WO2003028885A1 - Photocatalyst element, method and device for preparing the same - Google Patents
Photocatalyst element, method and device for preparing the same Download PDFInfo
- Publication number
- WO2003028885A1 WO2003028885A1 PCT/JP2002/010007 JP0210007W WO03028885A1 WO 2003028885 A1 WO2003028885 A1 WO 2003028885A1 JP 0210007 W JP0210007 W JP 0210007W WO 03028885 A1 WO03028885 A1 WO 03028885A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- photocatalyst
- photocatalyst film
- film
- porous
- preparing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
- B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
- B01J21/063—Titanium; Oxides or hydroxides thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J33/00—Protection of catalysts, e.g. by coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/31—Density
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/391—Physical properties of the active metal ingredient
- B01J35/395—Thickness of the active catalytic layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/70—Catalysts, in general, characterised by their form or physical properties characterised by their crystalline properties, e.g. semi-crystalline
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/024—Multiple impregnation or coating
- B01J37/0244—Coatings comprising several layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
- B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
- B01J37/347—Ionic or cathodic spraying; Electric discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G23/00—Compounds of titanium
- C01G23/04—Oxides; Hydroxides
- C01G23/047—Titanium dioxide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2235/00—Indexing scheme associated with group B01J35/00, related to the analysis techniques used to determine the catalysts form or properties
- B01J2235/15—X-ray diffraction
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
- C01P2002/74—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/03—Particle morphology depicted by an image obtained by SEM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/01—Particle morphology depicted by an image
- C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
- C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
- C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
- C01P2004/86—Thin layer coatings, i.e. the coating thickness being less than 0.1 time the particle radius
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Geology (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Optics & Photonics (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Nanotechnology (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Composite Materials (AREA)
- Catalysts (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/490,116 US7799731B2 (en) | 2001-09-28 | 2002-09-27 | Photocatalyst element, method and device for preparing the same |
| DE60238703T DE60238703D1 (de) | 2001-09-28 | 2002-09-27 | Photokatalysator und verfahren zu seiner herstellung |
| EP02800017A EP1442793B1 (en) | 2001-09-28 | 2002-09-27 | Photocatalyst and method for preparing the same |
| JP2003532199A JP4261353B2 (ja) | 2001-09-28 | 2002-09-27 | 光触媒体、光触媒体の製造方法及び光触媒体の製造装置 |
| KR1020047004587A KR100882345B1 (ko) | 2001-09-28 | 2002-09-27 | 광촉매체, 광촉매체의 제조 방법 및 광촉매체의 제조 장치 |
| US12/769,343 US8022011B2 (en) | 2001-09-28 | 2010-04-28 | Photocatalyst element, method and device for preparing the same |
| US12/769,390 US20100206723A1 (en) | 2001-09-28 | 2010-04-28 | Photocatalyst element, method and device for preparing the same |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001/303953 | 2001-09-28 | ||
| JP2001303953 | 2001-09-28 |
Related Child Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US10490116 A-371-Of-International | 2002-09-27 | ||
| US12/769,343 Division US8022011B2 (en) | 2001-09-28 | 2010-04-28 | Photocatalyst element, method and device for preparing the same |
| US12/769,390 Division US20100206723A1 (en) | 2001-09-28 | 2010-04-28 | Photocatalyst element, method and device for preparing the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2003028885A1 true WO2003028885A1 (en) | 2003-04-10 |
Family
ID=19123954
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2002/010007 Ceased WO2003028885A1 (en) | 2001-09-28 | 2002-09-27 | Photocatalyst element, method and device for preparing the same |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US7799731B2 (ja) |
| EP (1) | EP1442793B1 (ja) |
| JP (1) | JP4261353B2 (ja) |
| KR (2) | KR100948542B1 (ja) |
| CN (1) | CN1332763C (ja) |
| DE (1) | DE60238703D1 (ja) |
| WO (1) | WO2003028885A1 (ja) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004359472A (ja) * | 2003-06-02 | 2004-12-24 | Japan Atom Energy Res Inst | 結晶配向した微結晶から成る二酸化チタン膜の作製方法 |
| JP2011514874A (ja) * | 2008-02-27 | 2011-05-12 | ピルキントン グループ リミテッド | 被覆グレージング |
| JP2013543054A (ja) * | 2010-09-17 | 2013-11-28 | エルジー・ハウシス・リミテッド | 表面モルフォロジー処理によるコーティング膜の親水性改善方法及びこれを用いて製造した超親水ガラスコーティング層 |
| JP2014098542A (ja) * | 2008-09-16 | 2014-05-29 | Toshiba Corp | 冷蔵庫 |
| WO2024225162A1 (ja) * | 2023-04-28 | 2024-10-31 | ニデック株式会社 | 親水膜及び光学部材 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE60238703D1 (de) | 2001-09-28 | 2011-02-03 | Shibaura Mechatronics Corp | Photokatalysator und verfahren zu seiner herstellung |
| CN1610581B (zh) | 2001-11-29 | 2013-04-03 | 芝浦机械电子装置股份有限公司 | 光催化剂的制造方法和光催化剂的制造装置 |
| EP1773729B1 (en) | 2004-07-12 | 2007-11-07 | Cardinal CG Company | Low-maintenance coatings |
| ITPR20040059A1 (it) * | 2004-08-06 | 2004-11-06 | Vacuum Surtec Srl | Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento. |
| WO2007121215A1 (en) | 2006-04-11 | 2007-10-25 | Cardinal Cg Company | Photocatalytic coatings having improved low-maintenance properties |
| US20080011599A1 (en) | 2006-07-12 | 2008-01-17 | Brabender Dennis M | Sputtering apparatus including novel target mounting and/or control |
| US20080134420A1 (en) * | 2006-12-07 | 2008-06-12 | Edward Ho | Led toilet seat cover |
| KR101512166B1 (ko) | 2007-09-14 | 2015-04-14 | 카디날 씨지 컴퍼니 | 관리가 용이한 코팅 기술 |
| FR2948037B1 (fr) * | 2009-07-17 | 2012-12-28 | Saint Gobain | Materiau photocatalytique |
| US9416235B2 (en) * | 2011-12-06 | 2016-08-16 | Nitto Boseki Co., Ltd. | Long-fiber-reinforced thermoplastic resin preform and fiber-reinforced resin compact using same |
| KR20160056017A (ko) * | 2014-11-11 | 2016-05-19 | 고려대학교 산학협력단 | 항균 구조물의 제조 방법 |
| WO2017085590A1 (en) * | 2015-11-16 | 2017-05-26 | Sabic Global Technologies B.V. | Multi-layered water- splitting photocatalyst having a plasmonic metal layer with optimized plasmonic effects |
| WO2018093985A1 (en) | 2016-11-17 | 2018-05-24 | Cardinal Cg Company | Static-dissipative coating technology |
Citations (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08302856A (ja) * | 1995-05-10 | 1996-11-19 | Ykk Kk | 防汚性建築材料及び外装建材ユニット |
| JPH10231146A (ja) * | 1996-12-18 | 1998-09-02 | Nippon Ita Glass Techno Res Kk | 防曇防汚ガラス物品 |
| EP0887179A1 (en) | 1996-12-09 | 1998-12-30 | Nippon Sheet Glass Co., Ltd. | Non-fogging article and process for the production thereof |
| JPH1129861A (ja) * | 1997-07-14 | 1999-02-02 | Bridgestone Corp | スパッタ膜の作製方法及び対向ターゲット式スパッタリング装置 |
| EP0901991A2 (en) * | 1997-08-29 | 1999-03-17 | Central Glass Company, Limited | Photocatalytic glass pane and method for producing same |
| JPH1190237A (ja) * | 1997-07-23 | 1999-04-06 | Toshiba Lighting & Technology Corp | 光触媒体、光触媒体の製造方法、消臭装置および照明器具 |
| JP2000239047A (ja) * | 1998-12-03 | 2000-09-05 | Nippon Sheet Glass Co Ltd | 親水性光触媒部材 |
| EP1074525A1 (en) | 1999-08-05 | 2001-02-07 | Nippon Sheet Glass Co., Ltd. | Article having photocatalytic activity |
| JP2001046882A (ja) * | 1999-08-05 | 2001-02-20 | Nippon Sheet Glass Co Ltd | 酸化チタンの光触媒膜の被覆方法 |
| JP2001051107A (ja) * | 1999-08-09 | 2001-02-23 | Toto Ltd | 浴室用防曇鏡及び浴室設備並びに浴室 |
| JP2001098187A (ja) * | 1999-05-21 | 2001-04-10 | Toto Ltd | 光触媒性親水性コーティング組成物、及び光触媒性親水性部材の製造方法 |
| JP2001129474A (ja) * | 1999-11-02 | 2001-05-15 | Tsutomu Minami | 膨らみパターンの形成方法および当該パターンを有する基体 |
| JP2001149790A (ja) * | 1999-11-25 | 2001-06-05 | Kobe Steel Ltd | 光触媒性に優れた被覆材料およびその製造方法 |
| JP2001262335A (ja) * | 2000-03-21 | 2001-09-26 | Nippon Sheet Glass Co Ltd | 被膜の被覆方法 |
| JP2001335343A (ja) * | 2000-05-23 | 2001-12-04 | Central Glass Co Ltd | 光触媒膜付きガラスおよびその製造方法 |
| WO2002002497A1 (en) | 2000-06-30 | 2002-01-10 | S.S. Steiner, Inc. | Rho-isoalpha acid hop products and methods |
| JP2002256416A (ja) * | 2001-03-01 | 2002-09-11 | Andes Denki Kk | 光触媒薄膜材料およびその応用品 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1992017621A1 (en) * | 1991-04-04 | 1992-10-15 | Conner Peripherals, Inc. | Apparatus and method for high throughput sputtering |
| DE69732285D1 (de) * | 1996-08-05 | 2005-02-24 | Nippon Sheet Glass Co Ltd | Photokatalysator und methode zu seiner herstellung |
| KR100291482B1 (ko) * | 1997-06-24 | 2001-06-01 | 시부키 유키오 | 이산화티탄 결정배향막을 갖는 재료 및 그 제조방법 |
| JP3469456B2 (ja) * | 1998-02-20 | 2003-11-25 | 東光株式会社 | スイッチング素子の駆動回路 |
| US6905578B1 (en) * | 1998-04-27 | 2005-06-14 | Cvc Products, Inc. | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure |
| FR2814094B1 (fr) * | 2000-09-20 | 2003-08-15 | Saint Gobain | Substrat a revetement photocatalytique et son procede de fabrication |
| DE60238703D1 (de) | 2001-09-28 | 2011-02-03 | Shibaura Mechatronics Corp | Photokatalysator und verfahren zu seiner herstellung |
| CN1610581B (zh) | 2001-11-29 | 2013-04-03 | 芝浦机械电子装置股份有限公司 | 光催化剂的制造方法和光催化剂的制造装置 |
-
2002
- 2002-09-27 DE DE60238703T patent/DE60238703D1/de not_active Expired - Lifetime
- 2002-09-27 WO PCT/JP2002/010007 patent/WO2003028885A1/ja not_active Ceased
- 2002-09-27 US US10/490,116 patent/US7799731B2/en not_active Expired - Lifetime
- 2002-09-27 EP EP02800017A patent/EP1442793B1/en not_active Expired - Lifetime
- 2002-09-27 JP JP2003532199A patent/JP4261353B2/ja not_active Expired - Lifetime
- 2002-09-27 CN CNB028214323A patent/CN1332763C/zh not_active Expired - Lifetime
- 2002-09-27 KR KR1020087026512A patent/KR100948542B1/ko not_active Expired - Lifetime
- 2002-09-27 KR KR1020047004587A patent/KR100882345B1/ko not_active Expired - Lifetime
-
2010
- 2010-04-28 US US12/769,343 patent/US8022011B2/en not_active Expired - Fee Related
- 2010-04-28 US US12/769,390 patent/US20100206723A1/en not_active Abandoned
Patent Citations (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08302856A (ja) * | 1995-05-10 | 1996-11-19 | Ykk Kk | 防汚性建築材料及び外装建材ユニット |
| EP0887179A1 (en) | 1996-12-09 | 1998-12-30 | Nippon Sheet Glass Co., Ltd. | Non-fogging article and process for the production thereof |
| JPH10231146A (ja) * | 1996-12-18 | 1998-09-02 | Nippon Ita Glass Techno Res Kk | 防曇防汚ガラス物品 |
| EP0882686A1 (en) | 1996-12-18 | 1998-12-09 | Nippon Sheet Glass Co., Ltd. | Nonfogging and stainproof glass articles |
| JPH1129861A (ja) * | 1997-07-14 | 1999-02-02 | Bridgestone Corp | スパッタ膜の作製方法及び対向ターゲット式スパッタリング装置 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004359472A (ja) * | 2003-06-02 | 2004-12-24 | Japan Atom Energy Res Inst | 結晶配向した微結晶から成る二酸化チタン膜の作製方法 |
| JP2011514874A (ja) * | 2008-02-27 | 2011-05-12 | ピルキントン グループ リミテッド | 被覆グレージング |
| JP2014098542A (ja) * | 2008-09-16 | 2014-05-29 | Toshiba Corp | 冷蔵庫 |
| JP2013543054A (ja) * | 2010-09-17 | 2013-11-28 | エルジー・ハウシス・リミテッド | 表面モルフォロジー処理によるコーティング膜の親水性改善方法及びこれを用いて製造した超親水ガラスコーティング層 |
| WO2024225162A1 (ja) * | 2023-04-28 | 2024-10-31 | ニデック株式会社 | 親水膜及び光学部材 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR100948542B1 (ko) | 2010-03-18 |
| DE60238703D1 (de) | 2011-02-03 |
| CN1578701A (zh) | 2005-02-09 |
| KR100882345B1 (ko) | 2009-02-12 |
| US7799731B2 (en) | 2010-09-21 |
| US8022011B2 (en) | 2011-09-20 |
| KR20080102321A (ko) | 2008-11-24 |
| EP1442793A4 (en) | 2007-04-25 |
| US20040248725A1 (en) | 2004-12-09 |
| KR20040047873A (ko) | 2004-06-05 |
| CN1332763C (zh) | 2007-08-22 |
| EP1442793A1 (en) | 2004-08-04 |
| JPWO2003028885A1 (ja) | 2005-01-13 |
| US20100210447A1 (en) | 2010-08-19 |
| EP1442793B1 (en) | 2010-12-22 |
| US20100206723A1 (en) | 2010-08-19 |
| JP4261353B2 (ja) | 2009-04-30 |
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