TW200802485A - Gate controlled filed emission triode and process for fabricating the same - Google Patents

Gate controlled filed emission triode and process for fabricating the same

Info

Publication number
TW200802485A
TW200802485A TW095120938A TW95120938A TW200802485A TW 200802485 A TW200802485 A TW 200802485A TW 095120938 A TW095120938 A TW 095120938A TW 95120938 A TW95120938 A TW 95120938A TW 200802485 A TW200802485 A TW 200802485A
Authority
TW
Taiwan
Prior art keywords
gate controlled
fabricating
emission triode
same
emitter arrays
Prior art date
Application number
TW095120938A
Other languages
English (en)
Other versions
TWI307908B (en
Inventor
Tseung-Yuan Tseng
Chia-Ying Lee
Seu-Yi Li
Pang Lin
Original Assignee
Univ Nat Chiao Tung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Nat Chiao Tung filed Critical Univ Nat Chiao Tung
Priority to TW095120938A priority Critical patent/TWI307908B/zh
Priority to US11/642,271 priority patent/US7704114B2/en
Publication of TW200802485A publication Critical patent/TW200802485A/zh
Application granted granted Critical
Publication of TWI307908B publication Critical patent/TWI307908B/zh
Priority to US12/386,161 priority patent/US8267734B2/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/022Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02Main electrodes
    • H01J1/30Cold cathodes, e.g. field-emissive cathode
    • H01J1/304Field-emissive cathodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00Electrodes common to discharge tubes
    • H01J2201/30Cold cathodes
    • H01J2201/304Field emission cathodes
    • H01J2201/30446Field emission cathodes characterised by the emitter material

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
TW095120938A 2006-06-13 2006-06-13 Gate controlled filed emission triode and process for fabricating the same TWI307908B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
TW095120938A TWI307908B (en) 2006-06-13 2006-06-13 Gate controlled filed emission triode and process for fabricating the same
US11/642,271 US7704114B2 (en) 2006-06-13 2006-12-20 Gate controlled field emission triode and process for fabricating the same
US12/386,161 US8267734B2 (en) 2006-06-13 2009-04-14 Gate controlled field emission triode and process for fabricating the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW095120938A TWI307908B (en) 2006-06-13 2006-06-13 Gate controlled filed emission triode and process for fabricating the same

Publications (2)

Publication Number Publication Date
TW200802485A true TW200802485A (en) 2008-01-01
TWI307908B TWI307908B (en) 2009-03-21

Family

ID=38820970

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095120938A TWI307908B (en) 2006-06-13 2006-06-13 Gate controlled filed emission triode and process for fabricating the same

Country Status (2)

Country Link
US (2) US7704114B2 (zh)
TW (1) TWI307908B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI385716B (zh) * 2008-11-28 2013-02-11 Univ Nat Chiao Tung 以水溶液製備金屬氧化物薄膜之方法

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100593264B1 (ko) * 2003-06-26 2006-06-26 학교법인 포항공과대학교 p-타입 반도체 박막과 n-타입 산화아연(ZnO)계나노막대의 이종접합 구조체, 이의 제법 및 이를 이용한소자
US7785922B2 (en) * 2004-04-30 2010-08-31 Nanosys, Inc. Methods for oriented growth of nanowires on patterned substrates
US7951422B2 (en) 2005-12-29 2011-05-31 Nanosys, Inc. Methods for oriented growth of nanowires on patterned substrates
US7804149B2 (en) * 2007-04-02 2010-09-28 The University Of Utah Research Foundation Nanostructured ZnO electrodes for efficient dye sensitized solar cells
TW201001624A (en) * 2008-01-24 2010-01-01 Soligie Inc Silicon thin film transistors, systems, and methods of making same
US8058627B2 (en) * 2008-08-13 2011-11-15 Wisys Technology Foundation Addressable transmission electron microscope grid
WO2010120196A1 (en) * 2009-04-14 2010-10-21 Institute Of Geological And Nuclear Sciences Limited Zinc oxide nanostructures and sensors using zinc oxide nanostructures
US9099273B2 (en) * 2011-10-05 2015-08-04 Lightlab Sweden Ab Method for manufacturing nanostructures and cathode for field emission lighting arrangement
US9443662B2 (en) 2012-11-07 2016-09-13 University Of South Florida Microstructured crystalline device in confined space, a dye-sensitized solar cell, and method of preparation thereof
CN104743507B (zh) * 2015-03-30 2016-06-22 上海应用技术学院 一种在微器件表面区域性生长氧化锌纳米线阵列的方法
EP3096341B1 (en) 2015-05-18 2020-07-22 LightLab Sweden AB Method for manufacturing nanostructures for a field emission cathode
CN105428185B (zh) * 2015-12-23 2017-04-12 中国电子科技集团公司第十二研究所 一种准集成栅控碳纳米管/纳米线场发射阴极的制作方法
CN106241858B (zh) * 2016-08-26 2018-01-23 广东工业大学 一种一维氧化锌晶体的制备方法
RU2653847C1 (ru) * 2017-01-18 2018-05-15 Акционерное общество "Научно-производственное предприятие "Алмаз" (АО "НПП "Алмаз") Катодно-сеточный узел с автоэмиссионным катодом
CN107818899B (zh) * 2017-11-02 2019-06-14 中山大学 可行列寻址的共面聚焦纳米冷阴极电子源阵列及制作方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5264937A (en) 1992-07-29 1993-11-23 Thomson Consumer Electronics, Inc. Apparatus for time division multiplexed processing of frequency division multiplexed signals
JPH0729897A (ja) * 1993-06-25 1995-01-31 Nec Corp 半導体装置の製造方法
US6015326A (en) 1996-09-03 2000-01-18 Advanced Vision Technologies,Inc. Fabrication process for electron field-emission display
WO2003084865A2 (en) * 2001-06-14 2003-10-16 Hyperion Catalysis International, Inc. Field emission devices using modified carbon nanotubes
TWI248626B (en) 2003-04-04 2006-02-01 Hon Hai Prec Ind Co Ltd Method for fabricating a field emission device
CN1228248C (zh) 2003-09-19 2005-11-23 中国科学院上海硅酸盐研究所 一种制备氧化锌纳米线的湿化学方法
US7491423B1 (en) * 2005-05-02 2009-02-17 Sandia Corporation Directed spatial organization of zinc oxide nanostructures

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI385716B (zh) * 2008-11-28 2013-02-11 Univ Nat Chiao Tung 以水溶液製備金屬氧化物薄膜之方法

Also Published As

Publication number Publication date
US7704114B2 (en) 2010-04-27
US20070284573A1 (en) 2007-12-13
TWI307908B (en) 2009-03-21
US20090203282A1 (en) 2009-08-13
US8267734B2 (en) 2012-09-18

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MM4A Annulment or lapse of patent due to non-payment of fees