JPS6422086A - Control equipment for laser wavelength - Google Patents
Control equipment for laser wavelengthInfo
- Publication number
- JPS6422086A JPS6422086A JP17732087A JP17732087A JPS6422086A JP S6422086 A JPS6422086 A JP S6422086A JP 17732087 A JP17732087 A JP 17732087A JP 17732087 A JP17732087 A JP 17732087A JP S6422086 A JPS6422086 A JP S6422086A
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- selection element
- narrow
- laser beam
- beam whose
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000010355 oscillation Effects 0.000 abstract 3
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
- H01S3/137—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity for stabilising of frequency
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Abstract
PURPOSE:To enable the highly accurate control of an narrow band oscillation excimer laser for a long time, by making the oscillation bandwidth narrow, by arranging a wavelength selection element, applying an etalon or diffraction grating type spectroscope to a wavelength detector, and performing the feedback control of a selected wavelength. CONSTITUTION:The resonator of a narrow band oscillation excimer laser is constituted by arranging a wavelength selection element 2 and a laser chamber 3 between a rear mirror 1 and a front mirror 5. A wavelength detector 8 detects the respective wavelengths of a reference light and a laser beam whose bandwidth is made narrow, and the detected outputs are delivered to a wavelength controller 9, which calculates the absolute value of the laser beam whose bandwidth is made narrow, according to the wavelength of a reference light, and calculates the difference between a set wavelength and a laser beam whose bandwidth is made narrow. In order to change the selection wavelength of the wavelength selection element 2 by the amount of the above-mentioned difference, a signal is sent from the wavelength controller 9 to a wavelength selection element driver 10, which makes the wavelength selection element 2 change the selection wavelength.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17732087A JPS6422086A (en) | 1987-07-17 | 1987-07-17 | Control equipment for laser wavelength |
| DE883891284T DE3891284T1 (en) | 1987-07-17 | 1988-07-18 | LASER SHAFT LENGTH CONTROL DEVICE |
| PCT/JP1988/000713 WO1989000779A1 (en) | 1987-07-17 | 1988-07-18 | Apparatus for controlling laser wavelength |
| US07/721,929 US5373515A (en) | 1987-07-17 | 1991-06-21 | Laser wavelength controlling apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17732087A JPS6422086A (en) | 1987-07-17 | 1987-07-17 | Control equipment for laser wavelength |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6422086A true JPS6422086A (en) | 1989-01-25 |
Family
ID=16028919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17732087A Pending JPS6422086A (en) | 1987-07-17 | 1987-07-17 | Control equipment for laser wavelength |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6422086A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01101683A (en) * | 1987-10-14 | 1989-04-19 | Mitsubishi Electric Corp | Stabilization of laser wavelength and wavelength stabilized laser |
| JPH0312975A (en) * | 1989-06-12 | 1991-01-21 | Nikon Corp | Laser oscillator and exposure device using same |
| JPH0364084A (en) * | 1989-08-02 | 1991-03-19 | Kokusai Denshin Denwa Co Ltd <Kdd> | Frequency stabilized light source |
| US5243614A (en) * | 1990-11-28 | 1993-09-07 | Mitsubishi Denki Kabushiki Kaisha | Wavelength stabilizer for narrow bandwidth laser |
| WO1999001890A1 (en) * | 1997-07-03 | 1999-01-14 | Hamamatsu Photonics K.K. | Discharge tube and method of calibrating laser wavelength by using the same |
| JP2014016247A (en) * | 2012-07-09 | 2014-01-30 | Shimadzu Corp | Wavelength variable monochromatic light source |
| JP2018503872A (en) * | 2014-12-29 | 2018-02-08 | エーエスエムエル ホールディング エヌ.ブイ. | Feedback control system for alignment system |
-
1987
- 1987-07-17 JP JP17732087A patent/JPS6422086A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01101683A (en) * | 1987-10-14 | 1989-04-19 | Mitsubishi Electric Corp | Stabilization of laser wavelength and wavelength stabilized laser |
| JPH0312975A (en) * | 1989-06-12 | 1991-01-21 | Nikon Corp | Laser oscillator and exposure device using same |
| JPH0364084A (en) * | 1989-08-02 | 1991-03-19 | Kokusai Denshin Denwa Co Ltd <Kdd> | Frequency stabilized light source |
| US5243614A (en) * | 1990-11-28 | 1993-09-07 | Mitsubishi Denki Kabushiki Kaisha | Wavelength stabilizer for narrow bandwidth laser |
| WO1999001890A1 (en) * | 1997-07-03 | 1999-01-14 | Hamamatsu Photonics K.K. | Discharge tube and method of calibrating laser wavelength by using the same |
| JP2014016247A (en) * | 2012-07-09 | 2014-01-30 | Shimadzu Corp | Wavelength variable monochromatic light source |
| JP2018503872A (en) * | 2014-12-29 | 2018-02-08 | エーエスエムエル ホールディング エヌ.ブイ. | Feedback control system for alignment system |
| US10082740B2 (en) | 2014-12-29 | 2018-09-25 | Asml Holding N.V. | Feedback control system of an alignment system |
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