (-COOCHs) Si-weight ratio: 54% Example 5 Average Molecule II 15100 and active oxygen 10.37%
30 parts of a polydimethylsiloxane compound having a diacyl peroxy group in the molecule represented by the following structural formula (3), 70 parts of styrene, and 200 parts of toluene were introduced into a flask equipped with a reflux condenser and a stirrer, and the mixture was placed in a nitrogen atmosphere. The mixture was reacted at 90° C. for 20 hours.
−・−・−・−(3)
以下実施例1に述べた製造方法と同様の方法で操作して
白色のポリマー87部を得た。-.-.-.-(3) The following procedure was carried out in the same manner as in Example 1 to obtain 87 parts of a white polymer.
かくして得られた白色ポリマーについて実施例1と同様
の物性を測定したところ、下記に示す特性値を示し、ス
チレン−ジメチルシロキサンブロック共重合体と確認さ
れた。When the physical properties of the thus obtained white polymer were measured in the same manner as in Example 1, it exhibited the characteristic values shown below, and was confirmed to be a styrene-dimethylsiloxane block copolymer.
πm2.88X10’
πM?、43X10’
■、 /M、 2.58
核磁気共鳴スペクトル:
0、O8ppm (Si−C)li)
6.56ppmおよび7.03ppa+ (−C6ns
)Si−重量比:32%
実施例6
平均分子量16500および活性酸素ff10.36%
の下記構造式(4)で示される分子中にジアシル型ペル
オキシ基を有するポリジメチルシロキサン化合物30部
、メチルメタクリレート70部、およびトルエン200
部を還流冷却器および攪拌機を備えたフラスコに導入し
、窒素雰囲気中90℃で20時間反応させた。以下実施
例2に述べた製造方法と同様の方法で操作してし白色の
ポリマー75部を得た。πm2.88X10' πM? , 43
) Si-weight ratio: 32% Example 6 Average molecular weight 16500 and active oxygen ff 10.36%
30 parts of a polydimethylsiloxane compound having a diacyl peroxy group in the molecule represented by the following structural formula (4), 70 parts of methyl methacrylate, and 200 parts of toluene.
A portion was introduced into a flask equipped with a reflux condenser and a stirrer, and reacted at 90° C. for 20 hours in a nitrogen atmosphere. The following procedure was carried out in the same manner as described in Example 2 to obtain 75 parts of a white polymer.
・−・・−(4)
かくして得られた白色ポリマーについて実施例lと同様
の物性を測定したところ、下記に示す特性値を示し、メ
チルメタクリレート−ジメチルシロキサンブロック共重
合体と確認された。... (4) When the physical properties of the thus obtained white polymer were measured in the same manner as in Example 1, it exhibited the characteristic values shown below, and was confirmed to be a methyl methacrylate-dimethylsiloxane block copolymer.
■、 5.81 X 10’
πW1.59X10’
■、、/π、 2.75
核磁気共鳴スペクトル:
0、O8ppm (Si−CI+)
3.67ppm (−COOCHz)
Si−重量比:33%
実施例7
実施例5で使用したものと同じポリジメチルシロキサン
化合物30部、酢酸ビニル70部、およびトルエン20
0部を還流冷却器および攪拌機を備えたフラスコに導入
し、窒素雰囲気中90℃で20時間反応させた。反応終
了後、フラスコ内容物を約15倍量のメタノール中に投
入し、ポリマーを析出させ、濾過によりポリマーを得た
。そして減圧乾燥させると白色のポリマー72部を得た
。■, 5.81 7 30 parts of the same polydimethylsiloxane compound used in Example 5, 70 parts of vinyl acetate, and 20 parts of toluene
0 part was introduced into a flask equipped with a reflux condenser and a stirrer, and reacted at 90° C. for 20 hours in a nitrogen atmosphere. After the reaction was completed, the contents of the flask were poured into about 15 times the amount of methanol to precipitate the polymer, and the polymer was obtained by filtration. After drying under reduced pressure, 72 parts of a white polymer was obtained.
かくして得られた淡黄色ポリマーについて実施例1と同
様の物性を測定したところ、下記に示す特性値を示し、
酢酸ビニル−ジメチルシロキサンブロック共重合体と確
認された。When the physical properties of the pale yellow polymer thus obtained were measured in the same manner as in Example 1, it showed the following characteristic values,
It was confirmed to be a vinyl acetate-dimethylsiloxane block copolymer.
M、、7.11X10’
M、 2.25X10’
M、/π、 3.16
核磁気共鳴スペクトル:
0、O8ppm (Si−Cfl:+)2、llppm
(酢酸ビニルのメチル基)Si−重量比:34%
比較例1
実施例1に用いた平均分子量10000のポリジメチル
シロキサン化合物のかわりに、平均分子量のみが150
0と異なるポリジメチルシロキサン46部およびラウロ
イルペルオキシド(純度99%)14部を用いた以外は
実施例1に述べた製造方法と同様の方法で操作して白色
ポリマー40部を得た。M,, 7.11X10' M, 2.25X10' M, /π, 3.16 Nuclear magnetic resonance spectrum: 0, O8ppm (Si-Cfl:+)2, llppm
(Methyl group of vinyl acetate) Si-weight ratio: 34% Comparative Example 1 Instead of the polydimethylsiloxane compound with an average molecular weight of 10,000 used in Example 1, only the average molecular weight was 150.
40 parts of a white polymer was obtained in the same manner as in Example 1, except that 46 parts of polydimethylsiloxane different from 0 and 14 parts of lauroyl peroxide (purity 99%) were used.
かくして得られた白色ポリマーについて核磁気共鳴吸収
スペクトルを測一定したところ、ジメチルシロキサンの
メチル基の吸収(0,08ppm)は確認されたが、ス
チレンのベンゼン環の吸収(6,56ppmおよび7.
03ppm)は確認されず、スチレン−ジメチルシロキ
サンブロック共重合体は得られなかった。When the nuclear magnetic resonance absorption spectrum of the thus obtained white polymer was measured, absorption of the methyl group of dimethylsiloxane (0.08 ppm) was confirmed, but absorption of the benzene ring of styrene (6.56 ppm and 7.0 ppm) was confirmed.
03 ppm) was not confirmed, and no styrene-dimethylsiloxane block copolymer was obtained.
比較例2
実施例2に用いた平均分子ffi 10000のポリジ
メチルシロキサン化合物のかわりに、平均分子量のみが
1500と異なるポリジメチルシロキサン46部および
ラウロイルペルオキシド(純度99%)14部を用いた
以外は実施例2に述べた製造方法と同様の方法で操作し
て白色ポリマー40部を得た。Comparative Example 2 The same procedure was carried out except that 46 parts of polydimethylsiloxane having an average molecular weight different from 1500 and 14 parts of lauroyl peroxide (purity 99%) were used in place of the polydimethylsiloxane compound with an average molecular ffi of 10000 used in Example 2. Working in a manner similar to that described in Example 2, 40 parts of a white polymer were obtained.
かくして得られた白色ポリマーについて核磁気共鳴吸収
スペクトルを測定したところ、ジメチルシロキサンのメ
チル基の吸収(0,08ppm)はlII認されたが、
メチルメタクリレートのメチルエステル基の吸収(3,
67ppm)は確認されず、メチルメタクリレート−ジ
メチルシロキサンブロック共重合体は得られなかった。When the nuclear magnetic resonance absorption spectrum of the thus obtained white polymer was measured, absorption of the methyl group of dimethylsiloxane (0.08 ppm) was observed.
Absorption of methyl ester group of methyl methacrylate (3,
67 ppm) was not confirmed, and no methyl methacrylate-dimethylsiloxane block copolymer was obtained.
比較例3
実施例7に用いた平均分子fi 15100のポリジメ
チルシロキサン化合物のかわりに、平均分子量のみが4
800と異なるポリジメチルシロキサン27部およびベ
ンゾイルペルオキシド(純度99%)2部を用いた以外
は実施例7に述べた製造方法と同様の方法で操作して白
色ポリマー22部を得た。Comparative Example 3 Instead of the polydimethylsiloxane compound with an average molecular fi of 15100 used in Example 7, a polydimethylsiloxane compound with an average molecular weight of only 4
22 parts of a white polymer was obtained by operating in the same manner as described in Example 7, except that 27 parts of a polydimethylsiloxane different from 800 and 2 parts of benzoyl peroxide (99% purity) were used.
かくして得られた白色ポリマーについて核磁気共鳴吸収
スペクトルを測定したところ、ジメチルシロキサンのメ
チル基の吸収(0,08ppm)は確認されたが、酢酸
ビニルのメチル基の吸収(2,11ppm)は確認され
ず、酢酸ビニル−ジメチルシロキサンブロック共重合体
は得られなかった。When the nuclear magnetic resonance absorption spectrum of the thus obtained white polymer was measured, absorption of the methyl group of dimethylsiloxane (0.08 ppm) was confirmed, but absorption of the methyl group of vinyl acetate (2.11 ppm) was not confirmed. However, no vinyl acetate-dimethylsiloxane block copolymer was obtained.
Claims (1)
(A): ▲数式、化学式、表等があります▼・・・・・・・・・
(A) (式中R_1は炭素数1〜15のアルキル基またはアリ
ール基を表す。また、Rは炭素数3〜10のアルキレン
基または▲数式、化学式、表等があります▼基を表し、
R_2は炭素数1〜15のアルキレン基またはフェニレ
ン基を表し、R_3は炭素数3〜10のアルキレン基ま
たは−(CH_2)_2O(CH_2)_3−基を表す
。また、mは10〜200で、xは2〜10である)で
示される分子中にジアシル型ペルオキシ基を有するポリ
ジメチルシロキサン化合物をラジカル重合開始剤として
使用することを特徴とするジメチルシロキサン系ブロッ
ク共重合体の製造方法。(1) When polymerizing a vinyl monomer, the following structural formula (A): ▲There are mathematical formulas, chemical formulas, tables, etc.▼・・・・・・・・・
(A) (In the formula, R_1 represents an alkyl group or an aryl group having 1 to 15 carbon atoms. In addition, R represents an alkylene group having 3 to 10 carbon atoms or a ▲ mathematical formula, chemical formula, table, etc. ▼ group,
R_2 represents an alkylene group having 1 to 15 carbon atoms or a phenylene group, and R_3 represents an alkylene group having 3 to 10 carbon atoms or a -(CH_2)_2O(CH_2)_3- group. Further, a dimethylsiloxane block characterized in that a polydimethylsiloxane compound having a diacyl peroxy group in the molecule represented by m is 10 to 200 and x is 2 to 10 is used as a radical polymerization initiator. Method for producing copolymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20012686A JPH0617480B2 (en) | 1986-08-28 | 1986-08-28 | Method for producing dimethylsiloxane block copolymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20012686A JPH0617480B2 (en) | 1986-08-28 | 1986-08-28 | Method for producing dimethylsiloxane block copolymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6357644A true JPS6357644A (en) | 1988-03-12 |
| JPH0617480B2 JPH0617480B2 (en) | 1994-03-09 |
Family
ID=16419249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20012686A Expired - Fee Related JPH0617480B2 (en) | 1986-08-28 | 1986-08-28 | Method for producing dimethylsiloxane block copolymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0617480B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02212622A (en) * | 1989-02-10 | 1990-08-23 | Koyo Seiko Co Ltd | Magnetic bearing spindle unit |
| US5089336A (en) * | 1989-08-14 | 1992-02-18 | Minnesota Mining And Manufacturing Company | General purpose siloxane release coatings |
| US5200436A (en) * | 1989-08-14 | 1993-04-06 | Minnesota Mining And Manufacture Company | Siloxane iniferter compounds, block copolymers made therewith and a method of making the block copolymers |
| DE10232993A1 (en) * | 2002-07-19 | 2004-02-05 | Wacker Polymer Systems Gmbh & Co. Kg | Silicone-containing polymers of ethylenically unsaturated monomers |
-
1986
- 1986-08-28 JP JP20012686A patent/JPH0617480B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02212622A (en) * | 1989-02-10 | 1990-08-23 | Koyo Seiko Co Ltd | Magnetic bearing spindle unit |
| US5089336A (en) * | 1989-08-14 | 1992-02-18 | Minnesota Mining And Manufacturing Company | General purpose siloxane release coatings |
| US5200436A (en) * | 1989-08-14 | 1993-04-06 | Minnesota Mining And Manufacture Company | Siloxane iniferter compounds, block copolymers made therewith and a method of making the block copolymers |
| DE10232993A1 (en) * | 2002-07-19 | 2004-02-05 | Wacker Polymer Systems Gmbh & Co. Kg | Silicone-containing polymers of ethylenically unsaturated monomers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0617480B2 (en) | 1994-03-09 |
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