WO2002069049A3 - Simultaneous imaging of two reticles - Google Patents

Simultaneous imaging of two reticles Download PDF

Info

Publication number
WO2002069049A3
WO2002069049A3 PCT/US2002/005656 US0205656W WO02069049A3 WO 2002069049 A3 WO2002069049 A3 WO 2002069049A3 US 0205656 W US0205656 W US 0205656W WO 02069049 A3 WO02069049 A3 WO 02069049A3
Authority
WO
WIPO (PCT)
Prior art keywords
wafer
images
reticles
exposure
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2002/005656
Other languages
French (fr)
Other versions
WO2002069049A2 (en
Inventor
Harry Sewell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Priority to JP2002568106A priority Critical patent/JP4714403B2/en
Priority to EP02707881A priority patent/EP1364257A1/en
Priority to KR1020027014433A priority patent/KR100815222B1/en
Publication of WO2002069049A2 publication Critical patent/WO2002069049A2/en
Publication of WO2002069049A3 publication Critical patent/WO2002069049A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention provides a method and system for simultaneously imaging at least two reticles (104a, 104b) onto a substrate. According to the present invention, the wafer is passed through the exposure sequence once with images from the reticles being exposed simultaneously onto the wafer. The throughput of the system is effectively maintained at the standard single pass throughput level or twice that of conventional systems. In one embodiment, the present invention produces two reticle images side-by-side in the exit pupil (134) of the optics (112) of a step and scan wafer exposure system. The scanning action of the exposure tool then effectively superimposes the two images during the exposure of the wafer. Each image exposes the photoresist as the wafer is scanned through the image field synchronously with the scanning is of the reticles. According to one embodiment, the image scanning is synchronized so that two required images are superimposed. According to another embodiment, the two images can be independently focused and aligned.
PCT/US2002/005656 2001-02-27 2002-02-27 Simultaneous imaging of two reticles Ceased WO2002069049A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002568106A JP4714403B2 (en) 2001-02-27 2002-02-27 Method and apparatus for exposing a dual reticle image
EP02707881A EP1364257A1 (en) 2001-02-27 2002-02-27 Simultaneous imaging of two reticles
KR1020027014433A KR100815222B1 (en) 2001-02-27 2002-02-27 A method of exposing a field on a substrate stage with an image from a lithographic apparatus and at least two patterns formed on at least one reticle

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27138001P 2001-02-27 2001-02-27
US60/271,380 2001-02-27

Publications (2)

Publication Number Publication Date
WO2002069049A2 WO2002069049A2 (en) 2002-09-06
WO2002069049A3 true WO2002069049A3 (en) 2003-05-30

Family

ID=23035311

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/005656 Ceased WO2002069049A2 (en) 2001-02-27 2002-02-27 Simultaneous imaging of two reticles

Country Status (5)

Country Link
US (1) US6611316B2 (en)
EP (1) EP1364257A1 (en)
JP (1) JP4714403B2 (en)
KR (1) KR100815222B1 (en)
WO (1) WO2002069049A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8721803B2 (en) 2006-12-05 2014-05-13 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method

Families Citing this family (300)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1255162A1 (en) 2001-05-04 2002-11-06 ASML Netherlands B.V. Lithographic apparatus
US6795168B2 (en) * 2002-04-08 2004-09-21 Numerical Technologies, Inc. Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process
KR20170018113A (en) 2003-04-09 2017-02-15 가부시키가이샤 니콘 Exposure method and apparatus, and device manufacturing method
TW201834020A (en) 2003-10-28 2018-09-16 日商尼康股份有限公司 Illumination optical device, exposure device, exposure method, and component manufacturing method
TW201809801A (en) 2003-11-20 2018-03-16 日商尼康股份有限公司 Optical illumination device, exposure device, exposure method, and component manufacturing method
US7361457B2 (en) * 2004-01-13 2008-04-22 International Business Machines Corporation Real-time configurable masking
CN1938646B (en) 2004-01-20 2010-12-15 卡尔蔡司Smt股份公司 Exposure device and measuring device for projection lens
US7064078B2 (en) * 2004-01-30 2006-06-20 Applied Materials Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme
EP1713115B1 (en) 2004-02-04 2016-05-04 Nikon Corporation Exposure apparatus, exposure method, and device producing method
TWI389174B (en) 2004-02-06 2013-03-11 尼康股份有限公司 Polarization changing device, optical illumination apparatus, light-exposure apparatus and light-exposure method
US20070030467A1 (en) * 2004-02-19 2007-02-08 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
DE102004013886A1 (en) * 2004-03-16 2005-10-06 Carl Zeiss Smt Ag Multiple Exposure Method, Microlithography Projection Exposure System and Projection System
US7387871B2 (en) * 2004-08-26 2008-06-17 Seagate Technology Llc Mask complementary multiple exposure technique
US20070258068A1 (en) * 2005-02-17 2007-11-08 Hiroto Horikawa Exposure Apparatus, Exposure Method, and Device Fabricating Method
WO2006101024A1 (en) * 2005-03-18 2006-09-28 Nikon Corporation Exposure method, exposure apparatus, device manufacturing method and exposure apparatus evaluating method
JP2006267761A (en) * 2005-03-25 2006-10-05 Fujitsu Hitachi Plasma Display Ltd Glass photomask exposure method
US9239524B2 (en) 2005-03-30 2016-01-19 Nikon Corporation Exposure condition determination method, exposure method, exposure apparatus, and device manufacturing method involving detection of the situation of a liquid immersion region
US20090226846A1 (en) * 2005-03-30 2009-09-10 Nikon Corporation Exposure Apparatus, Exposure Method, and Device Manufacturing Method
US7209217B2 (en) * 2005-04-08 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing plural patterning devices
EP1873816A4 (en) 2005-04-18 2010-11-24 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
US8236467B2 (en) 2005-04-28 2012-08-07 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
EP2660854B1 (en) 2005-05-12 2017-06-21 Nikon Corporation Projection optical system, exposure apparatus and exposure method
US7736825B2 (en) * 2005-06-02 2010-06-15 Asml Holding N.V. Lithographic apparatus and device manufacturing method utilizing a resettable or reversible contrast enhancing layer in a multiple exposure system
KR20080018158A (en) 2005-06-21 2008-02-27 가부시키가이샤 니콘 Exposure apparatus and exposure method, maintenance method and device manufacturing method
US20070085989A1 (en) * 2005-06-21 2007-04-19 Nikon Corporation Exposure apparatus and exposure method, maintenance method, and device manufacturing method
US7924416B2 (en) 2005-06-22 2011-04-12 Nikon Corporation Measurement apparatus, exposure apparatus, and device manufacturing method
WO2007000995A1 (en) * 2005-06-28 2007-01-04 Nikon Corporation Exposure apparatus and method, and device manufacturing method
SG162801A1 (en) * 2005-06-29 2010-07-29 Nikon Corp Exposure apparatus, substrate processing method, and device producing method
KR100613461B1 (en) * 2005-06-29 2006-08-17 주식회사 하이닉스반도체 Dual exposure method using double exposure technology and photomask for it
US8179517B2 (en) 2005-06-30 2012-05-15 Nikon Corporation Exposure apparatus and method, maintenance method for exposure apparatus, and device manufacturing method
CN100526992C (en) 2005-07-01 2009-08-12 株式会社尼康 Exposure apparatus, exposure method, device manufacturing method
TW200710616A (en) * 2005-07-11 2007-03-16 Nikon Corp Exposure apparatus and method for manufacturing device
KR100729263B1 (en) * 2005-07-14 2007-06-15 삼성전자주식회사 Substrate exposure apparatus
EP1918983A4 (en) * 2005-08-05 2010-03-31 Nikon Corp PLATINUM APPARATUS AND EXPOSURE APPARATUS
KR101449055B1 (en) 2005-08-23 2014-10-08 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device manufacturing method
TWI450044B (en) 2005-08-31 2014-08-21 尼康股份有限公司 An optical element, an exposure apparatus using the same, an exposure method, and a manufacturing method of the micro-element
CN101258581B (en) 2005-09-09 2011-05-11 株式会社尼康 Exposure apparatus, exposure method, and device manufacturing method
US8111374B2 (en) 2005-09-09 2012-02-07 Nikon Corporation Analysis method, exposure method, and device manufacturing method
US20070070323A1 (en) * 2005-09-21 2007-03-29 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
EP1936665A4 (en) 2005-09-21 2010-03-31 Nikon Corp EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
WO2007043535A1 (en) * 2005-10-07 2007-04-19 Nikon Corporation Optical characteristic measuring method, exposure method, device manufacturing method, inspecting apparatus and measuring method
US7948675B2 (en) * 2005-10-11 2011-05-24 Nikon Corporation Surface-corrected multilayer-film mirrors with protected reflective surfaces, exposure systems comprising same, and associated methods
US8681314B2 (en) 2005-10-24 2014-03-25 Nikon Corporation Stage device and coordinate correction method for the same, exposure apparatus, and device manufacturing method
US20070095739A1 (en) * 2005-10-24 2007-05-03 Nikon Corporation Utility transfer apparatus, stage apparatus, exposure apparatus, and device manufacturing method
US20070127135A1 (en) * 2005-11-01 2007-06-07 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
EP1950795A4 (en) 2005-11-01 2010-06-02 Nikon Corp EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING THE APPARATUS
WO2007055237A1 (en) 2005-11-09 2007-05-18 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US20070127002A1 (en) * 2005-11-09 2007-06-07 Nikon Corporation Exposure apparatus and method, and device manufacturing method
JPWO2007055199A1 (en) 2005-11-09 2009-04-30 株式会社ニコン Exposure apparatus and method, and device manufacturing method
EP1962328B1 (en) 2005-11-14 2013-01-16 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
WO2007058188A1 (en) * 2005-11-15 2007-05-24 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
KR20080068820A (en) 2005-11-16 2008-07-24 가부시키가이샤 니콘 Substrate processing method, photomask manufacturing method and photomask, and device manufacturing method
JP2007165869A (en) 2005-11-21 2007-06-28 Nikon Corp Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
US7803516B2 (en) 2005-11-21 2010-09-28 Nikon Corporation Exposure method, device manufacturing method using the same, exposure apparatus, and substrate processing method and apparatus
US7782442B2 (en) * 2005-12-06 2010-08-24 Nikon Corporation Exposure apparatus, exposure method, projection optical system and device producing method
KR20080071555A (en) * 2005-12-06 2008-08-04 가부시키가이샤 니콘 Exposure apparatus, exposure method, projection optical system and device manufacturing method
KR20080071552A (en) 2005-12-06 2008-08-04 가부시키가이샤 니콘 Exposure method, exposure apparatus and device manufacturing method
JP2007318069A (en) * 2005-12-06 2007-12-06 Nikon Corp Exposure apparatus and exposure method, device manufacturing method, and projection optical system
EP2768016B1 (en) 2005-12-08 2017-10-25 Nikon Corporation Exposure apparatus and method
KR100689836B1 (en) * 2005-12-23 2007-03-08 삼성전자주식회사 Exposure equipment having an auxiliary photo mask and exposure method using the same
TWI409598B (en) 2005-12-28 2013-09-21 尼康股份有限公司 Pattern forming method and pattern forming apparatus, exposure method and exposure apparatus, and component manufacturing method
US8411271B2 (en) * 2005-12-28 2013-04-02 Nikon Corporation Pattern forming method, pattern forming apparatus, and device manufacturing method
US8953148B2 (en) 2005-12-28 2015-02-10 Nikon Corporation Exposure apparatus and making method thereof
TWI457977B (en) 2005-12-28 2014-10-21 尼康股份有限公司 A pattern forming method and a pattern forming apparatus, and an element manufacturing method
WO2007077875A1 (en) * 2005-12-28 2007-07-12 Nikon Corporation Exposure apparatus, exposure method, and device production method
JP2007201457A (en) * 2005-12-28 2007-08-09 Nikon Corp Exposure apparatus, exposure method, and device manufacturing method
KR101323565B1 (en) 2006-01-19 2013-10-29 가부시키가이샤 니콘 Moving body drive method, moving body drive system, pattern formation method, pattern formation device, exposure method, exposure device, and device fabrication method
KR20080101865A (en) * 2006-02-16 2008-11-21 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device manufacturing method
TW200801833A (en) 2006-02-16 2008-01-01 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
KR20080102192A (en) * 2006-02-16 2008-11-24 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device manufacturing method
JP4957281B2 (en) * 2006-02-16 2012-06-20 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
KR20080103564A (en) * 2006-02-16 2008-11-27 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device manufacturing method
EP3267258A1 (en) 2006-02-21 2018-01-10 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
CN101385120B (en) 2006-02-21 2012-09-05 株式会社尼康 Measuring apparatus and method, processing apparatus and method, pattern forming apparatus and method, exposure apparatus and method, and device manufacturing method
CN101980084B (en) 2006-02-21 2013-01-23 株式会社尼康 Exposure apparatus, exposure method, and device manufacturing method
JP4973652B2 (en) * 2006-03-03 2012-07-11 株式会社ニコン Exposure apparatus and device manufacturing method
US8023103B2 (en) 2006-03-03 2011-09-20 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP4929762B2 (en) * 2006-03-03 2012-05-09 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
EP1995768A4 (en) * 2006-03-13 2013-02-06 Nikon Corp EXPOSURE APPARATUS, MAINTENANCE METHOD, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
US8982322B2 (en) 2006-03-17 2015-03-17 Nikon Corporation Exposure apparatus and device manufacturing method
US20080013062A1 (en) * 2006-03-23 2008-01-17 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
TWI454859B (en) 2006-03-30 2014-10-01 尼康股份有限公司 Mobile device, exposure device and exposure method, and component manufacturing method
US7884921B2 (en) * 2006-04-12 2011-02-08 Nikon Corporation Illumination optical apparatus, projection exposure apparatus, projection optical system, and device manufacturing method
EP2009677A4 (en) * 2006-04-14 2010-10-13 Nikon Corp EXPOSURE DEVICE, METHOD OF MANUFACTURING THE SAME, AND EXPOSURE METHOD
EP2009678A4 (en) * 2006-04-17 2011-04-06 Nikon Corp LIGHTING OPTICAL APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
DE102006021797A1 (en) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optical imaging device with thermal damping
EP2037486A4 (en) 2006-05-18 2012-01-11 Nikon Corp EXPOSURE METHOD AND APPARATUS, MAINTENANCE METHOD AND METHOD OF MANUFACTURING THE APPARATUS THEREFOR
TW200818256A (en) * 2006-05-22 2008-04-16 Nikon Corp Exposure method and apparatus, maintenance method, and device manufacturing method
EP2034515A4 (en) 2006-05-23 2012-01-18 Nikon Corp SERVICE METHOD, EXPOSURE METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD
WO2007135998A1 (en) 2006-05-24 2007-11-29 Nikon Corporation Holding device and exposure device
JPWO2007139017A1 (en) * 2006-05-29 2009-10-08 株式会社ニコン Liquid recovery member, substrate holding member, exposure apparatus, and device manufacturing method
CN101479832B (en) 2006-06-09 2011-05-11 株式会社尼康 Apparatus with mobile body, exposure apparatus, exposure method and device manufacturing method
EP2037488A4 (en) 2006-06-09 2011-11-23 Nikon Corp METHOD AND DEVICE FOR FORMING PATTERNS, METHOD AND DEVICE FOR EXPOSING, AND METHOD FOR MANUFACTURING DEVICES
WO2008001871A1 (en) 2006-06-30 2008-01-03 Nikon Corporation Maintenance method, exposure method and apparatus and device manufacturing method
WO2008007633A1 (en) * 2006-07-12 2008-01-17 Nikon Corporation Illuminating optical apparatus, exposure apparatus and device manufacturing method
WO2008026593A1 (en) * 2006-08-30 2008-03-06 Nikon Corporation Exposure apparatus, device production method, cleaning method, and cleaning member
SG10201507256WA (en) 2006-08-31 2015-10-29 Nikon Corp Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
TWI596444B (en) 2006-08-31 2017-08-21 尼康股份有限公司 Exposure method and device, and device manufacturing method
TWI547771B (en) 2006-08-31 2016-09-01 尼康股份有限公司 Mobile body drive system and moving body driving method, pattern forming apparatus and method, exposure apparatus and method, component manufacturing method, and method of determining
KR101770082B1 (en) 2006-09-01 2017-08-21 가부시키가이샤 니콘 Mobile object driving method, mobile object driving system, pattern forming method and apparatus, exposure method and apparatus, device manufacturing method and calibration method
SG10201407218XA (en) 2006-09-01 2015-01-29 Nippon Kogaku Kk Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
WO2008029884A1 (en) * 2006-09-08 2008-03-13 Nikon Corporation Cleaning member, cleaning method and device manufacturing method
KR101419195B1 (en) 2006-09-08 2014-07-15 가부시키가이샤 니콘 Mask, exposure apparatus and device manufacturing method
US7872730B2 (en) 2006-09-15 2011-01-18 Nikon Corporation Immersion exposure apparatus and immersion exposure method, and device manufacturing method
EP2085741A1 (en) * 2006-09-28 2009-08-05 Nikon Corporation Line width measuring method, image forming status detecting method, adjusting method, exposure method and device manufacturing method
US7999918B2 (en) * 2006-09-29 2011-08-16 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
KR101419196B1 (en) 2006-09-29 2014-07-15 가부시키가이샤 니콘 Exposure apparatus, exposure method, and device manufacturing method
US20080100909A1 (en) * 2006-10-30 2008-05-01 Nikon Corporation Optical element, liquid immersion exposure apparatus, liquid immersion exposure method, and method for producing microdevice
WO2008056735A1 (en) * 2006-11-09 2008-05-15 Nikon Corporation Holding unit, position detecting system and exposure system, moving method, position detecting method, exposure method, adjusting method of detection system, and device producing method
JP5055971B2 (en) 2006-11-16 2012-10-24 株式会社ニコン Surface treatment method, surface treatment apparatus, exposure method, exposure apparatus, and device manufacturing method
EP2998983B1 (en) * 2006-12-27 2018-03-21 Nikon Corporation Stage apparatus, exposure apparatus and device fabricating method
US20080212047A1 (en) * 2006-12-28 2008-09-04 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US8004651B2 (en) * 2007-01-23 2011-08-23 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
JP2010519722A (en) * 2007-02-23 2010-06-03 株式会社ニコン Exposure method, exposure apparatus, device manufacturing method, and immersion exposure substrate
KR101531426B1 (en) 2007-03-01 2015-06-24 가부시키가이샤 니콘 PELICLE FRAME DEVICE, MASK, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
US8497980B2 (en) * 2007-03-19 2013-07-30 Nikon Corporation Holding apparatus, exposure apparatus, exposure method, and device manufacturing method
US8134685B2 (en) * 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US20080246941A1 (en) * 2007-04-06 2008-10-09 Katsura Otaki Wavefront aberration measuring device, projection exposure apparatus, method for manufacturing projection optical system, and method for manufacturing device
KR20100014357A (en) * 2007-04-12 2010-02-10 가부시키가이샤 니콘 Measuring method, exposure method, and device fabricating method
US8665418B2 (en) * 2007-04-18 2014-03-04 Nikon Corporation Projection optical system, exposure apparatus, and device manufacturing method
US8194322B2 (en) * 2007-04-23 2012-06-05 Nikon Corporation Multilayer-film reflective mirror, exposure apparatus, device manufacturing method, and manufacturing method of multilayer-film reflective mirror
US20080266651A1 (en) * 2007-04-24 2008-10-30 Katsuhiko Murakami Optical apparatus, multilayer-film reflective mirror, exposure apparatus, and device
US8300207B2 (en) 2007-05-17 2012-10-30 Nikon Corporation Exposure apparatus, immersion system, exposing method, and device fabricating method
US20090122282A1 (en) * 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
KR20100031694A (en) * 2007-05-28 2010-03-24 가부시키가이샤 니콘 Exposure apparatus, device manufacturing method, cleaning device, cleaning method and exposure method
US8164736B2 (en) * 2007-05-29 2012-04-24 Nikon Corporation Exposure method, exposure apparatus, and method for producing device
US8098362B2 (en) 2007-05-30 2012-01-17 Nikon Corporation Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
US20090015806A1 (en) * 2007-06-04 2009-01-15 Nikon Corporation Environmental control apparatus, stage apparatus, exposure apparatus and device manufacturing method
JP4968335B2 (en) * 2007-06-11 2012-07-04 株式会社ニコン Measuring member, sensor, measuring method, exposure apparatus, exposure method, and device manufacturing method
US8547527B2 (en) 2007-07-24 2013-10-01 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
US8243257B2 (en) 2007-07-24 2012-08-14 Nikon Corporation Position measurement system, exposure apparatus, position measuring method, exposure method and device manufacturing method, and tool and measuring method
US8194232B2 (en) 2007-07-24 2012-06-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
JP5177449B2 (en) 2007-07-24 2013-04-03 株式会社ニコン Moving body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and device manufacturing method
US9025126B2 (en) * 2007-07-31 2015-05-05 Nikon Corporation Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
US20090051895A1 (en) * 2007-08-24 2009-02-26 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
US8237919B2 (en) * 2007-08-24 2012-08-07 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
US8023106B2 (en) * 2007-08-24 2011-09-20 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
US8867022B2 (en) 2007-08-24 2014-10-21 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
US8218129B2 (en) * 2007-08-24 2012-07-10 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
US9304412B2 (en) 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
CN101855705A (en) * 2007-09-07 2010-10-06 国立大学法人横滨国立大学 Drive control method, drive control device, stage control method, stage control device, exposure method, exposure device, and measurement device
US8421994B2 (en) 2007-09-27 2013-04-16 Nikon Corporation Exposure apparatus
JP5267029B2 (en) 2007-10-12 2013-08-21 株式会社ニコン Illumination optical apparatus, exposure apparatus, and device manufacturing method
CN101681123B (en) 2007-10-16 2013-06-12 株式会社尼康 Illumination optical system, exposure apparatus, and device manufacturing method
SG185313A1 (en) 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
DE102007051669A1 (en) * 2007-10-26 2009-04-30 Carl Zeiss Smt Ag Imaging optics, projection exposure apparatus for microlithography with such an imaging optical system and method for producing a microstructured component with such a projection exposure apparatus
US9013681B2 (en) * 2007-11-06 2015-04-21 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
WO2009060585A1 (en) * 2007-11-07 2009-05-14 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US9256140B2 (en) * 2007-11-07 2016-02-09 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
US8665455B2 (en) * 2007-11-08 2014-03-04 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
US8422015B2 (en) * 2007-11-09 2013-04-16 Nikon Corporation Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
CN101680746B (en) * 2007-12-11 2013-11-20 株式会社尼康 Moving body device, exposure device, pattern forming device, and device manufacturing method
US20090147228A1 (en) * 2007-12-11 2009-06-11 Nikon Corporation Exposure apparatus, manufacturing method thereof, and maintenance method of exposure apparatus
US8115906B2 (en) * 2007-12-14 2012-02-14 Nikon Corporation Movable body system, pattern formation apparatus, exposure apparatus and measurement device, and device manufacturing method
US8711327B2 (en) * 2007-12-14 2014-04-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20090174873A1 (en) * 2007-12-17 2009-07-09 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
SG153748A1 (en) 2007-12-17 2009-07-29 Asml Holding Nv Lithographic method and apparatus
US8355113B2 (en) * 2007-12-17 2013-01-15 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US8964166B2 (en) * 2007-12-17 2015-02-24 Nikon Corporation Stage device, exposure apparatus and method of producing device
SG183058A1 (en) * 2007-12-17 2012-08-30 Nikon Corp Exposure apparatus, exposure method and device manufacturing method
US8269945B2 (en) * 2007-12-28 2012-09-18 Nikon Corporation Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
US8237916B2 (en) * 2007-12-28 2012-08-07 Nikon Corporation Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
KR101477833B1 (en) * 2007-12-28 2014-12-30 가부시키가이샤 니콘 Exposure apparatus, moving body drive system, pattern forming apparatus and exposure method, and device manufacturing method
US8792079B2 (en) * 2007-12-28 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
US8451425B2 (en) * 2007-12-28 2013-05-28 Nikon Corporation Exposure apparatus, exposure method, cleaning apparatus, and device manufacturing method
JP5369443B2 (en) 2008-02-05 2013-12-18 株式会社ニコン Stage apparatus, exposure apparatus, exposure method, and device manufacturing method
WO2009098891A1 (en) * 2008-02-08 2009-08-13 Nikon Corporation Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing method
US20090218743A1 (en) * 2008-02-29 2009-09-03 Nikon Corporation Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall
US20100039628A1 (en) * 2008-03-19 2010-02-18 Nikon Corporation Cleaning tool, cleaning method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
SG156564A1 (en) * 2008-04-09 2009-11-26 Asml Holding Nv Lithographic apparatus and device manufacturing method
JPWO2009125867A1 (en) * 2008-04-11 2011-08-04 株式会社ニコン Stage apparatus, exposure apparatus, and device manufacturing method
US8654306B2 (en) * 2008-04-14 2014-02-18 Nikon Corporation Exposure apparatus, cleaning method, and device fabricating method
TW200951640A (en) * 2008-04-30 2009-12-16 Nikon Corp Exposure apparatus, exposure method, and device manufacturing method
SG174005A1 (en) 2008-04-30 2011-09-29 Nikon Corp Stage device, pattern formation apparatus, exposure apparatus, stage drive method, exposure method, and device manufacturing method
US8817236B2 (en) 2008-05-13 2014-08-26 Nikon Corporation Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
US8228482B2 (en) * 2008-05-13 2012-07-24 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8786829B2 (en) * 2008-05-13 2014-07-22 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP2282188B1 (en) 2008-05-28 2015-03-11 Nikon Corporation Illumination optical system and exposure apparatus
US20090305171A1 (en) * 2008-06-10 2009-12-10 Nikon Corporation Apparatus for scanning sites on a wafer along a short dimension of the sites
TW201003053A (en) * 2008-07-10 2010-01-16 Nikon Corp Deformation measuring apparatus, exposure apparatus, jig for deformation measuring apparatus, position measuring method and device manufacturing method
TW201009895A (en) * 2008-08-11 2010-03-01 Nikon Corp Exposure apparatus, maintaining method and device fabricating method
US8736813B2 (en) * 2008-08-26 2014-05-27 Nikon Corporation Exposure apparatus with an illumination system generating multiple illumination beams
US8705170B2 (en) * 2008-08-29 2014-04-22 Nikon Corporation High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations
US9304385B2 (en) * 2008-09-16 2016-04-05 Nikon Corporation Exposure method and device manufacturing method including selective deformation of a mask
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8325325B2 (en) * 2008-09-22 2012-12-04 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8994923B2 (en) * 2008-09-22 2015-03-31 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8384875B2 (en) * 2008-09-29 2013-02-26 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US20100091257A1 (en) * 2008-10-10 2010-04-15 Nikon Corporation Optical Imaging System and Method for Imaging Up to Four Reticles to a Single Imaging Location
US20100123883A1 (en) * 2008-11-17 2010-05-20 Nikon Corporation Projection optical system, exposure apparatus, and device manufacturing method
JP5151949B2 (en) * 2008-12-10 2013-02-27 株式会社ニコン MOBILE DEVICE, MOBILE DRIVING METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
US8902402B2 (en) 2008-12-19 2014-12-02 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8760629B2 (en) 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8599359B2 (en) 2008-12-19 2013-12-03 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, and carrier method
US8773635B2 (en) 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20100196832A1 (en) 2009-01-30 2010-08-05 Nikon Corporation Exposure apparatus, exposing method, liquid immersion member and device fabricating method
JP5482784B2 (en) 2009-03-10 2014-05-07 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
US8953143B2 (en) * 2009-04-24 2015-02-10 Nikon Corporation Liquid immersion member
US20100296074A1 (en) * 2009-04-30 2010-11-25 Nikon Corporation Exposure method, and device manufacturing method
US20110085152A1 (en) * 2009-05-07 2011-04-14 Hideaki Nishino Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method
TW201115280A (en) * 2009-05-15 2011-05-01 Nikon Corp Exposure apparatus and device manufacturing method
US20100323303A1 (en) * 2009-05-15 2010-12-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, and device fabricating method
US8970820B2 (en) 2009-05-20 2015-03-03 Nikon Corporation Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method
US8553204B2 (en) * 2009-05-20 2013-10-08 Nikon Corporation Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
US8792084B2 (en) * 2009-05-20 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US9312159B2 (en) 2009-06-09 2016-04-12 Nikon Corporation Transport apparatus and exposure apparatus
US8355116B2 (en) 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
US8472008B2 (en) * 2009-06-19 2013-06-25 Nikon Corporation Movable body apparatus, exposure apparatus and device manufacturing method
US8355114B2 (en) * 2009-06-19 2013-01-15 Nikon Corporation Exposure apparatus and device manufacturing method
US8294878B2 (en) 2009-06-19 2012-10-23 Nikon Corporation Exposure apparatus and device manufacturing method
US8446569B2 (en) 2009-06-19 2013-05-21 Nikon Corporation Exposure apparatus, exposure method and device manufacturing method
US20110008734A1 (en) * 2009-06-19 2011-01-13 Nikon Corporation Exposure apparatus and device manufacturing method
TWI512405B (en) * 2009-08-07 2015-12-11 尼康股份有限公司 A moving body device, an exposure apparatus, and an element manufacturing method
JP5618261B2 (en) * 2009-08-07 2014-11-05 株式会社ニコン Exposure apparatus and device manufacturing method
US8514395B2 (en) 2009-08-25 2013-08-20 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US8493547B2 (en) 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US8488109B2 (en) 2009-08-25 2013-07-16 Nikon Corporation Exposure method, exposure apparatus, and device manufacturing method
US20110102761A1 (en) * 2009-09-28 2011-05-05 Nikon Corporation Stage apparatus, exposure apparatus, and device fabricating method
US20110096312A1 (en) 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110096318A1 (en) 2009-09-28 2011-04-28 Nikon Corporation Exposure apparatus and device fabricating method
US20110075120A1 (en) 2009-09-30 2011-03-31 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110086315A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110085150A1 (en) 2009-09-30 2011-04-14 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US20110199591A1 (en) * 2009-10-14 2011-08-18 Nikon Corporation Exposure apparatus, exposing method, maintenance method and device fabricating method
WO2011052703A1 (en) 2009-10-30 2011-05-05 Nikon Corporation Exposure apparatus and device manufacturing method
TWI643027B (en) 2009-11-09 2018-12-01 尼康股份有限公司 Exposure apparatus, exposure method, maintenance method of exposure apparatus, adjustment method of exposure apparatus, and component manufacturing method
US20110242520A1 (en) 2009-11-17 2011-10-06 Nikon Corporation Optical properties measurement method, exposure method and device manufacturing method
US20110123913A1 (en) 2009-11-19 2011-05-26 Nikon Corporation Exposure apparatus, exposing method, and device fabricating method
US20110128523A1 (en) * 2009-11-19 2011-06-02 Nikon Corporation Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
US20110164238A1 (en) 2009-12-02 2011-07-07 Nikon Corporation Exposure apparatus and device fabricating method
US20110134400A1 (en) * 2009-12-04 2011-06-09 Nikon Corporation Exposure apparatus, liquid immersion member, and device manufacturing method
WO2011081062A1 (en) 2009-12-28 2011-07-07 株式会社ニコン Liquid immersion member, method for manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
US8488106B2 (en) 2009-12-28 2013-07-16 Nikon Corporation Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
KR20120113238A (en) 2010-01-08 2012-10-12 가부시키가이샤 니콘 Liquid-immersion member, exposing device, exposing method, and device manufacturing method
US8841065B2 (en) 2010-02-12 2014-09-23 Nikon Corporation Manufacturing method of exposure apparatus and device manufacturing method
WO2011102109A1 (en) 2010-02-20 2011-08-25 株式会社ニコン Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method
US20110222031A1 (en) 2010-03-12 2011-09-15 Nikon Corporation Liquid immersion member, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013863A1 (en) 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US8937703B2 (en) 2010-07-14 2015-01-20 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120013864A1 (en) 2010-07-14 2012-01-19 Nikon Corporation Liquid immersion member, immersion exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120012191A1 (en) 2010-07-16 2012-01-19 Nikon Corporation Liquid recovery apparatus, exposure apparatus, liquid recovering method, device fabricating method, program, and storage medium
US20120019804A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, cleaning apparatus, device fabricating method, program, and storage medium
US20120019803A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program, and storage medium
US20120019802A1 (en) 2010-07-23 2012-01-26 Nikon Corporation Cleaning method, immersion exposure apparatus, device fabricating method, program, and storage medium
US20120162619A1 (en) 2010-12-27 2012-06-28 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposing method, device fabricating method, program, and storage medium
US20120188521A1 (en) 2010-12-27 2012-07-26 Nikon Corporation Cleaning method, liquid immersion member, immersion exposure apparatus, device fabricating method, program and storage medium
WO2012102060A1 (en) 2011-01-28 2012-08-02 株式会社ニコン Driving system and driving method, light exposure device and light exposure method, and driving system designing method
NL2008157A (en) * 2011-02-22 2012-08-24 Asml Netherlands Bv Lithographic apparatus and lithographic projection method.
WO2012115002A1 (en) 2011-02-22 2012-08-30 株式会社ニコン Holding device, exposure device and production method for device
US10120283B2 (en) 2011-06-06 2018-11-06 Nikon Corporation Illumination method, illumination optical device, and exposure device
JP6020834B2 (en) 2011-06-07 2016-11-02 株式会社ニコン Illumination optical system, exposure apparatus, and device manufacturing method
TWI587002B (en) 2011-06-13 2017-06-11 尼康股份有限公司 Lighting method
US20130016329A1 (en) 2011-07-12 2013-01-17 Nikon Corporation Exposure apparatus, exposure method, measurement method, and device manufacturing method
US9329496B2 (en) 2011-07-21 2016-05-03 Nikon Corporation Exposure apparatus, exposure method, method of manufacturing device, program, and storage medium
US9256137B2 (en) 2011-08-25 2016-02-09 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130050666A1 (en) 2011-08-26 2013-02-28 Nikon Corporation Exposure apparatus, liquid holding method, and device manufacturing method
US20130135594A1 (en) 2011-11-25 2013-05-30 Nikon Corporation Liquid immersion member, immersion exposure apparatus, exposure method, device manufacturing method, program, and recording medium
US20130169944A1 (en) 2011-12-28 2013-07-04 Nikon Corporation Exposure apparatus, exposure method, device manufacturing method, program, and recording medium
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
US9360772B2 (en) 2011-12-29 2016-06-07 Nikon Corporation Carrier method, exposure method, carrier system and exposure apparatus, and device manufacturing method
US9268231B2 (en) 2012-04-10 2016-02-23 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
WO2013161428A1 (en) 2012-04-26 2013-10-31 株式会社ニコン Measurement method and encoder device, and exposure method and device
US9081297B2 (en) 2012-05-01 2015-07-14 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography apparatus having dual reticle edge masking assemblies and method of use
WO2013175835A1 (en) 2012-05-21 2013-11-28 株式会社ニコン Reflector, projection optical system, exposure apparatus, and device manufacturing method
US8993974B2 (en) 2012-06-12 2015-03-31 Nikon Corporation Color time domain integration camera having a single charge coupled device and fringe projection auto-focus system
CN104541208B (en) 2012-07-09 2019-01-22 株式会社尼康 Driving system and driving method, and exposure apparatus and exposure method
US9823580B2 (en) 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9243896B2 (en) 2012-08-15 2016-01-26 Nikon Corporation Two axis encoder head assembly
EP2905805B1 (en) 2012-10-02 2020-07-22 Nikon Corporation Exposure apparatus, exposure method, and pattern-manufacturing method by lithography
JP6394967B2 (en) 2012-10-02 2018-09-26 株式会社ニコン MOBILE DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
US9568828B2 (en) 2012-10-12 2017-02-14 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9494870B2 (en) 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9772564B2 (en) 2012-11-12 2017-09-26 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method
US9798252B2 (en) 2012-11-20 2017-10-24 Nikon Corporation Exposure apparatus, movable body apparatus, and device manufacturing method
WO2014084229A1 (en) 2012-11-30 2014-06-05 株式会社ニコン Transfer system, exposure apparatus, transfer method, exposure method, device manufacturing method, and suction apparatus
EP3866184B1 (en) 2012-11-30 2024-10-09 Nikon Corporation Carrier system, exposure apparatus and carry-in method
US9651873B2 (en) 2012-12-27 2017-05-16 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
JP6119242B2 (en) 2012-12-27 2017-04-26 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
US9720331B2 (en) 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
US9057955B2 (en) 2013-01-22 2015-06-16 Nikon Corporation Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
US9352073B2 (en) 2013-01-22 2016-05-31 Niko Corporation Functional film
WO2014132923A1 (en) 2013-02-28 2014-09-04 株式会社ニコン Sliding film, member on which sliding film is formed, and manufacturing method therefor
KR20160003140A (en) 2013-05-09 2016-01-08 가부시키가이샤 니콘 Optical element, projection optical system, exposure apparatus, and device manufacturing method
HK1220808A1 (en) 2013-06-28 2017-05-12 株式会社尼康 Mobile body apparatus, exposure apparatus, and device manufacturing method
WO2015001805A1 (en) 2013-07-05 2015-01-08 株式会社ニコン Multilayer film reflector, multilayer film reflector manufacturing method, projection optical system, exposure apparatus, device manufacturing method
US20160336101A1 (en) 2013-09-04 2016-11-17 Ckd Corporation Armature coil for electromagnetic actuator, electromagnetic actuator, exposure apparatus, and device manufacturing method
JP6369472B2 (en) 2013-10-08 2018-08-08 株式会社ニコン Immersion member, exposure apparatus and exposure method, and device manufacturing method
KR102746062B1 (en) 2013-10-30 2024-12-23 가부시키가이샤 니콘 Substrate-holding apparatus, exposure apparatus, and device manufacturing method
JP6380412B2 (en) 2014-01-16 2018-08-29 株式会社ニコン Exposure apparatus, exposure method, and device manufacturing method
US20150234295A1 (en) * 2014-02-20 2015-08-20 Nikon Corporation Dynamic patterning method that removes phase conflicts and improves pattern fidelity and cdu on a two phase-pixelated digital scanner
US10088756B2 (en) 2014-07-08 2018-10-02 Asml Netherlands B.V. Lithographic apparatus and method
KR102658509B1 (en) 2014-12-24 2024-04-17 가부시키가이샤 니콘 Method for controlling moving body, exposure method, method for manufacturing device, moving body apparatus, and exposure apparatus
JP6459082B2 (en) 2014-12-24 2019-01-30 株式会社ニコン Measuring apparatus and measuring method, exposure apparatus and exposure method, and device manufacturing method
TWI703402B (en) 2015-03-25 2020-09-01 日商尼康股份有限公司 Layout method, mark detection method, exposure method, measurement device, exposure apparatus, and device manufacturing method
KR102556130B1 (en) 2016-09-27 2023-07-14 가부시키가이샤 니콘 Determination method and apparatus, program, information recording medium, exposure apparatus, layout information providing method, layout method, mark detection method, exposure method, and device manufacturing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03183115A (en) * 1989-12-12 1991-08-09 Seiko Epson Corp Semiconductor manufacturing apparatus
US6134008A (en) * 1996-07-15 2000-10-17 Mitsubishi Denki Kabushiki Kaisha Aligner and patterning method using phase shift mask
US6153357A (en) * 1990-03-20 2000-11-28 Hitachi, Ltd. Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5841520A (en) * 1995-08-09 1998-11-24 Nikon Corporatioin Exposure apparatus and method that use mark patterns to determine image formation characteristics of the apparatus prior to exposure
US5851701A (en) * 1997-04-01 1998-12-22 Micron Technology, Inc. Atom lithographic mask having diffraction grating and attenuated phase shifters
US6351304B1 (en) * 1999-06-04 2002-02-26 Canon Kabushiki Kaisha Multiple exposure method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03183115A (en) * 1989-12-12 1991-08-09 Seiko Epson Corp Semiconductor manufacturing apparatus
US6153357A (en) * 1990-03-20 2000-11-28 Hitachi, Ltd. Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
US6134008A (en) * 1996-07-15 2000-10-17 Mitsubishi Denki Kabushiki Kaisha Aligner and patterning method using phase shift mask

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 015, no. 434 (E - 1129) 6 November 1991 (1991-11-06) *
See also references of EP1364257A1 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8721803B2 (en) 2006-12-05 2014-05-13 Nikon Corporation Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method

Also Published As

Publication number Publication date
US20020123012A1 (en) 2002-09-05
KR100815222B1 (en) 2008-03-19
US6611316B2 (en) 2003-08-26
JP4714403B2 (en) 2011-06-29
EP1364257A1 (en) 2003-11-26
KR20030053473A (en) 2003-06-28
WO2002069049A2 (en) 2002-09-06
JP2004519850A (en) 2004-07-02

Similar Documents

Publication Publication Date Title
WO2002069049A3 (en) Simultaneous imaging of two reticles
EP1233305A3 (en) Photolithographic device with multiple reticles
EP1039511A4 (en) Projection exposure method and projection aligner
EP0964307A3 (en) Projection exposure apparatus and method
AU5174798A (en) Method and system for imaging an object or pattern
US7355690B2 (en) Double inspection of reticle or wafer
CA2246698A1 (en) Confocal microscope
EP1120690A2 (en) EUV reticle thermal management
TW200715443A (en) A method and a system for establishing an inspection-recipe
WO1999014706A3 (en) Visual inspection and verification system
EP0964282A3 (en) Projection exposure apparatus with a catadioptric projection optical system
EP1154330A3 (en) Exposure method and exposure apparatus
ATE459982T1 (en) METHOD AND APPARATUS FOR PRODUCING A BONDED DIELECTRIC SEPARATION WAFER
WO2002099533A3 (en) Alternating phase-shift mask inspection method and apparatus
EP1041443A3 (en) Lithographic process for device fabrication using dark-field illumination and apparatus therefor
EP0874283A3 (en) Optical exposure apparatus and photo-cleaning method
WO2003076891A3 (en) Moiré method and measuring system for measuring the distortion of an optical imaging system
US6795168B2 (en) Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process
EP1441257A3 (en) Illumination apparatus, projection exposure apparatus, and device fabricating method
JPH1050585A5 (en)
EP1298494A2 (en) High numerical aperture projection system for microlithography
TWI847264B (en) High resolution multispectral multi-field-of-view imaging system for wafer inspection
JP3347405B2 (en) Illumination device and exposure apparatus including the illumination device
JPH07130606A (en) Aligner
JP2986627B2 (en) Alignment method of mask and work in proximity exposure apparatus

Legal Events

Date Code Title Description
ENP Entry into the national phase

Ref country code: JP

Ref document number: 2002 568106

Kind code of ref document: A

Format of ref document f/p: F

WWE Wipo information: entry into national phase

Ref document number: 2002707881

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1020027014433

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 1020027014433

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 2002707881

Country of ref document: EP