WO2003034105A3 - Verfahren zur herstellung eines massstabes, sowie derart hergestellter massstab und eine positionsmesseinrichtung - Google Patents

Verfahren zur herstellung eines massstabes, sowie derart hergestellter massstab und eine positionsmesseinrichtung Download PDF

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Publication number
WO2003034105A3
WO2003034105A3 PCT/EP2002/010669 EP0210669W WO03034105A3 WO 2003034105 A3 WO2003034105 A3 WO 2003034105A3 EP 0210669 W EP0210669 W EP 0210669W WO 03034105 A3 WO03034105 A3 WO 03034105A3
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WO
WIPO (PCT)
Prior art keywords
scale
reflection
producing
measuring device
position measuring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2002/010669
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English (en)
French (fr)
Other versions
WO2003034105A2 (de
Inventor
Peter Speckbacher
Georg Flatscher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dr Johannes Heidenhain GmbH
Original Assignee
Dr Johannes Heidenhain GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dr Johannes Heidenhain GmbH filed Critical Dr Johannes Heidenhain GmbH
Priority to EP02801294A priority Critical patent/EP1436647B1/de
Priority to DE50213242T priority patent/DE50213242D1/de
Priority to US10/491,931 priority patent/US7312878B2/en
Publication of WO2003034105A2 publication Critical patent/WO2003034105A2/de
Publication of WO2003034105A3 publication Critical patent/WO2003034105A3/de
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Transform (AREA)
  • Body Structure For Vehicles (AREA)
  • Vehicle Body Suspensions (AREA)
  • Position Fixing By Use Of Radio Waves (AREA)

Abstract

Die Erfindung betrifft ein Verfahren zur Herstellung eines Massstabes in Form eines Phasengitters und den Massstab selbst, sowie eine Positionsmesseinrichtung mit diesem Massstab, der zwei voneinander beabstandete Reflexionsschichten (2, 4) aufweist, die zu beiden Seiten einer Abstandsschicht (3) angeordnet sind. Die Herstellung des Massstabes umfasst folgende Verfahrensschritte: zur Verfügung stellen einer ersten Reflexionsschicht (2) als eine ganzflächig durchgehende Schicht, die eine Beziehung A = R/η ≥ 3 erfüllt, wobei R der Reflexionsgrad und η der Rückstreukoeffizient für Elektronen ist, Aufbringen der Abstandsschicht (3) auf die erste Reflexionsschicht (2), Aufbringen der zweiten Reflexionsschicht (4) auf die Abstandsschicht (3), Strukturieren der zweiten Reflexionsschicht (4) durch einen Elektronenstrahllithografieprozess.
PCT/EP2002/010669 2001-10-11 2002-09-24 Verfahren zur herstellung eines massstabes, sowie derart hergestellter massstab und eine positionsmesseinrichtung Ceased WO2003034105A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP02801294A EP1436647B1 (de) 2001-10-11 2002-09-24 Verfahren zur herstellung eines massstabes, sowie derart hergestellter massstab und eine positionsmesseinrichtung
DE50213242T DE50213242D1 (de) 2001-10-11 2002-09-24 Derart hergestellter massstab und eine positionsmesseinrichtung
US10/491,931 US7312878B2 (en) 2001-10-11 2002-09-24 Method for manufacturing a scale, a scale manufactured according to the method and a position measuring device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10150099A DE10150099A1 (de) 2001-10-11 2001-10-11 Verfahren zur Herstellung eines Maßstabes, sowie derart hergestellter Maßstab und eine Positionsmesseinrichtung
DE10150099.8 2001-10-11

Publications (2)

Publication Number Publication Date
WO2003034105A2 WO2003034105A2 (de) 2003-04-24
WO2003034105A3 true WO2003034105A3 (de) 2004-01-08

Family

ID=7702118

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2002/010669 Ceased WO2003034105A2 (de) 2001-10-11 2002-09-24 Verfahren zur herstellung eines massstabes, sowie derart hergestellter massstab und eine positionsmesseinrichtung

Country Status (5)

Country Link
US (1) US7312878B2 (de)
EP (1) EP1436647B1 (de)
AT (1) ATE421707T1 (de)
DE (2) DE10150099A1 (de)
WO (1) WO2003034105A2 (de)

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Publication number Priority date Publication date Assignee Title
US7085057B2 (en) * 2003-10-15 2006-08-01 Invenios Direct-write system and method for roll-to-roll manufacturing of reflective gratings
CN100397045C (zh) * 2004-01-26 2008-06-25 三丰株式会社 标尺的制造方法和光电式编码器
JP2006178312A (ja) * 2004-12-24 2006-07-06 Canon Inc 表面反射型位相格子
DE102006027047A1 (de) * 2006-06-10 2007-12-13 Dr. Johannes Heidenhain Gmbh Maßstab mit einem reflektierenden Phasengitter
US8116002B2 (en) * 2007-08-27 2012-02-14 Lumella Inc. Grating device with adjusting layer
NL2003638A (en) 2008-12-03 2010-06-07 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
JP5656467B2 (ja) * 2010-06-17 2015-01-21 Dmg森精機株式会社 位置検出装置
JP5695478B2 (ja) 2011-04-15 2015-04-08 Dmg森精機株式会社 光学式変位測定装置
DE102013220190B4 (de) 2013-10-07 2021-08-12 Dr. Johannes Heidenhain Gmbh Messteilung und lichtelektrische Positionsmesseinrichtung mit dieser Messteilung
DE102016201068A1 (de) * 2016-01-26 2017-07-27 Dr. Johannes Heidenhain Gmbh Maßverkörperung und Positionsmesseinrichtung mit dieser Maßverkörperung
DE102017201257A1 (de) * 2017-01-26 2018-07-26 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
JP6958237B2 (ja) * 2017-10-30 2021-11-02 セイコーエプソン株式会社 エンコーダースケール、エンコーダースケールの製造方法、エンコーダー、ロボット、電子部品搬送装置、プリンターおよびプロジェクター
JP2021131312A (ja) * 2020-02-20 2021-09-09 株式会社ミツトヨ スケール
CN113835187B (zh) * 2021-09-24 2024-08-30 科德数控股份有限公司 高精度角度反射镜的安装制造方法及高精度角度反射镜
DE102024002189A1 (de) 2024-07-05 2026-01-08 Dr. Johannes Heidenhain Gmbh Maßverkörperung und optische Positionsmesseinrichtung mit dieser Maßverkörperung
CN120627907B (zh) * 2025-08-11 2025-11-04 湖南普照信息材料有限公司 一种反射式光栅坯料、制作方法、及其检测系统

Citations (3)

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Publication number Priority date Publication date Assignee Title
US4522862A (en) * 1981-12-04 1985-06-11 Johannes Heidenhain Gmbh High resolution recording medium and method for producing same
US5377044A (en) * 1990-03-19 1994-12-27 Canon Kabushiki Kaisha Reflecting diffraction grating and device, such as encoder or the like, using the same
US5786931A (en) * 1995-04-13 1998-07-28 Johannes Heidenhain Gmbh Phase grating and method of producing phase grating

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US4155735A (en) * 1977-11-30 1979-05-22 Ppg Industries, Inc. Electromigration method for making stained glass photomasks
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US4885231A (en) * 1988-05-06 1989-12-05 Bell Communications Research, Inc. Phase-shifted gratings by selective image reversal of photoresist
DE4033013C2 (de) 1990-10-18 1994-11-17 Heidenhain Gmbh Dr Johannes Polarisationsoptische Anordnung
DE4303975A1 (de) * 1993-02-11 1994-08-18 Heidenhain Gmbh Dr Johannes Teilungsträger
US5323266A (en) * 1993-02-26 1994-06-21 United States Of America As Represented By The Secretary Of The Air Force Electroformed buried gratings for high-power shared aperture systems
US5625729A (en) * 1994-08-12 1997-04-29 Brown; Thomas G. Optoelectronic device for coupling between an external optical wave and a local optical wave for optical modulators and detectors
EP0773458B1 (de) 1995-11-11 2000-03-08 Dr. Johannes Heidenhain GmbH Auflicht-Phasengitter
DE19652563A1 (de) * 1996-12-17 1998-06-18 Heidenhain Gmbh Dr Johannes Lichtelektrische Positionsmeßeinrichtung
US5812629A (en) * 1997-04-30 1998-09-22 Clauser; John F. Ultrahigh resolution interferometric x-ray imaging
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EP1319170B1 (de) * 2000-09-14 2005-03-09 Dr. Johannes Heidenhain GmbH Positionsmesseinrichtung
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Publication number Priority date Publication date Assignee Title
US4522862A (en) * 1981-12-04 1985-06-11 Johannes Heidenhain Gmbh High resolution recording medium and method for producing same
US5377044A (en) * 1990-03-19 1994-12-27 Canon Kabushiki Kaisha Reflecting diffraction grating and device, such as encoder or the like, using the same
US5786931A (en) * 1995-04-13 1998-07-28 Johannes Heidenhain Gmbh Phase grating and method of producing phase grating

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PEUKER M: "Optimum energy for high resolution low voltage electron beam lithography - Monte Carlo simulations and experiments", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 53, no. 1-4, June 2000 (2000-06-01), pages 337 - 340, XP004237785, ISSN: 0167-9317 *

Also Published As

Publication number Publication date
WO2003034105A2 (de) 2003-04-24
EP1436647A2 (de) 2004-07-14
US20050052743A1 (en) 2005-03-10
DE10150099A1 (de) 2003-04-17
ATE421707T1 (de) 2009-02-15
US7312878B2 (en) 2007-12-25
EP1436647B1 (de) 2009-01-21
DE50213242D1 (de) 2009-03-12

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