WO2002014439A3 - Process for producing coatings using surface-active photoinitiators - Google Patents

Process for producing coatings using surface-active photoinitiators Download PDF

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Publication number
WO2002014439A3
WO2002014439A3 PCT/EP2001/009123 EP0109123W WO0214439A3 WO 2002014439 A3 WO2002014439 A3 WO 2002014439A3 EP 0109123 W EP0109123 W EP 0109123W WO 0214439 A3 WO0214439 A3 WO 0214439A3
Authority
WO
WIPO (PCT)
Prior art keywords
radical
formula
substituted
unsubstituted
active
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2001/009123
Other languages
French (fr)
Other versions
WO2002014439A2 (en
Inventor
Gisele Baudin
Tunja Jung
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Ciba SC Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG, Ciba SC Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Priority to KR1020037002201A priority Critical patent/KR100818643B1/en
Priority to DE60128105T priority patent/DE60128105T8/en
Priority to JP2002519570A priority patent/JP5068413B2/en
Priority to EP01974127A priority patent/EP1311627B1/en
Priority to AU2001293732A priority patent/AU2001293732A1/en
Priority to US10/343,620 priority patent/US7279200B2/en
Priority to CA002417112A priority patent/CA2417112A1/en
Priority to MXPA03001383A priority patent/MXPA03001383A/en
Priority to BRPI0113233-4B1A priority patent/BR0113233B1/en
Publication of WO2002014439A2 publication Critical patent/WO2002014439A2/en
Publication of WO2002014439A3 publication Critical patent/WO2002014439A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/66—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety
    • C07C69/73—Esters of carboxylic acids having esterified carboxylic groups bound to acyclic carbon atoms and having any of the groups OH, O—metal, —CHO, keto, ether, acyloxy, groups, groups, or in the acid moiety of unsaturated acids
    • C07C69/738—Esters of keto-carboxylic acids or aldehydo-carboxylic acids
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C09D4/06—Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09D159/00 - C09D187/00
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Silicon Polymers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

Compounds of formula (I) in which r is a number 1 or 2; s is a number from 1 to 1000; R is radical of formula (II); or R is, for example, unsubstituted or substituted naphthyl, anthracyl, phenanthryl or a heterocyclic radical; R1, R2, R3, R4 and R5 independently of one another are, for example hydrogen; unsubstituted or substituted phenyl or C1-C12alkyl; A, if s is 1, is a surface-active radical of formula (III); or A, if s is 1, is a surface-active radical A0; or A, if s is a number greater than 1, is a radical of the formula (III) in which n corresponds to the number s, or A, if s is 2, is a radical A1; A0 is, for example, in each case unsubstituted or substituted C6-C30alkyl, C6-C30alkenyl, C6-C30alkynyl or C6-C30aralkyl; A1 is, for example, in each case unsubstituted or substituted C6-C30alkylene, C6-C30alkenylene, C6-C30alkynylene or C6-C30aralkylene; n is, for example, a number from 1 to 1000; m is a number from 0 to 100; p is a number 0-10000; x is a number from 1 to 10; Y, if r is 1, is a divalent group and Y, if r is 2, is a trivalent group, and Y, if A has the definition A0, is a single bond; G1, G2, R13, R14, R15, R16, R17, R18, R19, R20, R21 and R22 are, for exmple, C1-C18alkyl; are particularly suitable as photoinitiators which accumulate at the surface in a process for curing coatings.
PCT/EP2001/009123 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators Ceased WO2002014439A2 (en)

Priority Applications (9)

Application Number Priority Date Filing Date Title
KR1020037002201A KR100818643B1 (en) 2000-08-14 2001-08-07 Manufacturing method of film using siloxane photoinitiator
DE60128105T DE60128105T8 (en) 2000-08-14 2001-08-07 PROCESS FOR PREPARING COATINGS USING PHOTOINITIATORS COLLECTING ON THE SURFACE
JP2002519570A JP5068413B2 (en) 2000-08-14 2001-08-07 Method for producing a coating using a surface active photoinitiator
EP01974127A EP1311627B1 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-accumulating photoinitiators
AU2001293732A AU2001293732A1 (en) 2000-08-14 2001-08-07 Process for producing coatings using siloxane photoinitiators
US10/343,620 US7279200B2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators
CA002417112A CA2417112A1 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators
MXPA03001383A MXPA03001383A (en) 2000-08-14 2001-08-07 Process for producing coatings using siloxane photoinitiators.
BRPI0113233-4B1A BR0113233B1 (en) 2000-08-14 2001-08-07 coating process, method of motivating a photoinitiator to accumulate on the surface of the coatings, surfactant photoinitiator, use of compounds of formula i, composition and coated substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00810720 2000-08-14
EP00810720.3 2000-08-14

Publications (2)

Publication Number Publication Date
WO2002014439A2 WO2002014439A2 (en) 2002-02-21
WO2002014439A3 true WO2002014439A3 (en) 2002-06-13

Family

ID=8174856

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2001/009123 Ceased WO2002014439A2 (en) 2000-08-14 2001-08-07 Process for producing coatings using surface-active photoinitiators

Country Status (13)

Country Link
US (1) US7279200B2 (en)
EP (1) EP1311627B1 (en)
JP (1) JP5068413B2 (en)
KR (1) KR100818643B1 (en)
CN (1) CN1211439C (en)
AT (1) ATE360666T1 (en)
AU (1) AU2001293732A1 (en)
BR (1) BR0113233B1 (en)
CA (1) CA2417112A1 (en)
DE (1) DE60128105T8 (en)
MX (1) MXPA03001383A (en)
TW (1) TWI244495B (en)
WO (1) WO2002014439A2 (en)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10022352A1 (en) * 2000-05-08 2001-11-22 Georg Gros Coating sheet metal used in the automobile, aviation and naval industries comprises using a chromate-free, water-dilutable anti corrosive binder coating and curing using UV
WO2002024344A2 (en) * 2000-09-25 2002-03-28 Chemetall Gmbh Method for pretreating and coating metal surfaces, prior to forming, with a paint-like coating and use of substrates so coated
CA2471810A1 (en) * 2002-02-04 2003-08-14 Ciba Speciality Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
EP1472292B1 (en) 2002-02-04 2008-07-23 Ciba Holding Inc. Surface-active siloxane photoinitiators
ATE483819T1 (en) 2002-03-06 2010-10-15 Basf Se ENZYMATIC PROCESS FOR PRODUCING AN ORGANOSILICON GROUP CONTAINING PHOTOINITIATORS
AU2003233984A1 (en) * 2002-04-26 2003-11-10 Ciba Specialty Chemicals Holding Inc. Incorporable photoinitiator
US20040115363A1 (en) * 2002-12-13 2004-06-17 Desai Umesh C. Sealant and sound dampening composition
US20070026509A1 (en) * 2003-06-06 2007-02-01 Jonathan Rogers Novel surface-active polysiloxane photoinitiators
EP1781750A4 (en) * 2004-07-27 2012-08-08 Duluxgroup Australia Pty Ltd SYSTEM FOR PROVIDING A RECONSTITUTED CELLULOSIC SUBSTRATE COATED WITH POWDER
CN101044023B (en) * 2004-10-22 2010-05-05 三菱丽阳株式会社 Matt acrylic resin film for thermoforming, method for producing same, and laminate containing same
US20060234026A1 (en) * 2005-04-18 2006-10-19 Huusken Robert W M Non-combustible high pressure laminate
US7919222B2 (en) * 2006-01-29 2011-04-05 Rohm And Haas Electronics Materials Llc Coating compositions for use with an overcoated photoresist
WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8680176B2 (en) * 2007-03-21 2014-03-25 The University Of Southern Mississippi Nanoencapsulation of isocyanates via aqueous media
CN105111924A (en) * 2009-04-30 2015-12-02 阿姆斯特郎世界工业公司 UVV curable coating compositions and method for coating flooring and other substrates with same
CN101880482B (en) * 2010-07-12 2012-10-24 重庆大学 Method for modifying nano metal oxide by coupling graft
DE102014107518A1 (en) * 2014-05-28 2015-12-03 Heraeus Kulzer Gmbh Reactive micro-applicator with metal-containing additives for use with dental adhesives
EP3341792A1 (en) * 2015-12-22 2018-07-04 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
JP6531729B2 (en) * 2016-07-19 2019-06-19 株式会社Sumco Method of evaluating carbon concentration of silicon sample, method of evaluating silicon wafer manufacturing process, method of manufacturing silicon wafer, and method of manufacturing silicon single crystal ingot
CN213006569U (en) 2017-06-21 2021-04-20 卡本有限公司 A system for additive manufacturing and a dispensing system useful for dispensing resin for additive manufacturing
US11304492B2 (en) * 2018-03-08 2022-04-19 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
US11793289B2 (en) 2018-03-08 2023-10-24 Applied Lacquer Industries Inc. Artificial nail tip and curing composition set and applying method thereof
CN113583539B (en) * 2021-08-11 2022-05-10 武汉工程大学 Optical resin composition, preparation method and application thereof
CN114409902B (en) * 2021-12-27 2023-04-25 北京化工大学 Multifunctional PDMS-based prepolymer, membrane based on the prepolymer and its preparation
EP4491688A4 (en) * 2022-03-07 2025-07-09 Lg Chemical Ltd CONNECTION
JP7722248B2 (en) 2022-04-22 2025-08-13 信越化学工業株式会社 Photoreactive organopolysiloxane, its production method, and photocurable composition

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1534320A (en) * 1975-09-18 1978-11-29 Stauffer Chemical Co Process and compositions for photopolymerisation
WO1998033761A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4038164A (en) * 1975-09-18 1977-07-26 Stauffer Chemical Company Photopolymerizable aryl and heterocyclic glyoxylate compositions and process
TW557298B (en) * 2000-08-14 2003-10-11 Ciba Sc Holding Ag A compound, a photopolymerizible composition, a process for producing coatings and a method for causing a photoinitiator to accumulate at the surface of coatings

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1534320A (en) * 1975-09-18 1978-11-29 Stauffer Chemical Co Process and compositions for photopolymerisation
WO1998033761A1 (en) * 1997-01-30 1998-08-06 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters

Also Published As

Publication number Publication date
BR0113233B1 (en) 2013-10-01
CN1211439C (en) 2005-07-20
US7279200B2 (en) 2007-10-09
AU2001293732A1 (en) 2002-02-25
CN1447844A (en) 2003-10-08
US20030213931A1 (en) 2003-11-20
CA2417112A1 (en) 2002-02-21
JP5068413B2 (en) 2012-11-07
EP1311627B1 (en) 2007-04-25
MXPA03001383A (en) 2003-06-06
KR20030055249A (en) 2003-07-02
DE60128105T8 (en) 2008-04-30
TWI244495B (en) 2005-12-01
DE60128105T2 (en) 2007-12-27
ATE360666T1 (en) 2007-05-15
BR0113233A (en) 2003-06-24
KR100818643B1 (en) 2008-04-04
JP2004506776A (en) 2004-03-04
EP1311627A2 (en) 2003-05-21
DE60128105D1 (en) 2007-06-06
WO2002014439A2 (en) 2002-02-21

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