JPS6446746A - Positive type photoresist composition - Google Patents

Positive type photoresist composition

Info

Publication number
JPS6446746A
JPS6446746A JP20272487A JP20272487A JPS6446746A JP S6446746 A JPS6446746 A JP S6446746A JP 20272487 A JP20272487 A JP 20272487A JP 20272487 A JP20272487 A JP 20272487A JP S6446746 A JPS6446746 A JP S6446746A
Authority
JP
Japan
Prior art keywords
formulas
sulfonic acid
oxygen plasma
titled
siloxane polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20272487A
Other languages
Japanese (ja)
Inventor
Tadayoshi Kokubo
Kazuya Uenishi
Saburo Imamura
Haruyori Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp, Fuji Photo Film Co Ltd filed Critical Nippon Telegraph and Telephone Corp
Priority to JP20272487A priority Critical patent/JPS6446746A/en
Publication of JPS6446746A publication Critical patent/JPS6446746A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain the titled composition which has a high sensitivity for a UV and a high oxygen plasma durability, by incorporating a specified photosensitive agent, in a specified alkaline soluble siloxane polymer. CONSTITUTION:The titled composition contains one or more kinds of the alkaline soluble siloxane polymer shown by formulas I and II, and at least one kind of the photosensitive agent selected from esters of a compd. contg. at least four active hydrogen atoms. in a molecule and 1,2-naphthoquinone diazido-5-sulfonic acid, and/or 1,2-naphthoquinone diazido-4-sulfonic acid. In formulas I and II, X is for example, carboxyl group, R<1>-R<5> are each hydrogen atom. or alkyl group, (l), (m), (n) and (p) are each 0 or a positive integer. Thus, the titled resist capable of reproducing a positive pattern for the UV with the high accuracy and has the oxygen plasma durability is obtd.
JP20272487A 1987-08-14 1987-08-14 Positive type photoresist composition Pending JPS6446746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20272487A JPS6446746A (en) 1987-08-14 1987-08-14 Positive type photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20272487A JPS6446746A (en) 1987-08-14 1987-08-14 Positive type photoresist composition

Publications (1)

Publication Number Publication Date
JPS6446746A true JPS6446746A (en) 1989-02-21

Family

ID=16462110

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20272487A Pending JPS6446746A (en) 1987-08-14 1987-08-14 Positive type photoresist composition

Country Status (1)

Country Link
JP (1) JPS6446746A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0229652A (en) * 1988-07-20 1990-01-31 Fuji Photo Film Co Ltd Photoresist composition
JPH0436755A (en) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd Resist composition
US6949324B2 (en) 2001-12-28 2005-09-27 Fujitsu Limited Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
WO2010115945A1 (en) * 2009-04-08 2010-10-14 Pierre Fabre Dermo-Cosmetique Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof
CN106120412A (en) * 2016-08-16 2016-11-16 江苏凯威新材料科技有限公司 Steel wire rope and manufacturing process thereof

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0229652A (en) * 1988-07-20 1990-01-31 Fuji Photo Film Co Ltd Photoresist composition
JPH0436755A (en) * 1990-06-01 1992-02-06 Fuji Photo Film Co Ltd Resist composition
US6949324B2 (en) 2001-12-28 2005-09-27 Fujitsu Limited Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
WO2010115945A1 (en) * 2009-04-08 2010-10-14 Pierre Fabre Dermo-Cosmetique Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof
FR2944281A1 (en) * 2009-04-08 2010-10-15 Fabre Pierre Dermo Cosmetique RESORCINOL SULFUR DERIVATIVES, THEIR PREPARATION AND THEIR COSMETIC USES
CN102421751A (en) * 2009-04-08 2012-04-18 皮埃尔·法布尔皮肤化妆品公司 Resorcinol sulfur derivatives, their preparation and cosmetic use
JP2012523391A (en) * 2009-04-08 2012-10-04 ピエール、ファブレ、デルモ‐コスメティーク Sulfur derivative of resorcinol, its production and its cosmetic use
AU2010233687B2 (en) * 2009-04-08 2014-07-24 Pierre Fabre Dermo-Cosmetique Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof
US8859819B2 (en) 2009-04-08 2014-10-14 Pierre Fabre Dermo-Cosmetique Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof
CN106120412A (en) * 2016-08-16 2016-11-16 江苏凯威新材料科技有限公司 Steel wire rope and manufacturing process thereof

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