WO2002078033A3 - Emetteur de faisceau electronique - Google Patents

Emetteur de faisceau electronique Download PDF

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Publication number
WO2002078033A3
WO2002078033A3 PCT/US2002/007442 US0207442W WO02078033A3 WO 2002078033 A3 WO2002078033 A3 WO 2002078033A3 US 0207442 W US0207442 W US 0207442W WO 02078033 A3 WO02078033 A3 WO 02078033A3
Authority
WO
WIPO (PCT)
Prior art keywords
filament
section
electron beam
beam emitter
variable cross
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2002/007442
Other languages
English (en)
Other versions
WO2002078033A2 (fr
Inventor
Tzvi Avnery
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Electron Beams Inc
Original Assignee
Advanced Electron Beams Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Electron Beams Inc filed Critical Advanced Electron Beams Inc
Priority to AU2002250296A priority Critical patent/AU2002250296A1/en
Priority to EP02719199A priority patent/EP1402553A2/fr
Priority to JP2002575976A priority patent/JP2004535655A/ja
Publication of WO2002078033A2 publication Critical patent/WO2002078033A2/fr
Publication of WO2002078033A3 publication Critical patent/WO2002078033A3/fr
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/13—Solid thermionic cathodes
    • H01J1/15—Cathodes heated directly by an electric current
    • H01J1/16—Cathodes heated directly by an electric current characterised by the shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J33/00—Discharge tubes with provision for emergence of electrons or ions from the vessel; Lenard tubes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Cold Cathode And The Manufacture (AREA)

Abstract

La présente invention concerne un filament permettant de générer des électrons pour un émetteur de faisceau électronique dans lequel le filament présente une section transversale et une longueur. La section transversale du filament varie selon la longueur afin de produire un profil désiré de génération d'électrons.
PCT/US2002/007442 2001-03-21 2002-03-12 Emetteur de faisceau electronique Ceased WO2002078033A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2002250296A AU2002250296A1 (en) 2001-03-21 2002-03-12 Filament having a variable cross-section, and electron beam emitter comprising such filament
EP02719199A EP1402553A2 (fr) 2001-03-21 2002-03-12 Emetteur de faisceau electronique
JP2002575976A JP2004535655A (ja) 2001-03-21 2002-03-12 電子ビーム放射器

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/813,928 US6630774B2 (en) 2001-03-21 2001-03-21 Electron beam emitter
US09/813,928 2001-03-21

Publications (2)

Publication Number Publication Date
WO2002078033A2 WO2002078033A2 (fr) 2002-10-03
WO2002078033A3 true WO2002078033A3 (fr) 2003-08-07

Family

ID=25213783

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/007442 Ceased WO2002078033A2 (fr) 2001-03-21 2002-03-12 Emetteur de faisceau electronique

Country Status (5)

Country Link
US (3) US6630774B2 (fr)
EP (1) EP1402553A2 (fr)
JP (1) JP2004535655A (fr)
AU (1) AU2002250296A1 (fr)
WO (1) WO2002078033A2 (fr)

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US6630774B2 (en) * 2001-03-21 2003-10-07 Advanced Electron Beams, Inc. Electron beam emitter
US7265367B2 (en) * 2001-03-21 2007-09-04 Advanced Electron Beams, Inc. Electron beam emitter
US7800194B2 (en) 2002-04-23 2010-09-21 Freedman Philip D Thin film photodetector, method and system
US7148613B2 (en) 2004-04-13 2006-12-12 Valence Corporation Source for energetic electrons
US20090205947A1 (en) * 2005-02-10 2009-08-20 John Barkanic Method for the reduction of malodorous compounds
JP3758667B1 (ja) 2005-05-17 2006-03-22 日新イオン機器株式会社 イオン源
US7750313B2 (en) 2005-05-17 2010-07-06 Nissin Ion Equipment Co., Ltd. Ion source
EP1775752A3 (fr) * 2005-10-15 2007-06-13 Burth, Dirk, Dr. Procédé de fabrication d'une fenêtre de sortie d'électrons par érodage
WO2008039461A2 (fr) * 2006-09-27 2008-04-03 Thinsilicon Corp. dispositif de contact arriÈre pour cellules photovoltaïques et procÉdÉ de fabrication d'un contact arriÈre
JP4910819B2 (ja) * 2007-03-26 2012-04-04 澁谷工業株式会社 電子線殺菌装置
US7656236B2 (en) 2007-05-15 2010-02-02 Teledyne Wireless, Llc Noise canceling technique for frequency synthesizer
WO2008150769A2 (fr) * 2007-05-31 2008-12-11 Thinsilicon Corporation Dispositif photovoltaïque et procédé de fabrication de dispositifs photovoltaïques
US8179045B2 (en) 2008-04-22 2012-05-15 Teledyne Wireless, Llc Slow wave structure having offset projections comprised of a metal-dielectric composite stack
JP2011521259A (ja) * 2008-05-21 2011-07-21 アドバンスト・エレクトロン・ビームズ・インコーポレーテッド スロットを含む電子銃を備える電子ビーム照射装置
SE0802101A2 (sv) * 2008-10-07 2010-07-20 Tetra Laval Holdings & Finance Omkopplingsbar anordning för elektronstrålesterilisering
SE0802102A2 (sv) * 2008-10-07 2010-07-20 Tetra Laval Holdings & Finance Styrmetod för en anordning för elektronstrålesterilisering och en anordning för utförande av nämnda metod
KR101319674B1 (ko) * 2009-05-06 2013-10-17 씬실리콘 코포레이션 광기전 전지 및 반도체층 적층체에서의 광 포획성 향상 방법
WO2010144459A2 (fr) * 2009-06-10 2010-12-16 Thinsilicon Corporation Modules photovoltaïques et procédés de production de modules photovoltaïques comprenant des empilements tandem de couches semi-conductrices
US20110114156A1 (en) * 2009-06-10 2011-05-19 Thinsilicon Corporation Photovoltaic modules having a built-in bypass diode and methods for manufacturing photovoltaic modules having a built-in bypass diode
CA2684277A1 (fr) * 2009-11-03 2011-05-03 Slab Innovation Inc. Revetement de briques pour mur mince et ensemble de fabrication connexe
DE102009061727B4 (de) * 2009-12-07 2017-09-14 Crosslinking AB Elektronenstrahleinheit mit Strahlfeldbegrenzung und Verfahren dazu
US9202660B2 (en) 2013-03-13 2015-12-01 Teledyne Wireless, Llc Asymmetrical slow wave structures to eliminate backward wave oscillations in wideband traveling wave tubes

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DE707254C (de) * 1937-08-31 1941-06-17 Telefunken Gmbh Unmittelbar geheizte Gluehkathode, bestehend aus Metallbaendern
GB888847A (en) * 1957-07-29 1962-02-07 Tesla Np A directly heated cathode wire
JPS59111223A (ja) * 1982-12-15 1984-06-27 Japan Atom Energy Res Inst テ−パ−付フイラメント陰極
US4473771A (en) * 1980-06-20 1984-09-25 Universite Laval Thermionic emitter for electron microscopy
US4760306A (en) * 1983-06-10 1988-07-26 The United States Of America As Represented By The United States Department Of Energy Electron emitting filaments for electron discharge devices
JPH08171848A (ja) * 1994-12-20 1996-07-02 Denki Kagaku Kogyo Kk 熱陰極構造体
JP2000011854A (ja) * 1998-06-08 2000-01-14 General Electric Co <Ge> フィラメント、エミッタ製造方法及びフィラメント支持系
WO2000034958A2 (fr) * 1998-12-10 2000-06-15 Applied Advanced Technologies, Inc. Accelerateur d'electrons a large faisceau d'electrons
WO2001004924A1 (fr) * 1999-07-09 2001-01-18 Advanced Electron Beams, Inc. Accelerateur de faisceau d'electrons

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US3610993A (en) 1969-12-31 1971-10-05 Westinghouse Electric Corp Electronic image device with mesh electrode for reducing moire patterns
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NL8302616A (nl) 1983-07-22 1985-02-18 Philips Nv Electronenbeeldbuis met een invangruimte voor losse deeltjes.
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US5254911A (en) 1991-11-22 1993-10-19 Energy Sciences Inc. Parallel filament electron gun
US5432876C1 (en) * 1992-10-19 2002-05-21 Minnesota Mining & Mfg Illumination devices and optical fibres for use therein
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DE4432984C2 (de) 1994-09-16 1996-08-14 Messer Griesheim Schweistechni Vorrichtung zum Bestrahlen von Oberflächen mit Elektronen
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NL1006491C2 (nl) 1997-07-04 1999-01-05 Quatre Mains Bv Inrichting voor het aanbrengen van geslepen tanden op een langwerpig blad.
US5856674A (en) * 1997-09-16 1999-01-05 Eaton Corporation Filament for ion implanter plasma shower
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EP1153240B1 (fr) * 1999-02-24 2003-11-19 3M Innovative Properties Company Dispositif d'eclairage servant a produire des modeles d'intensite predetermines
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US6630774B2 (en) * 2001-03-21 2003-10-07 Advanced Electron Beams, Inc. Electron beam emitter

Patent Citations (10)

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Publication number Priority date Publication date Assignee Title
DE707254C (de) * 1937-08-31 1941-06-17 Telefunken Gmbh Unmittelbar geheizte Gluehkathode, bestehend aus Metallbaendern
GB888847A (en) * 1957-07-29 1962-02-07 Tesla Np A directly heated cathode wire
US4473771A (en) * 1980-06-20 1984-09-25 Universite Laval Thermionic emitter for electron microscopy
JPS59111223A (ja) * 1982-12-15 1984-06-27 Japan Atom Energy Res Inst テ−パ−付フイラメント陰極
US4760306A (en) * 1983-06-10 1988-07-26 The United States Of America As Represented By The United States Department Of Energy Electron emitting filaments for electron discharge devices
JPH08171848A (ja) * 1994-12-20 1996-07-02 Denki Kagaku Kogyo Kk 熱陰極構造体
JP2000011854A (ja) * 1998-06-08 2000-01-14 General Electric Co <Ge> フィラメント、エミッタ製造方法及びフィラメント支持系
US6259193B1 (en) * 1998-06-08 2001-07-10 General Electric Company Emissive filament and support structure
WO2000034958A2 (fr) * 1998-12-10 2000-06-15 Applied Advanced Technologies, Inc. Accelerateur d'electrons a large faisceau d'electrons
WO2001004924A1 (fr) * 1999-07-09 2001-01-18 Advanced Electron Beams, Inc. Accelerateur de faisceau d'electrons

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Title
PATENT ABSTRACTS OF JAPAN vol. 008, no. 229 (E - 273) 20 October 1984 (1984-10-20) *
PATENT ABSTRACTS OF JAPAN vol. 1996, no. 11 29 November 1996 (1996-11-29) *
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 04 31 August 2000 (2000-08-31) *

Also Published As

Publication number Publication date
US20020135285A1 (en) 2002-09-26
US6800989B2 (en) 2004-10-05
EP1402553A2 (fr) 2004-03-31
US20040064938A1 (en) 2004-04-08
US6630774B2 (en) 2003-10-07
WO2002078033A2 (fr) 2002-10-03
AU2002250296A1 (en) 2002-10-08
US20050052109A1 (en) 2005-03-10
JP2004535655A (ja) 2004-11-25
US7180231B2 (en) 2007-02-20

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