WO1998027251A1 - Apparatus for growing silicon carbide crystals - Google Patents

Apparatus for growing silicon carbide crystals Download PDF

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Publication number
WO1998027251A1
WO1998027251A1 PCT/US1997/021882 US9721882W WO9827251A1 WO 1998027251 A1 WO1998027251 A1 WO 1998027251A1 US 9721882 W US9721882 W US 9721882W WO 9827251 A1 WO9827251 A1 WO 9827251A1
Authority
WO
WIPO (PCT)
Prior art keywords
liner
silicon carbide
cavity
container
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1997/021882
Other languages
French (fr)
Inventor
Robert C. Glass
Walter E. Gaida
Ronald R. Ronallo
Hudson Mcdonald Hobgood
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Northrop Grumman Corp
Original Assignee
Northrop Grumman Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Northrop Grumman Corp filed Critical Northrop Grumman Corp
Priority to AT97950744T priority Critical patent/ATE202601T1/en
Priority to JP52773798A priority patent/JP2001506222A/en
Priority to EP97950744A priority patent/EP0948672B1/en
Priority to DE69705427T priority patent/DE69705427T2/en
Publication of WO1998027251A1 publication Critical patent/WO1998027251A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/36—Carbides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus

Definitions

  • the invention in general relates to crystal growth and more particularly to the production of silicon carbide crystals with improved processability and defect and impurity reduction. Description of related art
  • Silicon carbide is being used extensively as a semiconductor material for various electronic applications.
  • Semiconductor devices of silicon carbide have the ability to operate at higher voltages and temperatures than conventional silicon or gallium arsenide devices thus providing for higher power devices with reduced cooling requirements.
  • Electronic applications for silicon carbide semiconductor devices include compact, low cost airborne, ship and ground radars, aircraft engine and flight controls, electric tank and ship propulsion systems and satellite communications, to name a few.
  • silicon carbide may be used in the field of high definition television, industrial power conditioning, nuclear control and instrumentation and electric vehicle power trains.
  • Pure silicon carbide crystals may be grown in a variety of ways, one of which utilizes a seed crystal of silicon carbide positioned within a furnace which also includes a source of pure silicon carbide. The source is heated to a temperature whereby the silicon carbide sublimates and is deposited upon the seed crystal.
  • the seed crystal is positioned within a container having a growth cavity for the crystal .
  • the container is of a material, such as graphite, which can withstand the temperatures experienced within the furnace .
  • a silicon carbide crystal As silicon carbide is deposited from the source, a silicon carbide crystal, called a boule, is grown within the container and comes into contact with the wall of the growth cavity and may actually fuse with it . After the boule is grown to the desired size, the container is removed from the furnace for separation of the grown crystal. During the separation process the container is physically ground away. Due to the interaction of the crystal periphery with the container, when the boule surface is reached the grinding process must continue at a much slower rate to avoid undue stressing of the crystal . The total grinding operation is a laborious and extremely time consuming process and reduces the total area of the final substrates derived from the boule.
  • the interaction of the boule with the wall of the growth container may cause or contribute to
  • the present invention obviates the tedious grinding of the boule surface, improves crystal purity, and reduces or eliminates various defects.
  • Apparatus for growing silicon carbide crystals in accordance with the present invention includes a crystal growth container which is placed within a crystal growing furnace.
  • the container has a crystal growing cavity which extends along a longitudinal axis and positioned within the cavity is a thermally anisotropic liner surrounding the longitudinal axis.
  • the liner is of a material which will withstand the temperatures encountered in the furnace during crystal growth and in a preferred embodiment the liner is made of pyrolytic graphite and contacts the inner wall of the container.
  • Fig. 1 illustrates, partially in cross section, some basic components of typical crystal growing apparatus utilized for growing silicon carbide boules .
  • Fig. 2 illustrates, in cross section, one embodiment of the present invention.
  • Fig. 3 illustrates the liner, shown in Fig. 2, in more detail.
  • Fig. 4 illustrates, in cross section, an embodiment of the invention for extending the length of the growth cavity .
  • Fig. 5 illustrates, in cross section, another embodiment of the invention.
  • Fig. 1 there is illustrated some basic components utilized in the growing of crystals such as silicon carbide crystals.
  • the crystal is grown in a furnace 10 which is heated to desired temperatures by means of an induction heating system 12.
  • a crystal growth container 14 having a crystal growth cavity 16 which surrounds a longitudinal axis 18.
  • a seed crystal 20 of silicon carbide is affixed at one end of the growth cavity 16 and silicon carbide is deposited thereon such as by vapor deposition, from a source 22 of pure silicon carbide.
  • Fig. 2 illustrates an embodiment of the invention which reduces or eliminates these problems and in addition will allow for experimentation with various factors which affect crystal growth.
  • the apparatus in Fig. 2 includes a crystal growth container 30, similar to that shown in Fig. 1 in having a crystal growth cavity 32 which surrounds a longitudinal axis 34. Positioned within the growth cavity 32 and surrounding the longitudinal axis 34 is a liner 36, which in the embodiment of Fig. 2 contacts the inner wall 38 of the growth cavity 32. For a growth cavity closed at one end, as illustrated, the liner also includes an end cover 40 to which is affixed the seed crystal 42.
  • Fig. 3 show an exploded view of the liner 36.
  • the liner 36 is in the form of a right circular cylinder of length L and of a uniform thickness T.
  • Liner 36 as well as end section 40 are of a material which can withstand the temperatures encountered during crystal growth and has anisotropic properties, particularly thermal anisotropy.
  • One material meeting these requirements is pyrolytic graphite which is a commercially available item having a unique structure formed of parallel layers of pure carbon atoms with a preferred orientation.
  • the layered structure of the liner 36 conducts heat much more efficiently along its length L parallel to the carbon layers, than through the liner wall in the thickness T direction.
  • the pyrolytic graphite liner 36 effectively seals the growth cavity 32 so that there is no vapor transport to the inner wall 38 thus preventing secondary nucleation thereon and reducing vapor losses.
  • the pyrolytic graphite itself has an extremely smooth surface such that no nucleation can occur on it. Since there is virtually no vapor transport out of the growth cavity 32 to the container 30, due to the pyrolytic graphite liner, the sublimated vapor composition may be modified for experimental purposes to see the effects on crystal growth.
  • the structure and composition of the pyrolytic graphite liner 36 also allows for ease of boule removal without the requirement for grinding the boule surface. After normal removal of the growth container 30 material, such as by grinding, the pyrolytic graphite liner 36 merely peels away from the grown boule thus leaving a greater boule volume and without stressing the silicon carbide crystal.
  • the extension 30' includes a growth cavity 32' which is sealed from the extension material by a section of liner 36' of pyrolytic graphite. The extension unit may then be held in position against the open end of growth container 30.
  • the invention also allows for variable heating of the growth cavity. This may be accomplished, as illustrated in Fig. 5, by tailoring the thickness of the pyrolytic graphite liner.
  • Fig. 5 shows, by way of example, a liner 46 wherein the thickness of the wall varies directly with length, although other variations are possible.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Silicon Compounds (AREA)
  • Ceramic Products (AREA)

Abstract

A silicon carbide growth container for placement into a crystal growing furnace. The growth container has a liner of pyrolytic graphite which seals the inside of the container and allows for easy removal of the grown silicon carbide crystal.

Description

APPARATUS FOR GROWING SILICON CARBIDE CRYSTALS
BACKGROUND OF THE INVENTION Field of the invention
The invention in general relates to crystal growth and more particularly to the production of silicon carbide crystals with improved processability and defect and impurity reduction. Description of related art
Silicon carbide is being used extensively as a semiconductor material for various electronic applications. Semiconductor devices of silicon carbide have the ability to operate at higher voltages and temperatures than conventional silicon or gallium arsenide devices thus providing for higher power devices with reduced cooling requirements. Electronic applications for silicon carbide semiconductor devices include compact, low cost airborne, ship and ground radars, aircraft engine and flight controls, electric tank and ship propulsion systems and satellite communications, to name a few. In the commercial sector, silicon carbide may be used in the field of high definition television, industrial power conditioning, nuclear control and instrumentation and electric vehicle power trains.
Pure silicon carbide crystals may be grown in a variety of ways, one of which utilizes a seed crystal of silicon carbide positioned within a furnace which also includes a source of pure silicon carbide. The source is heated to a temperature whereby the silicon carbide sublimates and is deposited upon the seed crystal. In one process, the seed crystal is positioned within a container having a growth cavity for the crystal . The container is of a material, such as graphite, which can withstand the temperatures experienced within the furnace .
As silicon carbide is deposited from the source, a silicon carbide crystal, called a boule, is grown within the container and comes into contact with the wall of the growth cavity and may actually fuse with it . After the boule is grown to the desired size, the container is removed from the furnace for separation of the grown crystal. During the separation process the container is physically ground away. Due to the interaction of the crystal periphery with the container, when the boule surface is reached the grinding process must continue at a much slower rate to avoid undue stressing of the crystal . The total grinding operation is a laborious and extremely time consuming process and reduces the total area of the final substrates derived from the boule.
In addition, the interaction of the boule with the wall of the growth container may cause or contribute to
(a)undesired formation of secondary silicon carbide grains nucleated on the container wall, as well as (b)low angle boundaries which are misorientations of local areas of the substrate.
The present invention obviates the tedious grinding of the boule surface, improves crystal purity, and reduces or eliminates various defects. SUMMARY OF THE INVENTION
Apparatus for growing silicon carbide crystals in accordance with the present invention includes a crystal growth container which is placed within a crystal growing furnace. The container has a crystal growing cavity which extends along a longitudinal axis and positioned within the cavity is a thermally anisotropic liner surrounding the longitudinal axis. The liner is of a material which will withstand the temperatures encountered in the furnace during crystal growth and in a preferred embodiment the liner is made of pyrolytic graphite and contacts the inner wall of the container.
BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 illustrates, partially in cross section, some basic components of typical crystal growing apparatus utilized for growing silicon carbide boules .
Fig. 2 illustrates, in cross section, one embodiment of the present invention.
Fig. 3 illustrates the liner, shown in Fig. 2, in more detail.
Fig. 4 illustrates, in cross section, an embodiment of the invention for extending the length of the growth cavity .
Fig. 5 illustrates, in cross section, another embodiment of the invention. DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring now to Fig. 1 there is illustrated some basic components utilized in the growing of crystals such as silicon carbide crystals. The crystal is grown in a furnace 10 which is heated to desired temperatures by means of an induction heating system 12. Within the furnace 10 there is located a crystal growth container 14 having a crystal growth cavity 16 which surrounds a longitudinal axis 18. A seed crystal 20 of silicon carbide is affixed at one end of the growth cavity 16 and silicon carbide is deposited thereon such as by vapor deposition, from a source 22 of pure silicon carbide. As the silicon carbide crystal grows in length in the cavity 16 it also contacts the inner wall 24 of the container 14, which is usually of a graphite material, and may actually fuse with the wall. As previously brought out, this fusion presents various processability, defect and impurity problems . Fig. 2 illustrates an embodiment of the invention which reduces or eliminates these problems and in addition will allow for experimentation with various factors which affect crystal growth.
The apparatus in Fig. 2 includes a crystal growth container 30, similar to that shown in Fig. 1 in having a crystal growth cavity 32 which surrounds a longitudinal axis 34. Positioned within the growth cavity 32 and surrounding the longitudinal axis 34 is a liner 36, which in the embodiment of Fig. 2 contacts the inner wall 38 of the growth cavity 32. For a growth cavity closed at one end, as illustrated, the liner also includes an end cover 40 to which is affixed the seed crystal 42.
Fig. 3 show an exploded view of the liner 36. For a cylindrical growth cavity 32 the liner 36 is in the form of a right circular cylinder of length L and of a uniform thickness T. Liner 36 as well as end section 40 are of a material which can withstand the temperatures encountered during crystal growth and has anisotropic properties, particularly thermal anisotropy. One material meeting these requirements is pyrolytic graphite which is a commercially available item having a unique structure formed of parallel layers of pure carbon atoms with a preferred orientation. Thus in Fig. 3 the layered structure of the liner 36 conducts heat much more efficiently along its length L parallel to the carbon layers, than through the liner wall in the thickness T direction. This produces a more uniform heating along the axial length of the growing silicon carbide boule. The pyrolytic graphite liner 36 effectively seals the growth cavity 32 so that there is no vapor transport to the inner wall 38 thus preventing secondary nucleation thereon and reducing vapor losses. The pyrolytic graphite itself has an extremely smooth surface such that no nucleation can occur on it. Since there is virtually no vapor transport out of the growth cavity 32 to the container 30, due to the pyrolytic graphite liner, the sublimated vapor composition may be modified for experimental purposes to see the effects on crystal growth. The structure and composition of the pyrolytic graphite liner 36 also allows for ease of boule removal without the requirement for grinding the boule surface. After normal removal of the growth container 30 material, such as by grinding, the pyrolytic graphite liner 36 merely peels away from the grown boule thus leaving a greater boule volume and without stressing the silicon carbide crystal.
If a longer boule is to be grown than can be accomodated by the length of growth cavity 32 then an extension portion may be added as illustrated in Fig. 4. The extension 30' includes a growth cavity 32' which is sealed from the extension material by a section of liner 36' of pyrolytic graphite. The extension unit may then be held in position against the open end of growth container 30.
In addition to being able to experiment with different vapor compositions, the invention also allows for variable heating of the growth cavity. This may be accomplished, as illustrated in Fig. 5, by tailoring the thickness of the pyrolytic graphite liner. Fig. 5 shows, by way of example, a liner 46 wherein the thickness of the wall varies directly with length, although other variations are possible.

Claims

What is claimed is:
1. Apparatus for use in the growth of silicon carbide crystals, comprising: (a) a crystal growth container for placement in a crystal growing furnace;
(b) said container having a crystal growing cavity which extends along a longitudinal axis; and
(c) a thermally anisotropic liner disposed within said cavity surrounding said longitudinal axis .
2. Apparatus according to claim 1 wherein:
(a) said liner is made of pyrolytic graphite.
3. Apparatus according to claim 1 wherein:
(a) said liner is symmetrically disposed around said longitudinal axis .
4. Apparatus according to claim 3 wherein: (a) said liner is cylindrical.
5. Apparatus according to claim 1 wherein:
(a) said liner contacts the wall of said cavity.
6. Apparatus according to claim 2 wherein: (a) said cavity is closed at one end and said liner includes an end portion of pyrolytic graphite.
7. Apparatus according to claim 1 which includes :
(a) a cavity extension having an opening extending along a longitudinal axis :
(b) a thermally anisotropic liner positioned within said opening,-
(c) said cavity extension being positioned against one end of said container.
8. Apparatus according to claim 1 wherein:
(a) said liner has a thickness which varies along the length thereof.
PCT/US1997/021882 1996-12-18 1997-11-20 Apparatus for growing silicon carbide crystals Ceased WO1998027251A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AT97950744T ATE202601T1 (en) 1996-12-18 1997-11-20 DEVICE FOR GROWING SILICON CARBIDE SINGLE CRYSTALS
JP52773798A JP2001506222A (en) 1996-12-18 1997-11-20 Equipment for silicon carbide crystal growth
EP97950744A EP0948672B1 (en) 1996-12-18 1997-11-20 Apparatus for growing silicon carbide crystals
DE69705427T DE69705427T2 (en) 1996-12-18 1997-11-20 DEVICE FOR BREEDING SILICON CARBIDE CRYSTALS

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/769,090 1996-12-18
US08/769,090 US5667587A (en) 1996-12-18 1996-12-18 Apparatus for growing silicon carbide crystals

Publications (1)

Publication Number Publication Date
WO1998027251A1 true WO1998027251A1 (en) 1998-06-25

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PCT/US1997/021882 Ceased WO1998027251A1 (en) 1996-12-18 1997-11-20 Apparatus for growing silicon carbide crystals

Country Status (6)

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US (1) US5667587A (en)
EP (1) EP0948672B1 (en)
JP (1) JP2001506222A (en)
AT (1) ATE202601T1 (en)
DE (1) DE69705427T2 (en)
WO (1) WO1998027251A1 (en)

Cited By (1)

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JP2002520252A (en) * 1998-07-14 2002-07-09 シーメンス アクチエンゲゼルシヤフト Method for producing SiC single crystal

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US5989340A (en) * 1995-11-14 1999-11-23 Siemens Aktiengesellschaft Process and device for sublimation growing of silicon carbide monocrystals
WO2001004389A1 (en) * 1999-07-07 2001-01-18 Siemens Aktiengesellschaft Sic monocrystal sublimation growth device with a film-covered crucible
JP2003527298A (en) * 2000-03-13 2003-09-16 トゥー‐シックス・インコーポレイテッド Fabrication of large single crystal seed crystals by mutual growth of tiled seed crystals
ATE509147T1 (en) * 2000-03-13 2011-05-15 Ii Vi Inc DEVICE FOR AXIAL GRADIENT TRANSPORT AND METHOD FOR PRODUCING LARGE-FORMAT SILICON CARBIDE SINGLE CRYSTALS
US6896738B2 (en) * 2001-10-30 2005-05-24 Cree, Inc. Induction heating devices and methods for controllably heating an article
GB2393500B (en) * 2003-01-29 2004-09-08 Morgan Crucible Co Induction furnaces and components
JP4480349B2 (en) * 2003-05-30 2010-06-16 株式会社ブリヂストン Method and apparatus for producing silicon carbide single crystal
US7608524B2 (en) * 2005-04-19 2009-10-27 Ii-Vi Incorporated Method of and system for forming SiC crystals having spatially uniform doping impurities
US8361227B2 (en) * 2006-09-26 2013-01-29 Ii-Vi Incorporated Silicon carbide single crystals with low boron content
US8858709B1 (en) 2006-04-11 2014-10-14 Ii-Vi Incorporated Silicon carbide with low nitrogen content and method for preparation
US7767022B1 (en) 2006-04-19 2010-08-03 Ii-Vi Incorporated Method of annealing a sublimation grown crystal
CN101680112A (en) * 2007-01-16 2010-03-24 Ii-Vi有限公司 Diameter-guided SiC sublimation growth with multilayer growth guides
KR100970319B1 (en) * 2007-07-24 2010-07-15 신에쓰 가가꾸 고교 가부시끼가이샤 Furnaces for manufacturing glass base materials or optical fibers
WO2009026269A1 (en) * 2007-08-20 2009-02-26 Ii-Vi Incorporated Stabilizing 4h polytype during sublimation growth of sic single crystals
DE112009003667B4 (en) * 2008-12-08 2024-04-25 Ii-Vi Inc. IMPROVED AXIAL GRADIENT TRANSPORT (AGT) GROWTH METHOD AND APPARATUS USING RESISTIVE HEATING
EP2411569B1 (en) 2009-03-26 2021-09-22 II-VI Incorporated Sic single crystal sublimation growth method and apparatus
US9322110B2 (en) 2013-02-21 2016-04-26 Ii-Vi Incorporated Vanadium doped SiC single crystals and method thereof
JP2015040146A (en) * 2013-08-22 2015-03-02 三菱電機株式会社 Single crystal production device and single crystal production method using the same
US9580837B2 (en) 2014-09-03 2017-02-28 Ii-Vi Incorporated Method for silicon carbide crystal growth by reacting elemental silicon vapor with a porous carbon solid source material
WO2017053883A1 (en) 2015-09-24 2017-03-30 Melior Innovations, Inc. Vapor deposition apparatus and techniques using high purity polymer derived silicon carbide
EP4269667A4 (en) * 2021-03-31 2024-05-29 Sec Carbon, Ltd. SIC SINGLE CRYSTAL GROWTH DEVICE AND SIC CRYSTAL GROWTH METHOD

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Also Published As

Publication number Publication date
DE69705427T2 (en) 2001-10-18
US5667587A (en) 1997-09-16
JP2001506222A (en) 2001-05-15
EP0948672A1 (en) 1999-10-13
EP0948672B1 (en) 2001-06-27
ATE202601T1 (en) 2001-07-15
DE69705427D1 (en) 2001-08-02

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