WO1983002786A1

WO1983002786A1 - Method of electroplating

Info

Publication number: WO1983002786A1
Application number: PCT/SE1983/000016
Authority: WO
Inventors: Jouko Kalevi Korpi; Teuvo Tapio Korpi
Original assignee: Individual
Current assignee: Individual
Priority date: 1982-02-09
Filing date: 1983-01-21
Publication date: 1983-08-18
Anticipated expiration: 1984-08-09
Also published as: DK161719C; AU1151483A; JPS59500134A; NO157221B; CA1224180A; EP0101446B1; DK462383D0; FI833644L; FI833644A0; SE8200728L; NO833669L; IT8367131A0; IT8367131A1; NO157221C; SE429765B; IT1159975B; DE3377068D1; EP0101446A1; US4501647A; DK462383A

Abstract

Procédé de placage électrolytique d'une pièce à usiner connectée en tant que cathode à un circuit de courant avec un métal de placage électrolytique, essentiellement du chrome. La pièce à usiner est transportée à travers un électrolyte (3) à une vitesse prédéterminée devant l'anode (2) dans le circuit de courant. Selon l'invention, un organe (4) agencé juste avant l'anode (2) agit sur la densité du courant entre lui-même et la cathode, obtenant ainsi le décapage de la cathode. Cela signifie que le placage électrolytique est effectué sur une surface récemment décapée. L'invention a également pour objet différents procédés de décapage.A method of electroplating a workpiece connected as a cathode to a current circuit with an electroplating metal, essentially chromium. The workpiece is transported through an electrolyte (3) at a predetermined speed in front of the anode (2) in the current circuit. According to the invention, a member (4) arranged just before the anode (2) acts on the density of the current between itself and the cathode, thereby obtaining the pickling of the cathode. This means that electrolytic plating is performed on a recently etched surface. The invention also relates to different pickling methods.

Description

Method of electroplating

The present invention relates to a method of electroplating metal, primarily chromium, onto a workpiece connected as cathode in a current circuit, said workpiece being fed through the electrolyte at a predetermined speed past the anode and any auxiliary anodes in the current circuit.

Electroplating metal on a cathode from an electrolyte entails relatively difficult and sensitive processes in which small variations in the current density between anode and cathode in the electrolyte may give rise to completely different properties in the coating and adhesion to the coated surface.

The present invention relates both to a method of achieving better adhesion to the coated surface and to a method of improving the density of the. coating itself.

Over the years a considerable number of patents have been granted describing various methods of electroplating metal objects.

German patent 484.206, dealing with chromium plating, proposes that initially the workpiece to be chromium plated is permitted to act as anode in order to etch the original surface to give better adhesion at subsequent electroplating with the workpiece, as cathode. Nowadays this method is used generally.

Furthermore, German patent 923.405 maintains that a more easily polished chromium surface is obtained if electroplating is performed in periods broken by short periods when the current is cut but the workpiece is allowed to remain in the electrolyte.

Swiss patent 498 941 describes a method of chromium plating elongate objects by gradually moving them through an anode. Swedish published specification 310 970 also reveals that when electroplating with chrome, for instance, the current density must be controlled over the entire area to be plated since differences in area, geometry or accessibility may cause the current density at some parts of the cathode to be so low that no plating at all occurs there. On the contrary, a warning is given that particularly unfavourable surfaces may be etched instead. From the second paragraph on page 3 of the published specification it is evident that cast-iron and steel cathodes are considered especially liable to such undesired etching in chromium-plating baths.

To avoid the above problems the published specification proposes placing an auxiliary electrode close to the area where the current density is either too low to give the desired plating or gives plating which is not desired on a particular part of the surface, because the current density is too high. The auxiliary electrode shall in this case be connected to a current source which is independent of the current circuit connected between anode and cathode.

The problem of etching in chromium baths with too low current density has also been discussed in US patent No.4,062,741 where it is suggested to connect a protective voltage of a few volts across those objects which must remain in the chromium-plating bath even after the current has been cut.

The method most frequently used in practice has otherwise been to first etch the object in question with inverse polarity and then plate it in the same bath.

The present invention relates to a new method resulting in a considerable improvement in the adhesion of the plated surface coating as well as its quality, by performing the etching and plating closer together in time and by enabling the pole-changing method to be avoided.

The method according to the invention is based on experience of electroplating gathered over the years, also verified in the patents discussed above. At the same time, however, the inventive concept offers a com pletely independent solution to previously unsolved problems. As already mentioned in the introduction, the method according to the invention relates to electroplating a metal, primarily chromium, onto a workpiece acting as cathode, said workpiece being fed through an electrolyte at a predetermined speed past an anode where depositing of the metals is effected.

The method according to the invention is based on the cathode being continuously etched immediately before it reaches the anode. Since this takes place continuously the pole-changing method, which has a number of drawbacks as already intimated, cannot be used.

According to the invention this continuous etching is achieved by arranging a member immediately before the anode, said member controlling the current density between itself and the cathode so that the surface is etched. This member may either be entirely electrically insulating or connected in a current circuit with the cathode in such a way that the current density provides etching of .the cathode when it passes the member in question. The method according to the invention can also be performed by arranging several pairs of etching members and anodes successively in the same electrolyte. The quality of the plated coating can also be improved by varying the distance between cathode and etching member and between cathode and anode along a distance along which the cathode is moved past these. In this way the current density, and thus the degree of etching, and the density of the electroplating can be varied to the desired value at each point along the surface of the cathode. The opportunity of giving the plated surface different hardness at different depths in this way may be of particular value. Certain other advantages can also be achieved and the entire etching-plating process can be carried out under partial vacuum. The method according to the invention is defined in the following claims and will now be further described in connection with a number of basic sketches of arrangements for performing the method. In this connection it may be mentioned that the method according to the invention has been tested with good results at the State Institute of Technical Research in Helsingfors, test report MRG 1776.

Figures 1 - 5 are basic sketches and such conventional elements as electroplating baths, measuring means and complete electrical connecting systems have been omitted or merely intimated.

Figure 1 shows the basic principle of the method according to the invention. A workpiece K is connected as cathode in the current circuit 1 with current source U. The anode is designated 2 and the electrolyte 3. The cathode K is fed continuously in the direction of the arrow V. Immediately before the workpiece K (cathode) reaches the anode 2, it passes under the member 4, characteristic for the invention, which constitutes an electrically insulating shield in the basic form shown in this figure. The distance between the anode 2 and the cathode K and the voltage of thecurrent souce U are essential variables with respect to the plating, while the distance a between the insulating member 4 and the cathode K and the distance B between the member 4 and the anode 2, together with the current strength over the anode, determine the etching. It is the current density which controls both etching and plating. All the variables discussed above are values which must be empirically determined. Etching takes place in the region 10 and plating in the region 11.

In the embodiment shown in Figure 2 the insulating member 4 is replaced by an electrically conducting member 5 which will thus in practice function in the same current circuit as the anode 2 and cathode K. This means that the previously mentioned valiables must be adjusted depending on the conditions prevailing.

In the embodiment shown in Figure 3 a member 6 to intensify the etching has been connected into its own current circuit 7 and has its own current source. The conditions discussed earlier apply here except that the prevlously mentioned variables must be given other values. In the embodiment shown in Figure 4 an insulating layer 8 has been arranged between the anode 2 and the member 6 intensifying the etching. It should be noted that the insulating layer 8 extends some way between the member 6 and the cathode K. This is not always necessary but may sometimes be advis able. A current circuit 7 may be connected to the member 6 as shown in Figure 3.

Figure 5 illustrates a modification in which the distance between anode and cathode (A1-A2) and between the etching-intensifying member 5 (4) and cathode (a1-a2) varies along the path of the cathode past said member and the anode. The member 5 (1) may consist of an electrically conducting member 5 as in Figure 2 or of an insulating member 4 as in Figure 1. According to this embodiment it is possible to influence the etching process along the member -5(4) in order to produce plating with gradually changing properties between the bottom and surface layers, for instance.

The variants shown in the drawings can to a great extent be combined with each other to achieve desired properties in the plating layer. For instance an insulating member 4 as well as an electrically conducting member 5 may be used arranged one after the other in the direction of movement of the workpiece (cathode).

Practical experiments have proved that the quality of the coating can be highly improved by having the wαrkpiece passing an anode, that is divided up in several parts by an insulating and shielding protection or by using several successive anodes having insulating and shielding protection between each other. The anodes may have different sources of current supply and different voltages. The quality of the coating can also be improved by giving the anode at the end an insulating and shielding protection resulting in a gradually decreasing current density.

Claims

1. Method of electroplating metal onto a workpiece (k) connected as cathode in a current circuit, said workpiece (k) being fed through the electrolyte (3) at a predetermined speed past the anode (2) and any auxiliary anodes in the current circuit, c h a r a c t e r i s e d in that, immediately prior to passing the anode (2), the workpiece (k) is caused to pass a member (4) controlling the current density in the electrolyte (3) between itself (4) and the cathode (k) so that the latter (k) is etched (10) on its way past the member (4), after which the metal (11) is deposited on the workpiece (k) at the subssquent anode (2).

2. Method according to claim 1, c h a r a c t e r i s e d in that, in order to achieve the desired etching, the workpiece (k) is caused to pass an electrically insulated shield (4) arranged immediately before the anode (2).

3. Method according to claim 1, c ha r a c t e r i s e d in that, before reaching the anode (2), the workpiece (k) is caused to pass an electrically conducting member (6), the conductivity of which is such that, together with the anode (2) and the cathode (k), the member (6) forms a current circuit producing such current density between the member (6) in question and the cathode (k) that the cathode (k) is etched (10) when it passes the member (6) before it reaches the anode (2) where the metal (11) is deposited.

4. Method according to claim 1, c h a r a c t e r i s e d in that said member (6) is connected in a current circuit (7) of its own, together with the cathode (k) and that this current circuit (7) is such that it results in etching (10) of the cathode (k) when it passes the member (6).

5. Method according to any of claims 3 or 4, c h a r a c t e r i s e d in that said electrically conducting member (6) is separated from the anode (2) by means of an electricall insulating layer (8), also extending in under the member (5) in question.

6. Method according to any of claims 1-5, c h a ra c t er i s e d in that the anode (2) is so arranged in relation to the direction of movement of the workpiece (k) that the distance (A1, A2) between the anode (2) and the workpiece (k) varies in the direction of movement of the workpiece, thus producing a varying current density bet ween the anode (2) and the workpiece (k).

7. Method according to claim 6, c h a r a c t e r i s e d in that the distans (A1, A2) between the anode (2) and the workpiece (k) decreases in the direction of movement of the workpiece (k).

Method according to any of the preceding claims, c h ar a c t e r i s e d in that the member (5) producing the etching is arranged so that the distance (al a2) between this and the wαrkpiece (k) varies in the direction of movement of the wαrkpiece (k).

Method according to any of the preceding claims, c h ar a c t e r i s e d in that the workpiece (k) is caused to pass under several pairs of etching members (4) and electroplating anodes (2) where the etching is controlled so that the layer (11) of electroplating on the workpiece (k) gradually increases.

10. Method according to any of claims 1-9, c h a r a c t er i s e d in that the entire process is performed under partial vacuum.