WO2001075968A3 - Method of manufacturing a heterojunction bicmos integrated circuit - Google Patents

Method of manufacturing a heterojunction bicmos integrated circuit Download PDF

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Publication number
WO2001075968A3
WO2001075968A3 PCT/US2001/009995 US0109995W WO0175968A3 WO 2001075968 A3 WO2001075968 A3 WO 2001075968A3 US 0109995 W US0109995 W US 0109995W WO 0175968 A3 WO0175968 A3 WO 0175968A3
Authority
WO
WIPO (PCT)
Prior art keywords
layer
define
over
manufacturing
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2001/009995
Other languages
French (fr)
Other versions
WO2001075968A2 (en
Inventor
Jay P John
James A Kirchgessner
Ik-Sung Lim
Michael H Kaneshiro
Vida Ilderem Burger
Phillip W Dahl
David L Stolfa
Richard W Mauntel
John W Steele
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Motorola Solutions Inc
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Priority to EP01922807A priority Critical patent/EP1273036B1/en
Priority to DE60134220T priority patent/DE60134220D1/en
Priority to AU2001249568A priority patent/AU2001249568A1/en
Publication of WO2001075968A2 publication Critical patent/WO2001075968A2/en
Publication of WO2001075968A3 publication Critical patent/WO2001075968A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00—Bipolar junction transistors [BJT]
    • H10D10/01—Manufacture or treatment
    • H10D10/021—Manufacture or treatment of heterojunction BJTs [HBT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/0107—Integrating at least one component covered by H10D12/00 or H10D30/00 with at least one component covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating IGFETs with BJTs
    • H10D84/0109—Integrating at least one component covered by H10D12/00 or H10D30/00 with at least one component covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating IGFETs with BJTs the at least one component covered by H10D12/00 or H10D30/00 being a MOS device
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01—Manufacture or treatment
    • H10D84/02—Manufacture or treatment characterised by using material-based technologies
    • H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401—Combinations of FETs or IGBTs with BJTs

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Bipolar Transistors (AREA)

Abstract

A method of manufacturing a heterojunction BiCMOS IC (100) includes forming a gate electrode (121, 131), forming a protective layer (901, 902) over the gate electrode, forming a semiconductor layer (1101) over the protective layer, depositing an electrically insulative layer (1102, 1103) over the semiconductor layer, using a mask layer (1104) to define a doped region (225) in the semiconductor layer and to define a hole (1201) in the electrically insulative layer, forming an electrically conductive layer (1301) over the electrically insulative layer, using another mask layer (1302) to define an emitter region (240) in the electrically conductive layer and to define an intrinsic base region (231) and a portion of an extrinsic base region (1502) to define another portion of the extrinsic base region in the electrically conductive layer.
PCT/US2001/009995 2000-03-30 2001-03-28 Method of manufacturing a heterojunction bicmos integrated circuit Ceased WO2001075968A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP01922807A EP1273036B1 (en) 2000-03-30 2001-03-28 Method of manufacturing a heterojunction bicmos integrated circuit
DE60134220T DE60134220D1 (en) 2000-03-30 2001-03-28 METHOD FOR PRODUCING A HETEROVER-BICMOS-INTEGRATED CIRCUIT
AU2001249568A AU2001249568A1 (en) 2000-03-30 2001-03-28 Method of manufacturing a heterojunction bicmos integrated circuit

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/539,130 2000-03-30
US09/539,130 US6461925B1 (en) 2000-03-30 2000-03-30 Method of manufacturing a heterojunction BiCMOS integrated circuit

Publications (2)

Publication Number Publication Date
WO2001075968A2 WO2001075968A2 (en) 2001-10-11
WO2001075968A3 true WO2001075968A3 (en) 2002-05-16

Family

ID=24149914

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/009995 Ceased WO2001075968A2 (en) 2000-03-30 2001-03-28 Method of manufacturing a heterojunction bicmos integrated circuit

Country Status (6)

Country Link
US (1) US6461925B1 (en)
EP (1) EP1273036B1 (en)
CN (1) CN1197148C (en)
AU (1) AU2001249568A1 (en)
DE (1) DE60134220D1 (en)
WO (1) WO2001075968A2 (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6426265B1 (en) * 2001-01-30 2002-07-30 International Business Machines Corporation Incorporation of carbon in silicon/silicon germanium epitaxial layer to enhance yield for Si-Ge bipolar technology
US6642607B2 (en) * 2001-02-05 2003-11-04 Matsushita Electric Industrial Co., Ltd. Semiconductor device
FR2822292B1 (en) * 2001-03-14 2003-07-18 St Microelectronics Sa METHOD FOR MANUFACTURING A DOUBLE POLYSILICON-TYPE BIPOLAR TRANSISTOR HETEROJUNCTION BASED AND CORRESPONDING TRANSISTOR
US20050250289A1 (en) * 2002-10-30 2005-11-10 Babcock Jeffrey A Control of dopant diffusion from buried layers in bipolar integrated circuits
JP2003168687A (en) * 2001-11-30 2003-06-13 Nec Electronics Corp Registration pattern and manufacturing method thereof
US20040194541A1 (en) * 2002-06-10 2004-10-07 The Procter & Gamble Company High-Q LC circuit moisture sensor
US6911369B2 (en) * 2003-02-12 2005-06-28 Taiwan Semiconductor Manufacturing Company, Ltd. Discontinuity prevention for SiGe deposition
US7517768B2 (en) * 2003-03-31 2009-04-14 Intel Corporation Method for fabricating a heterojunction bipolar transistor
JP2005005580A (en) * 2003-06-13 2005-01-06 Renesas Technology Corp Semiconductor device
US7038298B2 (en) * 2003-06-24 2006-05-02 International Business Machines Corporation High fT and fmax bipolar transistor and method of making same
TW200524139A (en) * 2003-12-24 2005-07-16 Renesas Tech Corp Voltage generating circuit and semiconductor integrated circuit
DE102005021932A1 (en) * 2005-05-12 2006-11-16 Atmel Germany Gmbh Method for producing integrated circuits
TW200849556A (en) * 2006-06-14 2008-12-16 Nxp Bv Semiconductor device and method of manufacturing such a device
CN102403344B (en) * 2010-09-10 2013-09-11 上海华虹Nec电子有限公司 Parasitic PNP bipolar transistor in silicon germanium BiCMOS (bipolar complementary metal oxide semiconductor) process
DE102017216214B4 (en) * 2017-09-13 2019-05-09 Infineon Technologies Ag Method for producing a combined semiconductor device

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2193036A (en) * 1986-07-24 1988-01-27 Mitsubishi Electric Corp Fabrication method of semiconductor device
DE3823249A1 (en) * 1987-07-10 1989-01-19 Hitachi Ltd SEMICONDUCTOR DEVICE
EP0341821A2 (en) * 1988-05-10 1989-11-15 Seiko Epson Corporation Method of manufacturing a semiconductor device
US4892837A (en) * 1987-12-04 1990-01-09 Hitachi, Ltd. Method for manufacturing semiconductor integrated circuit device
JPH025463A (en) * 1988-06-24 1990-01-10 Hitachi Ltd Semiconductor integrated circuit device and manufacture thereof
US5091322A (en) * 1989-04-14 1992-02-25 Kabushiki Kaisha Toshiba Semiconductor device and method of manufacturing the same

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2590295B2 (en) * 1990-06-06 1997-03-12 株式会社東芝 Semiconductor device and manufacturing method thereof
JPH10135238A (en) * 1996-11-05 1998-05-22 Sony Corp Semiconductor device and manufacturing method thereof

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2193036A (en) * 1986-07-24 1988-01-27 Mitsubishi Electric Corp Fabrication method of semiconductor device
DE3823249A1 (en) * 1987-07-10 1989-01-19 Hitachi Ltd SEMICONDUCTOR DEVICE
US4892837A (en) * 1987-12-04 1990-01-09 Hitachi, Ltd. Method for manufacturing semiconductor integrated circuit device
EP0341821A2 (en) * 1988-05-10 1989-11-15 Seiko Epson Corporation Method of manufacturing a semiconductor device
JPH025463A (en) * 1988-06-24 1990-01-10 Hitachi Ltd Semiconductor integrated circuit device and manufacture thereof
US5091322A (en) * 1989-04-14 1992-02-25 Kabushiki Kaisha Toshiba Semiconductor device and method of manufacturing the same

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 014, no. 142 (E - 0904) 16 March 1990 (1990-03-16) *

Also Published As

Publication number Publication date
EP1273036B1 (en) 2008-05-28
EP1273036A2 (en) 2003-01-08
US6461925B1 (en) 2002-10-08
AU2001249568A1 (en) 2001-10-15
DE60134220D1 (en) 2008-07-10
CN1422439A (en) 2003-06-04
WO2001075968A2 (en) 2001-10-11
CN1197148C (en) 2005-04-13

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