WO2000016163A3 - Method and apparatus for developing photoresist patterns - Google Patents

Method and apparatus for developing photoresist patterns Download PDF

Info

Publication number
WO2000016163A3
WO2000016163A3 PCT/US1999/020115 US9920115W WO0016163A3 WO 2000016163 A3 WO2000016163 A3 WO 2000016163A3 US 9920115 W US9920115 W US 9920115W WO 0016163 A3 WO0016163 A3 WO 0016163A3
Authority
WO
WIPO (PCT)
Prior art keywords
manifold
fluid
developer
rinse
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1999/020115
Other languages
French (fr)
Other versions
WO2000016163A2 (en
Inventor
Emir Gurer
Ed C Lee
Murthy Krishna
Reese Reynolds
John Salois
Royal Cherry
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Priority to EP99945422A priority Critical patent/EP1114355B8/en
Priority to AU58023/99A priority patent/AU5802399A/en
Priority to DE69942913T priority patent/DE69942913D1/en
Priority to JP2000570638A priority patent/JP3708437B2/en
Priority to AT99945422T priority patent/ATE487164T1/en
Publication of WO2000016163A2 publication Critical patent/WO2000016163A2/en
Publication of WO2000016163A3 publication Critical patent/WO2000016163A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/027—Coating heads with several outlets, e.g. aligned transversally to the moving direction of a web to be coated
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02—Spray pistols; Apparatus for discharge
    • B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0884—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point the outlet orifices for jets constituted by a liquid or a mixture containing a liquid being aligned

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)

Abstract

Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polymer layer on a substrate with an initial charge of a developer fluid; then rinsing the polymer with an additional charge of the developer fluid so as to controllably minimize a subsequent sudden change in pH; and then rinsing the polymer with a charge of another fluid. An apparatus for minimizing fluid impingement force on a polymer layer to be developed on a substrate includes: a nozzle including: a developer manifold adapted to supply a developer fluid; a plurality of developer fluid conduits coupled to the developer manifold; a rinse manifold adapted to supply a rinse fluid; and a plurality of rinse fluid conduits coupled to the developer manifold. The developer manifold and the rinse manifold can be staggered so as to reduce an external width of the nozzle compared to a nominal external width of the nozzle achievable without either intersecting the fluid manifold and the another manifold or staggering the fluid manifold and the another manifold. The systems and methods provide advantages including improve yield via reduced process-induced defect and partial counts, and improved critical dimension (CD) control capability.
PCT/US1999/020115 1998-09-17 1999-09-01 Method and apparatus for developing photoresist patterns Ceased WO2000016163A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
EP99945422A EP1114355B8 (en) 1998-09-17 1999-09-01 Method and apparatus for developing photoresist patterns
AU58023/99A AU5802399A (en) 1998-09-17 1999-09-01 Improved yield and line width performance for liquid polymers and other materials
DE69942913T DE69942913D1 (en) 1998-09-17 1999-09-01 METHOD AND DEVICE FOR DEVELOPING PHOTORESIST PATTERNS
JP2000570638A JP3708437B2 (en) 1998-09-17 1999-09-01 Improved yield and linewidth characteristics of liquid polymers and other materials
AT99945422T ATE487164T1 (en) 1998-09-17 1999-09-01 METHOD AND APPARATUS FOR DEVELOPING PHOTORESIST PATTERNS

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US10073898P 1998-09-17 1998-09-17
US60/100,738 1998-09-17
US09/221,060 1998-12-28
US09/221,060 US6248171B1 (en) 1998-09-17 1998-12-28 Yield and line width performance for liquid polymers and other materials

Publications (2)

Publication Number Publication Date
WO2000016163A2 WO2000016163A2 (en) 2000-03-23
WO2000016163A3 true WO2000016163A3 (en) 2000-09-08

Family

ID=26797493

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/020115 Ceased WO2000016163A2 (en) 1998-09-17 1999-09-01 Method and apparatus for developing photoresist patterns

Country Status (9)

Country Link
US (6) US6248171B1 (en)
EP (1) EP1114355B8 (en)
JP (1) JP3708437B2 (en)
KR (1) KR100560180B1 (en)
AT (1) ATE487164T1 (en)
AU (1) AU5802399A (en)
DE (1) DE69942913D1 (en)
TW (1) TWI249657B (en)
WO (1) WO2000016163A2 (en)

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US6689215B2 (en) 1998-09-17 2004-02-10 Asml Holdings, N.V. Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface
US6248171B1 (en) * 1998-09-17 2001-06-19 Silicon Valley Group, Inc. Yield and line width performance for liquid polymers and other materials
US6746826B1 (en) * 2000-07-25 2004-06-08 Asml Holding N.V. Method for an improved developing process in wafer photolithography
WO2003030228A2 (en) * 2001-10-03 2003-04-10 Silicon Valley Group, Inc. Method and apparatus for mitigating cross-contamination between liquid dispensing jets in close proximity to a surface
US7389783B2 (en) * 2002-09-30 2008-06-24 Lam Research Corporation Proximity meniscus manifold
US6770424B2 (en) 2002-12-16 2004-08-03 Asml Holding N.V. Wafer track apparatus and methods for dispensing fluids with rotatable dispense arms
KR100562302B1 (en) * 2003-12-27 2006-03-22 동부아남반도체 주식회사 Random Polymer Removal Using Multi-Chemical Liquid Treatment Steps
EP2017653B1 (en) 2007-01-26 2009-11-18 Sick Ag Optoelectronic sensor and reception method with correction of light interference or stray light
TWI409597B (en) * 2010-08-06 2013-09-21 Inotera Memories Inc Developer spraying device for reducing usage quantity of developer
US9120190B2 (en) 2011-11-30 2015-09-01 Palo Alto Research Center Incorporated Co-extruded microchannel heat pipes
US10371468B2 (en) 2011-11-30 2019-08-06 Palo Alto Research Center Incorporated Co-extruded microchannel heat pipes
US8875653B2 (en) * 2012-02-10 2014-11-04 Palo Alto Research Center Incorporated Micro-extrusion printhead with offset orifices for generating gridlines on non-square substrates
JP6300477B2 (en) 2012-09-20 2018-03-28 花王株式会社 Cleaning composition for skin or hair
JP6235843B2 (en) 2012-09-20 2017-11-22 花王株式会社 Cleaning composition for skin or hair
US9573144B2 (en) * 2014-05-30 2017-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Coating apparatus and method of forming coating film
KR101593019B1 (en) 2015-11-05 2016-02-11 고진우 Interior board that light is emited light
US10203606B1 (en) * 2017-11-22 2019-02-12 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for dispensing developer onto semiconductor substrate
CN112965347B (en) * 2020-11-12 2023-11-03 重庆康佳光电科技有限公司 Wafer developing device, method and wafer
US11747729B2 (en) 2021-03-19 2023-09-05 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor developer tool and methods of operation
CN113772246A (en) * 2021-09-10 2021-12-10 贵州聚材科技有限公司 Device capable of coating light-storing and light-reflecting coatings at multiple points simultaneously and using method thereof
US20230415204A1 (en) * 2022-06-23 2023-12-28 Taiwan Semiconductor Manufacturing Company, Ltd. Wet cleaning tool and method

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Also Published As

Publication number Publication date
US20040062876A1 (en) 2004-04-01
EP1114355B1 (en) 2010-11-03
US7255975B2 (en) 2007-08-14
ATE487164T1 (en) 2010-11-15
US6669779B2 (en) 2003-12-30
US7208262B2 (en) 2007-04-24
KR100560180B1 (en) 2006-03-13
JP3708437B2 (en) 2005-10-19
US6248171B1 (en) 2001-06-19
US20070089671A1 (en) 2007-04-26
EP1114355A2 (en) 2001-07-11
AU5802399A (en) 2000-04-03
US20020187442A1 (en) 2002-12-12
US20050095368A1 (en) 2005-05-05
TWI249657B (en) 2006-02-21
KR20010089163A (en) 2001-09-29
US7625692B2 (en) 2009-12-01
DE69942913D1 (en) 2010-12-16
EP1114355B8 (en) 2011-01-19
US20070059651A1 (en) 2007-03-15
JP2002525653A (en) 2002-08-13
WO2000016163A2 (en) 2000-03-23

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