TWI232199B - Substrate transporting apparatus, substrate processing apparatus using the transporting apparatus and substrate processing method - Google Patents
Substrate transporting apparatus, substrate processing apparatus using the transporting apparatus and substrate processing method Download PDFInfo
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- TWI232199B TWI232199B TW091103130A TW91103130A TWI232199B TW I232199 B TWI232199 B TW I232199B TW 091103130 A TW091103130 A TW 091103130A TW 91103130 A TW91103130 A TW 91103130A TW I232199 B TWI232199 B TW I232199B
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- substrate
- transfer
- port
- substrates
- carrying
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H10P72/3402—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H10P72/3411—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
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- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Rollers For Roller Conveyors For Transfer (AREA)
Abstract
Description
1232199 五、發明說明(2) __ 受基板。然後,利用推料銷的下降,美 帶,並開始進行搬送。 土板便讓渡給輸送 從輸送帶上將基板讓渡給索引機械人, 換句話說,在讓渡位置上具備有推料 D樣的進仃。 搬送至讓渡位置的基板,便利用推4 利用輸送帶被 基板搬送面更上方處。藉由此推料帶的 的基板,制用索引機械人而被承接向、准持方;上升位置處 在曰本專利特開平10-310240號公報中 利用輸送帶所搬送基板的路徑,7揭不有可迴避 由採用此種推料銷,便可將基板:二的之推料銷。藉 方位置的立體重疊二個位置處板送帶1,與其上 處’便可形成供使搬入前或搬;的上升位置 衝部(基板讓渡位置)。鐾如,—9基板呈待機狀態的緩 緩衝部的話,因為可從二j册^在基板搬出埠上設置此種 不致阻礙基板的流暢,^ g ^快速的排除基板,因此便 基板處理部内進行Ϊ理可順利的將基板逐次依序的搬送入 此構造的基板處理袭置, 中,分別具有控制部。哕Μ *索引單元與基板處理單元 使索引機械人聯繫於推^寻控制部藉由執行數據通信,而 元與基板處理單元係屬^銷與輪送帶的動作。因為索引單 利用索引單元端的控制部不/同的單元,因此索引機械人便 則利用基板處理單元/進行控制著,而推料銷與輸送帶 例。 而的控制部進行控制著,此乃屬於通 所以,基板處理單—山 而的控制部,便配合著基板搬入埠1232199 V. Description of the invention (2) __ Accept substrate. Then, using the lowering of the pusher pin, the belt is tapered and the transfer is started. The soil plate is transferred to the conveyor. The substrate is transferred from the conveyor to the indexing robot. In other words, there is a feed D-like feed at the transfer location. It is convenient to push the substrate transferred to the transfer position to the upper side of the substrate transfer surface using a conveyor belt. By using the substrate of the push belt, the index robot is used to produce the substrate. The ascending position is in the path of the substrate transferred by the conveyor in Japanese Patent Application Laid-Open No. 10-310240. There is no avoiding that by using such a push pin, the substrate can be pushed: the second push pin. The debit position is three-dimensionally overlapped with the board conveying belt 1 at the two positions, and the upper position ′ can be used to form a rising position before or during the moving; a punching portion (substrate transfer position). For example, if the -9 substrate is in the buffer zone in the standby state, it can be installed on the substrate removal port from the second book ^ This does not hinder the smoothness of the substrate, ^ g ^ Quickly exclude the substrate, so the substrate processing section The controller can smoothly transfer the substrates one by one into the substrate processing structure of this structure, and each has a control unit.哕 M * Index unit and substrate processing unit The index robot is connected to the search control unit to perform data communication, and the unit and the substrate processing unit belong to the actions of pin and carousel. Because the index sheet uses different / different units from the control unit side of the index unit, the index robot uses the substrate processing unit / control, and pushes the pin and the conveyor belt as an example. The control unit controls it. This is common. Therefore, the control unit of the substrate processing unit—the mountain—coordinates the movement of the substrate into the port.
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五'發明說明(3) 的推斜处 的控制=提:ί:;渡給輸送帶的時序,㈣索引單元端 制部,則配::美* : ϊ ΐ。此夕卜’基板處理單元端的控 板而上升的日:/板搬出ΐ的推料銷’從輸送帶上承接基 求。此等Α: ’對=引單元端的控制部提供基板搬出要 經由索Κ板搬人要求與基板搬出要纟,則透過通信電路 索引機㈣控制部而接收’並應答於此,而控制著 讓::i送單元端的控制部係預估推料銷將基板 。輸迗π的時序,而提早發出基板搬入要求。 晶ί中反般二’*引機械人便從放置於晶盒站丄的 往基板搬入在;;板的狀態下,移 pa η ^ M 俊在對基板處理早疋端的控制部,靖 丄=續庐於可搬入基板並經確認之後,便將未處理的一 ^ %讓:給基板搬入埠的推料銷。再讓渡此基板之後,索 控制部便對基板處理单元的控制冑,通知基板已 同樣的,基板處理單元的控制部乃預估 巧“理基板並上升的時序,而提早發出 求。S發出此基板搬出要求時,索引機械人便移 搬出埠。然後,在對基板處理單元端的控制部,詢=反 屬於可搬出基板並經確認之後,便從基板搬出埠的推=^ 上,承接一片已處理完畢的基板。然後,索引單元的柝釦 部便對基板處理單元的控制部,通知基板已搬出完畢二^ 此索引機械人便將所承接的基板,收容於晶盒站的晶各^Fifth invention description (3) Control of the inclined position = mention: ί :; timing of crossing the conveyor belt, ㈣ index unit terminal, then equipped with :: United States *: ϊ ΐ. At the same time, the day when the control board at the substrate processing unit end rises: / the board pushes out the pusher pin 'receives the request from the conveyor belt. These Α: 'The control unit at the end of the lead unit provides the board removal request via the cable board moving request and the board removal request, which is received through the communication circuit indexing machine's control unit' and responds to this, and controls the : The control unit at the end of the i-feed unit estimates the push pin to move the substrate. Enter the timing of 迗 π, and issue a board move-in request early. In the case of crystallization, the robot is moved from the substrate placed at the crystal box station to the substrate; in the state of the plate, move pa η ^ M Jun in the control section of the substrate processing early end, Jing Yan = After the substrate can be moved into the substrate and confirmed, the unprocessed ^% will be given to: the push pin for the substrate into the port. After giving up the substrate again, the cable control unit will control the substrate processing unit to notify the substrate that the same. The control unit of the substrate processing unit estimates the timing of the substrate processing and rising, and issues the request early. S issued When this substrate is requested to be removed, the index robot will move out of the port. Then, in the control section of the substrate processing unit, inquiring = it belongs to the substrate that can be removed and confirm it, then push it from the substrate removal port = ^ to receive a piece The processed substrate. Then, the snap unit of the indexing unit informs the control unit of the substrate processing unit to notify that the substrate has been moved out. This indexing robot will store the received substrate in each of the crystal box stations ^
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【發明欲解決之課題】 索引,械人的搬送節拍乃受限於其搬送能力。此搬送節 拍在=照於基板處理單元的基板處理能力下,大多屬於偏 低勺[月兄而索引機械人的搬送節拍,實質上定基板處理 裝置的處理節拍。 限制索引機械人之搬送節拍的主因,除搬送能力之外, 尚有f引機械人動作是否最佳化的觀點。在如上述的基板 處理裝置中’纟自基板處理單元的基板搬人要求與基板搬 出要求並非同步產生。所以,隨基板搬入要求與基板搬 出要求的發出時序,亦有使索引機械人動作喪失效率的情 況0 譬如由基板處理單 應此,在剛由索引單 入動作之後。可想像 的情況。此時在從基 索引機械人在基板搬 發出基板搬出要求, 盒中取出基板,而執 銷的動作。所以,之 埠,並從基板搬出埠 如此在索引單元中 發出基板搬入要求與 將索引機械人的動作 基板搬 引機械 元發出 基板搬 σί ’ 不 往目標 給基板 械人移 收容於 知道從 時序, 入要求 人指示 基板搬 出要求 管在其 晶盒, 搬入埠 往基板 晶盒中 基板處 因此便 元的控制部發出 元的控制部對索 便從基板處理單 板處理單元發出 出埠附近待機的 索引機械人將移 行將此基板讓渡 後再度將索弓丨機 上承接基板,而 ,因為無法預先 基板搬出要求的 予以最佳化。 ,並對 基板搬 出要求 時,若 後馬上 並從晶 之推料 搬出 〇 理單元 未必可[Problems to be Solved by the Invention] Index, the robot's transfer tempo is limited by its transfer ability. Most of the transfer tempo is based on the substrate processing capacity of the substrate processing unit. Most of the transfer tempo is the transfer tempo of the index robot, which essentially determines the processing tempo of the substrate processing device. The main reason for restricting the robot's transfer tempo is that, in addition to the transfer ability, there is still a point of view whether the robot's motion is optimized. In the substrate processing apparatus described above, the substrate transfer request from the substrate processing unit is not generated simultaneously with the substrate transfer request. Therefore, with the issuing sequence of the board loading request and the board moving request, there are cases where the index robot operation is inefficient. For example, the board processing unit responds to this, just after the index loading operation. Conceivable situation. At this time, when the substrate index robot sends a substrate removal request on the substrate, the substrate is taken out of the box and the pin operation is performed. Therefore, the port, and the port from the substrate, so the substrate moving request is issued in the index unit and the substrate robot is moved by the index robot. The substrate is moved to the target. The entry request person instructs the substrate removal request tube to be placed in its crystal box, and the port is moved to the substrate in the substrate crystal box. Therefore, the control unit of the unit sends out the index from the substrate processing single board processing unit to the standby index near the port. The robot will transfer this substrate and then accept the substrate on the cable bow again, because it cannot be optimized in advance because the substrate cannot be removed in advance. And when the substrate is required to be removed, if the material is removed from the crystal immediately afterwards, the processing unit may not be necessary.
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J巧趣《中J用高十生能 五、發明說明(5) 在為縮短索引機械人的搬送節拍,雖可者♦ 的 致 機械人構成索引機械人,但是此種解決方 丨王w π乃泛,因在蔣墓 大幅的成本增加,因此最好不要。 ..... 有鑒於斯,本發明之目的在於提供一種可將從_置 盒站中的晶盒取出基板,並搬入基板處理部,铁^ = 處理部搬出基板並收容於晶盒中的索引機械人動作^二最 佳化,藉此而可縮短索引機械人的搬送節拍之基板搬送裝 再者,本發明之另一目的在於提供一種利用將索引機械 人動作予以最佳化,而縮短其搬送節拍,結果可提昇基板 處理生產性的基板處理裝置與基板處理方法。 【解決課題之手段及發明效果】 緣是,為達上述目的之申請專利範圍第1項所記載發明 的基板搬送裝置,係供對具備有··搬入未處理基板的基板 搬入埠(ΡΙ),與將已處理完畢的基板予以搬出的基板搬出 埠(Ρ0)之基板處理部(TRT),執行基板的搬入與搬出之基 板搬送裝置(IND);其特徵在於包含有:設置供收容基板用 之晶盒的晶盒站(11 );供從第一基板讓渡位置,將基板搬 入於上述基板搬入埠中的基板搬入機構(2〇5, 3Α,ρ,5〇); 從設置於上述晶盒站的晶盒中取出基板,並在上述第一基 板瓖渡位置處,將基板讓渡給上述基板搬入機構,同時將 被搬出於上述基板搬出埠的基板,收容於設置在上述晶盒 站中的晶盒之索引機械人(R);在與上述基板處理部中所 設置的基板處理控制機構(2 〇丨)之間進行通信,並從上述J Qiaoqu "Zhong J uses ten high energy. V. Description of the invention (5) In order to shorten the transfer cycle of the index robot, although it may be possible that the robot will constitute the index robot, this solution 丨 Wang w π is general Because of the significant cost increase at the tomb of Jiang, it is best not to. ..... In view of this, the object of the present invention is to provide a substrate that can take out a substrate from a crystal box in a box station and carry it into the substrate processing unit. The index robot operation is optimized to reduce the substrate transfer and loading of the index robot, and another object of the present invention is to provide a method for optimizing the index robot operation and shortening it. As a result of the transfer cycle, the substrate processing apparatus and the substrate processing method that can improve the productivity of the substrate processing can be achieved. [Means for solving the problem and the effects of the invention] The reason is that the substrate transfer device of the invention described in item 1 of the scope of patent application for achieving the above-mentioned purpose is for transferring a substrate into a port (PI) having a substrate carrying an unprocessed substrate. And the substrate processing unit (TRT) of the substrate carrying-out port (P0) for carrying out the processed substrate, and a substrate transferring device (IND) for carrying in and out of the substrate; characterized in that it includes: Crystal box station (11) of the crystal box; a substrate transfer mechanism (205, 3Α, ρ, 50) for transferring the substrate from the first substrate transfer position into the substrate transfer port; The substrate is taken out from the crystal box of the cassette station, and the substrate is transferred to the substrate carrying-in mechanism at the first substrate transfer position, and the substrate carried out from the substrate carrying-out port is stored in the crystal box station. The index robot (R) of the crystal box in the communication; communicates with the substrate processing control mechanism (200) provided in the substrate processing section, and starts from the above.
1232199 五、發明說明(6) 基板處理控制機構對應要求,而控制著上述基板搬入機 ,,同時獨立於來自上述基板處理控制機構的要求,控制 著上述索引機械人的基板搬送控制機構(2 〇 2 )。另,括號 =ϋ央文子母與數字’乃表示對應後述實施形態的構成要 件等。以下均相同。 文 ,照此構造的話,設置有供從第—基板讓渡位置,將基 二ίΐΐΐ搬入埠中用的基板搬入機構,此基板搬入機 ΓίΠ:戒人,同時利用基板搬送控制機構而被控制 邱的::Γ制機構,因為對應的來自具備有基板處理 田"L : 求 使基板搬入機構產生動作, 機構:mrf給基板搬入槔的速度。基板搬送控制 索引機械構的基板搬入動作之間’便可對 的im制機構可正確掌握其控制下之基板搬入機構 制機“控;r兒所構乃利用基板搬送控 置處,便可將是否有保以在第-基板讓渡位 、者基板寺貝訊,從基板處理部6ίϊ 基板處理控制機構處經由通信而取得。 基板搬送控制機構乃在若基 之狀態的言舌,僅要對索引機 _ ::至未保持者基板 讓渡給基板搬人機構的j亍j ^日不 < 曰曰盒中搬出基板並 處理控制機構的基板搬入要:可執:=對應來自基板 要求,而執行索引機械構的基板搬入 ]才工制因此便可將索引機械人 第11頁 \\312\2d-code\91-05\9ll03130.ptd 1232199 五、發明說明(7) 動作,以最佳化,並可縮短搬送節拍。 項的:Γ 圍第2項所記載的發明,係申請專利範圍第1 項的基板搬送裝詈Φ,舌4 4 乐1 置處時,便從上述其 ^ *到達第二基板讓渡位 #( 206 3B Ρ 5Π^ ^ ★中搬出基板用的基板搬出機 Γ:九 ;上述索引機械人係在上述第二基板讓 :ϊΐί置=上述基板搬出機構中承接基板,並將基板 的晶盒中;上述基板搬送控制 述基板搬出機構。a 理控制機構的要求,控制著上 槿ίΐΐ冓造中,利用控制著索引機械人之基板搬送控制機 出其f下之某個基板搬出機構,執行從基板搬出埠中搬 心ί播:匕,I板搬送控㈣機構僅要對應來自基板處理 „的基板搬出要求’而使基板搬出機構產生動作便 U:獨立於此類基板搬出要求,控制著索引機械人 :動作。錯此因為可將索引機械人動作更進一步的最佳 ,便可達更進一步的將搬送節拍予以縮短化。 f申請專利範圍第2項所述發明中,設置有將基板搬入 S板搬入璋的基板搬入機才籌,與供從基板搬出料搬出 ϋ用的基板搬出機構,而且該等均在控制著索引機械人 、土板搬送控制機構之控制下。所以,基板搬送控制機構 便不再對基板處理控制機構進行通信的詢問,而可正確掌 握,板搬入機構與基板搬出機構的狀態(即,該等是否保 持著基板)。故,基板搬送控制機構便在當基板搬入機構 未保持著基板時,便指示索引機械人在第一基板讓渡位 C:\2D-CODE\91-05\91103130.ptd 第12頁 1232199 五、發明說明(8) 置’將未處理基板讓渡給基板搬入機構,反之,基板搬出 機構以保持著基板的話’便指示索引機械人在第二基板讓 渡位置,承接此基板並收容於晶盒的動作。如此便可將索 引機械人的動作,便可在切離基板處理部的狀態下進行控 =^此便不致依存於基板搬人要求或基板搬出要求的發 出日守序,可將索引機械人動作予以最佳化。 申明專利範圍第3項所記載發明的基板搬送裝置,係 ί ΐ 5 1 以搬出的基板搬出埠(ρ 0)之基板處理部 二含有:設置供收容基板用之晶盒;=),/、 出i中二基板讓渡位置處時’便從上述基板搬 置二的基板搬出機構(2°6,3B,p,50);從設 晶盒中取出基板’並將基板供應給上述 土板搬入皐,同日守在上述第二基板讓渡位置 板搬出機構承接基板,收容 ^ 2上述基 之索引機械人⑻;在與上1基=在/部=盒:^的Λ盒 間進行通信,並從上述二 ,ϊ制著上述基板搬出機構,獨立於 述基板處理控制機構的要求,控制著上述索引機只 人的基板搬送控制機構(2〇2 )。 >、引機械 在此發明中,因為設置有供從基板處理 搬出基板用的基板搬出機構, 、土板擻出埠 制用的基板搬送控制機構,押φ荖 1用索引機械人控 紙稱控制者此基板搬出機構,俾可 \\3l2\2d- code\91-05\91103130.ptd 第13頁 1232199 — 五、發明說明(9) i於基板搬出要求的使帝弓丨—44ί , t β 達索弓丨::: 祛械人進行動作。藉此便可 翅化。Λ 的取佳化,結果便可實現搬送節拍的縮 第2 = ”第4項所記載的發明’係在申請專利範圍 置传』= 板搬送裝置中,上述第-基板讓渡位 β μ置/、上述基板搬入埠不同高度的位置處。 於話’因為基板搬入埠與基板讓渡位置,配置 分重聂:::’因此利用該等在俯視圖中,配置呈至少部 :::方:,,便可減少基板搬送裝置的台面佔有面積。 第2二專利乾圍第5項所記載的發明,係在申請專利範圍 置或3項戶:記載的基板搬送裝置中’上述第二基板讓渡位 —-己置王與上述基板搬出埠不同高度的位置處。 ,此構造,便如同申請專利範圍第4項所記 可$減基板搬送裝置的台面佔有面積。 譬^在基板搬入埠或基板搬出埠中,亦可設置沿略水平 入搬送面移動基板的搬送輸送帶(3〇)。此情況下,基板搬 機構或基板搬出機構最好設置有··在較上述搬送面更上 的上升位置(第一基板讓渡位置或第二基板讓渡位置), ,、車父上述搬送面更下方的下降位置之間,保持著基板並可 上,或下降’且可迴避經上述搬送輸送帶而被搬送的基板 路梭並進行升降,在上升位置處,在與上述搬送機械人之 間4渡基板’並利用在上述上升位置與下降位置之間進行 2降’而在與上述搬送輸送帶之間讓渡基板的機構(後述 實施形態的推料銷ρ)。1232199 V. Description of the invention (6) The substrate processing control mechanism controls the substrate handling machine corresponding to the requirements, and at the same time, independently of the requirements from the substrate processing control mechanism, controls the substrate transfer control mechanism of the index robot (2 〇 2 ). In addition, the brackets = "ϋ 文 文 子 子" and the number ′ indicate the constituent elements and the like corresponding to the embodiment described later. The following are the same. If the structure is as described above, a substrate transfer mechanism is provided for transferring the second substrate to the port from the first substrate transfer position. This substrate transfer machine ΓίΠ: At the same time, it is controlled by the substrate transfer control mechanism. :: Γ system, because the corresponding comes from a substrate processing field " L: It is necessary to make the substrate transfer mechanism work, mechanism: mrf to the substrate transfer speed. The substrate transfer control index is between the substrate transfer operation of the mechanical mechanism and the “im” mechanism can correctly grasp the control of the substrate transfer mechanism under its control. Is there any guarantee to obtain the first-substrate transfer position, or the substrate substrate, from the substrate processing unit 6? The substrate processing control mechanism is obtained through communication. The substrate transfer control mechanism is in the state of Ruoji, only need to tell Indexer _ :: j 亍 j to the substrate holder transfer mechanism to the substrate holder who did not hold it ^ 日 不 不 日 日 日 日 The substrate is moved out of the box and processed by the control mechanism. And the indexing mechanism is moved into the substrate], so the indexing robot can be page 11 \\ 312 \ 2d-code \ 91-05 \ 9ll03130.ptd 1232199 V. Description of the invention (7) Actions for the best The invention described in item 2 of Γ is the substrate transfer device of item 1 of the patent application scope Φ, and when the tongue 4 4 Le 1 is placed, it will follow the above ^ * Reach the second substrate yielding position # (206 3B Ρ 5Π ^ ^ ★ The substrate unloading machine for carrying out substrates Γ: Nine; the index robot is used for receiving the substrate in the second substrate transfer unit: the above substrate removing mechanism, and placing the substrate in the crystal box of the substrate; A. The control of the control mechanism controls the production of the board, using the substrate transfer control machine that controls the index robot to output a substrate removal mechanism under f, and executes the removal from the substrate removal port: The dagger and I-board transfer control mechanism only needs to respond to the substrate removal request from the substrate processing and cause the substrate removal mechanism to act. U: Independent of this type of substrate removal request, it controls the index robot: the action. This is because it can be wrong. By further optimizing the index robot action, the transfer cycle can be further shortened. F In the invention described in the second item of the patent application scope, a substrate loading machine is provided for loading the substrate into the S-board and the 璋. And the substrate removal mechanism for substrate removal and material removal, and these are under the control of the index robot and the soil plate transfer control mechanism. The substrate transfer control mechanism no longer inquires about the communication of the substrate processing control mechanism, but can correctly grasp the status of the board transfer mechanism and the substrate transfer mechanism (ie, whether or not the substrate is maintained). Therefore, the substrate transfer control mechanism will When the substrate carrying-in mechanism does not hold the substrate, the index robot is instructed to give up the place on the first substrate C: \ 2D-CODE \ 91-05 \ 91103130.ptd Page 12 1232199 V. Description of the invention (8) Set ' The unprocessed substrate is transferred to the substrate carrying-in mechanism. On the contrary, if the substrate carrying-out mechanism is to hold the substrate, the index robot is instructed to move to the second substrate transferring position to receive the substrate and store it in the crystal box. In this way, the movement of the indexing robot can be controlled in a state of being cut off from the substrate processing section. = ^ This does not depend on the day-to-day order of the substrate moving request or the substrate moving out request, and the index robot can be moved. Be optimized. The substrate transfer device of the invention described in item 3 of the declared patent scope is ί 5 1 The substrate processing unit 2 of the substrate removal port (ρ 0) which is carried out contains: a crystal box for storing substrates; =), /, When the second substrate transfer position in i is taken out, the substrate removal mechanism (2 ° 6, 3B, p, 50) of the second substrate transfer second substrate is removed; the substrate is taken out of the crystal box, and the substrate is supplied to the soil plate. Carrying in, and holding the board at the second board transfer position on the same day, the board take-out mechanism receives the board and houses ^ 2 the above-mentioned index robot 进行; communicates with the Λ box of the above 1 base = in / part = box: ^ From the above two, the above-mentioned substrate carrying-out mechanism is fabricated, independently of the substrate processing control mechanism's request, and controls only the substrate carrying control mechanism (202) of the indexer. > In this invention, because a substrate carrying mechanism is provided for carrying substrates out of the substrate processing, and a substrate carrying control mechanism for soil plate and port production, φ 荖 1 is controlled by an index robot control paper scale. The controller's substrate removal mechanism is not allowed. \\ 3l2 \ 2d-code \ 91-05 \ 91103130.ptd Page 13 1232199 — V. Description of the invention (9) i The emperor's bow required for the substrate removal 丨 —44ί, t β Dassault Bow 丨 ::: Disarmer moves. With this, you can become winged. The optimization of Λ can achieve the reduction of the transfer cycle. As a result, the invention described in the fourth item "is set in the scope of the patent application" = board transfer device, the above-mentioned substrate transfer position β μ is set / 、 The above-mentioned substrates are moved into the port at different heights. In the words, 'Because the substrate is moved into the port and the substrate transfer position, the configuration is divided into two parts ::' Therefore, in the plan view, the configuration is at least part ::: 方: The invention can reduce the area occupied by the table of the substrate transfer device. The invention described in item 5 of the second patent patent is within the scope of the patent application or three items: The substrate transfer device described in the above-mentioned second substrate transfer Ferry—Jizhiwang is at a different height from the above-mentioned substrate moving port. This structure can reduce the area occupied by the table of the substrate moving device as described in item 4 of the scope of patent application. For example, in the substrate moving port or In the substrate carrying-out port, a carrying conveyor (30) for moving the substrate along a slightly horizontal carrying surface may also be provided. In this case, it is preferable to provide a substrate carrying mechanism or a substrate carrying-out mechanism. Up position The first substrate transfer position or the second substrate transfer position), and between the lower position of the driver's above-mentioned conveying surface and the lower position, the substrate can be kept up and down, or can be lowered, and can be avoided by the above-mentioned conveying conveyor belt. The substrate shuttle is transferred and lifted. At the raised position, the substrate is crossed 4 times with the transfer robot, and the lowered position is transferred between the raised and lowered positions. A mechanism for transferring a substrate (push pin ρ in the embodiment described later).
1232199 五、發明說明(10) 申晴專利範圍第6項所記載的發明係基板處理裝置,乃 包含有:對從基板搬入埠所搬入的基板施行處理,並將經 處理後的基板搬出於基板搬出埠的基板處理部(丁RT);與 上述申請專利範圍第1至5項中任一項所述基板搬送裝 置(IND)。 藉由此構造’因為可縮短索引機械人的搬送節拍,因此 便可縮短基板處理裝置的整體基板處理節拍。藉此便可提 升基板處理裝置的生產性。 申請專利範圍第7項所記載的發明係基板處理方法,乃基 板處理裝置之基板處理方法,而該基板處理裝置係具備有·· 對彳文基板搬入璋(p I)所搬入的基板施行處理,並將經處理 後的基板搬出於基板搬出琿(p〇)上的基板處理部(TRT); 與對此基板處理部執行基板之搬入/搬出的基板搬送裝 置(IND);其特徵在於包含有:利用索引機械人“),從設置 在晶盒站(11 )中的晶盒中取出基板,並在第一基板讓渡位 置處,將此基板讓渡給基板搬入機構(2〇5,3A,p,5〇)的讓渡 t驟m述基板搬入機構,#從上述第一基板讓渡位 置移=到上述基板搬入埠處時,便讓渡基板的步驟;利用 ΐί!弓獻,,從上述基板搬出埠中所搬出的基板,收 = 晶盒站之晶盒中的步驟;制接受來自上 二/斤Γ基板處理控㈣ 上述基板搬运邛之基板搬送控制機構(2 〇 求,控制著上述基板搬入機構的牛· 5 %僻的步驟,以及利用上述某板 搬送控制機構控制著上述索引機# a 次扪用上乩丞板 厅、Ή钺械人的步驟。1232199 V. Description of the invention (10) The substrate processing device of the invention described in item 6 of Shen Qing's patent scope includes: processing the substrate carried in from the substrate carrying port, and removing the processed substrate out of the substrate. The substrate processing unit (DRT) of the removal port; and the substrate transfer device (IND) described in any one of the above-mentioned patent application scope items 1 to 5. With this structure, since the transfer robot of the index robot can be shortened, the overall substrate processing cycle of the substrate processing apparatus can be shortened. This can improve the productivity of the substrate processing apparatus. The invention described in the scope of patent application No. 7 is a substrate processing method, which is a substrate processing method of a substrate processing device, and the substrate processing device is provided with a processing method for a substrate carried by a script substrate transfer unit (p I) And transfer the processed substrate out of the substrate processing unit (TRT) on the substrate transfer unit (p0); and the substrate transfer unit (IND) that carries in / out the substrate to the substrate processing unit; There are: using the index robot ") to take out the substrate from the crystal box set in the crystal box station (11), and at the first substrate transfer position, transfer this substrate to the substrate transfer mechanism (205, 3A, p, 50) the transfer of the substrate transfer mechanism, # from the first substrate transfer position to the substrate transfer port, the process of transferring the substrate; The substrates carried out from the substrate carrying port described above are collected in the steps of the crystal box of the crystal box station; the substrate transfer control mechanism (2), Controlling the board carrying mechanism The steps of 5% of the steps are not complete, and the steps of using the above-mentioned board conveyance control mechanism to control the indexing machine # a time to use the upper board hall and the robot.
1232199 五、發明說明(11) 藉由此方法,同樣的可達如同相關申請專 發明所述及功效。 弟1項 申請專利範圍第8項所記載的發明,係申請專利範 項所述的基板處理方法,乃更包含有:利用基板搬 = (2〇6,30B,P,50),將搬出於上述基板搬出淳中的基戍,構 送至第二基板讓渡位置處的步驟;為收容於設置在上: 盒站之晶盒中,而利用上述索引機械人在上述第二基柘= 渡位置中,從上述基板搬出機構中承接基板的步驟;f 利用上述基板搬送控制機構,對應來自上述基板處理 機f的要求,控制著上述基板搬出機構的步驟。 1制 藉由此方法,同樣的可達如同相關申請專利範圍 發明所述及功效。 貝 申請專利範圍第9項所記載的發明係基板處理方法, J板處理裝置之基板處理方&,而該基板處理裝置係具備 有:對從基板搬入埠(?1)所搬入的基板施行處理,並將經 處理後的基板搬出於基板搬出埠(p〇)上的基板處理部、 (TRT);與對此基板處理部執行基板之搬入/搬出的基板搬 运部(IND);其特徵在於包含有:利用索引機械人“), =置在晶盒站⑴)中的晶盒中取出基板,並將此基板讓渡 給上述基板搬入埠的步驟;將從上述基板搬出埠中所搬出 的基板,利用基板搬出機構(2〇6, 3〇B,p,5〇),搬送至第二基 板讓渡位置處的步驟;利用上述索引機械人,在上述第二^ 基板讓渡位置處,從上述基板搬出機構中接 此基板收容於設置在上述晶盒站之晶盒中的步驟;利:接1232199 V. Description of the invention (11) By this method, the same effect as described in the related patent application can be achieved. The invention described in item 8 of the first patent application scope is the substrate processing method described in the patent application, and it also includes: using substrate moving = (206, 30B, P, 50), which will be moved out The above substrate is moved out of the base of Chunzhong and is transferred to the second substrate transfer location. In order to be accommodated in the crystal box set on the top: box station, the above-mentioned index robot is used in the above-mentioned second base = In the position, the step of receiving the substrate from the substrate carrying-out mechanism; f The use of the substrate carrying control mechanism controls the step of the substrate carrying-out mechanism in response to a request from the substrate processing machine f. 1 system By this method, the same effect as described in the related patent application invention can be achieved. The invention described in the ninth patent application scope of the present invention is a substrate processing method, a substrate processing method of a J-plate processing device, and the substrate processing device is provided with a method for executing a substrate loaded from a substrate loading port (? 1). Process and move the processed substrate out of the substrate processing section (TRT) on the substrate removal port (p0); and the substrate transfer section (IND) for carrying in / out of substrates to this substrate processing section; its characteristics The method includes the steps of: taking out the substrate from the crystal box placed in the crystal box station using the index robot "), and transferring the substrate to the substrate carrying port; and taking the substrate out of the substrate carrying port. Step of transferring the substrate to the second substrate transfer position using the substrate transfer mechanism (206, 30B, p, 50); using the index robot, at the second substrate transfer position , The step of receiving the substrate from the substrate carrying-out mechanism and accommodating the substrate in the crystal box set in the crystal box station;
1232199 五、發明說明(12) 受來自上述基板處理部中所設置基板處理控制機構(2 〇 i ) 之要求的上述基板搬送部之基板搬送控制機構(2 〇 2 ),對鹿 上述要求,控制著上述基板搬出機構的步驟;以及利用 '上 述基板搬送控制機構控制著上述索引機械人的步驟。 藉由此方法,同樣的可達如同相關申請專利範圍第3項 發明所述及功效。 ' 【發明之實施形態】 以下,參照所附圖式詳細說明本發明之實施形態。 圖1係本發明一實施形態的基板處理裝置整體構造簡略 化俯視圖。此基板處理裝置係供處理如液晶顯示裝置或 PDP顯示裝置之類的平面顯示器中,所使用的玻璃基板用 的裝置。此基板處理裝置具有將複數玻璃基板一邊依次滾 動搬送一邊進行處理基板,所謂連續單片式裝置形熊。 此基板處理裝置乃結合:從基板搬入埠ρι承接未處理的 基板並進行處理’並將經處理後的基板搬出於基板搬出淳 P0上的基板處理部TRT ;以及對基板處理部TRT執行基板的 搬入/搬出之索引單元IND而構成的。 基板處理部TRT係具備有俯視呈u字型排列的複數處理部 T1〜Tm,Tm+:l〜TN(m··自然數)。在此u字型排列的處理邻 T1,列的二端處,分別設有基板搬入基m P0。在基板搬入埠PI與基板搬出埠P〇上,分別配置有輸送 帶模組3A,3B。 在罪近基板搬入埠P I與基板搬出埠PQ處設有索引單元 I ND。索引單元I ND具備有可承載複數晶盒c複數排列著的1232199 V. Description of the invention (12) The substrate transfer control mechanism (202) of the substrate transfer unit received from the substrate processing control mechanism (200i) provided in the above substrate processing unit controls the above requirements of the deer. And a step of controlling the index robot by the substrate transfer control mechanism. In this way, the same effect as described in the third invention of the related patent application can be achieved. [Embodiments of the invention] Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. Fig. 1 is a simplified plan view of the overall structure of a substrate processing apparatus according to an embodiment of the present invention. This substrate processing apparatus is an apparatus for processing a glass substrate used in a flat panel display such as a liquid crystal display device or a PDP display device. This substrate processing apparatus has a so-called continuous monolithic device-shaped bear that processes a plurality of glass substrates while sequentially rolling and conveying them. This substrate processing device is a combination of: receiving unprocessed substrates from the substrate into the port and processing them; and removing the processed substrates out of the substrate processing unit TRT on the substrate P0; and performing the substrate processing on the substrate processing unit TRT. The index unit IND is moved in / out. The substrate processing section TRT is provided with a plurality of processing sections T1 to Tm, Tm +: 1 to TN (m ·· natural number) arranged in a u-shaped arrangement in plan view. Substrate carrying base m P0 is provided at the two ends of the column adjacent to T1 in the u-shaped arrangement. Conveyor belt modules 3A and 3B are respectively arranged on the substrate carrying-in port PI and the substrate carrying-out port P0. An index unit I ND is provided at the substrate near-port P I and the substrate near-port PQ. The index unit I ND is provided with a plurality of arrays capable of supporting a plurality of crystal boxes c.
纖I \\312\2d-code\91-05\91103130.ptdFiber I \\ 312 \ 2d-code \ 91-05 \ 91103130.ptd
第17頁Page 17
1232199 五、發明說明(13) 晶盒載置部1 1 (晶盒站),以及索引機械人R。 索引機械人R係呈可沿晶盒載置部1丨中之晶盒c排列方向 的水平移動,而且可使基板保持用臂部7〇對晶盒c水平的 進行,且可沿垂直方向進行升降,並可繞垂直軸進行旋轉 的構造。藉由此構造,索引機械人R便可從任何晶盒^中取 出一片未經處理過的基板,並在基板搬入埠P丨中,讓渡給 輸送帶模組3A,且在基板搬出埠P〇中,從輸送帶模組 中,一片片的承接經處理完畢的基板,然後將此經處理完 畢的基板收容於任何晶盒C中。 在基板處理部TRT中,於索引單元IND相對端的端部處, 設置有當從處理部以移往處理部Tm + 1時,便搬送基板用的 區間搬送裝置150 ’·及使此基板保持臂151在處理部Tm與處 理部Tm + 1 5之間進行往返移動的驅動機構】52。藉由此區間 =裝=50的作用’便執行從將基板依定速度朝遠離索 引早兀IND的方向進行搬$ ’並執行基板處理的處理部 ^且中將基板讓渡給將基板依定速度朝索引單元1 ND 方向搬运i並執行基板處理的處理部以+^^^組中。藉 處理對象的基板便沿U字型路徑進行搬送,並施^處 二與=輸送帶模組3A之基板搬入璋ρι附近構造的簡 Ϊ = 圖2係沿搬送方向X的剖面構造。圖3係沿 Ϊ將Λ搬i平面的剖面構造。輸送帶模組3 a係具備 ^ ·紅朝^方向X搬送的基板予以旋轉的複數搬送 30;以及供在與索引機械Μ之間讓渡基板而升降的複數 Μ 第18頁 C:\2D-OODE\9I-05\9】103130.ptd 12321991232199 V. Description of the invention (13) Crystal box mounting section 1 (crystal box station), and index robot R. The index robot R can move horizontally along the arrangement direction of the crystal box c in the crystal box mounting section 1 丨, and can make the substrate holding arm portion 70 perform the horizontal movement of the crystal box c, and it can be performed in the vertical direction. It can be raised and lowered and can be rotated around a vertical axis. With this structure, the index robot R can take out an unprocessed substrate from any crystal box ^, and transfer it to the port P 丨 in the substrate, transfer it to the conveyor module 3A, and remove the substrate in port P. In 〇, from the conveyor belt module, the processed substrates are received one by one, and then the processed substrates are stored in any crystal box C. In the substrate processing section TRT, at the end of the opposite end of the index unit IND, a section transfer device 150 ′ for transferring a substrate when moving from the processing section to the processing section Tm + 1 is provided, and the substrate holding arm is provided. 151 Driving mechanism for reciprocating movement between the processing section Tm and the processing section Tm + 15] 52. With the function of this interval = 50 = 50, the processing unit that moves the substrate from the predetermined speed away from the index IND and executes the substrate processing is performed, and the substrate is transferred to the substrate The processing unit that transports i and performs substrate processing in the direction of the index unit 1 ND is in the + ^^^ group. The substrate to be processed is transported along the U-shaped path, and the processing is performed. The second and third = the structure of the substrate near the conveyor belt module 3A. 简 = Figure 2 is a cross-sectional structure along the transport direction X. Fig. 3 is a cross-sectional structure taken along the plane Λ 搬 i. Conveyor module 3a is provided with a plurality of conveyances 30 in which the substrates conveyed in the ^ direction X are rotated in a red direction; and a plurality of conveyances M for raising and lowering the substrates to and from the indexing machine M. Page 18C: \ 2D- OODE \ 9I-05 \ 9】 103130.ptd 1232199
根推料銷p(基板搬入機構)。 推料銷p係具有··在屬於搬送 較搬送輥30更外側位置處,沿垂直向的Y方向上’於 此基部41上端直角f曲的水平 4⑨的基部41,從 42前端朝垂直方向直立,且前端=2結以及在此水平臂部 基板支撑部43。基部41係利用驅動^ = 的 且延期軸進行升降。 動栻構50而繞其軸旋轉, 經由基部41的轉動,立設於水平 擔邮4 9,庙π、a I 牙口P 4 2刖立而上的基板支 撐一43,便俯視描繪出圓弧,如圖3 搬入埠p I區域内的其士 丁邊又在進入基板 的退撐置81,與退出於此區域外側 構50而升卩欠,蚀I進仃變位。此外,基部41利用經驅動機 +, 土板支撐部43亦進行升降。此基板支撐部 便如圖2所不般,可在搬送輥3〇的基板搬送面cp更上方 的上升位置91(第一基板讓渡位置),或在較基板搬送面CP 更下方的下降位置92。推料銷p的升降,係於基板支撐部 43在基板支撐位置81的狀態下,或基板支撐部在退出位置 8 2的狀態下等任一情況下均將進行升降。 推料銷P乃配設呈基板支撐部43在基板支撐位置81或退 出位置82之任一者上時,水平臂部42便俯視收藏於鄰接搬 送輥3 0軸3 1的一對間隙中的方式。所以,搬送輥3 〇與推料 銷P便無相干涉的顧慮。 在收容輸送帶模組3 A的基板導入室3 5之一側壁上,設有 供索引機械人R之臂部7 〇插拔用的開口 3 6。索引機械人r便 從此開口 36,將未處理的基板搬入於輸送帶模組3A上。Push pin p (substrate carry-in mechanism). The pusher pin p has a horizontal 4⑨ base 41 that is perpendicular to the upper end of the base 41 in the Y direction perpendicular to the Y position at a position outside the transfer roller 30, and stands upright from the front end of the 42 to the vertical direction. And the front end = 2 knots and the horizontal arm portion substrate support portion 43 here. The base 41 is raised and lowered by the driving shaft and the extension shaft. The movable structure 50 rotates around its axis. Through the rotation of the base 41, it is erected on the horizontal post 4 9. The temple π, a I tooth mouth P 4 2 stands on the substrate support 43, and the arc is drawn in a plan view. As shown in Fig. 3, the side of the chip that was moved into the area of port p I is again at the back support 81 of the substrate, and exits from the outer structure 50 in this area and rises and falls, and the eclipse I is displaced. In addition, the base portion 41 is driven by the drive machine +, and the soil plate support portion 43 is also raised and lowered. This substrate supporting portion is not like the one shown in FIG. 2, and can be at a rising position 91 (the first substrate transfer position) above the substrate transfer surface cp of the transfer roller 30 or a lower position below the substrate transfer surface CP. 92. The raising and lowering of the pusher pin p is performed in either of the cases where the substrate supporting portion 43 is in the substrate supporting position 81 or the substrate supporting portion is in the withdrawn position 82. When the push pin P is provided with the substrate support portion 43 at either of the substrate support position 81 or the withdrawal position 82, the horizontal arm portion 42 is stored in a pair of gaps adjacent to the transport roller 30 axis 31 in a plan view. the way. Therefore, there is no fear of interference between the transfer roller 30 and the pusher pin P. An opening 36 for inserting and removing the arm portion 70 of the indexing robot R is provided on one side wall of the substrate introduction chamber 35 that houses the conveyor module 3A. The indexing robot r then loads the unprocessed substrate into the conveyor module 3A through the opening 36.
C:\2D-C0DE\91-05\91103130.ptd 第19頁 1232199 五、發明說明(15) 在基板搬入於輸送帶模組3A上時,推料銷p便位於上升 位置9 1處,而基板支撐部4 3則位於基板支撐位置8丨位置 處。在此狀態下’索引機械人R的臂部70便將基板放置於 推料銷P上,並從開口 36處退出。其次,推料銷?在基板支 樓部43維持於基板支撐位置81的狀態下,便下降至$降位 置92。結果,基板便被移載至搬送輥3〇上,並開始此^送 輥3 0的基板搬送。 基板搬入埠P I在此實施形態中,係設定於搬送輥3 〇的基 板搬送面cp内。利用搬送輥30的搬送,基板81便更早被ς 送至基板搬入埠Ρ I區域的外側,使推料銷ρ呈可承接次一 基板的狀態。換句話說,利用基部4〗的轉動,基板支撐部 43 =退出至退出位置82,在此狀態下,推料銷ρ將上升。 =時水平臂部42與基板支撐部43因為在基板搬入埠ρι區域 外,所以推料銷P藉由迴避基板搬送路徑而上升,便無干 涉到讓渡於搬送輥3〇上之基板S1的顧慮。 …、 田推料銷P到達上升位置91時,利用驅動機構5〇而使基 口 Ml轉動,基板支撐部43便被導入於基板支撐位置。如 =之前所,接的基板S1便在退出於基板搬入埠?1區域之 f 便已7^成承接下一個基板S2的準備。所以,推料銷ρ 基板搬入埠PI上方,可不必等待基板S1的搬送,而馬 上將下一個基板S2讓渡給推料銷ρ。 在之前所承接的基板S1到達基板搬入埠?1的區域外之時 推料銷ρ便將下降,並將第二片的基板S2讓渡給搬送 匕 此基板係從基板導入室3 5的出口 3 7,搬入於處理部C: \ 2D-C0DE \ 91-05 \ 91103130.ptd Page 19 1232199 V. Description of the invention (15) When the substrate is carried on the conveyor module 3A, the push pin p is located at the rising position 91, and The substrate supporting portion 43 is located at the substrate supporting position 8 丨. In this state, the arm portion 70 of the index robot R places the substrate on the push pin P, and exits from the opening 36. Second, push sales? In the state where the substrate supporting portion 43 is maintained at the substrate supporting position 81, it is lowered to the $ lower position 92. As a result, the substrate is transferred to the transfer roller 30, and the substrate transfer by the transfer roller 30 is started. In this embodiment, the substrate carrying port PI is set in the substrate carrying surface cp of the carrying roller 30. By the transfer of the transfer roller 30, the substrate 81 is transported to the outside of the region where the substrate is carried in the port P I earlier, so that the push pin ρ is in a state capable of receiving the next substrate. In other words, using the rotation of the base 4, the substrate supporting portion 43 = withdraws to the withdrawn position 82. In this state, the push pin ρ will rise. When the horizontal arm portion 42 and the substrate support portion 43 are outside the area where the substrate is carried in, the pusher pin P rises by avoiding the substrate conveyance path, and there is no interference with the substrate S1 that has been transferred to the conveying roller 30. concern. When the field push pin P reaches the rising position 91, the base port M1 is rotated by the driving mechanism 50, and the substrate supporting portion 43 is introduced at the substrate supporting position. As = before, the connected substrate S1 is exiting from the substrate carrying port? The f of area 1 is already ready to accept the next substrate S2. Therefore, the push pin ρ substrate is moved into the port PI without waiting for the substrate S1 to be transferred, and the next substrate S2 is transferred to the push pin ρ by the horse. Has the previously received substrate S1 reached the substrate carrying port? When it is outside the area of 1, the pusher pin ρ will drop, and the second substrate S2 will be transferred to the conveyor. This substrate is taken out from the substrate introduction chamber 3 5 at the exit 3 7 and carried into the processing section.
1232199 五、發明說明(16) ' " "'一"一 T1 〇 讲^後’重複同樣的動作’並不必等待之前所承接基板的 α送’便可逐次的將基板供應給輸送帶模組3 A。 在輸送可模組3 A上,於基板搬入埠p I二端,設置有供將 基板朝搬方向X排列於特定方向上的一對排列機構6〇。此 排列機構60在經由推料銷p將基板讓渡於搬送輥3〇之後, 再於搬送輥3 〇開始搬送基板之前,便將基板排列於搬送輥 0上。此基板的排列亦可在基板支撐於推料銷p的狀態下 進行。 〜 ^圖4,輸送帶模組3A之更具體的内部構造俯視圖。圖5係 攸圖4箭頭方向v觀看到的側視圖。圖6係從圖4箭頭方向贝 方向所觀看到的背視圖。將在基板s搬送方向1觀看到輸送 帶模組3A的情況,視為正面。 此輸送帶模組3A係如上述具有複數搬送輥3〇,該等搬送 輥30的軸31,乃沿γ方向平行配置。各軸31係在沿搬送方 向X的垂直面而設置的一對支撐板32上,以二端可自由轉 ,的方式支撐著。在各軸31的一端上,固定著輪33。在固 定於相鄰的一對軸31上的輪33,分別於其上捲繞著時序帶 34。在相鄰軸31的輪33間的位置上,配置著賦予時序帶34 所需張力用的張力輥34A。 固定於配置在搬送方向X最下游端的軸31上之輪33,透 過輪39與時序帶40而被傳遞來自馬達38的驅動力。此驅動 力便利用捲繞於相鄰軸3 1的各輪3 3間之時序帶3 4,而傳達 於所有的轴3 1。1232199 V. Description of the invention (16) '" "' a " a T1 〇 After ^ 'repeating the same action', you don't have to wait for the alpha feeding of the substrates you have previously received to supply the substrates to the conveyor belt one by one Module 3 A. On the transportable module 3 A, a pair of alignment mechanisms 60 for arranging the substrates in a specific direction toward the carrying direction X is provided at both ends of the substrate carrying-in port p I. The arranging mechanism 60 arranges the substrates on the transfer roller 0 after the substrates are transferred to the transfer rollers 30 through the push pins p, and before the substrates are transferred by the transfer rollers 30. The arrangement of the substrates may be performed with the substrates supported by the push pins p. ~ ^ FIG. 4 is a more detailed plan view of the internal structure of the conveyor module 3A. FIG. 5 is a side view as viewed in the direction of the arrow v in FIG. 4. Fig. 6 is a rear view seen from the direction of the arrow in Fig. 4; A case where the conveyor module 3A is viewed in the substrate s conveying direction 1 is regarded as a front surface. This conveyor belt module 3A has a plurality of conveying rollers 30 as described above, and the shafts 31 of these conveying rollers 30 are arranged in parallel in the γ direction. Each of the shafts 31 is supported on a pair of support plates 32 provided along a vertical plane in the conveying direction X, so that both ends can rotate freely. A wheel 33 is fixed to one end of each shaft 31. Timing belts 34 are wound around the wheels 33 fixed to the adjacent pair of shafts 31, respectively. A tension roller 34A is provided at a position between the wheels 33 of the adjacent shafts 31 to give a necessary tension to the timing belt 34. The wheel 33 fixed to the shaft 31 disposed at the most downstream end in the conveying direction X passes through the wheel 39 and the timing belt 40 to transmit the driving force from the motor 38. This driving force is conveniently transmitted to all the shafts 31 by the timing belt 3 4 wound between the wheels 3 3 of the adjacent shafts 31.
12321991232199
1232199 五、發明說明(19) '- 便不致呈待機狀態,可從索引機械人R承接下一個基 所以,推料銷P因為具有所謂的緩衝功能,因此便可 在進行基板瓖渡日守的等待時間,而可達基板處理的效 化。換句話說,因為在之前被搬入的基板,被搬送至 搬入埠PI區域外之後,便馬上使推料銷p下降,而可將土 個基板瓖渡給搬送輥3 0,因此便可縮短基板間的間隔。 在基板搬出埠P0的輸送帶模組3B,亦如同上述輸送;楹 組3A般的構造。但是,輸送帶模組3β乃因為朝從處理部μ 所搬出的索引單70 I ND方向進行搬送,因此在圖2與圖7 中’便將基板朝與X方向相反的方向進行搬送。 換句話說,在輸送帶模組3Β中,搬送輥3〇係朝推料銷ρ 而滾動搬送基板。推料銷ρ則在較基板搬送面cp更下方處 待機田基板到達設定在搬送面CP上的基板搬出埠P0 特,推料銷P便將上升,而將基板支撐於較基板搬送面cp 更上方的位置(第二基板讓渡位置)。此基板可利用索引機 械人R的臂部7 〇順利取用。 當$將基板讓渡給索引機械人R的推料銷ρ,位於上升位 置9 1日=,推料銷P的基部4丨與水平臂部4 2,亦位於從基板 的搬达路徑退出的位置處(參照圖3 )。其中,下一個應取 出的基板’即便推料銷P在上升位置9 1的情況時,亦將朝 基板搬出埠P〇方向進行搬送。 立推料銷P係在將基板讓渡給索引機械人R之後,基板支撐 部=便轉動至退出位置82的位置處,在此狀態下,下降至 下IV位置9 2。換句話說,推料銷ρ係在讓渡基板後,便迴1232199 V. Description of the invention (19) '-It will not be in a standby state. It can take the next base from the index robot R. Because the push pin P has a so-called buffer function, it can be used to carry out the circuit board. The waiting time can reach the effect of substrate processing. In other words, since the substrate that was previously carried is transported outside the PI area of the carry-in port, the pusher pin p is immediately lowered, and the substrate can be transferred to the transfer roller 30, so the substrate can be shortened. Interval. The conveyor module 3B in the substrate carrying port P0 is also configured as described above; 楹 group 3A. However, since the conveyor module 3β is transported in the direction of the index sheet 70 I ND carried out from the processing unit μ, the substrate is transported in the direction opposite to the X direction in FIGS. 2 and 7 ′. In other words, in the conveyor belt module 3B, the conveyance roller 30 rolls the substrate toward the push pin ρ. The pusher pin ρ waits for the substrate to reach the substrate removal port P0 set on the transfer surface CP at a position lower than the substrate transfer surface cp, and the pusher pin P will rise to support the substrate more than the substrate transfer surface cp. Upper position (second substrate transfer position). This substrate can be smoothly accessed by the arm 70 of the indexing robot R. When $ gives up the substrate to the pusher pin ρ of the index robot R, it is located at the rising position 9 1 =, the base 4 丨 and the horizontal arm 4 2 of the pusher pin P are also located in the exit path from the substrate's conveyance path. Position (see Figure 3). Among them, the substrate to be taken out next 'will be transferred toward the substrate carrying-out port P0 even when the pusher pin P is at the rising position 91. After the vertical push pin P has passed the substrate to the index robot R, the substrate support portion = is rotated to the exit position 82, and in this state, it is lowered to the lower IV position 92. In other words, after the push pin ρ is transferred to the substrate, it returns
1232199 發明說明(2(〇 避基板的搬送路徑而下降。然後,基板支撐部43便轉動至 基板支撐位置81的位置處,在下一個基板到達基板搬出埠 PO之珂便呈待機狀態。 如此在基板搬出埠PQ的輸送帶模組3B,將不必待機將基 ,從推料銷p讓渡給索引機械人R,便可逐次的搬送基板。 藉此處理後的基板便♦不致停滞,而可有效率的處理基板。 此外,因為不需要基板讓渡的待機,因此可縮短基板間的 距離,而提高基板處理效率。 圖8係索引機械人R構成例的立體圖。索引機械人R係具 備有:可沿Y方向進行往返直線移動的基台丨〇 1 ;依可對基 台101自由進行轉動與升降的方式裝設的圓柱1〇2 ;可自由 轉動的裝設在圓柱102上的第一臂部丨03 ;可自由轉動的裝 設於第一臂部103前端的第二臂部丨〇4 ;以及可自由轉動的 裝设在此第二臂部1 〇 4前端的上述臂部7 〇。第一臂部1 〇 3、 第二臂部1 0 4及臂部7 0均可自由的繞垂直軸旋轉。所以, 第一臂部103、第二臂部1〇4及臂部70便構成所謂的天平秤 桿。第二臂部1 0 4之轉動連動於第一臂部1 〇 3的轉動,而利 用第二臂部1 0 4的轉動,此臂部便將伸屈,並維持臂部μ 的姿勢,且可使臂部70對圓柱1〇2中心軸,進行靠近/遠離 方向的直線移動。 在基台1 0 1的一側面上,固定著在一對軌道丨丨〇上滑動的 滑動塊111。在此滑動塊111中,固定著螺合於螺絲轴丨12' 上的螺栓螺母。所以,利用依馬達1 1 3將螺絲軸丨丨2進行正 轉/反轉驅動,便可將基台1 〇 1沿γ方向進行往返直線移1232199 Description of the invention (2 (0) to avoid the substrate conveyance path and descend. Then, the substrate support portion 43 is rotated to the position of the substrate support position 81, and the next substrate reaches the substrate removal port PO, and it is in a standby state. The conveyor module 3B removed from the port PQ will not have to wait for the substrate to be transferred from the push pin p to the index robot R, and the substrates can be transferred one by one. The processed substrates will not stagnate and may have Efficient processing of substrates. In addition, since there is no need for waiting for substrate transfer, the distance between substrates can be shortened to improve substrate processing efficiency. Figure 8 is a perspective view of a configuration example of the index robot R. The index robot R has: Abutment that can be moved back and forth and linearly in the Y direction. 〇1; a cylinder 102 installed in such a way that the abutment 101 can be rotated and lifted freely; a first arm that can be freely installed on the cylinder 102 A second arm portion 〇04 which is rotatably installed at the front end of the first arm portion 103; and an arm portion 70 which is rotatably installed at the front end of this second arm portion 104. First arm part 1 〇 3. The second arm portion 104 and the arm portion 70 can freely rotate around the vertical axis. Therefore, the first arm portion 103, the second arm portion 104, and the arm portion 70 constitute a so-called balance weighing rod. The rotation of the two arm portions 104 is linked to the rotation of the first arm portion 103, and by using the rotation of the second arm portion 104, the arm portion will be flexed and stretched, and the posture of the arm portion μ can be maintained, and The arm 70 is linearly moved toward and away from the center axis of the cylinder 102. On one side of the abutment 101, a slide block 111 that slides on a pair of rails 丨 丨 is fixed. Here The sliding block 111 holds the bolt and nut screwed onto the screw shaft 丨 12 '. Therefore, by using the motor 1 1 3 to rotate the screw shaft 丨 丨 2 forward / reverse, the abutment 1 〇1 Move back and forth linearly in the γ direction
C:\2D-CODE\91-O5\9110313O.ptd 第25頁 1232199C: \ 2D-CODE \ 91-O5 \ 9110313O.ptd Page 25 1232199
在此種構造的索引機械人R中,蕻± _ 乂 _ R τ 猎由基台101的往返直緩 移動、圓柱1 0 2的升降與轉動、7芬 、将勁以及一對臂部1 0 3,1 〇 4的伸 屈,便將基板從晶盒C中搬出,# > λ ^°In the index robot R of this structure, 蕻 ± _ 乂 _ R τ hunts back and forth and slowly moves from the abutment 101, the lifting and turning of the cylinder 1 0 2, 7 fen, strength, and a pair of arms 1 0 3,104, the substrate was removed from the crystal box C, # > λ ^ °
,η ^ w /傲出,亚搬入於輸送帶模組3A, η ^ w / proud, Asia moved into the conveyor module 3A
上。同樣的,可將從輸送帶槎έ q R 入於晶盒C中。 C核組3B上所呈接到的基板,搬 邱:!土述基板處理裝置的電構造方塊圖。在基板處理 口PTRT中δ又有供控制處理部丁 1〜μ用沾f lL ..丄+ 1 1 N用的基板處理控制部2 〇 1 快座丨立〇’在索引單元IND中設有控制著索引機械人R的索引 控制部2 0 2。基板處理控制邮9 η 1你表:?丨 、 、〇而 处佐# 2 0 1與索引控制部2 0 2則透過 1電路203而連接,並執行相互間的數據交換。 =板處理控制部2 〇 1係除控制著處理部τ丨〜TN之外,亦控 制者具備有基板搬入埠PI端之輸送帶模組3A的搬送輥3〇之 動=,以及控制著具備基板搬出埠p0端之輸送帶模組3B的 搬送較3 0之動作。 再者’索引控制部2 0 2除控制著索引機械人r的動作之 外’亦控制著由基板搬入埠p丨之輸送帶模組3A所具備推料 銷P ’與驅動其之驅動機構5〇所構成之基板搬入機構2〇5的 動作’以及控制著由基板搬出埠p〇之輸送帶模組3B所具備 的推料銷P與驅動其之驅動機構5〇所構成之基板搬出機構 2 0 6的動作。 基板處理控制部2 0 1乃當利用基板搬入埠PI端的搬送較 30 ’將基板供應給最先的處理部T1時,便透過通信電路 2 0 3 ’對索引控制部2 〇 2發出基板搬入要求。此外,基板處on. Similarly, the crystal belt C can be loaded with q R from the conveyor belt. Substrates presented on the C core group 3B, move Qiu:! Block diagram of the electrical structure of the substrate processing apparatus. In the substrate processing port PTRT, there is also a substrate processing control unit 2 for controlling the processing unit 1 ~ μ for f lL .. 丄 + 1 1 N 2 〇1 Quick seat 丨 is provided in the index unit IND The index control unit 2 0 2 that controls the index robot R. The substrate processing control post 9 η 1 is shown in the following table:? 丨, 〇 处 佐 # 2 0 1 and the index control section 2 0 2 are connected through a circuit 203 and perform data exchange with each other. = The board processing control section 2 〇1 controls the processing section τ 丨 ~ TN, and also controls the movement of the conveying roller 30 of the conveyor belt module 3A of the PI port of the substrate moving port =, and controls the The conveyance of the conveyor module 3B at the p0 end of the substrate removal port is more than 30. In addition, the "index control unit 2 0 2 not only controls the operation of the index robot r" but also controls the pusher pin P 'provided in the conveyor module 3A of the substrate carrying port p 丨 and the driving mechanism 5 that drives it. The operation of the substrate carrying-in mechanism 205 constituted by 〇 'and the substrate carrying-out mechanism 2 constituted by the pusher pin P provided in the conveyor module 3B of the substrate carrying-out port p0 and the driving mechanism 50 driving the same 0 6 actions. The substrate processing control unit 201 sends a substrate transfer request to the index control unit 2 0 2 through the communication circuit 2 0 3 'when the substrate is supplied to the first processing unit T1 by using the substrate transfer port PI port transfer 30'. . In addition, the substrate
\\312\2d-code\9l-05\9l103130.Ptd\\ 312 \ 2d-code \ 9l-05 \ 9l103130.Ptd
1232199 五、發明說明(22) 理控制部201在基板從最後的處理部^中取出,並利用某 板搬出埠P0的搬送輥30,將基板搬送至推料銷p位 ·" 搬出埠PO)時,便透過通信電路2 0 3,對索引控制部2〇2土發 f基板搬出要求。其中,基板搬入要求及/或基板搬出要 求亦可在考慮搬送輥30的基板搬送速度、透過通作電路 機構2 0 6的動作速度等,而在提早的時序便發出。 索引控制部202係當透過通信電路2〇3接收到基板搬入要 求時,構成基板搬入機構2 0 5的推料銷Ρ便下降。藉此美 便從推料銷Ρ讓渡給基板搬入埠ρι的搬送輥3〇上。胃此外土, f引控制部202係當透過通信電路2 〇3而接收到基板搬出要 求時二便應答於此,使構成基板搬出機構2〇6的推料銷?上 升、。藉此,基板便從基板搬出埠p〇端的搬送輥3〇之搬送面 上被上舉。在此狀態下,來自最後處理部TN的已處理完畢 板,便可利用搬送報3 0而導入於被上舉基板的下方空 相關索引機械人R的控制,乃獨立於透過通信電路, >所供應的基板搬入要求與基板搬出要求而執行。換句話 说,索引控制部20 2在構成基板搬入機構2〇5的推料銷?位 於上升位置(第一基板讓渡位置)處,若此推料銷P並未保 2著基板的話,便對索引機械人R發出,從載置於晶盒載 部π上的晶盒C中取出一片基板3,並載置於此推料銷p 二動作指令。此外,索引控制部20 2係在構成基板搬出 枝構2 0 6的推料銷p位於上升位置(第二基板讓渡位置)處, 第27頁 \\312\2d-code\91-05\91103130.ptd 1232199 五、發明說明(23) " 一 "" "" 當此推料銷P有保持著基板時,便對索引機械人R發出,從 基板搬出機構20 6的推料銷p承接基板,並將該基板收容於 晶盒載置部11的晶盒c内之指令。 構成基板搬入機構2〇5與基板搬出機構2〇6的推料銷p是 t保持著基板,可由之前的基板搬入機構2〇5、基板搬出 ,構2 0 6、及索引機械人R的動作記錄中進行判斷。換句話 說’在索引機械人R剛剛將基板讓渡給基板搬入機構2〇5的 推料銷P上之後,此推料銷p便呈保持著基板。而若此推料 銷P —經下降,並再度上升時,在剛上升之後,基板搬入 機構20 5的推料銷p便屬於未保持基板。同樣的,在基板搬 出機構2 0 6的推料銷P剛上升之後,便可判斷此推料銷p上 並未保持著基板。而在索引機械人R剛從基板搬出機構2〇6 的$料銷P上承接到基板之後,便可判斷此推料銷p並未保 =著基板。然後,當基板搬出機構2 0 6的推料銷p 一經下 降,並再度上升時,在其剛上升之後,該推料便 保持著基板。 索引控制部2 0 2係根據索引機械人R位置(嬖靠 ,入璋與基板搬料PH任—者)、索引機; =狀態(譬如從晶盒C取出基板,並供應給基板搬入機構 2〇5的基板搬人動作中,或者從基板搬出機構綱中承接已 ,理完畢的基板,並收容於晶盒c内的基板搬出動作中 等),而將索引機械人R的動作予以最佳化。 索引控制部202係在基板搬入機構2〇5的推料銷p下降完 成之時序’便透過通信電路2〇3,對基板處理控制部2〇ι提1232199 V. Description of the invention (22) The physical control unit 201 removes the substrate from the final processing unit ^ and uses a certain plate transfer roller 30 to transfer the substrate to the push pin p position. &Quot; Remove port PO ), Through the communication circuit 203, it requests the index control unit 202 to send out the PCB. Among them, the substrate carrying-in request and / or substrate carrying-out request may be issued at an earlier timing in consideration of the substrate carrying speed of the carrying roller 30 and the operating speed of the through-circuit circuit mechanism 206. When the index control unit 202 receives the board loading request through the communication circuit 203, the push pin P constituting the board loading mechanism 205 is lowered. This facilitates the transfer from the pusher pin P to the transfer roller 30 of the substrate transfer port. In addition to the stomach, the f control unit 202 responds to the substrate removal request when it receives the substrate removal request through the communication circuit 203, and makes the push pin constituting the substrate removal mechanism 206? Up ,. Thereby, the substrate is lifted up from the conveying surface of the conveying roller 30 at the end of the substrate carrying port p0. In this state, the processed board from the final processing unit TN can be introduced into the control of the air-correlation index robot R below the lifted substrate using the transport report 30, which is independent of the communication circuit, > The supplied substrate carrying-in request and substrate carrying-out request are executed. In other words, is the index control unit 20 2 in the push pin constituting the substrate carrying-in mechanism 205? It is located at the ascending position (the first substrate transfer position). If the pusher pin P does not hold the substrate, it will be sent to the index robot R from the crystal box C placed on the wafer carrier π. Take out a piece of substrate 3 and place it on the push pin p. In addition, the index control unit 20 2 is located at the raised position (second substrate transfer position) of the push pin p constituting the substrate carrying branch structure 2 06, page 27 \\ 312 \ 2d-code \ 91-05 \ 91103130.ptd 1232199 V. Description of the invention (23) " One " " " " When this push pin P holds the substrate, it will be issued to the index robot R and the push from the substrate removal mechanism 20 6 The material pin p receives an instruction for receiving the substrate and accommodating the substrate in the crystal case c of the crystal case mounting portion 11. The push pin p constituting the substrate carrying-in mechanism 205 and the substrate carrying-out mechanism 206 holds the substrate at t, and can be operated by the previous substrate carrying-in mechanism 205, the substrate carrying-out mechanism, the structure 206, and the index robot R. Judge in the record. In other words, 'Just after the index robot R has transferred the substrate to the pusher pin P of the substrate carrying mechanism 205, the pusher pin p holds the substrate. If the pusher pin P is lowered and then raised again, the pusher pin p of the substrate carrying-in mechanism 20 5 immediately after the lifter belongs to an unretained substrate. Similarly, just after the pusher pin P of the substrate carrying-out mechanism 206 is raised, it can be judged that the substrate is not held on the pusher pin p. And just after the indexing robot R receives the substrate from the $ material pin P of the substrate carrying-out mechanism 206, it can be judged that the pushing pin p is not secured to the substrate. Then, as soon as the push pin p of the substrate carrying-out mechanism 206 is lowered and raised again, the pusher holds the substrate immediately after it is raised. The index control unit 2 0 2 is based on the position of the indexing robot R (reliance, entry, and substrate transfer PH), the indexing machine; = state (such as taking out the substrate from the crystal box C and supplying it to the substrate transfer mechanism 2 (5) In the substrate moving operation, or after receiving and processing the substrate from the substrate removal mechanism, the substrate removal operation in the crystal box (c) is optimized), and the operation of the index robot R is optimized. . The index control unit 202 sends the substrate processing control unit 20 to the substrate processing control unit 200 through the communication circuit 203 at the timing when the push pin p of the substrate carrying-in mechanism 205 is completed.
1232199 五、發明說明(24) " " --〜 供基板搬入完畢訊號。此外,索引控制部202在基板搬出 機構m的推料銷p於上升後的時4,便透過通信電路 2 0 3 ’對基板~處理控制部2(H提供基板搬出完畢訊號。 =此在本實施形態中,將基板搬入基板搬入埠p I上的基 板搬入;構2 0 5 ’與從基板搬出埠p q將基板搬出的基板搬 出機構2 0 6,冑可利用索引控制部2 02進行控制|。而該等 基板搬入機構2 〇 5與基板搬出機構2 〇 6,則對應從基板處理 控制部201透過通信電路2〇3的基板搬入要求 出動#。所以,便可毫不遲滞的執行對基板搬入 皐PI的基板搬入與從基板搬出埠p〇搬出基板。 此外,索引控制部202則獨立於來自基板處理控制部2〇1 的基板搬入*求與基板搬出要*,而控制*索引機械人 。藉此索引機械人R的動作,便不致依存於分同步產生的 ^板搬入要求與基板搬出要求,而可依最佳態樣使索引機 戒產。生^作。藉此,便可明顯的縮短索引機械人R的搬 U郎拍、、’σ果,因為可縮短基板處理裝置的整體處理節 拍,因此可明顯的提昇生產性。 依本毛月者的貫驗’若利用基板處理控制部2 〇 1控制 基板搬入機構2 0 5與基板搬出機構2 0 6的話, ㈣秒。換句話說,以6。秒一片的速度將已處理完畢的: 板搬出於基板搬出蟑ΡΟ上,乃為極限。相對於此,若採用 利用索引控制部202控制著基板搬入機構2〇5與基板搬出機 構20 6之構造的話’便可將基板處理節拍縮短為42秒。藉1232199 V. Description of the invention (24) " " In addition, the index control unit 202 provides a signal to the substrate through the communication circuit 2 0 3 ′ to the processing control unit 2 (H to provide a signal for the completion of the substrate removal.) In the embodiment, the substrate is carried into the substrate into the substrate carrying port p I; the structure 2 0 5 ′ and the substrate carrying mechanism 2 0 6 carrying the substrate out from the substrate carrying port pq can be controlled by the index control unit 202 | The substrate carrying-in mechanism 2 05 and the substrate carrying-out mechanism 2 06 correspond to the substrate moving-in request for the substrate moving control unit 201 through the communication circuit 203. Therefore, it is possible to execute the adjustment without delay. Substrate Carry-in: PI's board-in and board-out port p0. In addition, the index control unit 202 is independent of the board-in. People. By this, the action of the indexing robot R is not dependent on the board moving in request and the board moving out request generated by the sub-synchronization, but the indexing machine can be stopped from production according to the best situation. Production. By this, you can Significantly shorter indexes Since the robot R's moving shots and σ results can shorten the overall processing cycle of the substrate processing device, it can significantly improve productivity. According to the test of this hairy month, if the substrate processing control unit is used 2 〇 1 Controlling the board moving-in mechanism 205 and the board moving-out mechanism 206, a leap second. In other words, the processing is completed at a speed of 6. one piece: The board is moved out of the substrate and removed from the cock, which is the limit. In contrast, if the structure in which the substrate control mechanism 202 and the substrate control mechanism 206 are controlled by the index control unit 202 is used, the substrate processing cycle can be shortened to 42 seconds.
1232199 五、發明說明(26)1232199 V. Description of Invention (26)
,並利用使推料銷P升 亦可使臂部70與推料銷p 〇 鎖P的基板讓渡,亦可 式達成。推料銷P的升降 的事項範圍,可進行各種 亦可將臂部7 0的高度設定為一定 降,而執行基板的讓渡。當然, 二者均升降,而讓渡基板的方式 同樣的,相關搬送輥3 〇與推料 用僅其中一者或二者均升降的方 構造並無特別限制。 此外’申请專利範圍中所記載 變化。 【元件編號之說明】 11 晶盒載置部 30 搬送輥 31 軸 32 支撐板 33 輪 34 時序帶 35 基板導入室 36 開口 37 出曰 38 馬達 39 輪 40 時序帶 41 基部 42 水平臂部 43 基板支樓部The use of raising the pusher pin P can also allow the arm 70 and the board of the pusher pin p 0 lock P to be transferred, which can also be achieved in a manner. The range of matters for raising and lowering the push pin P can be various. The height of the arm portion 70 can be set to a certain level, and the transfer of the substrate can be performed. Of course, both of them are raised and lowered, and the method of transferring the substrate is the same. There is no particular limitation on the structure of the related conveying rollers 30 and the pusher which only lifts or both of them. In addition, the changes described in the scope of the patent application. [Explanation of the component number] 11 cassette mounting section 30 transfer roller 31 shaft 32 support plate 33 wheel 34 timing belt 35 substrate introduction chamber 36 opening 37 output 38 motor 39 wheel 40 timing belt 41 base 42 horizontal arm 43 substrate support Building
\\312\2d-code\91-05\91103130.ptd 第31頁 1232199\\ 312 \ 2d-code \ 91-05 \ 91103130.ptd Page 31 1232199
五、發明說明(27) 50 驅動機構 51 搖動臂 55 支撐框 56 汽缸 60 排列機構 61 栓 62 支撐構件 63 汽缸 70 臂部 81 基板支撐位置 82 退出位置 91 上升位置 92 下降位置 101 基台 102 圓柱 103 第一臂部 104 弟二臂部 110 軌道 113 馬達 150 區間搬送裝置 151 基板保持臂 152 驅動機構 201 基板處理控制部 202 索引控制部 \\312\2d-code\91-05\91103130.ptd 第32頁 % 1232199 圖式簡單說明 圖1為本發明一實施形態之基板處理來 念俯視圖。 圖2為輸送帶内部構造的簡略剖視圖a 圖3為同輸送帶内部構造的簡略剖視_ 圖4為輪送帶的具體構造例俯視圖。 圖5為輪送帶的具體構造例側視圖。 圖6為輸送帶的具體構造例後視圖。 圖7為供驅動推料銷用的驅動機構構造挪 體圖 換 it 楙 圖8為機械人構造例的爻體圖。 圖9為構成上述基板處#裝置的電性構造區塊圖 C:\2D-C0DE\91-05\91103130.ptd 第34頁V. Description of the invention (27) 50 Drive mechanism 51 Swing arm 55 Support frame 56 Cylinder 60 Alignment mechanism 61 Pin 62 Support member 63 Cylinder 70 Arm portion 81 Substrate support position 82 Exit position 91 Raise position 92 Lower position 101 Abutment 102 Cylinder 103 The first arm 104, the second arm 110, the track 113, the motor 150, the section transfer device 151, the substrate holding arm 152, the driving mechanism 201, the substrate processing control section 202, the index control section \\ 312 \ 2d-code \ 91-05 \ 91103130.ptd 32nd Page% 1232199 Brief Description of Drawings Figure 1 is a top view of a substrate processing method according to an embodiment of the present invention. Fig. 2 is a schematic cross-sectional view of the internal structure of the conveyor belt. Fig. 3 is a schematic cross-sectional view of the internal structure of the same conveyor belt. Fig. 4 is a plan view of a specific structural example of the carousel. FIG. 5 is a side view of a specific structural example of the carousel. FIG. 6 is a rear view of a specific structural example of the conveyor belt. Fig. 7 is a structural diagram of a driving mechanism for driving a push pin. It is replaced by it Fig. 8 is a structural diagram of an example of a robot structure. Figure 9 is a block diagram of the electrical structure constituting the #device at the above substrate C: \ 2D-C0DE \ 91-05 \ 91103130.ptd page 34
Claims (1)
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001050772A JP3884622B2 (en) | 2001-02-26 | 2001-02-26 | Substrate transport apparatus, substrate processing apparatus using the same, and substrate processing method |
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| Publication Number | Publication Date |
|---|---|
| TWI232199B true TWI232199B (en) | 2005-05-11 |
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| TW091103130A TWI232199B (en) | 2001-02-26 | 2002-02-22 | Substrate transporting apparatus, substrate processing apparatus using the transporting apparatus and substrate processing method |
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| JP (1) | JP3884622B2 (en) |
| KR (1) | KR100483824B1 (en) |
| TW (1) | TWI232199B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI475627B (en) * | 2007-05-17 | 2015-03-01 | 布魯克斯自動機械公司 | Substrate conveyor, substrate processing apparatus and system, method of reducing particulate contamination of substrate during substrate processing, and method of combining conveyor and processor |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| KR20090049169A (en) * | 2007-11-13 | 2009-05-18 | 세메스 주식회사 | Drive magnetic force member, substrate transfer unit and substrate processing apparatus using same |
| WO2011040931A1 (en) * | 2009-10-02 | 2011-04-07 | Foundationip, Llc | Generating intellectual property intelligence using a patent search engine |
| US20120210936A1 (en) * | 2011-02-21 | 2012-08-23 | Ji Fu Machinery & Equipment Inc. | Systems and methods for mutli-chamber photovoltaic module processing |
-
2001
- 2001-02-26 JP JP2001050772A patent/JP3884622B2/en not_active Expired - Fee Related
-
2002
- 2002-02-08 KR KR10-2002-0007302A patent/KR100483824B1/en not_active Expired - Fee Related
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9978623B2 (en) | 2007-05-09 | 2018-05-22 | Brooks Automation, Inc. | Side opening unified pod |
| TWI475627B (en) * | 2007-05-17 | 2015-03-01 | 布魯克斯自動機械公司 | Substrate conveyor, substrate processing apparatus and system, method of reducing particulate contamination of substrate during substrate processing, and method of combining conveyor and processor |
| US11201070B2 (en) | 2007-05-17 | 2021-12-14 | Brooks Automation, Inc. | Side opening unified pod |
Also Published As
| Publication number | Publication date |
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| KR100483824B1 (en) | 2005-04-20 |
| JP2002252264A (en) | 2002-09-06 |
| KR20020069479A (en) | 2002-09-04 |
| JP3884622B2 (en) | 2007-02-21 |
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