WO2003028885A1 - Photocatalyst element, method and device for preparing the same - Google Patents

Photocatalyst element, method and device for preparing the same Download PDF

Info

Publication number
WO2003028885A1
WO2003028885A1 PCT/JP2002/010007 JP0210007W WO03028885A1 WO 2003028885 A1 WO2003028885 A1 WO 2003028885A1 JP 0210007 W JP0210007 W JP 0210007W WO 03028885 A1 WO03028885 A1 WO 03028885A1
Authority
WO
WIPO (PCT)
Prior art keywords
photocatalyst
photocatalyst film
film
porous
preparing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2002/010007
Other languages
English (en)
French (fr)
Inventor
Junji Hiraoka
Takahiro Doke
Hisato Haraga
Daisuke Noguchi
Yoshio Kawamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Shibaura Mechatronics Corp
Original Assignee
Toto Ltd
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd, Shibaura Mechatronics Corp filed Critical Toto Ltd
Priority to US10/490,116 priority Critical patent/US7799731B2/en
Priority to DE60238703T priority patent/DE60238703D1/de
Priority to EP02800017A priority patent/EP1442793B1/en
Priority to JP2003532199A priority patent/JP4261353B2/ja
Priority to KR1020047004587A priority patent/KR100882345B1/ko
Publication of WO2003028885A1 publication Critical patent/WO2003028885A1/ja
Anticipated expiration legal-status Critical
Priority to US12/769,343 priority patent/US8022011B2/en
Priority to US12/769,390 priority patent/US20100206723A1/en
Ceased legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39Photocatalytic properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/0215Coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/063Titanium; Oxides or hydroxides thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J33/00Protection of catalysts, e.g. by coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/31Density
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/30Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/391Physical properties of the active metal ingredient
    • B01J35/395Thickness of the active catalytic layer
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/60Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00Catalysts, in general, characterised by their form or physical properties
    • B01J35/70Catalysts, in general, characterised by their form or physical properties characterised by their crystalline properties, e.g. semi-crystalline
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02Impregnation, coating or precipitation
    • B01J37/024Multiple impregnation or coating
    • B01J37/0244Coatings comprising several layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/341Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
    • B01J37/347Ionic or cathodic spraying; Electric discharge
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00Compounds of titanium
    • C01G23/04Oxides; Hydroxides
    • C01G23/047Titanium dioxide
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2235/00Indexing scheme associated with group B01J35/00, related to the analysis techniques used to determine the catalysts form or properties
    • B01J2235/15X-ray diffraction
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/03Particle morphology depicted by an image obtained by SEM
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/01Particle morphology depicted by an image
    • C01P2004/04Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/80Particles consisting of a mixture of two or more inorganic phases
    • C01P2004/82Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
    • C01P2004/84Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
    • C01P2004/86Thin layer coatings, i.e. the coating thickness being less than 0.1 time the particle radius

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Geology (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Nanotechnology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Catalysts (AREA)
  • Physical Vapour Deposition (AREA)
PCT/JP2002/010007 2001-09-28 2002-09-27 Photocatalyst element, method and device for preparing the same Ceased WO2003028885A1 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US10/490,116 US7799731B2 (en) 2001-09-28 2002-09-27 Photocatalyst element, method and device for preparing the same
DE60238703T DE60238703D1 (de) 2001-09-28 2002-09-27 Photokatalysator und verfahren zu seiner herstellung
EP02800017A EP1442793B1 (en) 2001-09-28 2002-09-27 Photocatalyst and method for preparing the same
JP2003532199A JP4261353B2 (ja) 2001-09-28 2002-09-27 光触媒体、光触媒体の製造方法及び光触媒体の製造装置
KR1020047004587A KR100882345B1 (ko) 2001-09-28 2002-09-27 광촉매체, 광촉매체의 제조 방법 및 광촉매체의 제조 장치
US12/769,343 US8022011B2 (en) 2001-09-28 2010-04-28 Photocatalyst element, method and device for preparing the same
US12/769,390 US20100206723A1 (en) 2001-09-28 2010-04-28 Photocatalyst element, method and device for preparing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001/303953 2001-09-28
JP2001303953 2001-09-28

Related Child Applications (3)

Application Number Title Priority Date Filing Date
US10490116 A-371-Of-International 2002-09-27
US12/769,343 Division US8022011B2 (en) 2001-09-28 2010-04-28 Photocatalyst element, method and device for preparing the same
US12/769,390 Division US20100206723A1 (en) 2001-09-28 2010-04-28 Photocatalyst element, method and device for preparing the same

Publications (1)

Publication Number Publication Date
WO2003028885A1 true WO2003028885A1 (en) 2003-04-10

Family

ID=19123954

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/010007 Ceased WO2003028885A1 (en) 2001-09-28 2002-09-27 Photocatalyst element, method and device for preparing the same

Country Status (7)

Country Link
US (3) US7799731B2 (ja)
EP (1) EP1442793B1 (ja)
JP (1) JP4261353B2 (ja)
KR (2) KR100948542B1 (ja)
CN (1) CN1332763C (ja)
DE (1) DE60238703D1 (ja)
WO (1) WO2003028885A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004359472A (ja) * 2003-06-02 2004-12-24 Japan Atom Energy Res Inst 結晶配向した微結晶から成る二酸化チタン膜の作製方法
JP2011514874A (ja) * 2008-02-27 2011-05-12 ピルキントン グループ リミテッド 被覆グレージング
JP2013543054A (ja) * 2010-09-17 2013-11-28 エルジー・ハウシス・リミテッド 表面モルフォロジー処理によるコーティング膜の親水性改善方法及びこれを用いて製造した超親水ガラスコーティング層
JP2014098542A (ja) * 2008-09-16 2014-05-29 Toshiba Corp 冷蔵庫
WO2024225162A1 (ja) * 2023-04-28 2024-10-31 ニデック株式会社 親水膜及び光学部材

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60238703D1 (de) 2001-09-28 2011-02-03 Shibaura Mechatronics Corp Photokatalysator und verfahren zu seiner herstellung
CN1610581B (zh) 2001-11-29 2013-04-03 芝浦机械电子装置股份有限公司 光催化剂的制造方法和光催化剂的制造装置
EP1773729B1 (en) 2004-07-12 2007-11-07 Cardinal CG Company Low-maintenance coatings
ITPR20040059A1 (it) * 2004-08-06 2004-11-06 Vacuum Surtec Srl Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento.
WO2007121215A1 (en) 2006-04-11 2007-10-25 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US20080134420A1 (en) * 2006-12-07 2008-06-12 Edward Ho Led toilet seat cover
KR101512166B1 (ko) 2007-09-14 2015-04-14 카디날 씨지 컴퍼니 관리가 용이한 코팅 기술
FR2948037B1 (fr) * 2009-07-17 2012-12-28 Saint Gobain Materiau photocatalytique
US9416235B2 (en) * 2011-12-06 2016-08-16 Nitto Boseki Co., Ltd. Long-fiber-reinforced thermoplastic resin preform and fiber-reinforced resin compact using same
KR20160056017A (ko) * 2014-11-11 2016-05-19 고려대학교 산학협력단 항균 구조물의 제조 방법
WO2017085590A1 (en) * 2015-11-16 2017-05-26 Sabic Global Technologies B.V. Multi-layered water- splitting photocatalyst having a plasmonic metal layer with optimized plasmonic effects
WO2018093985A1 (en) 2016-11-17 2018-05-24 Cardinal Cg Company Static-dissipative coating technology

Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08302856A (ja) * 1995-05-10 1996-11-19 Ykk Kk 防汚性建築材料及び外装建材ユニット
JPH10231146A (ja) * 1996-12-18 1998-09-02 Nippon Ita Glass Techno Res Kk 防曇防汚ガラス物品
EP0887179A1 (en) 1996-12-09 1998-12-30 Nippon Sheet Glass Co., Ltd. Non-fogging article and process for the production thereof
JPH1129861A (ja) * 1997-07-14 1999-02-02 Bridgestone Corp スパッタ膜の作製方法及び対向ターゲット式スパッタリング装置
EP0901991A2 (en) * 1997-08-29 1999-03-17 Central Glass Company, Limited Photocatalytic glass pane and method for producing same
JPH1190237A (ja) * 1997-07-23 1999-04-06 Toshiba Lighting & Technology Corp 光触媒体、光触媒体の製造方法、消臭装置および照明器具
JP2000239047A (ja) * 1998-12-03 2000-09-05 Nippon Sheet Glass Co Ltd 親水性光触媒部材
EP1074525A1 (en) 1999-08-05 2001-02-07 Nippon Sheet Glass Co., Ltd. Article having photocatalytic activity
JP2001046882A (ja) * 1999-08-05 2001-02-20 Nippon Sheet Glass Co Ltd 酸化チタンの光触媒膜の被覆方法
JP2001051107A (ja) * 1999-08-09 2001-02-23 Toto Ltd 浴室用防曇鏡及び浴室設備並びに浴室
JP2001098187A (ja) * 1999-05-21 2001-04-10 Toto Ltd 光触媒性親水性コーティング組成物、及び光触媒性親水性部材の製造方法
JP2001129474A (ja) * 1999-11-02 2001-05-15 Tsutomu Minami 膨らみパターンの形成方法および当該パターンを有する基体
JP2001149790A (ja) * 1999-11-25 2001-06-05 Kobe Steel Ltd 光触媒性に優れた被覆材料およびその製造方法
JP2001262335A (ja) * 2000-03-21 2001-09-26 Nippon Sheet Glass Co Ltd 被膜の被覆方法
JP2001335343A (ja) * 2000-05-23 2001-12-04 Central Glass Co Ltd 光触媒膜付きガラスおよびその製造方法
WO2002002497A1 (en) 2000-06-30 2002-01-10 S.S. Steiner, Inc. Rho-isoalpha acid hop products and methods
JP2002256416A (ja) * 2001-03-01 2002-09-11 Andes Denki Kk 光触媒薄膜材料およびその応用品

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1992017621A1 (en) * 1991-04-04 1992-10-15 Conner Peripherals, Inc. Apparatus and method for high throughput sputtering
DE69732285D1 (de) * 1996-08-05 2005-02-24 Nippon Sheet Glass Co Ltd Photokatalysator und methode zu seiner herstellung
KR100291482B1 (ko) * 1997-06-24 2001-06-01 시부키 유키오 이산화티탄 결정배향막을 갖는 재료 및 그 제조방법
JP3469456B2 (ja) * 1998-02-20 2003-11-25 東光株式会社 スイッチング素子の駆動回路
US6905578B1 (en) * 1998-04-27 2005-06-14 Cvc Products, Inc. Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure
FR2814094B1 (fr) * 2000-09-20 2003-08-15 Saint Gobain Substrat a revetement photocatalytique et son procede de fabrication
DE60238703D1 (de) 2001-09-28 2011-02-03 Shibaura Mechatronics Corp Photokatalysator und verfahren zu seiner herstellung
CN1610581B (zh) 2001-11-29 2013-04-03 芝浦机械电子装置股份有限公司 光催化剂的制造方法和光催化剂的制造装置

Patent Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08302856A (ja) * 1995-05-10 1996-11-19 Ykk Kk 防汚性建築材料及び外装建材ユニット
EP0887179A1 (en) 1996-12-09 1998-12-30 Nippon Sheet Glass Co., Ltd. Non-fogging article and process for the production thereof
JPH10231146A (ja) * 1996-12-18 1998-09-02 Nippon Ita Glass Techno Res Kk 防曇防汚ガラス物品
EP0882686A1 (en) 1996-12-18 1998-12-09 Nippon Sheet Glass Co., Ltd. Nonfogging and stainproof glass articles
JPH1129861A (ja) * 1997-07-14 1999-02-02 Bridgestone Corp スパッタ膜の作製方法及び対向ターゲット式スパッタリング装置
JPH1190237A (ja) * 1997-07-23 1999-04-06 Toshiba Lighting & Technology Corp 光触媒体、光触媒体の製造方法、消臭装置および照明器具
EP0901991A2 (en) * 1997-08-29 1999-03-17 Central Glass Company, Limited Photocatalytic glass pane and method for producing same
JP2000239047A (ja) * 1998-12-03 2000-09-05 Nippon Sheet Glass Co Ltd 親水性光触媒部材
JP2001098187A (ja) * 1999-05-21 2001-04-10 Toto Ltd 光触媒性親水性コーティング組成物、及び光触媒性親水性部材の製造方法
EP1074525A1 (en) 1999-08-05 2001-02-07 Nippon Sheet Glass Co., Ltd. Article having photocatalytic activity
JP2001046882A (ja) * 1999-08-05 2001-02-20 Nippon Sheet Glass Co Ltd 酸化チタンの光触媒膜の被覆方法
JP2001051107A (ja) * 1999-08-09 2001-02-23 Toto Ltd 浴室用防曇鏡及び浴室設備並びに浴室
JP2001129474A (ja) * 1999-11-02 2001-05-15 Tsutomu Minami 膨らみパターンの形成方法および当該パターンを有する基体
JP2001149790A (ja) * 1999-11-25 2001-06-05 Kobe Steel Ltd 光触媒性に優れた被覆材料およびその製造方法
JP2001262335A (ja) * 2000-03-21 2001-09-26 Nippon Sheet Glass Co Ltd 被膜の被覆方法
JP2001335343A (ja) * 2000-05-23 2001-12-04 Central Glass Co Ltd 光触媒膜付きガラスおよびその製造方法
WO2002002497A1 (en) 2000-06-30 2002-01-10 S.S. Steiner, Inc. Rho-isoalpha acid hop products and methods
JP2002256416A (ja) * 2001-03-01 2002-09-11 Andes Denki Kk 光触媒薄膜材料およびその応用品

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HUIYAO WANG ET AL.: "Effects of substrate temperature on the microstructure and photocatalytic reactivity of TiO2 films", J. MATER. SCI. MATER. ELECTRON., vol. 9, no. 5, 1998, pages 327 - 330, XP002963474 *
See also references of EP1442793A4
SUSUMU SUZUKI ET AL.: "1. Sputtering-hou niyoru hikarishokubai TiO2 no seimaku", ASAHI GLASS CO., LTD. KENKYU HOKOKU, vol. 49, 2000, pages 1 - 6 *
ZHENG S.K. ET AL.: "Photocatalytic activity of nanostructured TiO2 thin films prepared by dc magnetron sputtering method", VACUUM, vol. 62, no. 4, 22 June 2001 (2001-06-22), pages 361 - 366, XP002963475 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004359472A (ja) * 2003-06-02 2004-12-24 Japan Atom Energy Res Inst 結晶配向した微結晶から成る二酸化チタン膜の作製方法
JP2011514874A (ja) * 2008-02-27 2011-05-12 ピルキントン グループ リミテッド 被覆グレージング
JP2014098542A (ja) * 2008-09-16 2014-05-29 Toshiba Corp 冷蔵庫
JP2013543054A (ja) * 2010-09-17 2013-11-28 エルジー・ハウシス・リミテッド 表面モルフォロジー処理によるコーティング膜の親水性改善方法及びこれを用いて製造した超親水ガラスコーティング層
WO2024225162A1 (ja) * 2023-04-28 2024-10-31 ニデック株式会社 親水膜及び光学部材

Also Published As

Publication number Publication date
KR100948542B1 (ko) 2010-03-18
DE60238703D1 (de) 2011-02-03
CN1578701A (zh) 2005-02-09
KR100882345B1 (ko) 2009-02-12
US7799731B2 (en) 2010-09-21
US8022011B2 (en) 2011-09-20
KR20080102321A (ko) 2008-11-24
EP1442793A4 (en) 2007-04-25
US20040248725A1 (en) 2004-12-09
KR20040047873A (ko) 2004-06-05
CN1332763C (zh) 2007-08-22
EP1442793A1 (en) 2004-08-04
JPWO2003028885A1 (ja) 2005-01-13
US20100210447A1 (en) 2010-08-19
EP1442793B1 (en) 2010-12-22
US20100206723A1 (en) 2010-08-19
JP4261353B2 (ja) 2009-04-30

Similar Documents

Publication Publication Date Title
WO2003028885A1 (en) Photocatalyst element, method and device for preparing the same
Zeman et al. Self-cleaning and antifogging effects of TiO 2 films prepared by radio frequency magnetron sputtering
Syarif et al. Preparation of anatase and rutile thin films by controlling oxygen partial pressure
Zeng et al. Research progress on the preparation methods for VO 2 nanoparticles and their application in smart windows
Yu et al. Photocatalytic activity and characterization of the sol-gel derived Pb-doped TiO2 thin films
ATE420223T1 (de) Substrat mit photokatalytischer beschichtung
WO2003009061A3 (en) Photoactive coating, coated article, and method of making same
CA2417936A1 (en) Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
IL166622A (en) Process for making alumina and layered coatings containing them
CA2314381A1 (en) Article having photocatalytic activity
WO2001010553A1 (fr) Matiere catalytique et article photocatalytique
CA2136454A1 (en) Process of Activating Anti-Microbial Materials
Kim et al. Influence of sputtering parameters on microstructure and morphology of TiO2 thin films
US11168401B2 (en) Nanostructured colour film having dual-phase first layer and/or amorphous metallic second layer
JP5121002B2 (ja) 光触媒機能および熱線反射機能を有するガラス部材、ならびに、それを用いた複層ガラス
WO2005000734A3 (en) Method of forming nanostructures on ceramics and the ceramics formed
EP2841618B1 (en) Arc-deposition method for producing al-cr-o coatings
WO2004036624A3 (en) Two-step atomic layer deposition of copper layers
JP2000096212A (ja) 光触媒膜被覆部材およびその製造方法
Chen et al. Investigation into the effects of deposition parameters on TiO2 photocatalyst thin films by rf magnetron sputtering
US20100051447A1 (en) Sol-gel precursors and methods for making lead-based perovskite films
CA2436001A1 (en) Method of forming a silicon dioxide film
Bayati et al. Low-temperature processing and control of structure and properties of TiO2/c-sapphire epitaxial heterostructures
Huang et al. Preparation of rutile and anatase phases titanium oxide film by RF sputtering
Shibata et al. Fabrication of anatase thin film with perfect c-axis orientation on glass substrate promoted by a two-dimensional perovskite nanosheet seed layer

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BY BZ CA CH CN CO CR CU CZ DE DM DZ EC EE ES FI GB GD GE GH HR HU ID IL IN IS JP KE KG KP KR LC LK LR LS LT LU LV MA MD MG MN MW MX MZ NO NZ OM PH PL PT RU SD SE SG SI SK SL TJ TM TN TR TZ UA UG US UZ VN YU ZA ZM

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ UG ZM ZW AM AZ BY KG KZ RU TJ TM AT BE BG CH CY CZ DK EE ES FI FR GB GR IE IT LU MC PT SE SK TR BF BJ CF CG CI GA GN GQ GW ML MR NE SN TD TG

DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2003532199

Country of ref document: JP

Ref document number: 2002800017

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1020047004587

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 20028214323

Country of ref document: CN

WWE Wipo information: entry into national phase

Ref document number: 10490116

Country of ref document: US

WWP Wipo information: published in national office

Ref document number: 2002800017

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1020087026512

Country of ref document: KR