TW200636385A - Photosensitive resin composition for display panel, its hardened material, and spacer for display panel - Google Patents

Photosensitive resin composition for display panel, its hardened material, and spacer for display panel

Info

Publication number
TW200636385A
TW200636385A TW095101066A TW95101066A TW200636385A TW 200636385 A TW200636385 A TW 200636385A TW 095101066 A TW095101066 A TW 095101066A TW 95101066 A TW95101066 A TW 95101066A TW 200636385 A TW200636385 A TW 200636385A
Authority
TW
Taiwan
Prior art keywords
display panel
photosensitive resin
resin composition
spacer
hardened material
Prior art date
Application number
TW095101066A
Other languages
Chinese (zh)
Other versions
TWI303354B (en
Inventor
Masaki Sasaki
Masao Arima
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of TW200636385A publication Critical patent/TW200636385A/en
Application granted granted Critical
Publication of TWI303354B publication Critical patent/TWI303354B/zh

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E02—HYDRAULIC ENGINEERING; FOUNDATIONS; SOIL SHIFTING
    • E02F—DREDGING; SOIL-SHIFTING
    • E02F7/00—Equipment for conveying or separating excavated material
    • E02F7/06—Delivery chutes or screening plants or mixing plants mounted on dredgers or excavators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
    • B03B—SEPARATING SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS
    • B03B5/00—Washing granular, powdered or lumpy materials; Wet separating
    • B03B5/62—Washing granular, powdered or lumpy materials; Wet separating by hydraulic classifiers, e.g. of launder, tank, spiral or helical chute concentrator type
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00—Treatment of sludge; Devices therefor
    • C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
    • C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
    • C02F11/125—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering using screw filters
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00—Treatment of sludge; Devices therefor
    • C02F11/12—Treatment of sludge; Devices therefor by de-watering, drying or thickening
    • C02F11/121—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering
    • C02F11/127—Treatment of sludge; Devices therefor by de-watering, drying or thickening by mechanical de-watering by centrifugation
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/007—Contaminated open waterways, rivers, lakes or ponds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/008—Mobile apparatus and plants, e.g. mounted on a vehicle

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mining & Mineral Resources (AREA)
  • Water Supply & Treatment (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Civil Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

The photosensitive resin composition for the display panel contains (A) an alkali-soluble, carboxyl group-containing photosensitive resin, (B) a polymerizable compound having an ethylenic unsaturated bond, (C) a photopolymerization initiator, and (D) a compound having a oxazin ring.
TW095101066A 2005-02-09 2006-01-11 Photosensitive resin composition for display panel, its hardened material, and spacer for display panel TW200636385A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005032642A JP2006220790A (en) 2005-02-09 2005-02-09 Photosensitive resin composition for display panel, its hardened material, and spacer for display panel

Publications (2)

Publication Number Publication Date
TW200636385A true TW200636385A (en) 2006-10-16
TWI303354B TWI303354B (en) 2008-11-21

Family

ID=36918838

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095101066A TW200636385A (en) 2005-02-09 2006-01-11 Photosensitive resin composition for display panel, its hardened material, and spacer for display panel

Country Status (4)

Country Link
JP (1) JP2006220790A (en)
KR (1) KR100736295B1 (en)
CN (1) CN100582937C (en)
TW (1) TW200636385A (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100741297B1 (en) * 2005-09-30 2007-07-20 주식회사 동진쎄미켐 Photosensitive resin composition
JP5002479B2 (en) * 2007-02-16 2012-08-15 太陽ホールディングス株式会社 Composition for forming cured film pattern and method for producing cured film pattern using the same
JP5050693B2 (en) * 2007-07-10 2012-10-17 日立化成工業株式会社 Photosensitive resin composition, photosensitive film, permanent mask resist, and method for producing the same
JP2010002886A (en) * 2008-05-21 2010-01-07 Sumitomo Chemical Co Ltd Colored photosensitive resin composition
KR101121038B1 (en) 2008-07-01 2012-03-15 주식회사 엘지화학 Photoresist resin composition containing a number of photo-initiators, transparent thin film layer and liquid crystal display using the same
WO2010002129A2 (en) * 2008-07-01 2010-01-07 주식회사 엘지화학 Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same
SG174576A1 (en) * 2009-04-14 2011-10-28 Sumitomo Bakelite Co Photosensitive resin composition, adhesive film, and light receiving device
KR101495533B1 (en) * 2010-12-21 2015-02-25 동우 화인켐 주식회사 Photosensitive resin composition for spacer, spacer manufactured by the composition and display device including the spacer
JP6084353B2 (en) * 2010-12-28 2017-02-22 太陽インキ製造株式会社 Photocurable resin composition manufacturing method, dry film manufacturing method, cured product manufacturing method, and printed wiring board manufacturing method
JP5196063B2 (en) * 2012-07-26 2013-05-15 日立化成株式会社 Photosensitive resin composition, photosensitive film, permanent mask resist, and method for producing the same
KR101992866B1 (en) * 2013-02-06 2019-06-25 동우 화인켐 주식회사 Colored photosensitive resin composition
JP2013140379A (en) * 2013-02-07 2013-07-18 Hitachi Chemical Co Ltd Photosensitive resin composition, photosensitive film, method of manufacturing permanent mask resist, and permanent mask resist
JP7495272B2 (en) * 2020-04-30 2024-06-04 サカタインクス株式会社 Resist composition for black matrix and black matrix
CN120993674B (en) * 2025-10-23 2026-03-06 武汉柔显科技股份有限公司 Negative photosensitive resin composition, cured film, pattern cured film and application thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05281728A (en) * 1992-04-01 1993-10-29 Fuji Photo Film Co Ltd Photopolymerizable composition
EP1478668B1 (en) * 2002-02-28 2013-04-10 Showa Denko K.K. Thiol compound, photopolymerization initiator composition and photosensitive composition
JP2003345015A (en) * 2002-05-29 2003-12-03 Sumitomo Chem Co Ltd Photosensitive resin composition
JP2004177498A (en) * 2002-11-25 2004-06-24 Nippon Shokubai Co Ltd Photosetting resin composition and its use
JP2004302049A (en) * 2003-03-31 2004-10-28 Hodogaya Chem Co Ltd Photosensitive resin composition
JP4345348B2 (en) * 2003-05-09 2009-10-14 Ｊｓｒ株式会社 Method for forming protrusion for vertical alignment type liquid crystal display element and spacer for vertical alignment type liquid crystal display element
CN100555078C (en) 2003-06-02 2009-10-28 东丽株式会社 Photosensitive resin composition and electronic component and display device prepared therefrom

Also Published As

Publication number Publication date
JP2006220790A (en) 2006-08-24
CN100582937C (en) 2010-01-20
TWI303354B (en) 2008-11-21
KR20060090605A (en) 2006-08-14
KR100736295B1 (en) 2007-07-06
CN1818780A (en) 2006-08-16

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Legal Events

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MK4A Expiration of patent term of an invention patent