WO2001086352A3 - Polymers for photoresist compositions for microlithography - Google Patents

Polymers for photoresist compositions for microlithography Download PDF

Info

Publication number
WO2001086352A3
WO2001086352A3 PCT/US2001/014520 US0114520W WO0186352A3 WO 2001086352 A3 WO2001086352 A3 WO 2001086352A3 US 0114520 W US0114520 W US 0114520W WO 0186352 A3 WO0186352 A3 WO 0186352A3
Authority
WO
WIPO (PCT)
Prior art keywords
photoresist compositions
microlithography
polymers
nitrile
transparency
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2001/014520
Other languages
French (fr)
Other versions
WO2001086352A2 (en
Inventor
Michael Fryd
Mookkan Periyasamy
Frank Leonard Schadt Iii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Priority to EP01933046A priority Critical patent/EP1279069A2/en
Priority to AU2001259509A priority patent/AU2001259509A1/en
Priority to JP2001583241A priority patent/JP2003532932A/en
Priority to US10/257,900 priority patent/US6951705B2/en
Publication of WO2001086352A2 publication Critical patent/WO2001086352A2/en
Publication of WO2001086352A3 publication Critical patent/WO2001086352A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)

Abstract

Nitrile/vinyl ether-containing polymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These photoresist compositions comprise 1) at least one ethylenically unsaturated compound comprised of a vinyl ether and 2) a nitrile-containing compound, e.g., acrylonitrile, which together impart high ultraviolet (UV) transparency and developability in basic media. In some embodiments, these photoresist compositions further comprise a fluoroalcohol group. The photoresist compositions of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which property makes them useful for lithography at these short wavelengths.
PCT/US2001/014520 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography Ceased WO2001086352A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP01933046A EP1279069A2 (en) 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography
AU2001259509A AU2001259509A1 (en) 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography
JP2001583241A JP2003532932A (en) 2000-05-05 2001-05-04 Polymers used in photoresist compositions for microlithography
US10/257,900 US6951705B2 (en) 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US20196100P 2000-05-05 2000-05-05
US60/201,961 2000-05-05

Publications (2)

Publication Number Publication Date
WO2001086352A2 WO2001086352A2 (en) 2001-11-15
WO2001086352A3 true WO2001086352A3 (en) 2002-03-28

Family

ID=22748003

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2001/014520 Ceased WO2001086352A2 (en) 2000-05-05 2001-05-04 Polymers for photoresist compositions for microlithography

Country Status (4)

Country Link
EP (1) EP1279069A2 (en)
JP (1) JP2003532932A (en)
AU (1) AU2001259509A1 (en)
WO (1) WO2001086352A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6830870B2 (en) 2002-05-28 2004-12-14 Arch Speciality Chemicals, Inc. Acetal protected polymers and photoresists compositions thereof

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003186198A (en) * 2001-12-19 2003-07-03 Sony Corp Resist material and exposure method
JP2003186197A (en) * 2001-12-19 2003-07-03 Sony Corp Resist material and exposure method
US7820369B2 (en) 2003-12-04 2010-10-26 International Business Machines Corporation Method for patterning a low activation energy photoresist
US7193023B2 (en) 2003-12-04 2007-03-20 International Business Machines Corporation Low activation energy photoresists
US7495135B2 (en) 2003-12-04 2009-02-24 International Business Machines Corporation Precursors to fluoroalkanol-containing olefin monomers, and associated methods of synthesis and use
US7297811B2 (en) 2003-12-04 2007-11-20 International Business Machines Corporation Precursors to fluoroalkanol-containing olefin monomers and associated methods of synthesis and use
JP5472217B2 (en) * 2011-06-29 2014-04-16 信越化学工業株式会社 Method for producing photoacid generator using 2,2-bis (fluoroalkyl) oxirane
US8968990B2 (en) * 2011-09-15 2015-03-03 Tokyo Ohka Kogyo Co., Ltd. Method of forming resist pattern
LT3424289T (en) 2013-03-14 2021-02-25 Precision Planting Llc System and method for agricultural implement trench depth control and soil monitoring
EP4230015A1 (en) 2017-10-02 2023-08-23 Precision Planting LLC Systems and apparatuses for soil and seed monitoring

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017712A1 (en) * 1998-09-23 2000-03-30 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
WO2000025178A2 (en) * 1998-10-27 2000-05-04 E.I. Du Pont De Nemours And Company Photoresists and processes for microlithography
WO2001037047A2 (en) * 1999-11-17 2001-05-25 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000017712A1 (en) * 1998-09-23 2000-03-30 E.I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
WO2000025178A2 (en) * 1998-10-27 2000-05-04 E.I. Du Pont De Nemours And Company Photoresists and processes for microlithography
WO2001037047A2 (en) * 1999-11-17 2001-05-25 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6830870B2 (en) 2002-05-28 2004-12-14 Arch Speciality Chemicals, Inc. Acetal protected polymers and photoresists compositions thereof

Also Published As

Publication number Publication date
JP2003532932A (en) 2003-11-05
EP1279069A2 (en) 2003-01-29
WO2001086352A2 (en) 2001-11-15
AU2001259509A1 (en) 2001-11-20

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