WO1997041632A1 - Electromagnetic actuator and its manufacture - Google Patents
Electromagnetic actuator and its manufacture Download PDFInfo
- Publication number
- WO1997041632A1 WO1997041632A1 PCT/JP1996/001148 JP9601148W WO9741632A1 WO 1997041632 A1 WO1997041632 A1 WO 1997041632A1 JP 9601148 W JP9601148 W JP 9601148W WO 9741632 A1 WO9741632 A1 WO 9741632A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- movable plate
- drive coil
- torsion bar
- coil
- electromagnetic actuator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
- H02K33/18—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with coil systems moving upon intermittent or reversed energisation thereof by interaction with a fixed field system, e.g. permanent magnets
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K99/00—Subject matter not provided for in other groups of this subclass
Definitions
- the present invention relates to an electromagnetic actuator and a method for manufacturing the electromagnetic actuator, which are miniaturized by using semiconductor manufacturing technology, and more particularly to an electromagnetic actuator and an electromagnetic actuator for preventing disconnection of a drive coil for driving a movable plate.
- a conventional electromagnetic actuator of this type will be described below using a planar galvanometer mirror as an example.
- Galvanometer mirrors are used in laser scanners and the like that deflect and scan laser light. The principle is that when a current flows through a movable coil placed in a magnetic field, electromagnetic force is generated in relation to the current and magnetic flux. This generates a torque (torque) proportional to the current.
- the moving coil rotates to an angle where the torque and the panel force are balanced, and the pointer is swung through the moving coil to detect the presence or absence of current and the magnitude of the current.
- a reflecting mirror is provided on a shaft that rotates integrally with the movable coil.
- a moving iron piece is used in place of a moving coil placed in a magnetic field, and a magnetic path is formed by two permanent magnets and a magnetic material provided with four magnetic poles around it. Is configured.
- the reflecting mirror is swung through the movable iron piece.
- scans polarized laser light for example, see Kyoritsu Shuppan Co., Ltd. “Practical Laser Technology”, P210-212, published on January 10, 1987, etc.
- the present inventors have proposed the above-mentioned ultra-small and thin planar type galvano mirror.
- This planar galvano mirror has a flat movable plate on a silicon substrate, and a movable plate that can swing vertically with respect to the silicon substrate at the center position of the movable plate.
- the torsion bar that supports the shaft is integrally formed.
- a plane coil for generating a magnetic field by energization is provided at the peripheral edge of the upper surface of the movable plate, and a total reflection mirror is provided at the center of the upper surface of the movable plate surrounded by the planar coil.
- a pair of electrode terminals is provided on the side of the silicon substrate that supports the movable plate, and is electrically connected to the planar coil via the toy chamber portion.
- a pair of permanent magnets is fixed around the movable plate so that a static magnetic field acts on a flat coil portion on the opposite side of the movable plate parallel to the axial direction of the torsional bar.
- a pair of permanent magnets is arranged above and below each of the opposite sides of the movable portion, and a static magnetic field generated between the pair of permanent magnets crosses the drive coil in a predetermined direction.
- a magnetic field is formed by a permanent magnet in a direction crossing the plane coil along the plane of the movable plate.
- the current and magnetic flux density are applied to both ends of the movable plate in accordance with the current density and magnetic flux density of the planar coil in the direction according to the left-hand rule of framing of force
- a magnetic force acts on the movable plate to rotate the movable plate.
- the torsion bar is twisted to generate a spring reaction force, and the movable plate rotates to a position where the magnetic force and the panel reaction force are balanced. Since the rotation angle of the movable plate is proportional to the current flowing through the planar coil, the rotation angle of the movable plate can be controlled by controlling the current flowing through the planar coil.
- the reflection direction of the laser beam incident on the total reflection mirror can be freely controlled, and the displacement angle of the total reflection mirror can be continuously and repeatedly operated. For example, scanning of laser light can be performed.
- a frame-shaped outer movable plate which is pivotally supported on a silicon substrate via a first torsion bar, and a second torsion bar whose axial direction is orthogonal to the first torsion bar.
- a two-axis galvanomirror with a flat inner movable plate supported by a movable plate and a total internal reflection mirror in the center of the upper surface of the inner movable plate.
- the wiring for connecting the planar coil provided on the upper surface of the movable plate to the electrode terminal on the silicon substrate side supporting the movable plate is conventionally composed of one axis and two wires.
- patterning is performed on the torsion bar.
- the metal material of the planar coil may break due to metal fatigue due to the repeated torsional motion of the torsion bar when the movable plate is driven, and the galvanomirror may be damaged by the fatigue strength of the planar coil.
- the problem is that the service life is determined.
- An object of the present invention is to provide an electromagnetic actuator and a method of manufacturing the same without causing any trouble.
- a movable plate and a torsion bar for pivotally supporting the movable plate with respect to the semiconductor substrate are integrally formed on the semiconductor substrate, and a drive coil provided on a peripheral portion of the movable plate.
- at least a part of the torsion bar is formed to be conductive, and an external power supply and a drive coil are electrically connected through the conductive region.
- the electric wiring of the metal having the polycrystalline structure is eliminated in the torsion bar part, the disconnection failure of the electric wiring due to the metal fatigue caused by the torsional motion of the torsion bar is eliminated. Since the semiconductor substrate used here has a single crystal structure, its life is semi-permanent if used within the elastic limit. Therefore, the life of the electromagnetic actuator can be extended.
- the entire torsion chamber is preferably made conductive.
- a reflecting mirror is provided at the center of the movable plate surrounded by the driving coil to form a galvanomirror, a very small and thin galvanomirror can be provided.
- the movable plate includes a frame-shaped outer movable plate and a flat inner movable plate
- the torsion bar includes a first torsion bar for supporting the outer movable plate on a semiconductor substrate and the first torsion bar.
- a second torsion bar having an axial direction orthogonal to the torsion bar and supporting the inner movable plate inside the outer movable plate; a first drive coil provided on an upper surface of the outer movable plate;
- a second drive coil is provided at a peripheral portion of the upper surface of the inner movable plate, and the second drive coil is provided at a central portion of the inner movable plate surrounded by the second drive coil.
- the galvano mirror was constructed with a reflector.
- a galvano mirror having a two-axis structure can be formed, and there is an advantage that deflection scanning of laser light or the like can be performed two-dimensionally.
- the first and second tone chambers are divided into two parts which are close to each other and electrically insulated from each other and are made conductive.
- a method for manufacturing an electromagnetic actuator comprising a step of forming a drive coil around the upper surface of a plate and a step of fixing a magnetic field generating means for applying a static magnetic field to the drive coil, only a portion where a tone ymber is formed is reduced.
- a movable plate is formed by the anisotropic etching, and when forming a drive coil, both ends of the conductive region are simultaneously formed. Then, an electrode terminal portion for connecting the conductive region to the external power supply side and the drive coil side is formed.
- any one of boron, aluminum, gallium and indium is used as the P-type impurity.
- the portion where the torsion bar is formed has a high concentration of a P-type impurity such as boron, aluminum, gallium or indium, and diffuses the conductive region.
- a P-type impurity such as boron, aluminum, gallium or indium
- the etching speed is extremely low with a specific etchant. As a result, the torsion bar forming portion remains, and a torsion bar having a conductive region can be formed.
- the volume resistivity of the conductive region of the torsion bar thus formed is
- a planar ultra-small and thin galvano mirror can be formed.
- FIG. 1 is a configuration diagram showing a first embodiment of an electromagnetic factory according to the present invention.
- FIG. 2, c 3 FIG is a configuration diagram of Toshi Yo members portion of the same first embodiment is an explanatory view of a manufacturing step of the same first embodiment.
- FIG. 4 is a configuration diagram showing a second embodiment of the present invention.
- FIG. 5 is a configuration diagram of a torsion bar portion of the first embodiment of the same.
- C FIG. 6 is a configuration diagram of a main part of a third embodiment of the present invention.
- FIGS. 1 and 2 show the configuration of a first embodiment in which the present invention is applied to a one-axis galvanomirror as an electromagnetic actuator according to the present invention.
- a galvanomirror 1 has upper and lower glass substrates 3 and 4 made of, for example, glass borate, as shown by arrows in the figure, respectively, on upper and lower surfaces of a silicon substrate 2. Anodically bonded to form a three-layer structure.
- Each of the glass substrates 3 and 4 has a structure in which grooves 3 A and 4 A formed by, for example, ultrasonic processing are provided at the center, thereby forming the silicon substrate 2 on the silicon substrate 2 described later.
- the movable space for the movable plate 5 is secured.
- the silicon substrate 2 has the above-mentioned flat plate-shaped movable plate 5 and a movable plate 5 pivotally supported at a center position of the movable plate 5 so as to be vertically swingable with respect to the silicon substrate 2.
- the conductive torsion bars 6, 6, which are a feature of the present invention, are integrally formed by anisotropic etching. The configuration of the torsion bars 6, 6 will be described later in detail with reference to FIG.
- a copper thin film that generates a magnetic field when energized is The planar coil 7 and the electrode terminal 31 as the drive coil of the film are formed by using an electrode coil method or the like. At the center of the upper surface of the movable plate 5 surrounded by the plane coil 7, a total reflection mirror 8 as a reflecting mirror is formed by aluminum vapor deposition. A pair of electrode terminals electrically connected to the electrode terminals 31 of the planar coil 7 via the torsion bars 6 and 6 are provided on the upper side surfaces of the torsion bars 6 and 6 of the silicon substrate 2. 9 and 9 are formed by an electric coil method or the like.
- Circular permanent magnets 10A, 10B and 11A, 11B are provided on the left and right sides of the upper and lower glass substrates 3 and 4 in the drawing.
- the permanent magnets 10A and 10B forming a pair are provided so that, for example, the lower side has an N pole and the upper side has an S pole.
- the permanent magnets 11A and 11B forming a pair have a lower S pole and an upper N pole. It is provided to be a pole.
- the permanent magnets 10A, 10B and 11A, 11B correspond to static magnetic field generating means.
- P-type impurities for example, boron are diffused at a high concentration, so that the entire tone bar 6 has conductivity.
- an electrode terminal 9 for electrically connecting to an external power supply (not shown) is formed in a conductive region shown by a broken line in the figure. Is done.
- an electrode terminal 31 for electrically connecting to the planar coil 7 on the movable plate 5 is provided in a conductive region shown by a broken line in the figure. Is formed.
- the planar coil 7 is a conductive transistor. 6 is electrically connected to an external power supply to supply current.
- the impurity concentration of boron is about 10 2 e / cm 3
- the volume resistivity of the conductive region of the torsion bar 16 is about 10 3 ⁇ cm, and Since it is extremely low and has high conductivity compared to 2.3 ⁇ 10 5 which is the volume resistivity of the intrinsic semiconductor, it can sufficiently function as a current path. In this way, if the torsion bar 6 is made conductive and a current is supplied to the planar coil 7 via the tone yomb 6 itself, a metal wiring pattern of a polycrystalline structure is provided on the torsion bar 6.
- the principle of operation of the galvanomirror according to the present embodiment is the same as that of the conventional art, and a description thereof will be omitted.
- the upper and lower surfaces of the silicon substrate 101 are thermally oxidized to form an oxide film 102 (step a).
- Step b the oxide film in the portion where the tone ymber is formed on the surface side is removed to form holes 103 for impurity diffusion (step b), and boron is diffused at a high concentration from the holes to form conductive regions 104. Yes (Step c).
- Thermal oxidation is performed at 1100 ° C. for 1 hour to form an oxide film on the conductive region 104 (d step), and then a SiO 2 film is formed thereon by sputtering (e step).
- a pattern of a through hole is formed on the back surface by photolithography, an oxide film in the portion of the through hole 105 is removed by etching (step f), and anisotropic etching is performed in the portion of the through hole 105.
- the movable plate 5 parts Is formed the conductive region 104 is not etched by the P + etch stop action, and the conductive transistor 16 composed of the conductive region 104 is formed at the same time (step g).
- Al (A1), gallium (Ga), indium (In), or the like is used instead of boron (B) as the P-type impurity, the P + etch stop effect can be obtained. Can be used.
- phosphorus (P), arsenic (A s), antimony (S b), bismuth (B i ) Etc. can be used.
- the contact hole 106 is formed by removing the oxide film at the electrode terminal formation portion (step h).
- step i the planar coil 7 and the electrode terminals 9 and 31 are formed on the surface-side oxide film 102 by a conventionally known electrode coil method.
- nickel is sputtered on the surface side of the silicon substrate 101 to form a nickel layer, and a copper layer is formed by electrolytic plating or spattering.
- the portions corresponding to the planar coil and the electrode terminals are masked with a positive type resist, copper etching and nickel etching are sequentially performed, the resist is removed after etching, and copper electrolytic plating is performed.
- the entire circumference of the nickel layer is covered with copper to form a copper layer corresponding to the plane coil and the electrode terminals.
- a negative-type plating resist is applied to a portion excluding the copper layer, and then copper electroplating is performed to thicken the copper layer to form a planar coil and electrode terminals.
- an insulating layer 107 made of, for example, photosensitive polyimide is formed to insulate the second-layer planar coil.
- This insulating layer 107 is formed excluding the electrode terminal portion and the coil connection portion between the first layer and the second layer (step j).
- a second-layer planar coil is again formed on the insulating layer 107 by the electric coil method (k step), and an insulating layer 107 of photosensitive polyimide or the like is formed thereon (1). Process).
- the upper glass substrate 3 and the lower glass substrate 4 are connected to the upper and lower surfaces of the silicon substrate by anodic bonding, respectively, and permanent magnets are provided at predetermined positions of the upper and lower glass substrates 3 and 4. Attach.
- FIGS. 4 and 5 show a configuration of a second embodiment in which the electromagnetic actuator of the present invention is applied to a galvano mirror having a two-axis structure.
- the same elements as those in the first embodiment are denoted by the same reference numerals.
- the two-axis galvanometer mirror 20 includes a movable plate 5 of the silicon substrate 2, a frame-shaped outer movable plate 5 A, and a flat inner movable plate 5 B.
- the outer movable plate 5A is pivotally supported on the silicon substrate 2 by first torsion bars 6A, 6A.
- the inner movable plate 5B is supported on the outer movable plate 5A by second torsion bars 6B, 6B formed orthogonal to the first torsion bars 6B, 6B. Is done.
- an electrode terminal electrically connected to a pair of outer electrode terminals 9A, 9A on the silicon substrate 2 through one portion of the first torsion bar 6A.
- Electrode terminal 41 electrically connected to the inner electrode terminals 9 B, 9 B on the substrate 2 and a planar coil 7 B as a second drive coil (in the figure, a single line is typically used except for the vicinity of the electrode terminals).
- Is provided, and a total reflection mirror 8 is formed at the center.
- it is connected to the planar coil 7B of the inner movable plate 5B via the second torsion bar 6B.
- Electrode terminal 42 is formed at the coil wiring end of the outer movable plate 5 A part
- the upper and lower glass substrates 3 and 4 each have a pair of two permanent magnets as a means for generating a static magnetic field of eight pairs each.
- 10A to 13A and 10B to 13B are arranged as shown.
- the permanent magnets 10A, 10B and 11A, 11B generate a magnetic field for driving the outer movable plate
- the permanent magnets 12A, 12B and 13A, 13B generate a magnetic field for driving the inner movable plate. is there.
- FIG. 5 shows the structure of the first and second torsion bars 6A and 6B of the second embodiment. Note that, since each of the tone members 6A and 6B have the same configuration, here, a toy joint for connecting the flat coil 7A on the outer movable plate 5A side to the electrode terminal 9A is used. The members are explained.
- conductive regions 104 and 104 are formed at the portion of the tone chamber 6A by diffusion and two impurities being insulated from each other in parallel and spaced apart from each other.
- each conductive region 104 should be approximately 50 m for the tone chamber 6 A having a width of approximately 300 ⁇ m, and the two conductive regions are formed by element isolation technology in semiconductor manufacturing technology. It is possible to insulate 104 and 104 from each other, and this can be realized without any problem.
- the second torsion bar 6B for connecting the plane coil 7B on the inner movable plate 5B side to the coil wiring on the outer movable plate 5A has an electrode terminal 9A in FIG.
- the electrode terminal 31 replaces the electrode terminal 41 instead of the electrode terminal 42
- the plane coil 7A merely replaces the plane coil 7B.
- a part may be configured. That is, the intermediate portion of the tone chamber 6A is penetrated and divided into two adjacent chambers 6a and 6b, and each of the chambers 6a and 6b is divided into two. In the same manner as in the first embodiment shown in FIG. 2, b is made into a conductive region by diffusing impurities into the whole.
- the spring reaction force characteristic due to the torsion bar is different from the structure with one torsion bar force, and the relationship between the magnetic force and the spring reaction force is different from the case with one torsion bar. It has no effect on the operation as a mirror, has the same effect of preventing coil disconnection as in the first and second embodiments, and can extend the life and improve the reliability of the planar galvano mirror. .
- a conductive region by impurity diffusion may be formed in a part of the transition bar 6 as shown in FIG. Absent.
- the upper and lower glass substrates 3 and 4 are not necessarily required.
- the present invention is applied to a planar galvano mirror as an electromagnetic actuator.
- the present invention can also be applied to an electromagnetic actuator such as the above-mentioned planar electromagnetic relay and a photodetector. Needless to say.
- the torsion bar portion is made conductive and the external power supply and the drive coil are electrically connected through the conductive region of the torsion bar, so that the torsion bar is twisted. Disconnection failure of the coil energizing wiring due to repetitive movement can be prevented, and the durability and reliability of the planar electromagnetic actuator can be improved.
- the present invention can improve the durability of this type of ultra-small planar electromagnetic actuator and can improve the life and reliability of equipment to which this type of planar electromagnetic actuator is applied. The above availability is great.
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Micromachines (AREA)
Description
Claims
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP96912254A EP0836265B1 (en) | 1996-04-26 | 1996-04-26 | Electromagnetic actuator and its manufacture |
| US08/981,245 US5966009A (en) | 1994-12-28 | 1996-04-26 | Electromagnetic actuator and manufacturing method therefor |
| DE69634603T DE69634603T2 (de) | 1996-04-26 | 1996-04-26 | Elektromagnetischer betätiger und verfahren zu seiner herstellung |
| PCT/JP1996/001148 WO1997041632A1 (en) | 1996-04-26 | 1996-04-26 | Electromagnetic actuator and its manufacture |
| KR1019970709300A KR100573709B1 (ko) | 1996-04-26 | 1996-04-26 | 전자엑츄에이터및그제조방법 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/JP1996/001148 WO1997041632A1 (en) | 1996-04-26 | 1996-04-26 | Electromagnetic actuator and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO1997041632A1 true WO1997041632A1 (en) | 1997-11-06 |
Family
ID=14153234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP1996/001148 Ceased WO1997041632A1 (en) | 1994-12-28 | 1996-04-26 | Electromagnetic actuator and its manufacture |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0836265B1 (ja) |
| KR (1) | KR100573709B1 (ja) |
| DE (1) | DE69634603T2 (ja) |
| WO (1) | WO1997041632A1 (ja) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4247254B2 (ja) * | 2006-08-08 | 2009-04-02 | マイクロプレシジョン株式会社 | 電磁駆動型光偏向素子 |
| DE102006038787A1 (de) * | 2006-08-18 | 2008-02-21 | Oc Oerlikon Balzers Ag | Spiegelantrieb für Projektionssysteme |
| US7420449B2 (en) | 2006-08-18 | 2008-09-02 | Oc Oerlikon Balzers Ag | Mirror actuating device for projection systems |
| JP6044943B2 (ja) * | 2011-10-25 | 2016-12-14 | インテル・コーポレーション | アクチュエータ |
| DE102012206280B4 (de) | 2012-04-17 | 2023-12-21 | Robert Bosch Gmbh | Mikromechanisches Bauteil und Herstellungsverfahren für ein mikromechanisches Bauteil |
| DE102012206269B4 (de) | 2012-04-17 | 2023-12-14 | Robert Bosch Gmbh | Mikromechanisches Bauteil und Herstellungsverfahren für ein mikromechanisches Bauteil |
| US11970389B2 (en) | 2018-08-10 | 2024-04-30 | Hamamatsu Photonics K.K. | Actuator device and method for manufacturing actuator device |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60107017A (ja) * | 1983-11-16 | 1985-06-12 | Hitachi Ltd | 光偏向素子 |
| JPH07175005A (ja) * | 1993-12-20 | 1995-07-14 | Nippon Signal Co Ltd:The | プレーナー型ガルバノミラー及びその製造方法 |
| JPH07218857A (ja) * | 1994-01-31 | 1995-08-18 | Masaki Esashi | 変位検出機能を備えたプレーナー型ガルバノミラー及びその製造方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0413975A (ja) * | 1990-05-07 | 1992-01-17 | Nec Corp | 半導体加速度センサ |
| DE4206174C2 (de) * | 1992-02-28 | 1995-06-22 | Bosch Gmbh Robert | Integrierter Sensor aus Silizium |
| JP3435844B2 (ja) * | 1994-03-07 | 2003-08-11 | 株式会社デンソー | 半導体加速度センサ及びその製造方法 |
-
1996
- 1996-04-26 EP EP96912254A patent/EP0836265B1/en not_active Expired - Lifetime
- 1996-04-26 DE DE69634603T patent/DE69634603T2/de not_active Expired - Lifetime
- 1996-04-26 WO PCT/JP1996/001148 patent/WO1997041632A1/ja not_active Ceased
- 1996-04-26 KR KR1019970709300A patent/KR100573709B1/ko not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60107017A (ja) * | 1983-11-16 | 1985-06-12 | Hitachi Ltd | 光偏向素子 |
| JPH07175005A (ja) * | 1993-12-20 | 1995-07-14 | Nippon Signal Co Ltd:The | プレーナー型ガルバノミラー及びその製造方法 |
| JPH07218857A (ja) * | 1994-01-31 | 1995-08-18 | Masaki Esashi | 変位検出機能を備えたプレーナー型ガルバノミラー及びその製造方法 |
Non-Patent Citations (1)
| Title |
|---|
| See also references of EP0836265A4 * |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0836265A1 (en) | 1998-04-15 |
| DE69634603T2 (de) | 2006-02-09 |
| KR100573709B1 (ko) | 2006-09-11 |
| KR19990022831A (ko) | 1999-03-25 |
| EP0836265B1 (en) | 2005-04-13 |
| DE69634603D1 (de) | 2005-05-19 |
| EP0836265A4 (en) | 2000-09-13 |
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