WO1999010563A3 - Verfahren und vorrichtung zum energiesparenden gleichzeitigen elektrolytischen behandeln von mehreren werkstücken - Google Patents

Verfahren und vorrichtung zum energiesparenden gleichzeitigen elektrolytischen behandeln von mehreren werkstücken Download PDF

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Publication number
WO1999010563A3
WO1999010563A3 PCT/DE1998/002501 DE9802501W WO9910563A3 WO 1999010563 A3 WO1999010563 A3 WO 1999010563A3 DE 9802501 W DE9802501 W DE 9802501W WO 9910563 A3 WO9910563 A3 WO 9910563A3
Authority
WO
WIPO (PCT)
Prior art keywords
workpieces
energy saving
electrolytic treatment
partial cells
several workpieces
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE1998/002501
Other languages
English (en)
French (fr)
Other versions
WO1999010563A2 (de
Inventor
Helmut Stiegler
Jens Maschmeyer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Atotech Deutschland GmbH and Co KG
Original Assignee
Atotech Deutschland GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland GmbH and Co KG filed Critical Atotech Deutschland GmbH and Co KG
Priority to EP98951217A priority Critical patent/EP1015671A2/de
Priority to JP2000507865A priority patent/JP2001514329A/ja
Publication of WO1999010563A2 publication Critical patent/WO1999010563A2/de
Publication of WO1999010563A3 publication Critical patent/WO1999010563A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C25D17/08—Supporting racks, i.e. not for suspending

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

Die Erfindung betrifft eine Vorrichtung und ein Verfahren zum energiesparenden gleichzeitigen elektrolytischen Behandeln mehrerer als Elektroden geschalteter Werkstücke mit jeweils gleichem Elektrolysestrom. Die Vorrichtung weist mindestens zwei elektrolytische Teilzellen in einem Badbehälter und mindestens eine Stromquelle zum Speisen der Teilzellen mit Elektrolysestrom auf. Die Teilzellen weisen wiederum zur elektrischen Kontaktierung dienende Halterungen und daran gehaltene Werkstücke sowie mindestens je eine Gegenelektrode auf. Beim Galvanisieren der Werkstücke werden die Werkstücke als Kathoden und die Gegenelektroden als Anoden geschaltet; beim elektrolytischen Ätzen/Entmetallisieren werden die Werkstücke als Anoden und die Gegenelektroden als Kathoden geschaltet.
PCT/DE1998/002501 1997-08-21 1998-08-19 Verfahren und vorrichtung zum energiesparenden gleichzeitigen elektrolytischen behandeln von mehreren werkstücken Ceased WO1999010563A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP98951217A EP1015671A2 (de) 1997-08-21 1998-08-19 Verfahren und vorrichtung zum energiesparenden gleichzeitigen elektrolytischen behandeln von mehreren werkstücken
JP2000507865A JP2001514329A (ja) 1997-08-21 1998-08-19 多数の被加工品を省エネで同時に電気分解的に処理するための方法と装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE1997136351 DE19736351C1 (de) 1997-08-21 1997-08-21 Verfahren und Vorrichtung zum präzisen Galvanisieren von Werkstücken
DE19736351.2 1997-08-21

Publications (2)

Publication Number Publication Date
WO1999010563A2 WO1999010563A2 (de) 1999-03-04
WO1999010563A3 true WO1999010563A3 (de) 1999-08-19

Family

ID=7839697

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE1998/002501 Ceased WO1999010563A2 (de) 1997-08-21 1998-08-19 Verfahren und vorrichtung zum energiesparenden gleichzeitigen elektrolytischen behandeln von mehreren werkstücken

Country Status (4)

Country Link
EP (1) EP1015671A2 (de)
JP (1) JP2001514329A (de)
DE (1) DE19736351C1 (de)
WO (1) WO1999010563A2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10141056C2 (de) * 2001-08-22 2003-12-24 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum elektrolytischen Behandeln von elektrisch leitfähigen Schichten in Durchlaufanlagen
DE102005032738B3 (de) * 2005-07-08 2006-11-23 Siemens Ag Verfahren und Vorrichtung zum Bearbeiten wenigstens zweier Werkstücke mittels elektrochemischer Behandlung
US8062496B2 (en) * 2008-04-18 2011-11-22 Integran Technologies Inc. Electroplating method and apparatus
US11542626B2 (en) * 2020-10-08 2023-01-03 Honeywell International Inc. Systems and methods for enclosed electroplating chambers
US11834752B2 (en) * 2021-04-28 2023-12-05 Honeywell International Inc. Electroplating systems and methods for wear-resistant coatings
CN118856207B (zh) * 2024-07-26 2025-05-23 沈阳欧施盾新材料科技有限公司 一种复合材料缠绕气瓶的金属内衬层的消除装置及消除方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3909368A (en) * 1974-07-12 1975-09-30 Louis W Raymond Electroplating method and apparatus
JPS5928597A (ja) * 1982-08-05 1984-02-15 Ibiden Co Ltd 炭素電極棒の電気メッキ方法及びそのメッキ装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1800954A1 (de) * 1968-10-03 1970-06-11 Siemens Ag Kupferbad-Wanne
DE3732476A1 (de) * 1987-09-24 1989-04-13 Schering Ag Verfahren zur angleichung der teilstroeme in einem elektrolytischen bad

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3909368A (en) * 1974-07-12 1975-09-30 Louis W Raymond Electroplating method and apparatus
JPS5928597A (ja) * 1982-08-05 1984-02-15 Ibiden Co Ltd 炭素電極棒の電気メッキ方法及びそのメッキ装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Section Ch Week 8413, Derwent World Patents Index; Class L03, AN 84-077814, XP002107524 *

Also Published As

Publication number Publication date
JP2001514329A (ja) 2001-09-11
DE19736351C1 (de) 1998-10-01
EP1015671A2 (de) 2000-07-05
WO1999010563A2 (de) 1999-03-04

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