TW200715548A - Integrated inductor - Google Patents

Integrated inductor

Info

Publication number
TW200715548A
TW200715548A TW094135491A TW94135491A TW200715548A TW 200715548 A TW200715548 A TW 200715548A TW 094135491 A TW094135491 A TW 094135491A TW 94135491 A TW94135491 A TW 94135491A TW 200715548 A TW200715548 A TW 200715548A
Authority
TW
Taiwan
Prior art keywords
layer pattern
integrated inductor
metal layer
electrically connected
stacked
Prior art date
Application number
TW094135491A
Other languages
English (en)
Other versions
TWI304261B (en
Inventor
Ta-Hsun Yeh
Yuh-Sheng Jean
Original Assignee
Realtek Semiconductor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Realtek Semiconductor Corp filed Critical Realtek Semiconductor Corp
Priority to TW094135491A priority Critical patent/TWI304261B/zh
Priority to US11/548,687 priority patent/US7612645B2/en
Priority to JP2006277978A priority patent/JP2007110129A/ja
Publication of TW200715548A publication Critical patent/TW200715548A/zh
Application granted granted Critical
Publication of TWI304261B publication Critical patent/TWI304261B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00—Fixed inductances of the signal type
    • H01F17/0006—Printed inductances
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/497—Inductive arrangements or effects of, or between, wiring layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F27/00—Details of transformers or inductances, in general
    • H01F27/34—Special means for preventing or reducing unwanted electric or magnetic effects, e.g. no-load losses, reactive currents, harmonics, oscillations, leakage fields

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Coils Or Transformers For Communication (AREA)
TW094135491A 2005-10-12 2005-10-12 Integrated inductor TWI304261B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW094135491A TWI304261B (en) 2005-10-12 2005-10-12 Integrated inductor
US11/548,687 US7612645B2 (en) 2005-10-12 2006-10-11 Integrated inductor
JP2006277978A JP2007110129A (ja) 2005-10-12 2006-10-11 集積インダクター

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094135491A TWI304261B (en) 2005-10-12 2005-10-12 Integrated inductor

Publications (2)

Publication Number Publication Date
TW200715548A true TW200715548A (en) 2007-04-16
TWI304261B TWI304261B (en) 2008-12-11

Family

ID=38035676

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094135491A TWI304261B (en) 2005-10-12 2005-10-12 Integrated inductor

Country Status (3)

Country Link
US (1) US7612645B2 (zh)
JP (1) JP2007110129A (zh)
TW (1) TWI304261B (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8717137B2 (en) * 2006-05-31 2014-05-06 Broadcom Corporation On-chip inductor using redistribution layer and dual-layer passivation
KR100904594B1 (ko) * 2007-08-27 2009-06-25 주식회사 동부하이텍 반도체 소자용 인덕터 및 그 제조 방법
US7956715B2 (en) * 2008-04-21 2011-06-07 University Of Dayton Thin film structures with negative inductance and methods for fabricating inductors comprising the same
US8143952B2 (en) 2009-10-08 2012-03-27 Qualcomm Incorporated Three dimensional inductor and transformer
US8816810B2 (en) * 2011-07-06 2014-08-26 Mediatek Inc. Integrated circuit transformer
KR101508812B1 (ko) * 2012-05-08 2015-04-06 삼성전기주식회사 코일 부품 제조방법 및 코일 부품
US9001031B2 (en) * 2012-07-30 2015-04-07 Qualcomm Mems Technologies, Inc. Complex passive design with special via implementation
KR20140125150A (ko) * 2013-04-18 2014-10-28 삼성전기주식회사 공통모드필터 및 이의 제조방법
US9177709B2 (en) * 2013-09-05 2015-11-03 Globalfoundries Inc. Structure and method for high performance multi-port inductor
KR101539879B1 (ko) * 2014-01-02 2015-07-27 삼성전기주식회사 칩 전자부품
KR101598295B1 (ko) * 2014-09-22 2016-02-26 삼성전기주식회사 다층 시드 패턴 인덕터, 그 제조방법 및 그 실장 기판
US10068699B1 (en) 2017-03-01 2018-09-04 Realtek Semiconductor Corp. Integrated inductor and fabrication method thereof
US10522282B2 (en) 2017-04-07 2019-12-31 Realtek Semiconductor Corp. High isolation integrated inductor and method thereof
US11277028B2 (en) 2017-05-26 2022-03-15 Nucurrent, Inc. Wireless electrical energy transmission system for flexible device orientation
US10896780B2 (en) * 2018-03-02 2021-01-19 Intel IP Corporation Resonant LC tank package and method of manufacture
US11283303B2 (en) 2020-07-24 2022-03-22 Nucurrent, Inc. Area-apportioned wireless power antenna for maximized charging volume
US11695302B2 (en) 2021-02-01 2023-07-04 Nucurrent, Inc. Segmented shielding for wide area wireless power transmitter
US12444677B2 (en) * 2021-10-27 2025-10-14 Microchip Technology Incorporated Integrated inductor including multi-component via layer inductor element

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5545916A (en) * 1994-12-06 1996-08-13 At&T Corp. High Q integrated inductor
JPH09162354A (ja) 1995-07-07 1997-06-20 Northern Telecom Ltd 集積インダクタ構造およびその製造方法
TW396594B (en) * 1998-07-13 2000-07-01 Winbond Electronics Corp High quality inductor device and its manufacturing method
TW386279B (en) * 1998-08-07 2000-04-01 Winbond Electronics Corp Inductor structure with air gap and method of manufacturing thereof
US6566731B2 (en) * 1999-02-26 2003-05-20 Micron Technology, Inc. Open pattern inductor
US6924725B2 (en) * 2002-03-21 2005-08-02 Infineon Technologies Ag Coil on a semiconductor substrate and method for its production
JP2004119489A (ja) 2002-09-24 2004-04-15 Mitsubishi Electric Corp 半導体装置
US6852605B2 (en) * 2003-05-01 2005-02-08 Chartered Semiconductor Manufacturing Ltd. Method of forming an inductor with continuous metal deposition
GB2406720B (en) 2003-09-30 2006-09-13 Agere Systems Inc An inductor formed in an integrated circuit
US7207096B2 (en) 2004-01-22 2007-04-24 International Business Machines Corporation Method of manufacturing high performance copper inductors with bond pads
JP2006173145A (ja) * 2004-12-10 2006-06-29 Sharp Corp インダクタ、共振回路、半導体集積回路、発振器、通信装置
KR100598113B1 (ko) * 2005-01-03 2006-07-07 삼성전자주식회사 인덕터 및 인덕터 형성 방법

Also Published As

Publication number Publication date
US7612645B2 (en) 2009-11-03
JP2007110129A (ja) 2007-04-26
TWI304261B (en) 2008-12-11
US20070126543A1 (en) 2007-06-07

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Legal Events

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MK4A Expiration of patent term of an invention patent