WO2000003301A3 - Exposure device having a planar motor - Google Patents

Exposure device having a planar motor Download PDF

Info

Publication number
WO2000003301A3
WO2000003301A3 PCT/US1999/015278 US9915278W WO0003301A3 WO 2000003301 A3 WO2000003301 A3 WO 2000003301A3 US 9915278 W US9915278 W US 9915278W WO 0003301 A3 WO0003301 A3 WO 0003301A3
Authority
WO
WIPO (PCT)
Prior art keywords
armature coils
movable member
supplied
electric current
planar motor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1999/015278
Other languages
French (fr)
Other versions
WO2000003301A2 (en
WO2000003301A9 (en
Inventor
Andrew J Hazelton
Keiichi Tanaka
John K Eaton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to EP99933725A priority Critical patent/EP1064713A4/en
Priority to AU49720/99A priority patent/AU4972099A/en
Publication of WO2000003301A2 publication Critical patent/WO2000003301A2/en
Publication of WO2000003301A3 publication Critical patent/WO2000003301A3/en
Publication of WO2000003301A9 publication Critical patent/WO2000003301A9/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
    • H02K2201/18—Machines moving with multiple degrees of freedom

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Epidemiology (AREA)
  • Electromagnetism (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Power Engineering (AREA)
  • Public Health (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Linear Motors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Motor Or Generator Cooling System (AREA)

Abstract

Disclosed is a planar motor device capable of effectively restraining thermal influence on the environment. When an electric current is supplied to armature coils (38) opposed to the magnet of a movable member (51), the movable member (51) is driven along a movement surface (21a) by electromagnetic force. When the movable member (51) is continued to be driven in a certain direction, electric current is supplied to the armature coils (38) opposed to the magnet for each movement position of the movable member (51), whereby the armature coils (38) supplied with electric current generate heat. The armature coils (38) are accommodated in a vacuum chamber (41) in a base (21), and are arranged so as to be in contact with a stator yoke (43), with a predetermined gap being defined between them and a ceramic plate (36) forming the vacuum chamber (41). Thus, the heat transmission from the armature coils (38) to the movement surface (21a) side is effected substantially by radiation alone, so that it is possible to effectively restrain thermal influence on the environment.
PCT/US1999/015278 1998-07-09 1999-07-07 Exposure device having a planar motor Ceased WO2000003301A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP99933725A EP1064713A4 (en) 1998-07-09 1999-07-07 Exposure device having a planar motor
AU49720/99A AU4972099A (en) 1998-07-09 1999-07-07 Exposure device having a planar motor

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP10/193878 1998-07-09
JP19387898A JP4088728B2 (en) 1998-07-09 1998-07-09 Planar motor device, driving device and exposure device

Publications (3)

Publication Number Publication Date
WO2000003301A2 WO2000003301A2 (en) 2000-01-20
WO2000003301A3 true WO2000003301A3 (en) 2000-03-16
WO2000003301A9 WO2000003301A9 (en) 2000-05-25

Family

ID=16315253

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/015278 Ceased WO2000003301A2 (en) 1998-07-09 1999-07-07 Exposure device having a planar motor

Country Status (4)

Country Link
EP (1) EP1064713A4 (en)
JP (1) JP4088728B2 (en)
AU (1) AU4972099A (en)
WO (1) WO2000003301A2 (en)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6351041B1 (en) 1999-07-29 2002-02-26 Nikon Corporation Stage apparatus and inspection apparatus having stage apparatus
TWI248718B (en) 1999-09-02 2006-02-01 Koninkl Philips Electronics Nv Displacement device
TW588222B (en) * 2000-02-10 2004-05-21 Asml Netherlands Bv Cooling of voice coil motors in lithographic projection apparatus
EP1124161A3 (en) * 2000-02-10 2004-01-07 ASML Netherlands B.V. Lithographic projection apparatus having a temperature controlled heat shield
JP4510419B2 (en) * 2003-10-01 2010-07-21 キヤノン株式会社 Stage apparatus, exposure apparatus, and device manufacturing method
JP4474151B2 (en) 2003-11-28 2010-06-02 キヤノン株式会社 Motor, exposure apparatus using the same, and device manufacturing method
JP4418699B2 (en) * 2004-03-24 2010-02-17 キヤノン株式会社 Exposure equipment
WO2006077511A1 (en) 2005-01-18 2006-07-27 Koninklijke Philips Electronics N.V. Coil assembly for use with an electric motor
JP2006287014A (en) 2005-04-01 2006-10-19 Canon Inc Positioning device and linear motor
JP4673117B2 (en) * 2005-04-08 2011-04-20 キヤノン株式会社 Stage apparatus and exposure apparatus
JP4936368B2 (en) * 2006-11-21 2012-05-23 株式会社リコー Vacuum chamber and electron beam drawing apparatus
DE102007035793A1 (en) 2007-07-04 2009-01-08 Institut für Mikroelektronik- und Mechatronik-Systeme gGmbH Precision planar positioning arrangement for workpiece, has discharging unit for discharging waste heat, so that sandwich structure of stator plate, rotor and auxiliary stator is provided, and measuring device for determining rotor position
US20100156198A1 (en) * 2008-12-22 2010-06-24 Alexander Cooper Shield layer plus refrigerated backside cooling for planar motors
JP5430204B2 (en) 2009-04-01 2014-02-26 キヤノン株式会社 Linear motor, stage apparatus using the same, exposure apparatus, and device manufacturing method
CN102782806A (en) 2010-03-04 2012-11-14 株式会社安川电机 Stage device
JP5632736B2 (en) * 2010-12-27 2014-11-26 キヤノンアネルバ株式会社 Substrate transfer apparatus and vacuum processing apparatus
RU2563967C1 (en) * 2014-07-01 2015-09-27 Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" Linear pulse motor of executive mechanism of nuclear reactor control and protection
WO2019233698A1 (en) * 2018-06-05 2019-12-12 Asml Netherlands B.V. Assembly comprising a cryostat and layer of superconducting coils and motor system provided with such an assembly
US12381464B2 (en) 2020-05-20 2025-08-05 Asml Netherlands B.V. Magnet assembly, coil assembly, planar motor, positioning device and lithographic apparatus

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5179304A (en) * 1990-07-26 1993-01-12 Nsk Ltd. Linear motor system
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61189637A (en) * 1985-02-19 1986-08-23 Canon Inc Exposure device
JPH05198490A (en) * 1992-01-22 1993-08-06 Fujitsu Ltd Charged particle beam exposure system
JP3475973B2 (en) * 1994-12-14 2003-12-10 株式会社ニコン Linear motor, stage device, and exposure device
JPH08293449A (en) * 1995-04-24 1996-11-05 Nikon Corp Exposure equipment

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5179304A (en) * 1990-07-26 1993-01-12 Nsk Ltd. Linear motor system
US5196745A (en) * 1991-08-16 1993-03-23 Massachusetts Institute Of Technology Magnetic positioning device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1064713A4 *

Also Published As

Publication number Publication date
JP2000032733A (en) 2000-01-28
WO2000003301A2 (en) 2000-01-20
AU4972099A (en) 2000-02-01
JP4088728B2 (en) 2008-05-21
EP1064713A2 (en) 2001-01-03
WO2000003301A9 (en) 2000-05-25
EP1064713A4 (en) 2005-07-20

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