WO2003032024A3 - Graded thickness optical element and method of manufacture therefor - Google Patents

Graded thickness optical element and method of manufacture therefor Download PDF

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Publication number
WO2003032024A3
WO2003032024A3 PCT/US2002/032373 US0232373W WO03032024A3 WO 2003032024 A3 WO2003032024 A3 WO 2003032024A3 US 0232373 W US0232373 W US 0232373W WO 03032024 A3 WO03032024 A3 WO 03032024A3
Authority
WO
WIPO (PCT)
Prior art keywords
optical element
graded
masking layer
aperture
thickness optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2002/032373
Other languages
French (fr)
Other versions
WO2003032024A2 (en
Inventor
Tzu-Yu Wang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Priority to EP02795513A priority Critical patent/EP1442321B1/en
Priority to AU2002360268A priority patent/AU2002360268A1/en
Priority to DE60222290T priority patent/DE60222290T2/en
Priority to JP2003534951A priority patent/JP2005505928A/en
Publication of WO2003032024A2 publication Critical patent/WO2003032024A2/en
Publication of WO2003032024A3 publication Critical patent/WO2003032024A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0883—Mirrors with a refractive index gradient
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/0006—Arrays
    • G02B3/0012—Arrays characterised by the manufacturing method
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18386—Details of the emission surface for influencing the near- or far-field, e.g. a grating on the surface
    • H01S5/18388—Lenses

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Physical Vapour Deposition (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Laminated Bodies (AREA)

Abstract

A graded optical element is provided that includes graded layers of optical material, wherein the layers may or may not have different indexes of refraction. A method for making such a graded thickness optical element is also provided. A masking layer is preferably spaced above a substrate, where the masking layer has at least one aperture therein. Optical material is then deposited on the substrate through the aperture in the masking layer to form a layer of refr material that extends laterally beyond the aperture in the masking layer in at least one region.
PCT/US2002/032373 2001-10-10 2002-10-10 Graded thickness optical element and method of manufacture therefor Ceased WO2003032024A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP02795513A EP1442321B1 (en) 2001-10-10 2002-10-10 Graded thickness optical element and method of manufacture therefor
AU2002360268A AU2002360268A1 (en) 2001-10-10 2002-10-10 Graded thickness optical element and method of manufacture therefor
DE60222290T DE60222290T2 (en) 2001-10-10 2002-10-10 OPTICAL COMPONENT WITH GRADIENT THICKNESS AND METHOD FOR THE PRODUCTION THEREOF
JP2003534951A JP2005505928A (en) 2001-10-10 2002-10-10 Thick-graded optical element and manufacturing method thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/975,299 US6606199B2 (en) 2001-10-10 2001-10-10 Graded thickness optical element and method of manufacture therefor
US09/975,299 2001-10-10

Publications (2)

Publication Number Publication Date
WO2003032024A2 WO2003032024A2 (en) 2003-04-17
WO2003032024A3 true WO2003032024A3 (en) 2003-09-25

Family

ID=25522883

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/032373 Ceased WO2003032024A2 (en) 2001-10-10 2002-10-10 Graded thickness optical element and method of manufacture therefor

Country Status (7)

Country Link
US (1) US6606199B2 (en)
EP (1) EP1442321B1 (en)
JP (1) JP2005505928A (en)
AT (1) ATE372524T1 (en)
AU (1) AU2002360268A1 (en)
DE (1) DE60222290T2 (en)
WO (1) WO2003032024A2 (en)

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US6985109B2 (en) * 2004-04-23 2006-01-10 Honeywell International, Inc. Reconfigurable aperture with an optical backplane
CN101535859B (en) * 2006-09-13 2012-05-02 埃迪斯科文大学 Optical Connection Components
US9081202B2 (en) * 2009-04-17 2015-07-14 The Invention Science Fund I Llc Evanescent electromagnetic wave conversion lenses I
US8630044B2 (en) * 2009-04-17 2014-01-14 The Invention Science Fund I Llc Evanescent electromagnetic wave conversion methods III
US8634140B2 (en) * 2009-04-17 2014-01-21 The Invention Science Fund I Llc Evanescent electromagnetic wave conversion apparatus III
US9083082B2 (en) * 2009-04-17 2015-07-14 The Invention Science Fund I Llc Evanescent electromagnetic wave conversion lenses III
US9081123B2 (en) 2009-04-17 2015-07-14 The Invention Science Fund I Llc Evanescent electromagnetic wave conversion lenses II
US8634144B2 (en) * 2009-04-17 2014-01-21 The Invention Science Fund I Llc Evanescent electromagnetic wave conversion methods I
US10422503B2 (en) 2009-10-30 2019-09-24 Ideal Industries Lighting Llc One-piece multi-lens optical member and method of manufacture
US9915409B2 (en) 2015-02-19 2018-03-13 Cree, Inc. Lens with textured surface facilitating light diffusion
KR101262470B1 (en) * 2011-01-31 2013-05-08 엘지이노텍 주식회사 Lens assembly and camera module
US8902508B2 (en) 2012-01-27 2014-12-02 Case Western Reserve University Consolidated multilayered gradient refractive index optical materials
US10400984B2 (en) 2013-03-15 2019-09-03 Cree, Inc. LED light fixture and unitary optic member therefor
US9920901B2 (en) 2013-03-15 2018-03-20 Cree, Inc. LED lensing arrangement
US10207440B2 (en) 2014-10-07 2019-02-19 Cree, Inc. Apparatus and method for formation of multi-region articles
CN104319351A (en) * 2014-10-31 2015-01-28 京东方科技集团股份有限公司 OLED array substrate, preparation method of OLED array substrate, display panel and display device
US9470394B2 (en) 2014-11-24 2016-10-18 Cree, Inc. LED light fixture including optical member with in-situ-formed gasket and method of manufacture
WO2016088216A1 (en) * 2014-12-03 2016-06-09 パイオニア株式会社 Optical filter manufacturing method
KR102571005B1 (en) * 2017-01-18 2023-08-30 에스케이하이닉스 주식회사 Image Sensor Having Light Refractive Patterns
US11275300B2 (en) 2018-07-06 2022-03-15 Applied Materials Inc. Extreme ultraviolet mask blank defect reduction
TWI818151B (en) 2019-03-01 2023-10-11 美商應用材料股份有限公司 Physical vapor deposition chamber and method of operation thereof
TWI845648B (en) * 2019-04-19 2024-06-21 美商應用材料股份有限公司 Bragg reflector, extreme ultraviolet (euv) mask blank comprising the same, and method of manufacturing the same
GB201913140D0 (en) 2019-09-12 2019-10-30 Ucl Business Plc Methods and apparatuses for fabricating polymeric conformal coatings, parts coated with polymeric conformal coatings, and optical apparatus

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Also Published As

Publication number Publication date
WO2003032024A2 (en) 2003-04-17
DE60222290T2 (en) 2008-01-03
AU2002360268A1 (en) 2003-04-22
EP1442321B1 (en) 2007-09-05
EP1442321A2 (en) 2004-08-04
US20030067688A1 (en) 2003-04-10
ATE372524T1 (en) 2007-09-15
DE60222290D1 (en) 2007-10-18
US6606199B2 (en) 2003-08-12
JP2005505928A (en) 2005-02-24

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