TW200710941A - A method of processing a semiconductor wafer, immersion lithography and edge-bead removal system - Google Patents

A method of processing a semiconductor wafer, immersion lithography and edge-bead removal system

Info

Publication number
TW200710941A
TW200710941A TW095123515A TW95123515A TW200710941A TW 200710941 A TW200710941 A TW 200710941A TW 095123515 A TW095123515 A TW 095123515A TW 95123515 A TW95123515 A TW 95123515A TW 200710941 A TW200710941 A TW 200710941A
Authority
TW
Taiwan
Prior art keywords
semiconductor wafer
immersion lithography
edge
bead removal
processing
Prior art date
Application number
TW095123515A
Other languages
English (en)
Other versions
TWI334161B (en
Inventor
Ching-Yu Chang
C C Ke
Vincent Yu
Original Assignee
Taiwan Semiconductor Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiwan Semiconductor Mfg Co Ltd filed Critical Taiwan Semiconductor Mfg Co Ltd
Publication of TW200710941A publication Critical patent/TW200710941A/zh
Application granted granted Critical
Publication of TWI334161B publication Critical patent/TWI334161B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0418—Apparatus for fluid treatment for etching
    • H10P72/0422—Apparatus for fluid treatment for etching for wet etching
    • H10P72/0424—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
TW095123515A 2005-06-30 2006-06-29 A method of processing a semiconductor wafer, immersion lithography and edge-bead removal system TWI334161B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69582605P 2005-06-30 2005-06-30
US11/337,986 US7691559B2 (en) 2005-06-30 2006-01-24 Immersion lithography edge bead removal

Publications (2)

Publication Number Publication Date
TW200710941A true TW200710941A (en) 2007-03-16
TWI334161B TWI334161B (en) 2010-12-01

Family

ID=37545242

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095123515A TWI334161B (en) 2005-06-30 2006-06-29 A method of processing a semiconductor wafer, immersion lithography and edge-bead removal system

Country Status (10)

Country Link
US (1) US7691559B2 (zh)
JP (1) JP4709698B2 (zh)
KR (1) KR100801159B1 (zh)
CN (1) CN1892445B (zh)
DE (1) DE102006029225B4 (zh)
FR (1) FR2888401B1 (zh)
IL (1) IL176568A (zh)
NL (1) NL1032067C2 (zh)
SG (1) SG128648A1 (zh)
TW (1) TWI334161B (zh)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080204687A1 (en) * 2007-02-23 2008-08-28 Nikon Corporation Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposure
US8435593B2 (en) 2007-05-22 2013-05-07 Asml Netherlands B.V. Method of inspecting a substrate and method of preparing a substrate for lithography
US7745095B2 (en) * 2007-07-05 2010-06-29 Asml Netherlands B.V. Lithographic method and device manufactured thereby
JP2009053575A (ja) * 2007-08-29 2009-03-12 Panasonic Corp フォトマスク及びそれを用いたパターン形成方法
JP2009058877A (ja) 2007-09-03 2009-03-19 Panasonic Corp フォトマスク及びそれを用いたパターン形成方法
CN101393401B (zh) * 2007-09-17 2011-08-17 中芯国际集成电路制造(上海)有限公司 光刻工艺的显影方法
US7824846B2 (en) * 2007-09-19 2010-11-02 International Business Machines Corporation Tapered edge bead removal process for immersion lithography
JP2009075207A (ja) * 2007-09-19 2009-04-09 Panasonic Corp フォトマスク及びそれを用いたパターン形成方法
CN101430501B (zh) * 2007-11-06 2015-04-01 中芯国际集成电路制造(上海)有限公司 一种修正光刻胶图形的方法
JP2009295716A (ja) * 2008-06-04 2009-12-17 Toshiba Corp 半導体装置の製造方法及び基板処理装置
US8227182B2 (en) * 2008-08-11 2012-07-24 Samsung Electronics Co., Ltd. Methods of forming a photosensitive film
KR101000944B1 (ko) * 2008-10-09 2010-12-13 세메스 주식회사 처리액 공급 유닛과 이를 이용한 기판 처리 장치 및 방법
CN101819382B (zh) * 2009-02-26 2012-02-08 中芯国际集成电路制造(上海)有限公司 在边缘去除过程中减少晶圆缺陷的方法及晶圆结构
CN102446701A (zh) * 2010-10-12 2012-05-09 上海华虹Nec电子有限公司 改善深沟槽刻蚀后硅片边缘硅尖刺缺陷的方法
CN102479676A (zh) * 2010-11-29 2012-05-30 上海华虹Nec电子有限公司 深沟槽刻蚀方法
US8826926B2 (en) 2011-06-06 2014-09-09 Micron Technology, Inc. Methods of profiling edges and removing edge beads
CN102969223B (zh) * 2011-08-31 2016-01-13 细美事有限公司 基板处理设备及基板处理方法
CN103915314B (zh) * 2012-12-31 2016-12-28 中芯国际集成电路制造(上海)有限公司 晶圆边缘清洗方法
JP5602887B2 (ja) * 2013-01-09 2014-10-08 ファナック株式会社 射出成形機の型締装置
US11062899B2 (en) * 2017-01-26 2021-07-13 Tokyo Electron Limited Coated film removing apparatus
JP7024307B2 (ja) * 2017-01-26 2022-02-24 東京エレクトロン株式会社 塗布膜除去装置、塗布膜除去方法及び記憶媒体
CN107255912B (zh) * 2017-08-02 2018-08-14 睿力集成电路有限公司 改善光刻胶涂覆过程中晶边缺陷的方法
JP7085392B2 (ja) * 2018-04-11 2022-06-16 東京エレクトロン株式会社 基板処理装置、基板処理方法及びコンピュータ読み取り可能な記録媒体
CN110444466A (zh) * 2018-05-06 2019-11-12 长鑫存储技术有限公司 光刻胶涂布工艺中的晶圆清洗方法及装置
EP3594748B1 (en) 2018-07-09 2021-04-14 C&D Semiconductor Services. Inc Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device
US11921427B2 (en) 2018-11-14 2024-03-05 Lam Research Corporation Methods for making hard masks useful in next-generation lithography
CN113227909B (zh) 2018-12-20 2025-07-04 朗姆研究公司 抗蚀剂的干式显影
TWI837391B (zh) 2019-06-26 2024-04-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
CN110729180B (zh) * 2019-11-26 2021-10-15 上海华力集成电路制造有限公司 洗晶边工艺方法
EP4651192A3 (en) 2020-01-15 2026-03-04 Lam Research Corporation Underlayer for photoresist adhesion and dose reduction
EP4078292A4 (en) * 2020-07-07 2023-11-22 Lam Research Corporation Integrated dry processes for patterning radiation photoresist patterning
WO2022031268A1 (en) 2020-08-04 2022-02-10 Applied Materials, Inc. Apparatus for removing photoresist off of photomask
US20230107357A1 (en) 2020-11-13 2023-04-06 Lam Research Corporation Process tool for dry removal of photoresist
JP7681106B2 (ja) 2020-12-08 2025-05-21 ラム リサーチ コーポレーション 有機蒸気によるフォトレジストの現像
KR20230053083A (ko) 2021-10-14 2023-04-21 삼성전자주식회사 포토레지스트 코팅 방법 및 이를 수행하기 위한 장치
CN114121615A (zh) * 2021-11-09 2022-03-01 华虹半导体(无锡)有限公司 半导体芯片制作方法
CN114236968A (zh) * 2021-12-20 2022-03-25 浙江大学杭州国际科创中心 光刻工艺中用于降低光刻胶膜厚的方法
KR20230097868A (ko) * 2021-12-24 2023-07-03 삼성전자주식회사 웨이퍼 처리 장치
KR20240160248A (ko) 2022-07-01 2024-11-08 램 리써치 코포레이션 에칭 정지 억제를 위한 금속 옥사이드 기반 포토레지스트의 순환적 현상
US12474640B2 (en) 2023-03-17 2025-11-18 Lam Research Corporation Integration of dry development and etch processes for EUV patterning in a single process chamber
KR20250069677A (ko) 2023-07-27 2025-05-19 램 리써치 코포레이션 금속-함유 포토레지스트에 대한 올-인-원 건식 현상

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5819350B2 (ja) 1976-04-08 1983-04-18 富士写真フイルム株式会社 スピンコ−テイング方法
US4510176A (en) 1983-09-26 1985-04-09 At&T Bell Laboratories Removal of coating from periphery of a semiconductor wafer
US4518678A (en) 1983-12-16 1985-05-21 Advanced Micro Devices, Inc. Selective removal of coating material on a coated substrate
JPS6353926A (ja) * 1986-08-22 1988-03-08 Yokogawa Hewlett Packard Ltd 半導体ウェ−ハのエッジからフォトレジストを除去する方式
US4732785A (en) 1986-09-26 1988-03-22 Motorola, Inc. Edge bead removal process for spin on films
JP2623608B2 (ja) * 1987-11-02 1997-06-25 ヤマハ株式会社 レジスト除去法
US4886728A (en) 1988-01-06 1989-12-12 Olin Hunt Specialty Products Inc. Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates
US5426017A (en) 1990-05-31 1995-06-20 Hoechst Celanese Corporation Composition and method for removing photoresist composition from substrates surfaces
US5362608A (en) 1992-08-24 1994-11-08 Brewer Science, Inc. Microlithographic substrate cleaning and compositions therefor
US5750317A (en) 1994-09-16 1998-05-12 Advanced Micro Devices, Inc. Process and system for flattening secondary edgebeads on resist coated wafers
US5513964A (en) * 1994-10-11 1996-05-07 Environamics Corporation Pump oil mister with reduced windage
JP2731752B2 (ja) * 1995-07-18 1998-03-25 山形日本電気株式会社 レジスト膜の処理方法
US5814433A (en) 1996-05-17 1998-09-29 Clariant Finance (Bvi) Limited Use of mixtures of ethyl lactate and N-methyl pyrollidone as an edge bead remover for photoresists
TW345681B (en) 1996-12-13 1998-11-21 Taiwan Semiconductor Mfg Co Ltd Method for removing covering layer on the peripheral edge portion of wafer
US5788477A (en) 1997-03-26 1998-08-04 Jones; Wendyle Gas flare
JPH11218933A (ja) * 1998-01-30 1999-08-10 Fuji Film Olin Kk レジスト洗浄除去用溶剤および電子部品製造用基材の製造方法
US5966628A (en) 1998-02-13 1999-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Process design for wafer edge in vlsi
US6516815B1 (en) * 1999-07-09 2003-02-11 Applied Materials, Inc. Edge bead removal/spin rinse dry (EBR/SRD) module
KR100419029B1 (ko) * 1999-08-31 2004-02-19 주식회사 하이닉스반도체 알칼리 처리 과정을 포함하는 포토레지스트 패턴 형성방법
JP3348842B2 (ja) 2000-01-11 2002-11-20 日本電気株式会社 回転塗布膜の形成方法
US6453916B1 (en) 2000-06-09 2002-09-24 Advanced Micro Devices, Inc. Low angle solvent dispense nozzle design for front-side edge bead removal in photolithography resist process
US6867884B1 (en) 2000-07-07 2005-03-15 Kodak Polychrome Graphics, Llc Halftone dot placement for multi-color images
JP2003100865A (ja) 2001-09-21 2003-04-04 Catalysts & Chem Ind Co Ltd 半導体基板の製造方法および半導体基板
TW561516B (en) 2001-11-01 2003-11-11 Tokyo Electron Ltd Substrate processing apparatus and substrate processing method
EP1554033A4 (en) * 2002-02-06 2007-12-05 Fujifilm Electronic Materials IMPROVED COMPOSITIONS FOR REMOVING BORED BEADS OF SEMICONDUCTOR LOADING BUFFER COATINGS AND METHOD FOR THEIR USE
JP2004179211A (ja) * 2002-11-25 2004-06-24 Nec Kansai Ltd レジスト塗布装置のエッジリンス機構
JP2005101498A (ja) * 2003-03-04 2005-04-14 Tokyo Ohka Kogyo Co Ltd 液浸露光プロセス用浸漬液および該浸漬液を用いたレジストパターン形成方法
US7247209B2 (en) 2003-06-12 2007-07-24 National Semiconductor Corporation Dual outlet nozzle for the combined edge bead removal and backside wash of spin coated wafers
US6809794B1 (en) 2003-06-27 2004-10-26 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
JP3993549B2 (ja) 2003-09-30 2007-10-17 株式会社東芝 レジストパターン形成方法
JP4101740B2 (ja) * 2003-12-09 2008-06-18 東京エレクトロン株式会社 塗布・現像装置及びレジストパターンの形成方法
JP4697406B2 (ja) * 2004-08-05 2011-06-08 信越化学工業株式会社 高分子化合物，レジスト保護膜材料及びパターン形成方法
JP4271109B2 (ja) 2004-09-10 2009-06-03 東京エレクトロン株式会社 塗布、現像装置、レジストパターン形成方法、露光装置及び洗浄装置
KR100568873B1 (ko) 2004-11-30 2006-04-10 삼성전자주식회사 웨이퍼의 에지 비드 스트립용 노즐장치

Also Published As

Publication number Publication date
KR100801159B1 (ko) 2008-02-11
SG128648A1 (en) 2007-01-30
FR2888401A1 (fr) 2007-01-12
FR2888401B1 (fr) 2015-06-26
CN1892445B (zh) 2012-04-18
US7691559B2 (en) 2010-04-06
IL176568A (en) 2014-07-31
TWI334161B (en) 2010-12-01
NL1032067C2 (nl) 2008-06-18
NL1032067A1 (nl) 2007-01-09
JP4709698B2 (ja) 2011-06-22
CN1892445A (zh) 2007-01-10
DE102006029225A1 (de) 2007-01-04
US20070003879A1 (en) 2007-01-04
DE102006029225B4 (de) 2011-06-09
IL176568A0 (en) 2006-10-31
JP2007013162A (ja) 2007-01-18
KR20070003657A (ko) 2007-01-05

Similar Documents

Publication Publication Date Title
US11150558B2 (en) Developing method
TW200623246A (en) Substrate cleaning method and developing apparatus
KR20090121215A (ko) 도포 처리 방법, 컴퓨터 판독 가능한 기억 매체, 및 도포 처리 장치
SG141385A1 (en) Lithographic apparatus and device manufacturing method
TW200505617A (en) Method and apparatus for removing an edge region of a layer applied to a substrate and for coating a substrate and a substrate
TW200743137A (en) Developing method and method for fabricating semiconductor device using the developing method
TWI266357B (en) Pattern forming method and method for manufacturing semiconductor device
CN102385262A (zh) 光刻工艺的显影方法
CN101625968A (zh) 提高湿法刻蚀性能的方法
JP2005256090A5 (zh)
EP1458015A3 (en) Spin coating apparatus for coating photoresist
US20100304311A1 (en) Method of producing resist pattern
KR100744277B1 (ko) 웨이퍼의 에지 비드 제거장치
US20140377709A1 (en) Method for manufacturing semiconductor device
JP2001345293A5 (zh)
JP4492931B2 (ja) フォトレジストパターンの形成方法
US20070026340A1 (en) Method of removing photoresist and photoresist rework method
TW200709295A (en) Method for manufacturing semiconductor device using immersion lithography process
JPH1140557A (ja) 半導体製造装置および半導体集積装置の製造方法
JPH11340113A (ja) 半導体製造装置及び半導体装置の製造方法
KR19980026391A (ko) 반도체 장치의 에지 비드 제거방법
KR20040067010A (ko) 포토레지스트 패턴 현상 방법
TW200801823A (en) Dynamic puddle developing process
JPS59104643A (ja) ホトレジストの現像方法
KR970008319A (ko) 반도체 소자의 어드히젼처리방법