WO2003000961A2 - Dispositif de fabrication de cristaux d'alliage - Google Patents
Dispositif de fabrication de cristaux d'alliage Download PDFInfo
- Publication number
- WO2003000961A2 WO2003000961A2 PCT/FR2002/002192 FR0202192W WO03000961A2 WO 2003000961 A2 WO2003000961 A2 WO 2003000961A2 FR 0202192 W FR0202192 W FR 0202192W WO 03000961 A2 WO03000961 A2 WO 03000961A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- zone
- heating
- oven
- furnace
- solidification
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
- C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1092—Shape defined by a solid member other than seed or product [e.g., Bridgman-Stockbarger]
Definitions
- the present invention relates to a device for manufacturing alloy crystals by cooling and controlled solidification of a liquid material.
- the homogeneity of the chemical composition is crucial because, in one case, it allows the mesh parameter to be adapted to that of an active thin layer deposited by epitaxy and, in another case, it participates directly in the detection.
- the coefficient k for the element Zn is equal to 1.3 which means that the percentage of Zn varies from simple to double along the ingot. This is shown in the diagram in Figure 1.
- the ordinate axis represents the concentration C of Zn in the alloy and the abscissa axis represents the fraction f of the solidified ingot.
- Curve 1 shows the evolution of the concentration of Zn according to the Pfann relation.
- Another known solution in an attempt to remedy this problem consists, in certain cases, in adding to the alloy an element whose segregation coefficient is opposite to that of the element for which the rate is to be stabilized. For example, in the case of
- Document US-A-4,980,133 discloses a device for manufacturing controlled growth crystals.
- the device comprises two heating tubes arranged in alignment and separated by a conductive sleeve.
- the heating tubes impose two zones of different temperatures while the conductive sleeve provides a zone of thermal gradient between the heating tubes.
- the growth of the crystal takes place in a bulb comprising the material to be crystallized. Crystallization is obtained by making lower the bulb from the warmer upper zone to the colder lower zone.
- US-A-4,264,406 discloses a method of crystal growth. The method includes the steps of:
- the crystallization point must advance very regularly as the crystal grows.
- the device according to the invention has the advantage of not requiring any displacement of the bulb or crucible containing the material, or even of the oven. It is therefore associated with a simple and very flexible process in its applications, in particular the shape of the gradient.
- the subject of the invention is therefore a device for manufacturing alloy crystals by cooling and controlled solidification of a liquid material comprising the constituents of the alloy, comprising an oven provided with heating means making it possible to liquidize said material and then cooling it until its solidification is gradually obtained, the device also comprising means for receiving said material placed in the furnace, characterized in that:
- the heating means comprise three heating elements providing three juxtaposed heating zones: a so-called hot zone, an intermediate zone called with a temperature gradient and a so-called cold zone, the intermediate zone being between the cold zone and the hot zone, the receiving means are fixed relative to the furnace and are located so that the material is in the intermediate zone,
- thermally conductive means are arranged between the receiving means and the heating means and extend from the cold zone to the hot zone.
- the heating means are electric heating means.
- the oven is a vertical oven, the three heating zones being superimposed.
- the hot zone can be located above the intermediate zone, the cold zone then being located below the intermediate zone.
- the thermally means conductors may consist of a tube.
- this tube is a tube of constant thickness.
- the thermally conductive means are made of a metal chosen from copper, aluminum and special steels.
- FIG. 1 is a diagram representing the evolution of the Zn concentration in a CdZnTe alloy according to Pfann's law for an ingot according to known art and for an ingot according to the invention
- - Figure 2 shows, schematically and in longitudinal section, a device for manufacturing alloy crystals according to the invention
- - Figure 3 is a graph showing the evolution of temperatures on the material to be solidified, at the start and at the end of solidification
- FIGS. 4A to 4C are graphs representing cooling programs allowing to modify or not the speed of solidification and the thermal gradient during solidification.
- FIG. 2 represents, in longitudinal section, a device for manufacturing alloy crystals according to the invention. This device is generally cylindrical.
- the device comprises a vertical oven 10 in the form of a hollow cylinder.
- the central hole of the oven allows the introduction of a crucible 20 comprising the material 21 to be crystallized.
- the oven 10 has three electric heating elements: the coil 11 located in the lower part, the coil 12 located in the middle part and the coil 13 located in the upper part.
- the coils 11, 12 and 13 respectively define a cold zone 14, an intermediate zone 15 (with temperature gradient) and a hot zone 16.
- the tube can be made of copper, aluminum or special steel.
- the diameter of the crucible 20 is very close to the inside diameter of the tube 17.
- the tube 17 passes through the three heating zones. Its thickness must be sufficient for the transport of calories from the hot zone to the cold zone to take place properly.
- the intermediate zone 15 has a height at least equal to the height of liquid material provided in the crucible 20.
- the crucible 20 is confined to the center of the furnace and remains stationary during the slow solidification operation which takes place from bottom to top in this example of implementation, at a speed of between 0.1 and 5 mm / h for a CdZnTe type alloy.
- Plugs 18 and 19 close the two ends of the central hole in the oven. They are housed in the parts of the central hole corresponding to the cold and hot zones. Controlled solidification of the material is obtained by creating a continuous thermal gradient in the intermediate zone 15. Its average value depends on the temperature difference between the upper 16 and lower 14 zones of the furnace and the power supplied to the intermediate zone 15.
- FIG. 3 illustrates the principle of controlled solidification implemented by the invention.
- FIG. 3 shows, on the right part of the figure, the crucible 20 containing the material to be crystallized 21.
- a graph representing the evolution of the temperatures on the material to be crystallized, at the beginning and at the end of solidification.
- solidification takes place bottom to top but this solidification can also be carried out from top to bottom or not vertically.
- point A (on the lower surface of the material) is at temperature T 0 which is the actual solidification temperature of the material.
- T 0 the actual solidification temperature of the material.
- point B located on the surface of the liquid, the temperature is higher and is worth T B.
- the thermal gradient between points A and B is (T B - T 0 ) / h, h being the height of the material in the crucible.
- the temperatures are plotted on the temperature axis T.
- the progressive solidification of the liquid material is obtained by cooling the three zones 14, 15 and 16.
- the whole of the thermal gradient moves during the operation towards lower temperatures as indicated by the arrows so that, when the temperature at point B reaches the value T 0 , solidification is complete.
- the invention allows the realization and control of very continuous and precise thermal gradients in the range (for example from 0 to 5 ° C / cm over 25 cm in length) on the whole of the liquid in particular and therefore a controlled action on the liquid convection regime, the main actor in the segregation of the material constituents.
- Curve 2 of FIG. 1 shows, for a CdZnTe alloy, the evolution of the Zn concentration using the device according to the invention. It can be noted, by comparison with curve 1, that better homogeneity is obtained on 80% of the ingot. The beginning and end of the ingot are discarded because they have specific defects.
- FIGS. 4A to 4C are graphs representing cooling programs making it possible to modify or not the speed of solidification and the thermal gradient during solidification.
- the height h of material to be crystallized has been mentioned in these figures.
- FIG. 4A shows programs with constant solidification speed.
- the solid line graph corresponds to a constant thermal gradient. It is similar to that of FIG. 3.
- the graph in phantom lines corresponds to a decreasing thermal gradient.
- the dashed line graph corresponds to an increasing thermal gradient.
- FIG. 4B shows a graph corresponding to a program with increasing solidification speed and decreasing thermal gradient.
- FIG. 4C shows a graph corresponding to a program with decreasing solidification speed and increasing thermal gradient.
- the device according to the invention remedies these risks for the following reasons: • the crucible containing the material is fixed and very confined in the furnace, which has the consequence no vibrations and no chimney effect for the surrounding gases;
- the thermally conductive means passing through the furnace best homogenize the thermal power generated by the furnace heating means, both radially and longitudinally;
- the device according to the invention is very simple and economically advantageous. It allows the production of high quality crystalline materials (minimum dislocation rate, perfection of the crystal lattice, minimized effects of species segregation).
- the thermally conductive means for example a tube
- the device according to the invention allows in particular the manufacture of CdZnTe crystals intended for optronics.
- the homogeneity of the Zn rate is improved by a factor of 1.5 on an ingot 90 mm in diameter and 100 mm long.
- the crystalline quality of the material obtained is very suitable for the intended application.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Abstract
Description
Claims
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/482,268 US7048799B2 (en) | 2001-06-26 | 2002-06-25 | Device for producing alloy crystals by cooling and controlled solidification of a liquid material |
| EP02758518A EP1399606B1 (fr) | 2001-06-26 | 2002-06-25 | Dispositif de fabrication de cristaux d'alliage |
| DE60205904T DE60205904T2 (de) | 2001-06-26 | 2002-06-25 | Vorrichtung zur herstellung von legierungskristallen |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR0108402A FR2826377B1 (fr) | 2001-06-26 | 2001-06-26 | Dispositif de fabrication de cristaux d'alliage par refroidissement et solidification controlee d'un materiau liquide |
| FR01/08402 | 2001-06-26 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| WO2003000961A2 true WO2003000961A2 (fr) | 2003-01-03 |
| WO2003000961A3 WO2003000961A3 (fr) | 2003-10-02 |
| WO2003000961A8 WO2003000961A8 (fr) | 2004-04-01 |
Family
ID=8864769
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/FR2002/002192 Ceased WO2003000961A2 (fr) | 2001-06-26 | 2002-06-25 | Dispositif de fabrication de cristaux d'alliage |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7048799B2 (fr) |
| EP (1) | EP1399606B1 (fr) |
| DE (1) | DE60205904T2 (fr) |
| FR (1) | FR2826377B1 (fr) |
| WO (1) | WO2003000961A2 (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1306073C (zh) * | 2004-12-22 | 2007-03-21 | 哈尔滨工业大学 | 晶体的可视小角度倾斜区熔生长装置及其生长方法 |
| CN1307329C (zh) * | 2004-06-30 | 2007-03-28 | 哈尔滨工业大学 | 晶体的可视化小角度倾斜温梯冷凝生长装置及其生长方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004111540A2 (fr) * | 2003-06-11 | 2004-12-23 | Huntington Alloys Corporation | Four a de zones de chauffage multiples et procede d'elimination des contraintes sur un superalliage |
| WO2014035480A1 (fr) * | 2012-08-30 | 2014-03-06 | General Electric Company | Four à induction doté d'une capacité de refroidissement uniforme |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4264406A (en) * | 1979-06-11 | 1981-04-28 | The United States Of America As Represented By The Secretary Of The Army | Method for growing crystals |
| EP0078830B1 (fr) * | 1981-05-15 | 1985-11-06 | Philips Electronics Uk Limited | Procede de formation de tellurure de mercure de cadmium cristallin et tellurure de mercure de cadmium cristallin forme a l'aide de cette methode |
| US4980433A (en) * | 1983-10-26 | 1990-12-25 | Betz Laboratories, Inc. | Novel amine-containing copolymers and their use |
| US4980133A (en) * | 1988-03-16 | 1990-12-25 | Ltv Aerospace & Defense Company | Apparatus comprising heat pipes for controlled crystal growth |
| JP2717568B2 (ja) * | 1989-02-21 | 1998-02-18 | 株式会社フューテックファーネス | 単結晶育成装置 |
| JP4228439B2 (ja) * | 1998-11-12 | 2009-02-25 | 住友電気工業株式会社 | 結晶製造装置 |
-
2001
- 2001-06-26 FR FR0108402A patent/FR2826377B1/fr not_active Expired - Lifetime
-
2002
- 2002-06-25 WO PCT/FR2002/002192 patent/WO2003000961A2/fr not_active Ceased
- 2002-06-25 US US10/482,268 patent/US7048799B2/en not_active Expired - Lifetime
- 2002-06-25 EP EP02758518A patent/EP1399606B1/fr not_active Expired - Lifetime
- 2002-06-25 DE DE60205904T patent/DE60205904T2/de not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1307329C (zh) * | 2004-06-30 | 2007-03-28 | 哈尔滨工业大学 | 晶体的可视化小角度倾斜温梯冷凝生长装置及其生长方法 |
| CN1306073C (zh) * | 2004-12-22 | 2007-03-21 | 哈尔滨工业大学 | 晶体的可视小角度倾斜区熔生长装置及其生长方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| DE60205904D1 (de) | 2005-10-06 |
| US20040244679A1 (en) | 2004-12-09 |
| EP1399606B1 (fr) | 2005-08-31 |
| WO2003000961A3 (fr) | 2003-10-02 |
| US7048799B2 (en) | 2006-05-23 |
| EP1399606A2 (fr) | 2004-03-24 |
| WO2003000961A8 (fr) | 2004-04-01 |
| DE60205904T2 (de) | 2006-06-22 |
| FR2826377A1 (fr) | 2002-12-27 |
| FR2826377B1 (fr) | 2003-09-05 |
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