WO2005100256A1 - Vorrichtung zur behandlung eines flüssigen oder gasförmigen mediums mittels uv-strahlen - Google Patents
Vorrichtung zur behandlung eines flüssigen oder gasförmigen mediums mittels uv-strahlen Download PDFInfo
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- WO2005100256A1 WO2005100256A1 PCT/EP2005/003776 EP2005003776W WO2005100256A1 WO 2005100256 A1 WO2005100256 A1 WO 2005100256A1 EP 2005003776 W EP2005003776 W EP 2005003776W WO 2005100256 A1 WO2005100256 A1 WO 2005100256A1
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
- C02F1/325—Irradiation devices or lamp constructions
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L9/00—Disinfection, sterilisation or deodorisation of air
- A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
- A61L9/18—Radiation
- A61L9/20—Ultraviolet radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
- B01J19/122—Incoherent waves
- B01J19/123—Ultraviolet light
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/0033—Heating devices using lamps
- H05B3/0038—Heating devices using lamps for industrial applications
- H05B3/0052—Heating devices using lamps for industrial applications for fluid treatments
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/91—Bacteria; Microorganisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/804—UV light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0869—Feeding or evacuating the reactor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0875—Gas
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
- B01J2219/0873—Materials to be treated
- B01J2219/0877—Liquid
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/28—Treatment of water, waste water, or sewage by sorption
- C02F1/283—Treatment of water, waste water, or sewage by sorption using coal, charred products, or inorganic mixtures containing them
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3223—Single elongated lamp located on the central axis of a turbular reactor
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/322—Lamp arrangement
- C02F2201/3228—Units having reflectors, e.g. coatings, baffles, plates, mirrors
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/326—Lamp control systems
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/32—Details relating to UV-irradiation devices
- C02F2201/328—Having flow diverters (baffles)
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/02—Fluid flow conditions
- C02F2301/024—Turbulent
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/02—Fluid flow conditions
- C02F2301/026—Spiral, helicoidal, radial
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/021—Heaters specially adapted for heating liquids
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/022—Heaters specially adapted for heating gaseous material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/30—Wastewater or sewage treatment systems using renewable energies
- Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy
Definitions
- the present invention relates to a device for treating a liquid or gaseous medium by means of ultraviolet rays (UV rays).
- the invention further relates to a particularly suitable use of this device.
- UV radiation is electromagnetic radiation that is located between the visible limit of short-wave light and X-rays and is in a wavelength range from approx. 100 nm to 400 nm. A distinction is made between the following areas: UVA radiation: 400 - 315 nm; UVB radiation: 315-280 nm; UVC radiation: approx. 280 - 200 nm; and VUV radiation: approx. ⁇ 180 nm.
- Devices for treating a liquid or gaseous medium by means of UV rays are used, for example, for UV disinfection or for UV oxidation.
- UV disinfection generally uses UVC radiation, which effectively kills microorganisms such as bacteria, yeast and fungi by damaging the DNA (deoxiribonucleic acid).
- the high absorption of the DNA in this UV radiation area triggers a photochemical reaction that causes an interruption in the irradiated microorganisms of the genetic information for cell multiplication and for the metabolism.
- the microorganisms are inactivated and rendered harmless in this way.
- the addition of chemicals is not necessary for UV disinfection.
- UV radiation with wavelengths less than 200 nm contains ionizing rays that trigger photochemical oxidation processes that can be used to purify gases or liquids, such as waste water, that contain organic pollutants, such as crop protection agents, hormones, dioxins, drug residues, etc. are contaminated.
- organic pollutants such as crop protection agents, hormones, dioxins, drug residues, etc.
- a separate oxidizing agent e.g. H 2 O 2 , ozone
- the oxidizable substances in the wastewater are mineralized by UV radiation.
- the oxidizing agent is split into highly reactive radicals. These radicals also contribute to the complete oxidation of the undesirable waste water constituents.
- EP 0 470 518 A1 describes a device designed in the form of a photochemical flow reactor for treating a liquid or gaseous one
- the device preferably works using an additionally supplied device
- the device comprises a UV radiation source with an axial longitudinal extent and a radial radiation direction essentially perpendicular thereto. Furthermore, the device has a single one
- Treatment chambers in the form of a long stainless steel container in which the
- UV radiation source is arranged.
- the inside wall of the stainless steel container is polished and serves as a reflector for the UV radiation.
- On the inside wall of the stainless steel container is polished and serves as a reflector for the UV radiation.
- Stainless steel containers have swirling elements attached, which swirl and mix the medium flowing through and guide them into the effective range of the UV radiation source.
- conventional devices for the treatment of a liquid or gaseous medium by means of UV rays must have a considerable size. This size not only requires a considerable amount of space, but also means that the device in question can only work with relatively low pressures, since otherwise strength problems arise.
- a very high power of the UV radiation source is required in prior art devices.
- conventional devices which are used for UV disinfection it has furthermore been found that part of the microorganisms in the medium to be treated are often not completely inactivated.
- the invention is based on the object or the technical problem of creating a simple and effective device for treating a liquid or gaseous medium by means of UV rays, which avoids as far as possible the disadvantages inherent in the prior art. According to a further aspect of this task, a particularly suitable use for such a device is to be demonstrated.
- This object is achieved by a device according to the invention having the features of claim 1.
- This device for treating a liquid or gaseous medium, in particular water or air, by means of UV rays comprises: a UV radiation source with an axial longitudinal extent and an essentially perpendicular, in particular radial, radiation direction; and several (ie at least two) layers of successive, radiatable ones arranged one above the other in the radiation direction
- Treatment chambers each of which is separated from the UV radiation source and from one another by a transparent, UV-permeable separating layer, and which, starting with a first treatment chamber closest to the UV radiation source in the radiation direction, each have a throughflow channel running along the longitudinal extent of the UV radiation source form for the medium which opens into the subsequent treatment chamber, which is further away from the UV radiation source in the radiation direction.
- the device according to the invention works in the flow method.
- the UV radiation source preferably emits UV rays in the UVC and / or VUV range.
- the UV radiation source can comprise a single or a plurality of UV individual radiation sources which are arranged at a common location or at different locations on the device. If several UV individual radiation sources are used, it is possible that they have both the same and different UV radiation spectra. For example, one UV single radiation source can then emit in the UVC and the other and VUV range.
- low, medium and high pressure lamps can be used as the UV radiation source.
- the number of layers of treatment chambers can vary in particular depending on the UV radiation source, the medium to be treated and its contaminants.
- the dimensions and geometries of the respective treatment chambers in particular their thickness in the radiation direction or their flow cross sections, can be the same or different.
- a desired flow dynamics as well as an optimal utilization of the penetration depth of the UV radiation or a certain spectral range into the medium and a certain absorption and reaction behavior of the medium can be achieved.
- Even the transparent, UV permeable separating layers or partial areas thereof can have the same or different properties, in particular UV transmission properties, and dimensions or thicknesses.
- the device according to the invention is comparatively small, compact and can be carried out with a low overall volume and requires only a small amount of space. Nevertheless, it is very robust.
- the compact design also makes it possible to work with higher pressures than in the prior art, as a result of which the throughput of the medium is increased or the same throughput can be achieved with a smaller device as with a larger, known device. While previously known devices work, for example, at approximately 1.5 bar, the device according to the invention is e.g. easily operated at 4.5 bar.
- the layered or multi-layered arrangement of the treatment chambers allows the residence time of the medium to be treated and the impurities contained in it to be considerably increased in the effective range of the UV radiation source, despite the small size.
- the radiation area of the UV radiation source is optimally used and the exposure time of the UV rays is maximized in the smallest space, since the medium to be treated is guided several times through the area of action of the UV radiation source during a single pass through the device. Due to its special design, the device according to the invention also offers further possibilities for extending the dwell time, which will be discussed in more detail below.
- the device according to the invention Because of the increased residence time of the medium to be treated in the radiation region of the UV radiation source, the device according to the invention has a considerably improved degree of disinfection and / or oxidation compared to previously known solutions. Microorganisms contained in the medium can thus be reliably deactivated. And any organic
- Pollutants can be completely oxidized or broken down into non-toxic compounds.
- combined UV process a combined UV disinfection and UV oxidation process
- This possibility arises primarily through the special layer arrangement of the successive treatment chambers which can be irradiated by the UV radiation in connection with the increase in the residence time of the medium and the exposure time of the UV radiation to the medium and its impurities.
- the medium is sterilized in the combined UV process both by damage to the DNA of the microorganisms contained, and the molecular composition of the remaining inactivated microorganisms or viruses is destroyed and completely destroyed by photochemical oxidation (e.g. in the context of wet combustion) reduced. This results in a very high degree of cleaning.
- any intolerance to certain proteins or chemical compositions of inactivated microorganisms or residues that are still physically present in the medium can thus be effectively avoided.
- the UV disinfection and UV oxidation can, as it were, flow into one another, or else can be carried out sequentially in successive treatment chambers.
- a method can thus be carried out which is similar to a natural process which can be achieved by the UV radiation of the sun, in which ultimately non-toxic, no longer active substances or compounds remain, which in turn can be returned to the bio-cycle.
- the device according to the invention Although in the combined UV process that can be implemented with the device according to the invention, separate oxidizing agents could in principle be used for UV oxidation, this is due to the high achievable Efficiency generally not required. A hazard from the use of such chemicals can thus be avoided. As a result of the optimal use of UV radiation, the device according to the invention also requires only one UV radiation source with a comparatively low power. The device according to the invention works ergo with high efficiency, low operating costs, low maintenance and consequently high economy.
- FIG. 1 shows a schematic block diagram of a device according to the invention in accordance with a first embodiment
- 2 shows a schematic longitudinal sectional view through an essential component of the device according to the invention in accordance with the first embodiment
- Fig. 3 is a schematic cross-sectional view taken along line A-A in Fig. 2;
- Fig. 4 is a schematic cross-sectional view taken along line B-B in Fig. 2;
- Fig. 5 is a schematic cross-sectional view taken along the line C-C in Fig. 2;
- FIG. 6 shows a schematic plan view of the device from FIG. 2 with the viewing direction according to arrow D in FIG. 1;
- FIG. 7 shows a schematic longitudinal sectional view through a device according to the invention in accordance with a second embodiment
- FIG. 8 shows a schematic cross-sectional view through a device according to the invention in accordance with a third embodiment
- FIG. 9 shows a schematic cross-sectional view through a device according to the invention in accordance with a fourth embodiment
- FIG. 10 shows a schematic longitudinal sectional view through an essential region of a device according to the invention in accordance with a fifth embodiment
- FIG. 11 shows an enlargement of area X from FIG. 10
- FIG. 12 shows a schematic cross-sectional view through an essential region of a device according to the invention in accordance with a sixth embodiment
- 13 shows a schematic longitudinal sectional view through a device according to the invention in accordance with a seventh embodiment
- Fig. 14 is a schematic cross-sectional view taken along the line XIV-XIV in Fig. 13;
- FIG. 15 is a schematic cross-sectional view along the line XV-XV in FIG. 13.
- FIG. 1 shows a schematic block diagram of a device according to the invention for treating a liquid or gaseous medium by means of UV rays, according to a first embodiment.
- the essential components of the device include a photochemical reactor 2 with a feed channel 4 for the liquid or gaseous medium to be treated and an outlet channel 6 for the treated medium.
- a photochemical reactor 2 with a feed channel 4 for the liquid or gaseous medium to be treated and an outlet channel 6 for the treated medium.
- the medium to be treated water is used in the present exemplary embodiment, which is contaminated by microorganisms or viruses and organic pollutants.
- the reactor 2 is coupled to a control device 8, which here has two safety and control sensors 10, 12 (here: an optical sensor and a temperature sensor).
- the device also has a pre-filter device 14, which is connected upstream of the feed channel 4, and one
- a solenoid valve 20 is provided between the outlet channel 6 and the pump 16.
- a filter device 22 downstream of the outlet duct 6 can also be provided in the line 18, which serves to filter out any radical residues and / or ozone residues in the treated medium.
- FIG. 2 shows a schematic longitudinal sectional view through the photochemical flow reactor 2 of the device according to the first embodiment.
- FIG. 3 shows a schematic cross-sectional view along the line AA in FIG. 2.
- the device or the reactor 2 comprises a UV radiation source 24 with an axial longitudinal extent and an essentially perpendicular, in particular radial, radiation direction R.
- the UV radiation source 24 has one UV radiation spectrum of at least 180 nm to at least 254 nm wavelength. In the present case, the UV radiation spectrum is in a range from approximately 180 nm to approximately 260 nm.
- the device has a plurality of layers of successive, radiatable treatment chambers K1 to K4 arranged or layered one above the other in the radiation direction.
- the treatment chambers K1-K4 are separated from the UV radiation source 24 and from each other by a transparent, UV-permeable separating layer T1 to T4.
- the treatment chambers K1 - K4 each form a flow channel for the medium which runs along the longitudinal extent of the UV radiation source 24 and which flows into the subsequent UV radiation source 24 in Radiation direction R opens more distant treatment chamber.
- the reactor 2 in the present example has four treatment chambers K1, K2, K3, K4, the length of which essentially corresponds to the axial length of the UV radiation source 24.
- the treatment chambers K1-K4 are arranged concentrically in the radial direction around the UV radiation source 24.
- K1 - K4 is circular.
- the treatment chambers K5 - K5 are separated from each other by five separating layers. At least that based on the UV Radiation source 24 first four separating layers T1 - T4 are transparent and transparent to UV radiation.
- both the first separating layer T1 which is arranged between the UV radiation source 24 and the first treatment chamber K1 and is closest to the UV radiation source 24, and the following one in the radial direction second separation layer T2 made of a first separation layer material.
- This first separating layer material has a UV permeability which essentially transmits the entire UV radiation spectrum of the UV radiation source 24, including a first partial spectrum with wavelengths less than 200 nm, that is to say also the UV radiation with approximately 180 nm.
- the first two separating layers T1, T2 are designed in the form of glass tubes which are made of synthetic quartz glass as the first separating layer material.
- the first separating layer T1 or the first glass tube could also be a transparent envelope wall of the UV radiation source 24 itself, which is transparent to the spectral range mentioned. This offers e.g. then on when a UV immersion lamp arranged in the first treatment chamber K1 is used as the UV radiation source 24.
- the total thickness of the partial layer measured in the radiation direction R, which is formed from the first two glass tubes T1, T2 and the first two treatment chambers K1, K2, into which the UV radiation enters through the synthetic quartz glass, is selected such that it is essentially one maximum effective
- Penetration depth of the first part of the spectrum corresponds to UV radiation, which results as a function of the absorption capacity of the water to be treated and the UV permeability of the first two glass tubes T1, T2 for this first part of the spectrum. This ensures optimal utilization of the short-wave, hard UV radiation of less than 200 nm for the purpose of one that is described below
- a larger layer thickness is not sensible, but possibly even dangerous, since then areas of the water to be treated in Direction of radiation R could no longer be reliably penetrated or detected.
- the third and fourth separating layers T3, T4 follow the first and second separating layers T1, T2 in the radiation direction R are made of a second separating layer material.
- This second separating layer material has a UV permeability which, of the UV radiation spectrum of the UV radiation source 24, only transmits UV radiation in a second partial spectrum with wavelengths greater than or equal to 200 nm.
- the third and fourth separating layers T3, T4 are also formed in the form of glass tubes which are made of natural quartz glass as the second separating layer material.
- the device according to the invention also has a residence time extension device for extending the residence time of the water to be treated and the impurities or pollutants contained therein in the radiation region of the UV radiation source 24.
- the successive treatment chambers K1-K4 form part of the residence time extension device. This is because during operation of the device, the water first flows through the feed channel 4 into the first, radially inner chamber K1, in this along the axial longitudinal extent of the UV radiation source 24 to an outlet opening 26 at the end, which at the same time has an inlet opening 26 at the end for the next, ie forms the second, radially following treatment chamber K2.
- the water is deflected by approximately 180 °, flows again along the longitudinal extent of the UV radiation source 24 and enters the third treatment chamber K4, which is located radially further outward, and is in turn deflected by 180 °. In an analogous manner, it arrives from the third treatment chamber K3 into the fourth, radially outermost chamber K4 and leaves the device through the outlet channel 6. The water is exposed to UV radiation along the entire flow path through the treatment chambers K1-K4.
- the residence time extension device comprises further detail elements, which are described below with reference to FIGS. 4 to 6 to be discribed.
- 4 shows a schematic cross-sectional view along the line BB in FIG. 2
- Fig. 5 is a schematic cross-sectional view taken along line CC in Fig. 2
- FIG. 6 shows a schematic plan view of the device from FIG. 2 with the viewing direction according to arrow D in FIG. 1.
- the feed channel 4 is designed as part of the residence time extension device in such a way that it opens into the first treatment chamber K1 essentially tangentially with respect to the radial radiation direction R or the circular cross-sectional shape of the first treatment chambers K1.
- the outlet opening 26 of the first treatment chamber K1 or the inlet opening 26 of the second treatment chamber K2 is e.g. designed slit-shaped with a lenticular slit cross-section (see also FIGS.
- the outlet duct 6 is also designed as part of the residence time extension device. Relative to the radial radiation direction R or the circular cross-sectional shape of the treatment chambers K1-K4, it emerges essentially tangentially and in the twist direction from the last treatment chamber K4, which is the most distant in the radiation direction R in the radiation direction R, and thus contributes to maintaining the spiral flow around it UV radiation source 24 at.
- the residence time extension device can have swirling elements 28 or turbulators which, for example, in the treatment chambers K1-K4, the feed channel 4, the outlet channel 6, inlet or Outlet openings 26 are arranged between successive treatment chambers or further supply and discharge lines.
- the swirling elements 28 include, for example, nub-like elevations, depressions, blades, wings, fences, rotating or vibrating parts or the like on the walls of the components mentioned. If these swirling elements 28 are used in connection with said tangential feed channel 4 and outlet channel 6, they should contribute to maintaining the basic direction of swirl.
- the swirling elements 28 can be permanently installed or can also be arranged on removable inserts, which simplifies cleaning work.
- vortex knobs are indicated, which are arranged on the glass tubes T1 - T4.
- the last one, i.e. here the fourth treatment chamber K4 has on its side furthest away from the UV radiation source 24 in the radiation direction a UV reflection device 30, which reflects the UV radiation emitted by the UV radiation source 24 and penetrated up to the outer wall KL and thus to a high level Utilization degree of UV radiation and an intensive treatment of the water contributes.
- the UV reflection device 30 can e.g. be a mirror layer applied to the inside of this wall KL or a highly polished, reflective surface.
- the outer wall KL is transparent to the UV radiation (e.g. made of natural quartz glass)
- the UV reflection device 30 can be designed, for example, in the form of a reflection or mirror layer or the like attached around the glass.
- the device is put into operation via the control device 8 and the UV
- Radiation source 24 activated. After a predetermined burn-in time, the solenoid valve 20 is opened and the pump 16 is actuated. Contaminated water is in the pre-filter device 14 in the reactor 2 and through it Treatment chambers K1 - K4 are sucked through, sterilized there and freed of chemical contaminants and flows out via the outlet channel 6, the possible afterfilter 22, the solenoid valve 20 and the pump 16.
- the optical sensor 10 has the task of detecting a clouding of the glass walls of the glass tubes T1-T4.
- Turbidity can e.g. caused by limescale and / or cloudy water. It would limit the performance of the reactor. In the case of a defined turbidity, this is reported to the control device 8 via a corresponding sensor signal.
- the control device 8 switches off the UV radiation source 24, the solenoid valve 20 and the pump 16 and does not permit a new start. Operation is only released again after cleaning or troubleshooting.
- the temperature sensor 12 has the task of protecting the reactor from overheating. If the flow of water were to be blocked, the reactor would heat up and the water in it would boil. The sensor 12 reports such a dangerous condition to the control device 8 and this then switches off the UV radiation source 24, the solenoid valve 20 and the pump 16.
- the polluted water contaminated with microorganisms or viruses is exposed to UV radiation in the first and second treatment chambers K1, K2, which has a UV radiation spectrum with wavelengths of both smaller and larger than 200 nm.
- UV radiation greater than 200 nm, in particular around 254 nm causes UV disinfection by destroying the DNA of the microorganisms contained in the water.
- the radiation below 200 nm, in particular around 180 nm sets UV oxidation in motion in the context of wet photochemical combustion.
- ozone O 3
- O 2 molecular oxygen
- the radiation below 200nm produces ozone (O 3 ) from the molecular oxygen (O 2 ) in the water. This is done in the first and second chamber.
- the Ozone is broken down into individual (single) oxygen atoms (O) by the existing UV radiation above 200nm.
- These already highly reactive oxygen atoms combine as a result of the photochemical reaction with hydrogen atoms (H +) to form OH molecules.
- OH molecules are free radicals which essentially destroy all types of the organic pollutants described above, in particular the molecular residues or shells of the deactivated microorganisms.
- OH radicals have a max. Lifespan of approximately 100 milliseconds. After that, they break down again into hydrogen and oxygen and thus into absolutely non-toxic substances. There are no harmful substances left in a photochemical reaction. All organic matter is completely oxidized (burned). Even substances such as pesticides (DDT, atrazines, etc.) or intermediate
- the radicals are generated in the first two treatment chambers K1, K2.
- the oxidation (“consumption”) of the radicals takes place largely in the third and fourth treatment chambers K3, K4.
- the above-described inherent or additionally designed residence time extension device of the device according to the invention enables production a high radical density and at the same time increases the accuracy of the OH radicals on the molecular structures to be destroyed by the swirling of the water.
- the residence time required for photochemical wet combustion is more than fulfilled with the construction according to the invention.
- the necessary residence time for the oxidation of protein bodies is, for example, approx. 100 mS.
- the third and fourth glass tubes T3, T4 are made of normal or natural quartz glass and UV radiation below 200 nm does not pass and the UV radiation below 200 nm has already been essentially completely absorbed in the first and second treatment chambers K1, K2 it in the third and fourth treatment chambers K3, K4 are no longer effective.
- Combined UV disinfection and UV oxidation therefore take place continuously in the device according to the invention (referred to above as the combined UV process), which ensures a very high degree of purification of the contaminated water.
- the sterilized and purified water should be passed over activated carbon for safety, which can be done in the post-filter device 22.
- Activated carbon restores a natural redox value. Because of the OH radicals, there is an enormously high redox potential of up to 2 volts in the treatment chambers K1 - K4 of the reactor 2. This is harmful and must be adjusted to the natural conditions (250 - 450 mV).
- FIG. 7 shows a schematic longitudinal sectional view through a device according to the invention in accordance with a second embodiment.
- the respective treatment chambers K1-K4 arranged in layers each extend in a spiral around the UV radiation source 24.
- FIG. 8 shows a schematic cross-sectional view through a device according to the invention in accordance with a third embodiment.
- the principle of operation of this variant essentially corresponds to that of the first embodiment, but the treatment chambers K1-K4 arranged in layers are grouped in a plate-like or box-like arrangement, and the UV radiation source 24 is placed on the side of this arrangement.
- Each treatment chamber K1 - K4 has a meandering flow path (not shown) for the medium to be treated.
- the device is equipped with a parabolic reflector device 32, which bundles the UV light emitted by the UV radiation source 24 onto the layered treatment chambers K1-K4.
- FIG. 9 shows a schematic cross-sectional view through a device according to the invention in accordance with a fourth embodiment.
- the embodiment according to FIG. 9 is similar in principle to that according to FIG. 8, but two UV individual radiation sources 24a, 24b are provided, which shine through the layered treatment chambers K1-K4 from two different sides.
- the first UV single radiation source 24a emits UV light in a spectrum smaller than 200 nm and the second 24b in a spectrum larger than 200 nm. If these UV single radiation sources 24a, 24b are each assigned a group of treatment chambers and between them e.g.
- a filter or a separating UV reflection device 34 is arranged in each case, so that UV disinfection and UV oxidation can be carried out separately in time and place within the device, e.g. first only UV disinfection and then UV oxidation.
- the first or second material for the respective transparent, UV-permeable separating layers can also act as a filter.
- FIG. 10 shows a schematic longitudinal sectional view through an essential partial area of a device according to the invention in accordance with a fifth embodiment.
- the swirling elements 28 or swirl knobs of the residence time extension device are transparent and UV-transparent.
- the transparent and UV-permeable interlacing elements 28 are at the same time an integral part of a respective transparent, UV-permeable separating layer T1, T2, T3.
- three-dimensionally deformed regions of the respective separating layer T1, T2, T3 form the transparent and UV-permeable interlacing elements 28.
- swirling elements 28 which are attached to or on the relevant transparent, UV-permeable separating layer T1, T2, T3.
- the transparent, UV-permeable interlacing elements 28 are designed as optical lenses (e.g. converging lenses or scattering lenses) and / or as light guides with precisely defined optical properties. They therefore have a double function, because on the one hand they swirl the medium to be treated and thereby increase its dwell time in the UV radiation, and on the other hand they focus (or scatter) the UV rays in a precisely predetermined manner and can thereby create one achieve increased yield of UV radiation. They are therefore briefly called opto-mechanical knobs 28 below. When viewed in the radiation direction R, the opto-mechanical knobs 28 have an essentially circular outline shape. Depending on the design, however, they can also be oval, square, rectangular, polygonal or have an irregular or asymmetrical layout.
- optical lenses e.g. converging lenses or scattering lenses
- light guides with precisely defined optical properties. They therefore have a double function, because on the one hand they swirl the medium to be treated and thereby increase its dwell time in the UV radiation, and on the other hand they focus (or scatter)
- the opto-mechanical knobs 28 of the respective separating layers T1, T2, T3 in this example bulge with their bulge against the radiation direction R of the UV rays.
- they are arranged on the side of the respective separating layer T1, T2, T3 facing the UV radiation.
- the opto-mechanical nubs 28 can, however, also be arranged on the side facing away from the UV radiation or even on both sides.
- the rear of the knobs 28 forms an indentation which, like the bulge on the front, in turn serves as a swirling element.
- the knobs 28 of a first separating layer are laterally offset with respect to the knobs of a second separating layer (for example T2).
- the nub height or the distance between the nub tips is selected as a function of the width measured in the radiation direction R of a treatment chamber delimited by the respective separating layers T1, T2, T3 such that the height or the distance has a predetermined value.
- the distance of an optical input plane (or output plane) of an opto-mechanical nub 28 of a separating layer (for example T2) arranged distally in the radiation direction R from the UV radiation source is at a distance from the optical output plane (or input plane) of a in the radiation direction R of
- the UV radiation source is provided with a proximally arranged separating layer (for example T1), which is preferably less than or equal to 15, in particular less than or equal to 10 mm (depending on the embodiment in particular also less than or equal to 9 mm, less than or equal to 8 mm, less than or equal to 7 mm, less than or equal to 6 mm , less than or equal to 5 mm, less than or equal to 4 mm, less than or equal to 3 mm, less than or equal to 2 mm, less than or equal to 1 mm, less than or equal to 0.5 mm, less than or equal to 0.25 mm).
- the nub tip or the nub head of an opto-mechanical nub 28 of the separating layer T2 is spaced approx. 0.5 mm from the side of the separating layer T1 facing away from the UV radiation source, so that the above-mentioned condition is fulfilled.
- Corresponding distances are preferably selected for the knobs 28 of the further separating layers (here: T3 in relation to T2).
- the UV radiation with a wavelength of less than 200 nm (here: e.g. 185 nm) only has to travel a short distance of max. Between the respective optical output and input levels. Move approx. 10 mm through the medium to be treated (e.g. water) and is not dampened too much.
- this short-wave UV radiation can therefore be transported into treatment chambers arranged further from the UV radiation source 24 and used there for photoreaction / UV oxidation and for the formation of ozone or radicals.
- the same effect can be achieved with the help of the opto-mechanical knobs 28, if necessary, for the longer-wave, sterilizing UV radiation greater than 200 nm (eg 254 nm).
- the respective distance in Depending on the respective wavelength of the UV sub-spectrum to be considered, the width of the treatment chamber determined by the mutual spacing of the separating layers and thus the distance to be bridged by the UV radiation in the medium to be treated between two adjacent separating layers and the type of medium to be treated ,
- the device according to the invention can thus be equipped with a larger number of treatment chambers without increasing the power or the electrical energy consumption of the UV radiation source and can clean a larger amount of the medium to be treated than would be possible without the opto-mechanical knobs 28.
- the degree of utilization that can be achieved depends in particular on the number of optomechanical knobs 28, their optical quality and the medium to be treated.
- FIG. 11 which shows an enlargement of the area X from FIG. 10, shows the beam path of the UV rays generated by an opto-mechanical nub 28 again more clearly.
- the optomechanical nub 28 essentially acts as a converging lens (in the manner of a dome lens), which focuses and bundles the incoming UV rays.
- FIG. 12 shows a schematic cross-sectional view through an essential region of a device according to the invention in accordance with a sixth
- Embodiment. This variant is largely similar to that of FIGS. 10 and 11. However, in this case the opto-mechanical knobs 28 of successive separating layers T1, T2, T3 are arranged one behind the other in the radiation direction R of the UV light source. A mixed form from the arrangement of the knobs 28 in FIGS. 10, 11 and 12 is also possible. In FIG. 12, the swirling caused by the opto-mechanical knobs 28 is again shown by thin, dashed lines treating medium indicated, which causes an increase in the residence time of the medium in the UV rays.
- the opto-mechanical knobs 28 arranged one behind the other in the radiation direction R of the UV light source are aligned with one another in such a way that an optical output plane (or input plane) of an opto-mechanical knob 28 of a first separating layer (for example T1 ) at a distance from an optical input plane (or output plane) of an optomechanical knob 28 of a second separating layer (for example T2) following in the radiation direction R, which is preferably less than or equal to 15 mm, in particular less than or equal to 10 mm (in certain applications) in particular also less than or equal to 9 mm, less than or equal to 8 mm, less than or equal to 7 mm, less than or equal to 6 mm, less than or equal to 5 mm, less than or equal to 4 mm, less than or equal to 3 mm, less than or equal to 2 mm, less than or equal to 1 mm, less than or equal to 0 , 5 mm, less than or equal to 0.25 mm).
- the transparent, UV-permeable separating layers T1, T2, T3 can likewise bring about optical bundling or scattering effects which can be combined with those of the optomechanical knobs 28.
- FIG. 13 is a schematic longitudinal sectional view through a device according to the invention according to a seventh embodiment.
- Fig. 14 is a schematic cross-sectional view along the line XIV-XIV in FIG. 13.
- FIG. 15 shows a schematic cross-sectional view along the line XV-XV in FIG. 13.
- the basic principle of this seventh variant corresponds to that previously explained
- 13 has an upper 36 and a lower removable cover 38, between which four concentrically arranged round quartz glass tubes, which form the UV-permeable separating layers Tl-T4, and an outer round quartz glass tube T5, which extend as a UV -Reflection device 30 forms.
- the outer quartz glass tube T5 is mirrored on the outside by vapor deposition of an aluminum layer and reflects UV rays arriving in the radiation direction R and passing through the quartz glass tube T5 to the aluminum layer against the radiation direction R. All of these quartz glass tubes Tl-T5 are sealed against the covers 36, 38 by seals, not shown. In this way, the respective components can be easily exchanged and, in particular, simple assembly and disassembly of the Tl-T5 quartz glass tube and simplified maintenance or repair can be implemented.
- the innermost quartz glass tube T1 extends through a central through opening 40 lengthwise through the covers 36, 38 and is open or openable on at least one side.
- the UV radiation source (not shown here for the sake of clarity) can be attached through the tube opening inside the tube T1 and the device, or removed again if necessary, without having to dismantle the separating layers T1-T5 or the covers 36, 38 is required.
- the covers 6, 38 each have a centering device 42 for the UV-permeable separating layers T1-T5 or tubes arranged therebetween, so that these can be arranged simply and securely at a predetermined position relative to one another and on the covers 36, 38.
- the centering device 42 comprises grooves and / or projections and / or shoulders or the like, into which or onto or onto which the respective tubes T1-T5 can be inserted or pushed on.
- the innermost tube T1 is through the through openings 40 and its seals centered. Because of this construction, it is not necessary to cast or glue the quartz glass tubes Tl-T5 into the covers 36, 38, which further facilitates maintenance or repair of the device.
- the upper cover 36 has an inlet 44 and an outlet 46 for the medium to be treated.
- inlet 44 and outlet 46 could also be provided on the lower cover 38. It is also possible that a respective cover 36, 38 has either only inlet 44 or outlet 46.
- the inlet 44 opens into the radially innermost treatment chamber K 1.
- the outlet 46 communicates with the radially outermost treatment chamber K 4 via a semicircular channel 48.
- connecting channels 50 or “transfer channels” are provided in the upper cover, which connect a treatment chamber K1-K3 to the respective subsequent treatment chamber K2-K4 (see, for example, FIG. 15).
- the connecting channels 50 can in principle also be arranged in the lower cover 38 or in both covers 36, 38.
- the seventh embodiment also has a further-developed residence time extension device. That is, as an alternative to or in addition to the components of the residence time extension device described above, it has a part which is arranged here in the upper 36 and lower cover 36. More precisely, the part of the residence time extension device arranged in the upper 36 and lower cover 38 has a swirling device for the medium to be treated. In this exemplary embodiment, this swirling device is integrated into the connecting channels.
- the swirling device comprises a nozzle device with a plurality of nozzles 50, the nozzle channels of which are designed as the connecting channels 52, as in FIG. 15 is indicated (in FIG. 15, the quartz glass tubes Tl-T5 are not shown for the sake of clarity).
- each two successive treatment chambers there are a plurality of nozzles 50 which, in relation to a longitudinal axis L of the treatment chambers (Kl - K4) or the device, form a ring around the longitudinal axis L. are arranged around.
- the nozzles 50 of such a nozzle ring are referred to below as nozzle stages D1 to D3. 15, a first and a second nozzle stage D1 and D3 can be seen on the lower cover 38.
- a third nozzle stage (D3) is located on the upper cover 36.
- No nozzle stage is necessary between the inlet 44 and the first treatment chamber Kl in this example, since the inlet 44 opens essentially tangentially into the first treatment chamber Kl, so that the inflowing medium flows into the chamber Kl rotates around the UV radiation source and flows in a spiral shape to the first nozzle stage D1.
- a nozzle stage could also be provided at the mouth of the first treatment chamber K1.
- the nozzle stages D1 to D3 are arranged alternately on the upper and lower covers 36, 38 between two successive treatment chambers, so that only the two nozzle stages D1 and D3 can be seen in FIG.
- the nozzle stages D1-D3 are each provided in shoulders (or also indentations or the like) on the underside of the upper cover 36 and on the upper side of the lower cover 38. In principle, the nozzle stages can also be installed in only one cover.
- the nozzles 50 are each designed such that their nozzle outlet opening, which opens into a respective treatment chamber K2-K4, defines a predetermined ejection direction for the medium to be treated.
- This ejection direction is chosen so that it is in relation to the ring shape of the Treatment chambers K2 - K4 and to the radiation direction R of the UV radiation source essentially tangential or at an oblique angle.
- the direction of ejection of the nozzles 50 can also have a component running in the longitudinal direction L. However, this should preferably be small.
- the path that the medium to be treated travels within the device is thus extended by approximately 480% per treatment chamber K1-K4.
- the medium rotates in the treatment chambers K1-K4 at a high rotational speed around the UV radiation source until it finally leaves the last treatment chamber K4.
- the medium and any impurities contained therein are exposed to the radiation from the UV radiation source for longer, which makes optimum use of the heat removal and
- the nozzle outlet openings and the ejection directions of the nozzles 50 of two successive treatment chambers K1-K2, K2-K3, K3-K4 are preferably aligned in opposite directions to one another, so that the direction of rotation of the medium reverses during a transition from one treatment chamber to the next. This also contributes to the prolongation of the residence time of the medium in the radiation from the UV radiation source and thus promotes improved utilization of the disinfection and oxidation performance.
- a throttle device for the medium to be treated flowing from one treatment chamber K2-K4 to the next is also arranged.
- This throttle device caused by a defined backflow of the medium, an increase in pressure in the medium and acts on the nozzles 50 with a predetermined pressure, so that the medium can be injected into the respective treatment chamber K2, K3, K4 with high acceleration and high speed.
- a respective nozzle 50 is designed as a throttle device on its medium inlet side, which can be achieved by a suitable nozzle.
- the nozzle channel 52 of a nozzle 50 that forms the respective connecting channel and tapers in the direction of ejection is curved or has curved or parabolically curved nozzle channel walls.
- a respective nozzle 50 is also on it
- Nozzle outlet opening equipped with a small discontinuity (not visible in the figures), which generates high-frequency small vortices within the medium flowing out of the nozzle 50.
- a discontinuity can e.g. be a tear-off edge or threshold at the nozzle outlet, an asymmetrical nozzle outlet or a vibrating nozzle tongue.
- When using a vibrating nozzle tongue it can be set to vibrate passively (e.g. by a resonance effect caused by the flowing medium) or actively (e.g. by a drive).
- the high-frequency small eddies reduce the friction of the flowing medium on the walls of the, similar to the so-called sharkskin effect
- Treatment chambers K2-K4 whereby an excessive pressure loss within the treatment chambers K2-K4 can be avoided.
- This is important because the defined back pressure of the medium for pressurizing the nozzles 50 is to be generated by the shape of the nozzle channels 52 functioning as connecting channels and must not be reduced by an inadmissibly large friction-related pressure loss.
- the medium to be treated is water
- the nozzles of the device according to the invention according to the seventh embodiment have a further positive effect.
- water molecules tend to form clusters at static pressure, such as in water pipes, which reduces the water's solution properties. The clusters of water molecules are broken up again by the mechanical forces of the nozzle effect, which restores the natural solution properties of the water.
- the treatment chambers can also have transparent, UV-permeable separating layers, which have different permeabilities or transmission properties for different UV radiation spectra or partial spectra for each separating layer.
- transparent, UV-permeable separating layers which have different permeabilities or transmission properties for different UV radiation spectra or partial spectra for each separating layer.
- natural or synthetic quartz glass was used for the separating layers in the above examples, other UV-transparent materials can in principle also be used if they have the properties described above for the wavelength range of UV radiation required in each case.
- the number of treatment chambers can vary depending on the application, but is at least two.
- the transparent, UV-transmissive swirling elements 28 designed as an optical lens or light guide can also be shaped in such a way that they develop their desired optical effect from both sides of a respective parting plane when the radiation is incident.
- the device can be used not only with a central UV radiation source, but e.g. can also be equipped with additional UV radiation sources placed around the respective treatment chambers and achieve the desired effects described above.
- a transparent, UV-permeable separating layer can also be used Have areas that are designed as an optical lens or light guide. These areas do not necessarily have to form the vortex elements 28 or function as such. This variant can of course also be implemented in combination with the transparent and UV-transparent swirling elements described above, which are used as optical lenses and / or light guides.
- T1 Transparent, UV-permeable separating layer made of synthetic quartz glass T3, T4 Transparent, UV-permeable separating layer made of natural quartz glass T5 Mirrored quartz glass tube
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Abstract
Description
Claims
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05732390.9A EP1737795B1 (de) | 2004-04-13 | 2005-04-11 | Vorrichtung zur behandlung eines flüssigen oder gasförmigen mediums mittels uv-strahlen |
| US11/628,375 US8153058B2 (en) | 2004-04-13 | 2005-04-11 | Device for the treatment of a liquid or gaseous medium by means of UV radiation |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP20040008805 EP1586539A1 (de) | 2004-04-13 | 2004-04-13 | Vorrichtung zur Behandlung eines flüssigen oder gasförmigen Mediums mittels UV-Strahlen |
| EP04008805.6 | 2004-04-13 | ||
| DE102004061253. | 2004-12-20 | ||
| DE200410061253 DE102004061253A1 (de) | 2004-04-13 | 2004-12-20 | Vorrichtung zur Behandlung eines flüssigen oder gasförmigen Mediums mittels UV-Strahlen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2005100256A1 true WO2005100256A1 (de) | 2005-10-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2005/003776 Ceased WO2005100256A1 (de) | 2004-04-13 | 2005-04-11 | Vorrichtung zur behandlung eines flüssigen oder gasförmigen mediums mittels uv-strahlen |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US8153058B2 (de) |
| EP (2) | EP1586539A1 (de) |
| DE (1) | DE102004061253A1 (de) |
| TW (1) | TW200600463A (de) |
| WO (1) | WO2005100256A1 (de) |
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| EP1914201A1 (de) * | 2006-10-18 | 2008-04-23 | HYDROTEC Gesellschaft Für Ökologische Verfahrenstechnik mbH | Vorrichtung zur UV-Behandlung von flüssigen Medien, insbesondere von Wasser |
| WO2008098708A1 (de) * | 2007-02-15 | 2008-08-21 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglas-bauteil als leitungseinheit für ein uv-entkeimungsgerät |
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| GB2523963B (en) * | 2013-02-06 | 2018-06-06 | Sterilux Sa | Closed container for storage and sterilization of inside contained objects |
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| DE9017684U1 (de) | 1990-08-08 | 1991-11-14 | Ibl Umwelt- Und Biotechnik Gmbh, 6900 Heidelberg | Vorrichtung zur Durchführung photochemischer Reaktionen |
| US5393419A (en) * | 1993-02-10 | 1995-02-28 | Amway Corporation | Ultraviolet lamp assembly for water purification |
| DE69412500T2 (de) * | 1993-10-06 | 1999-04-15 | Water Recovery Plc, Bicester, Oxon | Uv-gerät zur behandlung einer flüssigkeit |
| SE504204C2 (sv) * | 1994-12-28 | 1996-12-09 | Rune Soeremark | Förfarande och anordning för behandling av fluida samt användning av detta fluidum |
| US5785845A (en) * | 1995-11-09 | 1998-07-28 | Colaiano; Robert | Water purifying system |
| US5707594A (en) * | 1996-05-07 | 1998-01-13 | Austin; Terrance | Pathogen control system |
| CA2231990C (en) * | 1997-03-14 | 2007-01-02 | Pura, Inc. | Apparatus for ultraviolet disinfection of water |
| US6589490B1 (en) * | 2000-10-20 | 2003-07-08 | Jorge M. Parra | UV water treatment apparatus |
| JP3914850B2 (ja) * | 2002-09-11 | 2007-05-16 | 株式会社東芝 | 紫外線併用オゾン促進酸化水処理装置およびオゾン促進酸化モジュール |
-
2004
- 2004-04-13 EP EP20040008805 patent/EP1586539A1/de not_active Withdrawn
- 2004-12-20 DE DE200410061253 patent/DE102004061253A1/de not_active Withdrawn
-
2005
- 2005-04-11 WO PCT/EP2005/003776 patent/WO2005100256A1/de not_active Ceased
- 2005-04-11 EP EP05732390.9A patent/EP1737795B1/de not_active Expired - Lifetime
- 2005-04-11 US US11/628,375 patent/US8153058B2/en not_active Expired - Fee Related
- 2005-04-12 TW TW094111495A patent/TW200600463A/zh unknown
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| US3519817A (en) * | 1967-03-16 | 1970-07-07 | Sulzer Ag | Apparatus and method for irradiating continuously flowing liquids |
| US3767918A (en) * | 1970-09-21 | 1973-10-23 | C Graybeal | Multiple pass fluid irradiator with sediment removal capability |
| US4968437A (en) * | 1986-05-09 | 1990-11-06 | Electrolux Water Systems, Inc. | Fluid purification system |
| WO1989002418A1 (fr) * | 1987-09-08 | 1989-03-23 | Simmering-Graz-Pauker Aktiengesellschaft | Procede et dispositif de purification de liquides |
| DE4233566A1 (de) * | 1992-09-29 | 1994-03-31 | Artec Armaturen Anlagentech | Reaktor zum Reinigen oder Regenerieren von mit Schadstoffen belasteten Flüssigkeiten |
| WO1995013853A1 (en) * | 1993-11-16 | 1995-05-26 | Whitehall Water Filtration Systems | Water treatment device |
| US5597482A (en) * | 1995-04-25 | 1997-01-28 | Melyon; Solly | Water purification apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1914201A1 (de) * | 2006-10-18 | 2008-04-23 | HYDROTEC Gesellschaft Für Ökologische Verfahrenstechnik mbH | Vorrichtung zur UV-Behandlung von flüssigen Medien, insbesondere von Wasser |
| WO2008098708A1 (de) * | 2007-02-15 | 2008-08-21 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglas-bauteil als leitungseinheit für ein uv-entkeimungsgerät |
Also Published As
| Publication number | Publication date |
|---|---|
| DE102004061253A1 (de) | 2005-11-10 |
| EP1737795A1 (de) | 2007-01-03 |
| EP1737795B1 (de) | 2014-01-15 |
| US8153058B2 (en) | 2012-04-10 |
| US20070181509A1 (en) | 2007-08-09 |
| TW200600463A (en) | 2006-01-01 |
| EP1586539A1 (de) | 2005-10-19 |
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