TW324706B - Process and apparatus for producing quartz glass plates - Google Patents

Process and apparatus for producing quartz glass plates

Info

Publication number
TW324706B
TW324706B TW084102423A TW84102423A TW324706B TW 324706 B TW324706 B TW 324706B TW 084102423 A TW084102423 A TW 084102423A TW 84102423 A TW84102423 A TW 84102423A TW 324706 B TW324706 B TW 324706B
Authority
TW
Taiwan
Prior art keywords
quartz glass
ash
backing
glass plates
layer
Prior art date
Application number
TW084102423A
Other languages
English (en)
Inventor
Christiansen Uwe
Steinkohl Anton
Original Assignee
Heraeus Quarzglas
Shinetsu Sekiei Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6519032&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW324706(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Heraeus Quarzglas, Shinetsu Sekiei Kk filed Critical Heraeus Quarzglas
Application granted granted Critical
Publication of TW324706B publication Critical patent/TW324706B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1407—Deposition reactors therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C03B19/1423—Reactant deposition burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C03B2207/52—Linear array of like burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/60—Relationship between burner and deposit, e.g. position
    • C03B2207/66—Relative motion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Glass Compositions (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
TW084102423A 1994-05-26 1995-03-14 Process and apparatus for producing quartz glass plates TW324706B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4418401A DE4418401C1 (de) 1994-05-26 1994-05-26 Verfahren und Vorrichtung zur Herstellung von Platten aus Quarzglas

Publications (1)

Publication Number Publication Date
TW324706B true TW324706B (en) 1998-01-11

Family

ID=6519032

Family Applications (1)

Application Number Title Priority Date Filing Date
TW084102423A TW324706B (en) 1994-05-26 1995-03-14 Process and apparatus for producing quartz glass plates

Country Status (7)

Country Link
US (1) US5667547A (zh)
EP (1) EP0684211B1 (zh)
JP (1) JP2796069B2 (zh)
KR (1) KR0162546B1 (zh)
CN (1) CN1070460C (zh)
DE (1) DE4418401C1 (zh)
TW (1) TW324706B (zh)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6101845A (en) * 1996-02-29 2000-08-15 Asahi Glass Company Ltd. Process for forming a glass sheet
JP2999751B2 (ja) * 1997-06-27 2000-01-17 三星電子株式会社 シリカ膜の製造装置及びその製造方法
US6286338B2 (en) * 1998-02-26 2001-09-11 Visteon Global Technologies, Inc. Block assembly for a gas-type lehr
US6319634B1 (en) 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
CN1119300C (zh) * 2000-05-25 2003-08-27 江苏省东海石英制品总厂 一种低羟基石英管的生产方法
US20020083740A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Process and apparatus for production of silica grain having desired properties and their fiber optic and semiconductor application
US20020083739A1 (en) * 2000-12-29 2002-07-04 Pandelisev Kiril A. Hot substrate deposition fiber optic preforms and preform components process and apparatus
US7797966B2 (en) * 2000-12-29 2010-09-21 Single Crystal Technologies, Inc. Hot substrate deposition of fused silica
US7021083B2 (en) * 2003-01-29 2006-04-04 Fitel Usa Corp. Manufacture of high purity glass tubes
US7677058B2 (en) * 2007-05-07 2010-03-16 Corning Incorporated Process and apparatus for making glass sheet
TWI464124B (zh) * 2009-05-15 2014-12-11 Corning Inc 滾軸至滾軸玻璃材料屬性及特徵
US8062733B2 (en) * 2009-05-15 2011-11-22 Corning Incorporated Roll-to-roll glass material attributes and fingerprint
US8359884B2 (en) * 2009-07-17 2013-01-29 Corning Incorporated Roll-to-roll glass: touch-free process and multilayer approach
US8438876B2 (en) * 2010-03-29 2013-05-14 Corning Incorporated Method and apparatus for removing glass soot sheet from substrate
DE102010013664A1 (de) * 2010-04-01 2011-06-09 Geib, Uwe, Dipl.-Wirt. Ing. (FH) Schmelzprozess mit durchschiebbarer Verblendung
US9321669B2 (en) * 2011-08-23 2016-04-26 Corning Incorporated Thin glass sheet with tunable coefficient of thermal expansion
US9199870B2 (en) 2012-05-22 2015-12-01 Corning Incorporated Electrostatic method and apparatus to form low-particulate defect thin glass sheets
US9452946B2 (en) 2013-10-18 2016-09-27 Corning Incorporated Locally-sintered porous soot parts and methods of forming
US10185084B2 (en) 2016-02-23 2019-01-22 Corning Incorporated Layered glass structures
US9422187B1 (en) 2015-08-21 2016-08-23 Corning Incorporated Laser sintering system and method for forming high purity, low roughness silica glass
WO2017034904A1 (en) * 2015-08-21 2017-03-02 Corning Incorporated Layered glass structures
CN107721138A (zh) * 2016-08-14 2018-02-23 徐林波 一种玻璃板的生产方法
CN114656134A (zh) * 2022-02-21 2022-06-24 江苏太平洋石英股份有限公司 一种复合石英玻璃板及其制备方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE153503C (zh) *
DE542682C (de) * 1932-01-27 Freeman Co Louis G Heizform zum Zurechtpressen von Schuhen
US263418A (en) * 1882-08-29 nairn
DE545682C (de) * 1930-02-07 1932-03-04 I G Farbenindustrie Akt Ges Verfahren zur Herstellung poroeser Koerper aus Quarz, Glas u. dgl.
DE1301009B (de) * 1965-08-05 1969-08-14 Wasagchemie Ag Vorrichtung und Verfahren zur kontinuierlichen Herstellung von Schaumglas bzw. -keramik
JPS5269423A (en) * 1975-12-08 1977-06-09 Toyo Glass Co Ltd Method of glass plate
US4363647A (en) * 1981-05-14 1982-12-14 Corning Glass Works Method of making fused silica-containing material
DE3226451C2 (de) * 1982-07-15 1984-09-27 Heraeus Quarzschmelze Gmbh, 6450 Hanau Verfahren zur Herstellung von schlierenfreien, blasenfreien und homogenen Quarzglasplatten und Vorrichtung zur Durchführung des Verfahrens
GB8530775D0 (en) * 1985-12-13 1986-01-22 Plessey Co Plc Producing quartz plate
US4872895A (en) * 1986-12-11 1989-10-10 American Telephone And Telegraph Company, At&T Bell Laboratories Method for fabricating articles which include high silica glass bodies
JPS6445163A (en) * 1987-08-14 1989-02-17 Seiko Epson Corp Semiconductor device
CN1045758A (zh) * 1989-03-22 1990-10-03 长沙市电子材料二厂 气炼法生产不透明乳白石英玻璃
US4950753A (en) * 1989-05-17 1990-08-21 Eli Lilly And Company Process for 3-exomethylenecepham sulfoxide esters
JPH0751449B2 (ja) * 1989-11-24 1995-06-05 日本板硝子株式会社 ガラス質焼結板の製造方法
JPH0455331A (ja) * 1990-06-20 1992-02-24 Hitachi Chem Co Ltd シリカガラスの製造法
JPH05825A (ja) * 1991-04-17 1993-01-08 Hitachi Chem Co Ltd シリカガラスの製造法
JP2628831B2 (ja) * 1993-07-09 1997-07-09 古河電気工業株式会社 光ファイバスート製造装置

Also Published As

Publication number Publication date
EP0684211A1 (de) 1995-11-29
CN1070460C (zh) 2001-09-05
JPH0859263A (ja) 1996-03-05
CN1122783A (zh) 1996-05-22
KR0162546B1 (ko) 1998-11-16
DE4418401C1 (de) 1995-06-01
EP0684211B1 (de) 1997-07-02
JP2796069B2 (ja) 1998-09-10
KR950031952A (ko) 1995-12-20
US5667547A (en) 1997-09-16

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