WO2003095193A1 - Thin film material and method for preparation thereof - Google Patents

Thin film material and method for preparation thereof Download PDF

Info

Publication number
WO2003095193A1
WO2003095193A1 PCT/JP2003/005819 JP0305819W WO03095193A1 WO 2003095193 A1 WO2003095193 A1 WO 2003095193A1 JP 0305819 W JP0305819 W JP 0305819W WO 03095193 A1 WO03095193 A1 WO 03095193A1
Authority
WO
WIPO (PCT)
Prior art keywords
thin film
film layer
film material
preparation
metal oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2003/005819
Other languages
English (en)
French (fr)
Inventor
Toyoki Kunitake
Mineo Hashizume
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to AU2003231423A priority Critical patent/AU2003231423A1/en
Priority to JP2004508517A priority patent/JPWO2003095193A1/ja
Priority to EP03725764A priority patent/EP1514679A4/en
Publication of WO2003095193A1 publication Critical patent/WO2003095193A1/ja
Priority to US10/983,056 priority patent/US20050129935A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/06—Coating with compositions not containing macromolecular substances
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal
    • Y10T428/31681—Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
PCT/JP2003/005819 2002-05-09 2003-05-09 Thin film material and method for preparation thereof Ceased WO2003095193A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2003231423A AU2003231423A1 (en) 2002-05-09 2003-05-09 Thin film material and method for preparation thereof
JP2004508517A JPWO2003095193A1 (ja) 2002-05-09 2003-05-09 薄膜材料およびその製造方法
EP03725764A EP1514679A4 (en) 2002-05-09 2003-05-09 THIN FILM MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
US10/983,056 US20050129935A1 (en) 2002-05-09 2004-11-08 Thin-film material and method for producing same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002/134314 2002-05-09
JP2002134314 2002-05-09

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/983,056 Continuation US20050129935A1 (en) 2002-05-09 2004-11-08 Thin-film material and method for producing same

Publications (1)

Publication Number Publication Date
WO2003095193A1 true WO2003095193A1 (en) 2003-11-20

Family

ID=29416703

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2003/005819 Ceased WO2003095193A1 (en) 2002-05-09 2003-05-09 Thin film material and method for preparation thereof

Country Status (5)

Country Link
US (1) US20050129935A1 (ja)
EP (1) EP1514679A4 (ja)
JP (1) JPWO2003095193A1 (ja)
AU (1) AU2003231423A1 (ja)
WO (1) WO2003095193A1 (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005205584A (ja) * 2003-11-27 2005-08-04 Tokyo Ohka Kogyo Co Ltd ナノ材料の製造方法ならびにこれに用いられる金属酸化物ナノ材料形成用組成物、鋳型および金属酸化物ナノ構造体
WO2005121019A1 (ja) * 2004-06-08 2005-12-22 Riken ナノ構造体の製造方法およびナノ構造体
JP2006297575A (ja) * 2005-04-25 2006-11-02 Tokyo Ohka Kogyo Co Ltd 鋳型形成用組成物
JP2007061752A (ja) * 2005-08-31 2007-03-15 Kitakyushu Foundation For The Advancement Of Industry Science & Technology 化学物質識別膜の製造方法
JP2008050469A (ja) * 2006-08-24 2008-03-06 Yaskawa Electric Corp グラフト重合膜付きフィルム、その製造方法、光グラフト重合装置、伸縮性高分子フィルムおよびその製造方法
JP2009058703A (ja) * 2007-08-31 2009-03-19 Tokai Kogaku Kk 光学多層膜およびその製造方法
JP2012236125A (ja) * 2011-05-10 2012-12-06 Asahi Sunac Corp 高分子超薄膜の製造方法及び高分子超薄膜の製造装置
JP2013032438A (ja) * 2011-08-02 2013-02-14 Nichias Corp シール材
KR20190047183A (ko) * 2017-10-27 2019-05-08 주식회사 넥스트이앤엠 이온선택성 고분자가 충진된 유무기 복합막

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005098075A1 (en) * 2004-04-06 2005-10-20 Lg Electronics, Inc. Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
US8664124B2 (en) 2005-10-31 2014-03-04 Novellus Systems, Inc. Method for etching organic hardmasks
US7399712B1 (en) * 2005-10-31 2008-07-15 Novellus Systems, Inc. Method for etching organic hardmasks
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
JP2009057518A (ja) * 2007-09-03 2009-03-19 Institute Of Physical & Chemical Research 異方性フィルムおよび異方性フィルムの製造方法
US8435608B1 (en) 2008-06-27 2013-05-07 Novellus Systems, Inc. Methods of depositing smooth and conformal ashable hard mask films
JP5234011B2 (ja) * 2010-01-07 2013-07-10 豊田合成株式会社 金属と樹脂との複合体の製造方法
SG195494A1 (en) 2012-05-18 2013-12-30 Novellus Systems Inc Carbon deposition-etch-ash gap fill process
US9362133B2 (en) 2012-12-14 2016-06-07 Lam Research Corporation Method for forming a mask by etching conformal film on patterned ashable hardmask
US9304396B2 (en) 2013-02-25 2016-04-05 Lam Research Corporation PECVD films for EUV lithography
US9589799B2 (en) 2013-09-30 2017-03-07 Lam Research Corporation High selectivity and low stress carbon hardmask by pulsed low frequency RF power
US9320387B2 (en) 2013-09-30 2016-04-26 Lam Research Corporation Sulfur doped carbon hard masks
US11247501B2 (en) 2014-08-27 2022-02-15 3M Innovative Properties Company Layer-by-layer assembled multilayer lamination transfer films
GB201718817D0 (en) * 2017-11-14 2017-12-27 N4 Pharma Uk Ltd Particulate material production process
WO2020243342A1 (en) 2019-05-29 2020-12-03 Lam Research Corporation High selectivity, low stress, and low hydrogen diamond-like carbon hardmasks by high power pulsed low frequency rf
CN114342043A (zh) 2019-08-30 2022-04-12 朗姆研究公司 低压下的高密度、模量和硬度的非晶碳膜
CN112552206B (zh) * 2020-12-16 2023-03-21 青岛科技大学 一种偶氮苯基衍生物、太阳热能燃料薄膜复合材料及其制备方法和用途
CN113181892A (zh) * 2021-04-22 2021-07-30 浙江工商大学 一种光催化防治藻类水华的产品及方法
CN113548640A (zh) * 2021-07-20 2021-10-26 天津智柔科技有限公司 一种规整微纳米锥阵列结构导电膜、其制备方法和应用

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04182309A (ja) * 1990-11-16 1992-06-29 Res Dev Corp Of Japan 多孔質シリカ薄膜の製造方法
JPH0558604A (ja) * 1991-08-30 1993-03-09 Res Dev Corp Of Japan 金属酸化物薄膜の製造方法
JPH09241008A (ja) * 1996-03-08 1997-09-16 Tokuyama Corp 金属酸化物薄膜の製造方法
JPH10167707A (ja) * 1996-12-16 1998-06-23 Kagaku Gijutsu Shinko Jigyodan 膜厚の制御された無機超薄膜の製造方法
JPH10249985A (ja) * 1997-03-11 1998-09-22 Tokuyama Corp 有機／金属酸化物複合薄膜の製造方法
JP2000254462A (ja) * 1999-03-11 2000-09-19 Toyoki Kunitake 光学異性体の分離・検出能をもつ金属酸化物薄膜
JP2001270022A (ja) * 2000-03-24 2001-10-02 National Institute For Materials Science チタニア超薄膜およびその製造方法
WO2001072878A1 (en) * 2000-03-28 2001-10-04 The Board Of Regents For Oklahoma State University Assembly of free-standing films using a layer-by-layer process
JP2002338211A (ja) * 2001-03-13 2002-11-27 Inst Of Physical & Chemical Res アモルファス状金属酸化物の薄膜材料
JP2002361767A (ja) * 2001-04-06 2002-12-18 Dainippon Printing Co Ltd 微粒子層積層膜およびそれを用いた光学機能材

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04182309A (ja) * 1990-11-16 1992-06-29 Res Dev Corp Of Japan 多孔質シリカ薄膜の製造方法
JPH0558604A (ja) * 1991-08-30 1993-03-09 Res Dev Corp Of Japan 金属酸化物薄膜の製造方法
JPH09241008A (ja) * 1996-03-08 1997-09-16 Tokuyama Corp 金属酸化物薄膜の製造方法
JPH10167707A (ja) * 1996-12-16 1998-06-23 Kagaku Gijutsu Shinko Jigyodan 膜厚の制御された無機超薄膜の製造方法
JPH10249985A (ja) * 1997-03-11 1998-09-22 Tokuyama Corp 有機／金属酸化物複合薄膜の製造方法
JP2000254462A (ja) * 1999-03-11 2000-09-19 Toyoki Kunitake 光学異性体の分離・検出能をもつ金属酸化物薄膜
JP2001270022A (ja) * 2000-03-24 2001-10-02 National Institute For Materials Science チタニア超薄膜およびその製造方法
WO2001072878A1 (en) * 2000-03-28 2001-10-04 The Board Of Regents For Oklahoma State University Assembly of free-standing films using a layer-by-layer process
JP2002338211A (ja) * 2001-03-13 2002-11-27 Inst Of Physical & Chemical Res アモルファス状金属酸化物の薄膜材料
JP2002361767A (ja) * 2001-04-06 2002-12-18 Dainippon Printing Co Ltd 微粒子層積層膜およびそれを用いた光学機能材

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1514679A4 *

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005205584A (ja) * 2003-11-27 2005-08-04 Tokyo Ohka Kogyo Co Ltd ナノ材料の製造方法ならびにこれに用いられる金属酸化物ナノ材料形成用組成物、鋳型および金属酸化物ナノ構造体
WO2005121019A1 (ja) * 2004-06-08 2005-12-22 Riken ナノ構造体の製造方法およびナノ構造体
US7993706B2 (en) 2004-06-08 2011-08-09 Riken Method of forming a nano-structure and the nano-structure
JP2006297575A (ja) * 2005-04-25 2006-11-02 Tokyo Ohka Kogyo Co Ltd 鋳型形成用組成物
JP2007061752A (ja) * 2005-08-31 2007-03-15 Kitakyushu Foundation For The Advancement Of Industry Science & Technology 化学物質識別膜の製造方法
JP2008050469A (ja) * 2006-08-24 2008-03-06 Yaskawa Electric Corp グラフト重合膜付きフィルム、その製造方法、光グラフト重合装置、伸縮性高分子フィルムおよびその製造方法
JP2009058703A (ja) * 2007-08-31 2009-03-19 Tokai Kogaku Kk 光学多層膜およびその製造方法
JP2012236125A (ja) * 2011-05-10 2012-12-06 Asahi Sunac Corp 高分子超薄膜の製造方法及び高分子超薄膜の製造装置
JP2013032438A (ja) * 2011-08-02 2013-02-14 Nichias Corp シール材
KR20190047183A (ko) * 2017-10-27 2019-05-08 주식회사 넥스트이앤엠 이온선택성 고분자가 충진된 유무기 복합막
KR102048811B1 (ko) * 2017-10-27 2019-11-26 주식회사 넥스트이앤엠 이온선택성 고분자가 충진된 유무기 복합막

Also Published As

Publication number Publication date
EP1514679A4 (en) 2008-02-20
JPWO2003095193A1 (ja) 2005-09-08
AU2003231423A1 (en) 2003-11-11
US20050129935A1 (en) 2005-06-16
EP1514679A1 (en) 2005-03-16

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