TW200726357A - Method for fabricating printing plate with fine pattern using electric field - Google Patents

Method for fabricating printing plate with fine pattern using electric field

Info

Publication number
TW200726357A
TW200726357A TW095116725A TW95116725A TW200726357A TW 200726357 A TW200726357 A TW 200726357A TW 095116725 A TW095116725 A TW 095116725A TW 95116725 A TW95116725 A TW 95116725A TW 200726357 A TW200726357 A TW 200726357A
Authority
TW
Taiwan
Prior art keywords
printing plate
fine pattern
electric field
conductive layer
etch
Prior art date
Application number
TW095116725A
Other languages
English (en)
Other versions
TWI324900B (en
Inventor
Nam-Kwon Oh
Original Assignee
Lg Philips Lcd Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lg Philips Lcd Co Ltd filed Critical Lg Philips Lcd Co Ltd
Publication of TW200726357A publication Critical patent/TW200726357A/zh
Application granted granted Critical
Publication of TWI324900B publication Critical patent/TWI324900B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • G03F7/405—Treatment with inorganic or organometallic reagents after imagewise removal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/14—Etching locally
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G03F7/0957—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer with sensitive layers on both sides of the substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/02—Engraving; Heads therefor
    • B41C1/025—Engraving; Heads therefor characterised by means for the liquid etching of substrates for the manufacturing of relief or intaglio printing forms, already provided with resist pattern

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Inorganic Chemistry (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Optics & Photonics (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Electroluminescent Light Sources (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Printing Plates And Materials Therefor (AREA)
TW095116725A 2005-12-29 2006-05-11 Method for fabricating printing plate with fine pattern using electric field TWI324900B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020050133600A KR101211293B1 (ko) 2005-12-29 2005-12-29 전계를 이용한 미세패턴이 형성된 인쇄판의 제조방법

Publications (2)

Publication Number Publication Date
TW200726357A true TW200726357A (en) 2007-07-01
TWI324900B TWI324900B (en) 2010-05-11

Family

ID=38213921

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095116725A TWI324900B (en) 2005-12-29 2006-05-11 Method for fabricating printing plate with fine pattern using electric field

Country Status (5)

Country Link
US (1) US7687226B2 (zh)
KR (1) KR101211293B1 (zh)
CN (1) CN1991588B (zh)
FR (1) FR2895698B1 (zh)
TW (1) TWI324900B (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100988437B1 (ko) * 2007-09-21 2010-10-18 주식회사 엘지화학 네가티브 포토레지스트를 이용한 유리 또는 금속 식각방법 및 이를 이용한 클리쉐의 제조방법
TW200941322A (en) * 2008-03-28 2009-10-01 Tpk Touch Solutions Inc Manufacturing method for conducting films on two surfaces of transparent substrate of touch-control circuit
CN101750903B (zh) * 2008-12-15 2013-01-02 中芯国际集成电路制造(上海)有限公司 光刻方法
KR101684578B1 (ko) * 2013-07-11 2016-12-08 서울대학교산학협력단 패턴의 형성방법, 및 상기 방법을 이용한 촉매 및 전자 소자
CN103422153A (zh) * 2013-08-22 2013-12-04 大连七色光太阳能科技开发有限公司 一种fto导电薄膜的刻蚀方法
CN106739427A (zh) * 2016-12-02 2017-05-31 成都印钞有限公司 一种用于银制品的腐蚀溶液及采用该腐蚀溶液蚀刻银版的工艺

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293156A (en) * 1963-06-25 1966-12-20 Beck Engraving Company Inc Method and apparatus for plating etched half-tone printing plates
EP0250154A3 (en) * 1986-06-18 1989-07-12 Minnesota Mining And Manufacturing Company Photographic element on a polymeric substrate with novel subbing layer
US5558977A (en) * 1995-12-22 1996-09-24 Eastman Kodak Company Imaging element comprising a transparent magnetic layer and a transparent electrically-conductive layer
JP3620223B2 (ja) * 1997-07-07 2005-02-16 富士ゼロックス株式会社 画像記録方法および画像記録装置
JP4048133B2 (ja) * 2003-02-21 2008-02-13 富士フイルム株式会社 感光性組成物及びそれを用いた平版印刷版原版
US7169313B2 (en) * 2005-05-13 2007-01-30 Endicott Interconnect Technologies, Inc. Plating method for circuitized substrates

Also Published As

Publication number Publication date
US20070154842A1 (en) 2007-07-05
KR20070070753A (ko) 2007-07-04
FR2895698B1 (fr) 2013-11-15
KR101211293B1 (ko) 2012-12-11
US7687226B2 (en) 2010-03-30
TWI324900B (en) 2010-05-11
CN1991588A (zh) 2007-07-04
CN1991588B (zh) 2010-05-12
FR2895698A1 (fr) 2007-07-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees