WO2002019034A1 - Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern - Google Patents

Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern Download PDF

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Publication number
WO2002019034A1
WO2002019034A1 PCT/JP2001/007275 JP0107275W WO0219034A1 WO 2002019034 A1 WO2002019034 A1 WO 2002019034A1 JP 0107275 W JP0107275 W JP 0107275W WO 0219034 A1 WO0219034 A1 WO 0219034A1
Authority
WO
WIPO (PCT)
Prior art keywords
refractive index
radiation
composition
forming
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2001/007275
Other languages
English (en)
French (fr)
Inventor
Isao Nishimura
Nobuo Bessho
Atsushi Kumano
Tsutomu Shimokawa
Kenji Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JSR Corp filed Critical JSR Corp
Priority to CA002387716A priority Critical patent/CA2387716A1/en
Priority to EP01958481A priority patent/EP1235104A4/en
Priority to US10/110,237 priority patent/US6828078B2/en
Priority to AU2001280157A priority patent/AU2001280157B2/en
Priority to AU8015701A priority patent/AU8015701A/xx
Publication of WO2002019034A1 publication Critical patent/WO2002019034A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/14—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/08—Bridged systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D498/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms
    • C07D498/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having nitrogen and oxygen atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D498/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L67/00—Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L69/00—Compositions of polycarbonates; Compositions of derivatives of polycarbonates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1847—Manufacturing methods
    • G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Optical Integrated Circuits (AREA)
PCT/JP2001/007275 2000-08-29 2001-08-24 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern Ceased WO2002019034A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CA002387716A CA2387716A1 (en) 2000-08-29 2001-08-24 Radiation sensitive refractive index changing composition and refractive index changing method
EP01958481A EP1235104A4 (en) 2000-08-29 2001-08-24 COMPOSITION HAVING SUBSTANTIALLY MODIFIABLE REFRACTION INDEX AND METHOD FOR FORMING REFRACTION INDEX PATTERN
US10/110,237 US6828078B2 (en) 2000-08-29 2001-08-24 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern
AU2001280157A AU2001280157B2 (en) 2000-08-29 2001-08-24 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern
AU8015701A AU8015701A (en) 2000-08-29 2001-08-24 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern

Applications Claiming Priority (12)

Application Number Priority Date Filing Date Title
JP2000258524 2000-08-29
JP2000-258524 2000-08-29
JP2000265483 2000-09-01
JP2000-265483 2000-09-01
JP2000-324508 2000-10-24
JP2000324508 2000-10-24
JP2000345764 2000-11-13
JP2000-345764 2000-11-13
JP2000-360075 2000-11-27
JP2000360075 2000-11-27
JP2001018765 2001-01-26
JP2001-018765 2001-01-26

Publications (1)

Publication Number Publication Date
WO2002019034A1 true WO2002019034A1 (en) 2002-03-07

Family

ID=27554833

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2001/007275 Ceased WO2002019034A1 (en) 2000-08-29 2001-08-24 Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern

Country Status (7)

Country Link
US (1) US6828078B2 (ja)
EP (1) EP1235104A4 (ja)
KR (1) KR100719426B1 (ja)
CN (1) CN1273869C (ja)
AU (2) AU2001280157B2 (ja)
CA (1) CA2387716A1 (ja)
WO (1) WO2002019034A1 (ja)

Cited By (3)

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JP2003043682A (ja) * 2001-08-01 2003-02-13 Jsr Corp 感放射線性誘電率変化性組成物、誘電率変化法
EP1331518A3 (en) * 2002-01-24 2004-04-07 JSR Corporation Radiation sensitive composition for forming an insulating film, insulating film and display device
US7125647B2 (en) 2001-03-13 2006-10-24 Jsr Corporation Radiation-sensitive composition changing in refractive index and utilization thereof

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CA2431358A1 (en) * 2000-12-11 2002-06-20 Jsr Corporation Radiation sensitive refractive index changing composition and refractive index changing method
DE10252563A1 (de) * 2002-06-27 2004-01-29 Atotech Deutschland Gmbh Verfahren zur Herstellung von integrierten Wellenleitern, Polymersysteme zur Herstellung solcher Wellenleiter sowie Verfahren zur Erzeugung von planaren Wellenleiterkanälen
US20040101268A1 (en) * 2002-11-27 2004-05-27 General Electric Company Optical device structures based on photo-definable polymerizable composites
CN100526918C (zh) * 2003-02-18 2009-08-12 住友电气工业株式会社 衍射光栅元件
JP3884412B2 (ja) * 2003-06-18 2007-02-21 株式会社東芝 記録媒体
JP4217886B2 (ja) 2003-06-25 2009-02-04 Ｊｓｒ株式会社 感放射線性屈折率変化性組成物、パターン形成法および光学材料
US7776236B2 (en) * 2003-07-25 2010-08-17 General Electric Company Index contrast enhanced optical waveguides and fabrication methods
JP4315010B2 (ja) * 2004-02-13 2009-08-19 Ｊｓｒ株式会社 感放射線性樹脂組成物、表示パネル用スペーサーおよび表示パネル
JP4461901B2 (ja) * 2004-05-11 2010-05-12 Ｔｄｋ株式会社 ホログラム記録材料及びホログラム記録媒体
WO2006064431A2 (en) * 2004-12-14 2006-06-22 Dutch Polymer Institute Porous holographic film
JP4197721B2 (ja) * 2006-12-18 2008-12-17 株式会社東芝 ホログラム記録媒体およびその製造方法
EP2341091B1 (en) 2008-09-22 2013-12-04 Mitsui Chemicals, Inc. Polymerizable composition for optical material, optical material, and method for preparing the optical material
US7847103B2 (en) * 2008-10-04 2010-12-07 Chia-Hu Chang Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole
TWI503334B (zh) * 2009-02-19 2015-10-11 Jsr Corp 聚合物及敏輻射線性組成物、及單體
US8743466B2 (en) 2010-06-15 2014-06-03 Sharp Kabushiki Kaisha Display device and method for forming the same
KR20160102225A (ko) * 2013-12-20 2016-08-29 코베스트로 도이칠란트 아게 개선된 감광성을 갖는 홀로그래픽 매체
US11198795B2 (en) 2015-02-17 2021-12-14 The Walman Optical Company Glycidyl ether based optical coating compositions
CN105833791B (zh) * 2016-03-30 2017-10-24 大连理工大学 一种含有邻硝基苄酯光降解基团的表面活性剂及其制备方法
CN112656763B (zh) * 2020-12-29 2022-07-15 吉林大学 一种基于剪切力响应的载药纳米胶束的制备方法
CN116297942B (zh) * 2023-03-01 2025-04-18 东营天东制药有限公司 同时检测回收乙醇中多种残留杂质的方法

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7125647B2 (en) 2001-03-13 2006-10-24 Jsr Corporation Radiation-sensitive composition changing in refractive index and utilization thereof
JP2003043682A (ja) * 2001-08-01 2003-02-13 Jsr Corp 感放射線性誘電率変化性組成物、誘電率変化法
WO2003012547A1 (fr) * 2001-08-01 2003-02-13 Jsr Corporation Composition a permittivite dont le rayonnement peut etre modifie par sensibilite et procede de formation d'un motif de permittivite
US7205085B2 (en) 2001-08-01 2007-04-17 Jsr Corporation Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern
EP1331518A3 (en) * 2002-01-24 2004-04-07 JSR Corporation Radiation sensitive composition for forming an insulating film, insulating film and display device

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EP1235104A1 (en) 2002-08-28
CN1273869C (zh) 2006-09-06
KR100719426B1 (ko) 2007-05-18
KR20020092921A (ko) 2002-12-12
US6828078B2 (en) 2004-12-07
AU8015701A (en) 2002-03-13
CN1388919A (zh) 2003-01-01
EP1235104A4 (en) 2008-10-01
CA2387716A1 (en) 2002-03-07
US20030064303A1 (en) 2003-04-03
AU2001280157B2 (en) 2005-08-11

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