KR920701865A - 평면패널디스플레이의 제조방법 - Google Patents

평면패널디스플레이의 제조방법

Info

Publication number
KR920701865A
KR920701865A KR1019910701375A KR910701375A KR920701865A KR 920701865 A KR920701865 A KR 920701865A KR 1019910701375 A KR1019910701375 A KR 1019910701375A KR 910701375 A KR910701375 A KR 910701375A KR 920701865 A KR920701865 A KR 920701865A
Authority
KR
South Korea
Prior art keywords
manufacturing
flat panel
panel display
flat
display
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
KR1019910701375A
Other languages
English (en)
Other versions
KR100196560B1 (ko
Inventor
윌리암 벨 휴글
Original Assignee
윌리암 벨 휴글
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 윌리암 벨 휴글 filed Critical 윌리암 벨 휴글
Publication of KR920701865A publication Critical patent/KR920701865A/ko
Application granted granted Critical
Publication of KR100196560B1 publication Critical patent/KR100196560B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/0402—Recording geometries or arrangements
    • G03H1/0408—Total internal reflection [TIR] holograms, e.g. edge lit or substrate mode holograms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/0005—Adaptation of holography to specific applications
    • G03H2001/0094—Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2223/00—Optical components
    • G03H2223/18—Prism

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Holo Graphy (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
KR1019910701375A 1989-04-19 1990-04-18 평면패널 디스플레이의 제조방법 Expired - Fee Related KR100196560B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB898908871A GB8908871D0 (en) 1989-04-19 1989-04-19 Manufacture of flat panel displays
GB8908871.0 1989-04-19

Publications (2)

Publication Number Publication Date
KR920701865A true KR920701865A (ko) 1992-08-12
KR100196560B1 KR100196560B1 (ko) 1999-06-15

Family

ID=10655307

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019910701375A Expired - Fee Related KR100196560B1 (ko) 1989-04-19 1990-04-18 평면패널 디스플레이의 제조방법

Country Status (7)

Country Link
US (1) US5626991A (ko)
EP (1) EP0469026B1 (ko)
JP (1) JP3208450B2 (ko)
KR (1) KR100196560B1 (ko)
DE (1) DE69031119T2 (ko)
GB (1) GB8908871D0 (ko)
WO (1) WO1990013062A2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100727781B1 (ko) * 2006-09-01 2007-06-14 주식회사 대우일렉트로닉스 광정보 처리장치와 처리방법

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9010009D0 (en) * 1990-05-03 1990-06-27 Hugle William B Method of manufacturing a transistor
US6329104B1 (en) * 1992-03-16 2001-12-11 Holtronic Technologies, Ltd. Position alignment system for holographic lithography process
US5640257A (en) * 1992-10-14 1997-06-17 Holtronic Technologies Ltd. Apparatus and method for the manufacture of high uniformity total internal reflection holograms
GB2271648B (en) * 1992-10-14 1996-04-03 Holtronic Technologies Ltd Apparatus and method for the manufacture of high uniformity total internal reflection holograms
GB2311144B (en) * 1996-03-12 2000-05-24 Holtronic Technologies Ltd Method and apparatus for holographically recording an essentially periodic pattern
DE19700162B4 (de) * 1997-01-07 2006-09-07 Eads Deutschland Gmbh Verfahren zur Herstellung eines holografischen Bildschirms für die Laseraufprojektion
DE19730565A1 (de) 1997-07-17 1999-02-11 Daimler Benz Ag Verwendung eines holographischen Bildschirmes als Darstellungsfläche für Informationssysteme
FR2771520B1 (fr) * 1997-11-24 1999-12-24 Commissariat Energie Atomique Procede de formation de motifs dans une couche de resine photosensible, hologramme pour sa mise en oeuvre et systeme d'enregistrement de l'hologramme, application aux sources et ecrans a micropointes
US6392750B1 (en) * 1999-08-31 2002-05-21 Candescent Technologies Corporation Use of scattered and/or transmitted light in determining characteristics, including dimensional information, of object such as part of flat-panel display
US6359669B1 (en) 1999-09-17 2002-03-19 Rockwell Collins, Inc. Flat panel displays having an edge texture
TWI294252B (en) * 2004-09-28 2008-03-01 Toshiba Matsushita Display Tec Display
EP2137571B1 (en) * 2007-04-16 2012-11-14 North Carolina State University Methods of fabricating liquid crystal polarization gratings on substrates and related devices
CN104122672B (zh) * 2014-07-24 2016-02-10 四川大学 一种基于微球形透镜阵列的3d显示器

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1267858A (en) * 1968-09-19 1972-03-22 Agfa Gevaert Ag Holographic process
US3677634A (en) * 1968-12-23 1972-07-18 Ibm Contactless mask pattern exposure process and apparatus system having virtual extended depth of focus
GB1216631A (en) * 1969-01-23 1970-12-23 Standard Telephones Cables Ltd Improvements in or relating to holographic storage of information
US3647289A (en) * 1969-03-28 1972-03-07 Holotron Corp Apparatus and method for hologram copying with reference beam intensity control
AT323808B (de) * 1969-12-19 1975-07-25 Siemens Ag Verfahren zur herstellung von halbleiterbauelementen mit holographischer projektion der ätzmuster und anordnung hiefür
DE2140408A1 (de) * 1971-08-12 1973-03-01 Ibm Deutschland Verfahren zur herstellung von hologrammen
US4200395A (en) 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
US4332473A (en) * 1979-01-31 1982-06-01 Tokyo Shibaura Denki Kabushiki Kaisha Apparatus for detecting a mutual positional relationship of two sample members
US4458977A (en) * 1981-06-01 1984-07-10 Hughes Aircraft Company Systems for forming improved reflection holograms with a single beam
US4878086A (en) * 1985-04-01 1989-10-31 Canon Kabushiki Kaisha Flat panel display device and manufacturing of the same
GB8531830D0 (en) * 1985-12-30 1986-02-05 Davies H J Photo fabrication
NL8600697A (nl) * 1986-01-09 1987-08-03 Philips Nv Beeldweergeefinrichting en een methode voor de vervaardiging ervan.
FR2593953B1 (fr) * 1986-01-24 1988-04-29 Commissariat Energie Atomique Procede de fabrication d'un dispositif de visualisation par cathodoluminescence excitee par emission de champ
GB8615908D0 (en) 1986-06-30 1986-08-06 Hugle W B Integrated circuits
GB8629223D0 (en) * 1986-12-06 1987-01-14 Emi Plc Thorn Replication of carriers
GB8802333D0 (en) * 1988-02-03 1988-03-02 Holtronic Technologies Ltd Improvements in manufacture of integrated circuits using holographic techniques

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100727781B1 (ko) * 2006-09-01 2007-06-14 주식회사 대우일렉트로닉스 광정보 처리장치와 처리방법

Also Published As

Publication number Publication date
EP0469026B1 (en) 1997-07-23
US5626991A (en) 1997-05-06
JP3208450B2 (ja) 2001-09-10
DE69031119T2 (de) 1998-02-05
DE69031119D1 (de) 1997-09-04
WO1990013062A2 (en) 1990-11-01
WO1990013062A3 (en) 1990-11-29
KR100196560B1 (ko) 1999-06-15
GB8908871D0 (en) 1989-06-07
JPH05505032A (ja) 1993-07-29
EP0469026A1 (en) 1992-02-05

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