WO2002098175A3 - Vorrichtung zur erwärmung von substraten mit seitenblenden und/oder sekundären reflektoren - Google Patents

Vorrichtung zur erwärmung von substraten mit seitenblenden und/oder sekundären reflektoren Download PDF

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Publication number
WO2002098175A3
WO2002098175A3 PCT/DE2002/001384 DE0201384W WO02098175A3 WO 2002098175 A3 WO2002098175 A3 WO 2002098175A3 DE 0201384 W DE0201384 W DE 0201384W WO 02098175 A3 WO02098175 A3 WO 02098175A3
Authority
WO
WIPO (PCT)
Prior art keywords
reflectors
screens
area
heating substrates
secondary reflectors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/DE2002/001384
Other languages
English (en)
French (fr)
Other versions
WO2002098175A2 (de
Inventor
Barbara Gerstendoerfer-Hart
Gunther Ackermann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10126019A external-priority patent/DE10126019A1/de
Application filed by Individual filed Critical Individual
Priority to EP02737791A priority Critical patent/EP1390969B1/de
Priority to DE10292382T priority patent/DE10292382D2/de
Priority to AU2002312723A priority patent/AU2002312723A1/en
Priority to DE50212070T priority patent/DE50212070D1/de
Publication of WO2002098175A2 publication Critical patent/WO2002098175A2/de
Publication of WO2002098175A3 publication Critical patent/WO2002098175A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/128—Infrared light
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0879—Solid
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/032—Heaters specially adapted for heating by radiation heating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0431—Apparatus for thermal treatment
    • H10P72/0436—Apparatus for thermal treatment mainly by radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Control Of Resistance Heating (AREA)
  • Recrystallisation Techniques (AREA)
  • Central Heating Systems (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Absorbent Articles And Supports Therefor (AREA)
  • Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
  • Resistance Heating (AREA)

Abstract

Die vorliegende Erfindung betrifft eine Vorrichtung zur Erwärmung von Substraten mit einem Emitter (1) zur Emission elektromagnetischer Strahlung (6) im Wellenlängenbereich von 200 nm bis 10000 nm sowie mit einem primären Reflektor (2), wobei der oder die primären Reflektoren (2) im Querschnitt in Form eines Polygonzuges oder einer Kurve ausgebildet sind und wobei in dem nachfolgenden Bereich zwischen dem Emitter (1) und dem zu bestrahlenden Substrat (5) oder einseitig oder beidseitig von diesem Bereich oder diesen bereich vollständig oder abschnittsweise umlaufen ein oder mehrere Blenden (3) und/oder sekundäre Reflektoren (9) vorgesehen sind, welche im Querschnitt in Form eines Polygonzuges oder einer Kurve ausgebildet sind, wobei die auf das Substrat (5) auftreffende Strahlung (6, 7) hinsichtlich ihrer Energieverteilung weitgehendst homogen ist.
PCT/DE2002/001384 2001-05-28 2002-04-13 Vorrichtung zur erwärmung von substraten mit seitenblenden und/oder sekundären reflektoren Ceased WO2002098175A2 (de)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP02737791A EP1390969B1 (de) 2001-05-28 2002-04-13 Vorrichtung zur erwärmung von substraten mit seitenblenden und sekundären reflektoren
DE10292382T DE10292382D2 (de) 2001-05-28 2002-04-13 Vorrichtung zur Erwärmung von Substraten mit Seitenblenden und/oder sekundären Reflektoren
AU2002312723A AU2002312723A1 (en) 2001-05-28 2002-04-13 Device for heating substrates with side screens and/or secondary reflectors
DE50212070T DE50212070D1 (de) 2001-05-28 2002-04-13 Vorrichtung zur erwärmung von substraten mit seitenblenden und sekundären reflektoren

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE10126019A DE10126019A1 (de) 2001-05-28 2001-05-28 Vorrichtung und Verfahren zur Temperierung von Substraten
DE10126019.9 2001-05-28
DE20116416.7 2001-10-08
DE20116416U DE20116416U1 (de) 2001-05-28 2001-10-08 Vorrichtung zur Erwärmung von Substraten mit Seitenblenden

Publications (2)

Publication Number Publication Date
WO2002098175A2 WO2002098175A2 (de) 2002-12-05
WO2002098175A3 true WO2002098175A3 (de) 2003-02-20

Family

ID=26009427

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2002/001384 Ceased WO2002098175A2 (de) 2001-05-28 2002-04-13 Vorrichtung zur erwärmung von substraten mit seitenblenden und/oder sekundären reflektoren

Country Status (4)

Country Link
EP (1) EP1390969B1 (de)
AT (1) ATE392008T1 (de)
DE (2) DE50212070D1 (de)
WO (1) WO2002098175A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMO20030095A1 (it) * 2003-04-04 2004-10-05 Dal Pont Engineering S R L Apparato per la polimerizzazione di inchiostri e vernici su supporti
DE102007048564A1 (de) * 2007-10-09 2009-04-23 Heraeus Noblelight Gmbh Vorrichtung für eine Bestrahlungseinheit
US20170358446A1 (en) * 2016-06-13 2017-12-14 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer processing apparatus and wafer processing method using the same

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4832777A (en) * 1987-07-16 1989-05-23 Texas Instruments Incorporated Processing apparatus and method
JPH0794415A (ja) * 1993-09-20 1995-04-07 Fujitsu Ltd ランプ加熱装置
US5892886A (en) * 1996-02-02 1999-04-06 Micron Technology, Inc. Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes
US6080965A (en) * 1997-09-18 2000-06-27 Tokyo Electron Limited Single-substrate-heat-treatment apparatus in semiconductor processing system
US6108491A (en) * 1998-10-30 2000-08-22 Applied Materials, Inc. Dual surface reflector
DE19923400A1 (de) * 1999-05-21 2000-11-30 Steag Rtp Systems Gmbh Vorrichtung und Verfahren zum thermischen Behandeln von Substraten

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4832777A (en) * 1987-07-16 1989-05-23 Texas Instruments Incorporated Processing apparatus and method
JPH0794415A (ja) * 1993-09-20 1995-04-07 Fujitsu Ltd ランプ加熱装置
US5892886A (en) * 1996-02-02 1999-04-06 Micron Technology, Inc. Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes
US6080965A (en) * 1997-09-18 2000-06-27 Tokyo Electron Limited Single-substrate-heat-treatment apparatus in semiconductor processing system
US6108491A (en) * 1998-10-30 2000-08-22 Applied Materials, Inc. Dual surface reflector
DE19923400A1 (de) * 1999-05-21 2000-11-30 Steag Rtp Systems Gmbh Vorrichtung und Verfahren zum thermischen Behandeln von Substraten

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 07 31 August 1995 (1995-08-31) *

Also Published As

Publication number Publication date
WO2002098175A2 (de) 2002-12-05
DE50212070D1 (de) 2008-05-21
EP1390969A2 (de) 2004-02-25
EP1390969B1 (de) 2008-04-09
DE10292382D2 (de) 2004-07-01
ATE392008T1 (de) 2008-04-15

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