WO1996000317A1 - Improvements in crystal growth - Google Patents
Improvements in crystal growth Download PDFInfo
- Publication number
- WO1996000317A1 WO1996000317A1 PCT/GB1995/001305 GB9501305W WO9600317A1 WO 1996000317 A1 WO1996000317 A1 WO 1996000317A1 GB 9501305 W GB9501305 W GB 9501305W WO 9600317 A1 WO9600317 A1 WO 9600317A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- crucible
- melt
- crystal
- injector
- molten material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
- C30B15/12—Double crucible methods
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1052—Seed pulling including a sectioned crucible [e.g., double crucible, baffle]
Definitions
- This invention relates to a method of growing crystals of uniform composition.
- the Czochralski seed-pulling technique for growing single crystals is well known (eg Z Physik. Chem. (Liebzig) 9.2, 219 (1918)). By this technique a seed crystal is brought into contact with molten material (melt) to facilitate further crystallisation. The crystal so produced is drawn from the melt as it grows.
- the apparatus of this technique comprises an outer crucible containing melt of the same composition as the crystal to be grown.
- An inner crucible floats on the melt in the outer crucible and a small channel through the bottom or side wall of the inner crucible allows melt to flow in from the outer crucible.
- the crystal is drawn from the melt in the inner crucible (which is replenished from the outer crucible via the channel) and, under equilibrium conditions, has the same composition as the molten material in the outer crucible.
- the respective melting points of the contents of each crucible are different and an essential feature of the double crucible technique (as applied to an incongruently solidifying melt) is that a temperature differential must be maintained between the outer and inner crucible: the temperature at which the crystal is drawn from the melt in the inner crucible is lower than that required to keep the melt in the outer crucible molten.
- the temperature differential achieved depends, inter alia, on the dimensions of each crucible (including wall and base thickness), the thermal conductivity of the crucible material, and the power and configuration of the heat source used to achieve melting.
- melt tends to freeze as it passes through the channel to the inner crucible.
- the resulting blockage is one of the major problems encountered when using the floating crucible technique with incongruently solidifying melts.
- the tendency for freezing to block the hole can be reduced by increasing its diameter but this increases the tendency for diffusion of the melt in the inner crucible back into the outer crucible (see for example G R Blackwell, Solid State Electronics I 105 (1964)). When this occurs, the composition of melt in the outer crucible no longer remains constant and hence the composition of the crystal produced is no longer uniform.
- Another feature of the floating crucible technique is that the inner crucible must be maintained concentric with the outer crucible if a symmetrical temperature distribution across the system is to be maintained. If the inner crucible drifts toward the walls of the outer crucible then undesirable localised freezing of the outer melt is likely.
- inner crucibles have been designed which incorporate spacers or fenders to ensure they remain substantially concentric with the outer crucible.
- this design gives rise to another problem, namely that of sticking of the inner crucible.
- the level of melt in the outer crucible falls and the floating inner crucible falls with it.
- fenders or spacers there is an increased tendency for the inner crucible to stick giving rise to uneven crystal growth or, in extreme cases, halting the growth process altogether.
- Another disadvantage of the double crucible technique is that, after crystal growth is complete, residual melt may cool and solidify in the double crucible assembly fusing the two crucibles together. This causes many crucibles to be broken or discarded. Ideally, the two crucibles would be separated before cooling and solidification takes place but crystal growth normally takes place at elevated temperatures and the double crucible assembly is typically maintained in an enclosed, inert atmosphere during growth in order to prevent the components of the melt being oxidised or otherwise degraded. Therefore manual separation of the two crucibles before cooling is difficult without exposing the residual melt to the outside atmosphere.
- Another problem commonly encountered when using the double crucible technique is that after charging both crucibles with appropriate melt, gas is often trapped in the channel for allowing melt to pass into the inner crucible and surface tension at the melt-gas interface prevents flow of melt from the outer to the inner crucible.
- the current invention offers a solution to the above problems by providing means for reducing the drop in temperature experienced by the melt as it passes through the channel to the inner crucible.
- This means takes the form of an injector which has the additional advantage that it can be removed and replaced if required.
- the problem of sticking of the inner crucible is reduced by incorporating locating means which are external to the outer crucible and the problem of residual melt solidifying in the crucibles is reduced by including means for withdrawing the inner crucible immediately after crystal growth is complete.
- Another aspect of the invention comprises a method of removing trapped gas from the channel in the inner crucible in order to facilitate flow of melt from the outer to the inner crucible.
- apparatus for growing crystals comprises
- a first crucible for containing a supply of molten material
- a second crucible being adapted for floating on the molten material within the first crucible and having means for allowing molten material to enter from the first crucible
- the means for allowing molten material to enter the first crucible comprises an injector formed from material of higher thermal conductivity than the material used to form the second crucible and configured to provide relatively high thermal contact with the molten material in the first crucible and relatively low thermal contact with the material in the second crucible.
- the injector is removable.
- a sealant is used to improve the seal between the injector and the inner crucible.
- a further preferred embodiment includes locating medns, outside the first crucible, for controlling the distance between the walls of the two crucibles.
- the means for drawing the growing crystal comprises a vertically adjustable pull rod linked to the second crucible such that further raising of the pull rod after crystal growth is complete causes the second crucible to be withdrawn from the first crucible.
- an improvement to the double crucible technique for crystal growth comprises the steps of:-
- figure 1 is a diagram representing equipment of the prior art typically used in the double crucible method of crystal growth
- figure 2 is a part representation of apparatus incorporating the features of the current invention ;
- figures 3a and 3b are respectively schematic cross-section and a view from below of a typical injector used in the current invention and
- figure 4 is a part representation of an alternative double crucible arrangement incorporating features of the current invention.
- a typical double crucible apparatus 1 includes a first (outer) crucible 2 and a second (inner) crucible 3-
- Crucibles 2 and 3 are formed from an inert material such as quartz, borosilicate glass, boron nitride or vitreous carbon.
- a narrow channel 4 is included in inner crucible 3-
- Material of the composition desired in the finished crystal is placed in the outer crucible 2 and heated by rf induction coil 5 via susceptor 6 to produce outer melt 7-
- the inner crucible 3 is placed on the outer melt 7 and typically is initially charged with material which, after heating to form melt 8, will solidify to form crystals of the desired composition.
- gas which is trapped in channel 4 may prevent or inhibit the flow of melt 7 into inner crucible 3-
- Spacers 9 maintain the inner crucible 3 substantially concentric with the outer crucible 2.
- the floating crucible apparatus typically includes a vertically adjustable and rotatable pull rod 10 to which a seed crystal 11 is secured by mechanical means such as clamping or wire fastening.
- the apparatus may include walls defining a chamber 12 which may be filled to a high pressure with an inert gas such as argon.
- chamber 12 may be evacuated.
- an encapsulation layer 13 of, for example, B 2 0 3 (eg see GB 1,113,069).
- the pull rod 10 is lowered so that seed crystal 11 is brought onto contact with inner melt 8 and crystallisation is facilitated.
- the crystal 14 grows it is rotated and drawn up and out of the inner melt 8 by pull rod 10.
- new melt enters through channel 4 and, under equilibrium conditions, the new melt so entering has the same composition as the growing crystal.
- crucibles 2 and 3 are formed from quartz.
- Outer melt 7 enters inner crucible 3 through injector 15.
- chamber 12 is evacuated to a pressure sufficiently low to effect removal of trapped gas from channel 4.
- the vacuum necessary to remove the gas depends on, inter alia, the viscosity of the melts 7 and 8 and the ambient pressure and is typically less than 100 N ⁇ f 2 .
- Inner crucible 3 is maintained substantially concentric with outer crucible
- locating holes 17 are situated in susceptor 6.
- Inner crucible 3 is linked to pull rod 10 via light chains 18 attached to plate 19. Pull rod 10 is free to rotate independently of plate 19 through which it passes. The position of plate 19 along pull rod 10 is maintained by stop 20.
- the length of the chains 18 is such that, by the time crystal growth is complete, substantially all of the slack has been taken up and further raising of pull rod 10 causes withdrawal of the inner crucible 3 and guide rods 16.
- Other arrangements, where further raising of pull rod 10 after crystal growth is complete will effect withdrawal of inner crucible 3 from outer crucible 2, will be apparent to those skilled in the art.
- injector 15 is set in the wall or floor of inner crucible 3 and is formed from a material of high conductivity, in this embodiment, graphite.
- the injector 1 includes a channel 4 and is substantially conical in shape with a flange at one end so that the thermal contact with the outer melt 7 is significantly greater than with the inner melt 8. Thus, the reduction in temperature experienced by the outer melt 7 as it flows through the channel 4 is reduced.
- Quartz rods 22 are typically about 2 - 3cm long with a cross-sectional diameter of about 1 - 2mm and at these dimensions exhibit significant flexibility and resilience.
- Injector 15 is removable and, as an alternative to the evacuation procedure detailed above for removing trapped gas from channel 4, it may be removed and filled with melt material before assembly of the apparatus.
- an appropriate sealant 24 for example graphite paper.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
Description
Claims
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8502899A JPH10502046A (en) | 1994-06-23 | 1995-06-06 | Crystal growth apparatus and method |
| EP95921056A EP0765406B1 (en) | 1994-06-23 | 1995-06-06 | Improvements in crystal growth |
| US08/750,871 US5879449A (en) | 1994-06-23 | 1995-06-06 | Crystal growth |
| DE69503633T DE69503633T2 (en) | 1994-06-23 | 1995-06-06 | METHOD AND DEVICE FOR CRYSTAL GROWTH |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9412629.9 | 1994-06-23 | ||
| GB9412629A GB9412629D0 (en) | 1994-06-23 | 1994-06-23 | Improvements in crystal growth |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1996000317A1 true WO1996000317A1 (en) | 1996-01-04 |
Family
ID=10757218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/GB1995/001305 Ceased WO1996000317A1 (en) | 1994-06-23 | 1995-06-06 | Improvements in crystal growth |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US5879449A (en) |
| EP (1) | EP0765406B1 (en) |
| JP (1) | JPH10502046A (en) |
| CN (2) | CN1047810C (en) |
| DE (1) | DE69503633T2 (en) |
| GB (1) | GB9412629D0 (en) |
| TW (1) | TW340879B (en) |
| WO (1) | WO1996000317A1 (en) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3596226B2 (en) * | 1997-03-17 | 2004-12-02 | 信越半導体株式会社 | Single crystal holding device |
| JP4052753B2 (en) * | 1999-02-24 | 2008-02-27 | 株式会社スーパーシリコン研究所 | Single crystal growth apparatus and single crystal growth method |
| WO2002030484A2 (en) * | 2000-10-09 | 2002-04-18 | Tricardia, Llc | Material useable for medical balloons and catheters |
| JP3617466B2 (en) * | 2001-03-16 | 2005-02-02 | 三菱住友シリコン株式会社 | Single crystal pulling device |
| JP4252300B2 (en) * | 2002-12-18 | 2009-04-08 | 日鉱金属株式会社 | Method for producing compound semiconductor single crystal and crystal growth apparatus |
| US20070056508A1 (en) * | 2003-04-23 | 2007-03-15 | Tsuguo Fukuda | Apparatus for producing fluoride crystal |
| TWI298752B (en) * | 2004-08-02 | 2008-07-11 | Univ Nat Taiwan | Method and apparatus for forming long single crystals with good uniformity |
| US7641733B2 (en) | 2004-09-01 | 2010-01-05 | Rensselaer Polytechnic Institute | Method and apparatus for growth of multi-component single crystals |
| WO2006068062A1 (en) * | 2004-12-22 | 2006-06-29 | Tokuyama Corporation | Metal fluoride single crystal pulling apparatus and process for producing metal fluoride single crystal with the apparatus |
| CN102586858A (en) * | 2012-04-01 | 2012-07-18 | 北京华进创威电子有限公司 | Double-crucible device for growing single crystals through induction heating physical vapor phase transfer |
| US9863062B2 (en) | 2013-03-14 | 2018-01-09 | Corner Star Limited | Czochralski crucible for controlling oxygen and related methods |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0226794A1 (en) * | 1985-11-25 | 1987-07-01 | Sumitomo Electric Industries Limited | Method of drawing-up a single crystal using a double-crucible apparatus and double-crucible apparatus therefor |
| EP0321576A1 (en) * | 1987-06-15 | 1989-06-28 | Mitsui Mining Company, Limited | Method for growing single crystal from molten liquid |
| EP0364899A1 (en) * | 1988-10-13 | 1990-04-25 | Mitsubishi Materials Corporation | Apparatus and process for growing crystals of semiconductor materials |
| EP0525765A1 (en) * | 1991-07-30 | 1993-02-03 | Mitsubishi Materials Corporation | Apparatus for growing single crystals |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4264385A (en) * | 1974-10-16 | 1981-04-28 | Colin Fisher | Growing of crystals |
| US4454096A (en) * | 1981-06-15 | 1984-06-12 | Siltec Corporation | Crystal growth furnace recharge |
| DE3316547C2 (en) * | 1983-05-06 | 1985-05-30 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Cold crucible for melting non-metallic inorganic compounds |
| EP0173764B1 (en) * | 1984-08-31 | 1989-12-13 | Gakei Electric Works Co., Ltd. | Single crystal growing method and apparatus |
| JPH02160690A (en) * | 1988-12-14 | 1990-06-20 | Sumitomo Electric Ind Ltd | Single crystal manufacturing equipment |
| US5047112A (en) * | 1990-08-14 | 1991-09-10 | The United States Of America As Represented By The United States Department Of Energy | Method for preparing homogeneous single crystal ternary III-V alloys |
| EP0509312B1 (en) * | 1991-04-16 | 1995-08-23 | Sumitomo Electric Industries, Limited | Czochralski method using a member for intercepting radiation from raw material molten solution and apparatus therefor |
-
1994
- 1994-06-23 GB GB9412629A patent/GB9412629D0/en active Pending
-
1995
- 1995-04-07 TW TW084100434A patent/TW340879B/en active
- 1995-06-06 WO PCT/GB1995/001305 patent/WO1996000317A1/en not_active Ceased
- 1995-06-06 US US08/750,871 patent/US5879449A/en not_active Expired - Fee Related
- 1995-06-06 CN CN95194738.9A patent/CN1047810C/en not_active Expired - Fee Related
- 1995-06-06 DE DE69503633T patent/DE69503633T2/en not_active Expired - Fee Related
- 1995-06-06 JP JP8502899A patent/JPH10502046A/en not_active Ceased
- 1995-06-06 EP EP95921056A patent/EP0765406B1/en not_active Expired - Lifetime
-
1999
- 1999-03-30 CN CN99104747.8A patent/CN1235211A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0226794A1 (en) * | 1985-11-25 | 1987-07-01 | Sumitomo Electric Industries Limited | Method of drawing-up a single crystal using a double-crucible apparatus and double-crucible apparatus therefor |
| EP0321576A1 (en) * | 1987-06-15 | 1989-06-28 | Mitsui Mining Company, Limited | Method for growing single crystal from molten liquid |
| EP0364899A1 (en) * | 1988-10-13 | 1990-04-25 | Mitsubishi Materials Corporation | Apparatus and process for growing crystals of semiconductor materials |
| EP0525765A1 (en) * | 1991-07-30 | 1993-02-03 | Mitsubishi Materials Corporation | Apparatus for growing single crystals |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0765406B1 (en) | 1998-07-22 |
| DE69503633D1 (en) | 1998-08-27 |
| DE69503633T2 (en) | 1998-12-24 |
| EP0765406A1 (en) | 1997-04-02 |
| CN1235211A (en) | 1999-11-17 |
| CN1156484A (en) | 1997-08-06 |
| CN1047810C (en) | 1999-12-29 |
| GB9412629D0 (en) | 1994-08-10 |
| TW340879B (en) | 1998-09-21 |
| JPH10502046A (en) | 1998-02-24 |
| US5879449A (en) | 1999-03-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1094039B1 (en) | Method for manufacturing quartz glass crucible | |
| KR0126239B1 (en) | A number of single crystal growth methods and devices used therein | |
| EP0765406B1 (en) | Improvements in crystal growth | |
| US4944925A (en) | Apparatus for producing single crystals | |
| US4238274A (en) | Method for avoiding undesirable deposits in crystal growing operations | |
| GB2139918A (en) | Crystal growing apparatus | |
| JP3254329B2 (en) | Method and apparatus for producing compound single crystal | |
| US4116642A (en) | Method and apparatus for avoiding undesirable deposits in crystal growing operations | |
| US3819421A (en) | Method for the manufacture of dislocation-free, single-crystal gallium arsenide rod | |
| US10815586B2 (en) | Gallium-arsenide-based compound semiconductor crystal and wafer group | |
| EP0355833B1 (en) | Method of producing compound semiconductor single crystal | |
| JP2024528341A (en) | Device and method for manufacturing single crystal silicon rods | |
| US3929556A (en) | Nucleating growth of lead-tin-telluride single crystal with an oriented barium fluoride substrate | |
| KR20020062971A (en) | Silicon semiconductor single crystal manufacturing apparatus and manufacturing method | |
| JP3569954B2 (en) | Semiconductor crystal growth method | |
| JP3812573B2 (en) | Semiconductor crystal growth method | |
| WO1986006109A1 (en) | Method and apparatus for growing single crystal bodies | |
| JP3492820B2 (en) | Compound semiconductor single crystal manufacturing equipment | |
| US5007979A (en) | Method of fabricating GaAs single crystal | |
| JPH01317188A (en) | Production of single crystal of semiconductor and device therefor | |
| JPS6090897A (en) | Method and apparatus for manufacturing compound semiconductor single crystal | |
| JPH08119784A (en) | Production of compound single crystal and production device therefor | |
| JP3158661B2 (en) | Method and apparatus for producing high dissociation pressure single crystal | |
| JPH03228893A (en) | Method for growing crystal | |
| JPH11189499A (en) | Method for manufacturing compound semiconductor single crystal |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| WWE | Wipo information: entry into national phase |
Ref document number: 95194738.9 Country of ref document: CN |
|
| AK | Designated states |
Kind code of ref document: A1 Designated state(s): CN GB JP KR US |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): AT BE CH DE DK ES FR GB GR IE IT LU MC NL PT SE |
|
| DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| WWE | Wipo information: entry into national phase |
Ref document number: 08750871 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 1995921056 Country of ref document: EP |
|
| WWP | Wipo information: published in national office |
Ref document number: 1995921056 Country of ref document: EP |
|
| WWG | Wipo information: grant in national office |
Ref document number: 1995921056 Country of ref document: EP |