WO2003087937A3 - Waterborne printed circuit board coating compositions - Google Patents
Waterborne printed circuit board coating compositions Download PDFInfo
- Publication number
- WO2003087937A3 WO2003087937A3 PCT/US2003/008838 US0308838W WO03087937A3 WO 2003087937 A3 WO2003087937 A3 WO 2003087937A3 US 0308838 W US0308838 W US 0308838W WO 03087937 A3 WO03087937 A3 WO 03087937A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- circuit board
- printed circuit
- coating compositions
- board coating
- surfactant
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Paints Or Removers (AREA)
- Materials For Photolithography (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Abstract
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03718025A EP1493313B1 (en) | 2002-04-11 | 2003-03-24 | Waterborne printed circuit board coating compositions |
| DE60310055T DE60310055T2 (en) | 2002-04-11 | 2003-03-24 | AQUEOUS COATING COMPOSITIONS FOR PCB |
| AU2003222042A AU2003222042A1 (en) | 2002-04-11 | 2003-03-24 | Waterborne printed circuit board coating compositions |
| DK03718025T DK1493313T3 (en) | 2002-04-11 | 2003-03-24 | Waterborne coating compositions for printed circuit boards |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US37149802P | 2002-04-11 | 2002-04-11 | |
| US60/371,498 | 2002-04-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2003087937A2 WO2003087937A2 (en) | 2003-10-23 |
| WO2003087937A3 true WO2003087937A3 (en) | 2004-03-11 |
Family
ID=29250689
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/US2003/008838 Ceased WO2003087937A2 (en) | 2002-04-11 | 2003-03-24 | Waterborne printed circuit board coating compositions |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20030219656A1 (en) |
| EP (1) | EP1493313B1 (en) |
| AT (1) | ATE347248T1 (en) |
| AU (1) | AU2003222042A1 (en) |
| DE (1) | DE60310055T2 (en) |
| DK (1) | DK1493313T3 (en) |
| ES (1) | ES2278155T3 (en) |
| TW (1) | TW200304933A (en) |
| WO (1) | WO2003087937A2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101020164B1 (en) | 2003-07-17 | 2011-03-08 | 허니웰 인터내셔날 인코포레이티드 | Planarization films for advanced microelectronic applications, and apparatus and methods for making same |
| JP4929784B2 (en) * | 2006-03-27 | 2012-05-09 | 富士通株式会社 | Multilayer wiring board, semiconductor device and solder resist |
| CN111454596B (en) * | 2019-01-18 | 2022-04-05 | 沈阳化工研究院有限公司 | Water-based nano anticorrosive paint and preparation method thereof |
| JP7255285B2 (en) * | 2019-03-28 | 2023-04-11 | 株式会社レゾナック | Photosensitive resin composition, photosensitive resin film, multilayer printed wiring board, semiconductor package, method for producing multilayer printed wiring board, and method for producing photosensitive resin composition |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2261664A (en) * | 1991-10-22 | 1993-05-26 | Coates Brothers Plc | Coating compositions |
| US5506089A (en) * | 1993-03-09 | 1996-04-09 | The Chromaline Corporation | Photosensitive resin composition |
| WO2001025314A1 (en) * | 1999-10-05 | 2001-04-12 | Cognis Corporation | Self-dispersible epoxide/surfactant coating compositions |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3930072A (en) * | 1974-06-28 | 1975-12-30 | Universal Oil Prod Co | Stabilization of metal plating baths |
| US4273851A (en) * | 1979-05-29 | 1981-06-16 | Richardson Graphics Company | Method of coating using photopolymerizable latex systems |
| JPS6462375A (en) * | 1987-09-02 | 1989-03-08 | Arakawa Chem Ind | Liquid photosolder resist ink composition of alkali development type |
| US5364736A (en) * | 1987-12-07 | 1994-11-15 | Morton International, Inc. | Photoimageable compositions |
| US5723261A (en) * | 1989-11-30 | 1998-03-03 | Tamura Kaken Co., Ltd. | Photopolymerizable composition |
| JPH04136857A (en) * | 1990-09-28 | 1992-05-11 | Hitachi Ltd | Photosesetting resist composition and manufacture of printed circuit board by using same and this circuit board |
| JP2877659B2 (en) * | 1993-05-10 | 1999-03-31 | 日本化薬株式会社 | Resist ink composition and cured product thereof |
| TW270123B (en) * | 1993-07-02 | 1996-02-11 | Ciba Geigy | |
| JP3134037B2 (en) * | 1995-01-13 | 2001-02-13 | 太陽インキ製造株式会社 | Thermosetting or photocuring / thermosetting coating composition using melamine organic acid salt |
| US5545510A (en) * | 1995-03-28 | 1996-08-13 | Mac Dermid, Inc. | Photodefinable dielectric composition useful in the manufacture of printed circuits |
| EP0737701B1 (en) * | 1995-04-13 | 2002-03-06 | Mitsui Chemicals, Inc. | Epoxy acrylate resins and their uses |
| US5853957A (en) * | 1995-05-08 | 1998-12-29 | Tamura Kaken Co., Ltd | Photosensitive resin compositions, cured films thereof, and circuit boards |
| JP2718007B2 (en) * | 1995-06-06 | 1998-02-25 | 太陽インキ製造株式会社 | Alkali-developable one-pack type photo solder resist composition and method for manufacturing printed wiring board using the same |
| WO1996041240A1 (en) * | 1995-06-07 | 1996-12-19 | W.R. Grace & Co.-Conn. | Water photoresist emulsions and methods of preparation thereof |
| JP3276833B2 (en) * | 1995-12-13 | 2002-04-22 | 太陽インキ製造株式会社 | Photocurable / thermosetting matte resist ink composition |
| US6207346B1 (en) * | 1997-04-09 | 2001-03-27 | Advanced Coatings International | Waterborne photoresists made from urethane acrylates |
| TW538318B (en) * | 2000-11-03 | 2003-06-21 | Ind Tech Res Inst | Photo-sensitive composition |
-
2003
- 2003-03-24 AT AT03718025T patent/ATE347248T1/en not_active IP Right Cessation
- 2003-03-24 DE DE60310055T patent/DE60310055T2/en not_active Expired - Fee Related
- 2003-03-24 EP EP03718025A patent/EP1493313B1/en not_active Expired - Lifetime
- 2003-03-24 WO PCT/US2003/008838 patent/WO2003087937A2/en not_active Ceased
- 2003-03-24 DK DK03718025T patent/DK1493313T3/en active
- 2003-03-24 US US10/394,587 patent/US20030219656A1/en not_active Abandoned
- 2003-03-24 AU AU2003222042A patent/AU2003222042A1/en not_active Abandoned
- 2003-03-24 ES ES03718025T patent/ES2278155T3/en not_active Expired - Lifetime
- 2003-03-27 TW TW092106965A patent/TW200304933A/en unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2261664A (en) * | 1991-10-22 | 1993-05-26 | Coates Brothers Plc | Coating compositions |
| US5506089A (en) * | 1993-03-09 | 1996-04-09 | The Chromaline Corporation | Photosensitive resin composition |
| WO2001025314A1 (en) * | 1999-10-05 | 2001-04-12 | Cognis Corporation | Self-dispersible epoxide/surfactant coating compositions |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1493313B1 (en) | 2006-11-29 |
| DK1493313T3 (en) | 2007-03-26 |
| AU2003222042A8 (en) | 2003-10-27 |
| ATE347248T1 (en) | 2006-12-15 |
| US20030219656A1 (en) | 2003-11-27 |
| DE60310055D1 (en) | 2007-01-11 |
| DE60310055T2 (en) | 2007-04-12 |
| TW200304933A (en) | 2003-10-16 |
| WO2003087937A2 (en) | 2003-10-23 |
| AU2003222042A1 (en) | 2003-10-27 |
| ES2278155T3 (en) | 2007-08-01 |
| EP1493313A2 (en) | 2005-01-05 |
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