WO2005109095A3 - Method for imprint lithography at constant temperature - Google Patents
Method for imprint lithography at constant temperature Download PDFInfo
- Publication number
- WO2005109095A3 WO2005109095A3 PCT/EP2004/053106 EP2004053106W WO2005109095A3 WO 2005109095 A3 WO2005109095 A3 WO 2005109095A3 EP 2004053106 W EP2004053106 W EP 2004053106W WO 2005109095 A3 WO2005109095 A3 WO 2005109095A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- layer
- template
- substrate
- constant temperature
- imprint lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/003—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor characterised by the choice of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/10—Isostatic pressing, i.e. using non-rigid pressure-exerting members against rigid parts or dies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
- B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/02—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles
- B29C43/021—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface
- B29C2043/023—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves
- B29C2043/025—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor of articles of definite length, i.e. discrete articles characterised by the shape of the surface having a plurality of grooves forming a microstructure, i.e. fine patterning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C43/00—Compression moulding, i.e. applying external pressure to flow the moulding material; Apparatus therefor
- B29C43/32—Component parts, details or accessories; Auxiliary operations
- B29C43/36—Moulds for making articles of definite length, i.e. discrete articles
- B29C43/3642—Bags, bleeder sheets or cauls for isostatic pressing
- B29C2043/3647—Membranes, diaphragms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
- B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
- B29C2059/023—Microembossing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
- B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
- B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
- B29C35/0888—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using transparant moulds
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| AT04804576T ATE552532T1 (en) | 2004-05-07 | 2004-11-25 | CONSTANT TEMPERATURE PRINT LITHOGRAPHY METHOD |
| CN2004800429844A CN101073034B (en) | 2004-05-07 | 2004-11-25 | Method for imprint lithography at constant temperature |
| HK08103894.3A HK1114185B (en) | 2004-05-07 | 2004-11-25 | Method for imprint lithography at constant temperature |
| US11/579,540 US7972553B2 (en) | 2004-05-07 | 2004-11-25 | Method for imprint lithography at constant temperature |
| JP2007511883A JP4267675B2 (en) | 2004-05-07 | 2004-11-25 | Constant temperature imprint lithography method |
| EP04804576A EP1743217B1 (en) | 2004-05-07 | 2004-11-25 | Method for imprint lithography at constant temperature |
| KR1020067025662A KR101166278B1 (en) | 2004-05-07 | 2004-11-25 | Method for imprint lithography at constant temperature |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04445057.5A EP1594001B1 (en) | 2004-05-07 | 2004-05-07 | Device and method for imprint lithography |
| EP04445057.5 | 2004-05-07 | ||
| US52156204P | 2004-05-25 | 2004-05-25 | |
| US60/521,562 | 2004-05-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| WO2005109095A2 WO2005109095A2 (en) | 2005-11-17 |
| WO2005109095A3 true WO2005109095A3 (en) | 2006-08-10 |
Family
ID=34932984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/EP2004/053106 Ceased WO2005109095A2 (en) | 2004-05-07 | 2004-11-25 | Method for imprint lithography at constant temperature |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US7972553B2 (en) |
| EP (2) | EP1594001B1 (en) |
| JP (1) | JP4267675B2 (en) |
| CN (2) | CN101073034B (en) |
| AT (1) | ATE552532T1 (en) |
| WO (1) | WO2005109095A2 (en) |
Families Citing this family (106)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7019819B2 (en) * | 2002-11-13 | 2006-03-28 | Molecular Imprints, Inc. | Chucking system for modulating shapes of substrates |
| US6939120B1 (en) * | 2002-09-12 | 2005-09-06 | Komag, Inc. | Disk alignment apparatus and method for patterned media production |
| US7641840B2 (en) * | 2002-11-13 | 2010-01-05 | Molecular Imprints, Inc. | Method for expelling gas positioned between a substrate and a mold |
| US9307648B2 (en) * | 2004-01-21 | 2016-04-05 | Microcontinuum, Inc. | Roll-to-roll patterning of transparent and metallic layers |
| US7833389B1 (en) * | 2005-01-21 | 2010-11-16 | Microcontinuum, Inc. | Replication tools and related fabrication methods and apparatus |
| US7534633B2 (en) * | 2004-07-02 | 2009-05-19 | Cree, Inc. | LED with substrate modifications for enhanced light extraction and method of making same |
| US7641468B2 (en) | 2004-09-01 | 2010-01-05 | Hewlett-Packard Development Company, L.P. | Imprint lithography apparatus and method employing an effective pressure |
| WO2006078918A2 (en) | 2005-01-21 | 2006-07-27 | Microcontinuum, Inc. | Replication tools and related fabrication methods and apparatus |
| US7713052B2 (en) * | 2005-02-25 | 2010-05-11 | Sumitomo Electric Industries, Ltd. | Processing method of fine structure and processing equipment for fine structure |
| WO2006131153A1 (en) * | 2005-06-10 | 2006-12-14 | Obducat Ab | Pattern replication with intermediate stamp |
| EP1905065B1 (en) * | 2005-06-20 | 2014-08-13 | Microcontinuum, Inc. | Roll-to-roll patterning |
| US8846551B2 (en) | 2005-12-21 | 2014-09-30 | University Of Virginia Patent Foundation | Systems and methods of laser texturing of material surfaces and their applications |
| US7500431B2 (en) * | 2006-01-12 | 2009-03-10 | Tsai-Wei Wu | System, method, and apparatus for membrane, pad, and stamper architecture for uniform base layer and nanoimprinting pressure |
| US7377765B2 (en) | 2006-02-14 | 2008-05-27 | Hitachi Global Storage Technologies | System, method, and apparatus for non-contact and diffuse curing exposure for making photopolymer nanoimprinting stamper |
| WO2007100849A2 (en) | 2006-02-27 | 2007-09-07 | Microcontinuum, Inc. | Formation of pattern replicating tools |
| KR100710851B1 (en) | 2006-03-22 | 2007-04-23 | (주) 비앤피 사이언스 | Nanoimprint Lithography Method and Apparatus |
| US7924399B2 (en) * | 2006-03-27 | 2011-04-12 | Asml Netherlands B.V. | Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods |
| CN100451840C (en) * | 2006-04-04 | 2009-01-14 | 吉林大学 | A method for constructing micron and submicron structured surfaces |
| US8215946B2 (en) | 2006-05-18 | 2012-07-10 | Molecular Imprints, Inc. | Imprint lithography system and method |
| EP1884830A1 (en) | 2006-08-04 | 2008-02-06 | Sony Deutschland GmbH | A method of applying a material on a substrate |
| US7946837B2 (en) * | 2006-10-06 | 2011-05-24 | Asml Netherlands B.V. | Imprint lithography |
| US7832416B2 (en) | 2006-10-10 | 2010-11-16 | Hewlett-Packard Development Company, L.P. | Imprint lithography apparatus and methods |
| US7632088B2 (en) * | 2006-10-20 | 2009-12-15 | Provost Fellows And Scholars Of The College Of The Holy And Undivided Trinity Of Queen Elizabeth Near Dublin | Cyclic loading system and methods for forming nanostructures |
| CN101674942B (en) | 2006-11-15 | 2012-01-25 | 3M创新有限公司 | Flexographic printing with curing during transfer to substrate |
| KR101371094B1 (en) | 2006-11-22 | 2014-03-12 | 엘아이지에이디피 주식회사 | Pattern forming apparatus and pattern forming method |
| KR20090107494A (en) * | 2006-12-05 | 2009-10-13 | 나노 테라 인코포레이티드 | How to pattern the surface |
| US8608972B2 (en) | 2006-12-05 | 2013-12-17 | Nano Terra Inc. | Method for patterning a surface |
| JP4989234B2 (en) * | 2007-01-09 | 2012-08-01 | 東芝機械株式会社 | Transfer device |
| JP5054412B2 (en) * | 2007-04-05 | 2012-10-24 | コマツ産機株式会社 | Hot press molding apparatus and mold system for the same |
| US7641467B2 (en) * | 2007-05-02 | 2010-01-05 | Asml Netherlands B.V. | Imprint lithography |
| US8010900B2 (en) * | 2007-06-08 | 2011-08-30 | Apple Inc. | User interface for electronic backup |
| US20090038636A1 (en) * | 2007-08-09 | 2009-02-12 | Asml Netherlands B.V. | Cleaning method |
| US7854877B2 (en) * | 2007-08-14 | 2010-12-21 | Asml Netherlands B.V. | Lithography meandering order |
| US20090056575A1 (en) * | 2007-08-31 | 2009-03-05 | Bartman Jon A | Pattern transfer apparatus |
| US8144309B2 (en) * | 2007-09-05 | 2012-03-27 | Asml Netherlands B.V. | Imprint lithography |
| KR100856559B1 (en) | 2007-09-20 | 2008-09-04 | 국민대학교산학협력단 | Temperature environment controller of nano imprint equipment and nano imprint equipment having same |
| NL1036034A1 (en) | 2007-10-11 | 2009-04-15 | Asml Netherlands Bv | Imprint lithography. |
| KR100874756B1 (en) | 2007-10-18 | 2008-12-19 | 한국생산기술연구원 | Fine Imprinting Device |
| WO2009072690A1 (en) * | 2007-12-07 | 2009-06-11 | Top Engineering Co., Ltd. | Apparatus for heating pattern frame |
| WO2009094572A1 (en) * | 2008-01-23 | 2009-07-30 | Microcontinuum, Inc. | Roll-to-roll patterning of transparent and metallic layers |
| JP2011067950A (en) * | 2008-01-25 | 2011-04-07 | Kyowa Hakko Chemical Co Ltd | Method of forming metallic film pattern |
| US8293455B2 (en) * | 2008-01-30 | 2012-10-23 | Hewlett-Packard Development Company, L.P. | Mandrel |
| JP2009208239A (en) * | 2008-02-29 | 2009-09-17 | Fujifilm Corp | Pattern forming method |
| EP2256788A4 (en) * | 2008-03-07 | 2011-03-30 | Showa Denko Kk | Uv nanoimprint method, resin replica mold and method for producing the same, magnetic recording medium and method for producing the same, and magnetic recording/reproducing apparatus |
| JP2009266901A (en) * | 2008-04-22 | 2009-11-12 | Sharp Corp | Transfer apparatus, method for manufacturing wafer-like optical device, electronic element wafer module, sensor wafer module, electronic element module, sensor module and electronic information instrument |
| EP2124514A1 (en) * | 2008-05-23 | 2009-11-25 | Nederlandse Centrale Organisatie Voor Toegepast Natuurwetenschappelijk Onderzoek TNO | Providing a plastic substrate with a metallic pattern |
| US8043085B2 (en) | 2008-08-19 | 2011-10-25 | Asml Netherlands B.V. | Imprint lithography |
| NL2003347A (en) * | 2008-09-11 | 2010-03-16 | Asml Netherlands Bv | Imprint lithography. |
| NL2003380A (en) * | 2008-10-17 | 2010-04-20 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| JP5155814B2 (en) * | 2008-10-21 | 2013-03-06 | 株式会社日立ハイテクノロジーズ | Imprint device |
| US8652393B2 (en) | 2008-10-24 | 2014-02-18 | Molecular Imprints, Inc. | Strain and kinetics control during separation phase of imprint process |
| US8309008B2 (en) * | 2008-10-30 | 2012-11-13 | Molecular Imprints, Inc. | Separation in an imprint lithography process |
| EP2199855B1 (en) | 2008-12-19 | 2016-07-20 | Obducat | Methods and processes for modifying polymer material surface interactions |
| EP2199854B1 (en) | 2008-12-19 | 2015-12-16 | Obducat AB | Hybrid polymer mold for nano-imprinting and method for making the same |
| NL2003871A (en) * | 2009-02-04 | 2010-08-05 | Asml Netherlands Bv | Imprint lithography. |
| NL2004265A (en) * | 2009-04-01 | 2010-10-04 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| NL2004266A (en) | 2009-04-27 | 2010-10-28 | Asml Netherlands Bv | An actuator. |
| NL2004409A (en) * | 2009-05-19 | 2010-11-22 | Asml Netherlands Bv | Imprint lithography apparatus. |
| NL2004680A (en) * | 2009-07-06 | 2011-01-10 | Asml Netherlands Bv | Imprint lithography apparatus. |
| NL2004735A (en) * | 2009-07-06 | 2011-01-10 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| NL2004681A (en) * | 2009-07-06 | 2011-01-10 | Asml Netherlands Bv | Imprint lithography apparatus. |
| NL2004932A (en) * | 2009-07-27 | 2011-01-31 | Asml Netherlands Bv | Imprint lithography template. |
| NL2004685A (en) * | 2009-07-27 | 2011-01-31 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| NL2004945A (en) * | 2009-08-14 | 2011-02-15 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| NL2004949A (en) * | 2009-08-21 | 2011-02-22 | Asml Netherlands Bv | Inspection method and apparatus. |
| NL2005007A (en) | 2009-08-28 | 2011-03-01 | Asml Netherlands Bv | Imprint lithography method and apparatus. |
| NL2005259A (en) * | 2009-09-29 | 2011-03-30 | Asml Netherlands Bv | Imprint lithography. |
| NL2005263A (en) * | 2009-09-29 | 2011-03-30 | Asml Netherlands Bv | Imprint lithography. |
| NL2005266A (en) | 2009-10-28 | 2011-05-02 | Asml Netherlands Bv | Imprint lithography. |
| WO2011050817A1 (en) * | 2009-11-02 | 2011-05-05 | Danmarks Tekniske Universitet | Method and device for nanoimprint lithography |
| US8691124B2 (en) | 2009-11-24 | 2014-04-08 | Asml Netherlands B.V. | Alignment and imprint lithography |
| NL2005436A (en) * | 2009-11-30 | 2011-05-31 | Asml Netherlands Bv | Inspection method and apparatus. |
| NL2005435A (en) | 2009-11-30 | 2011-05-31 | Asml Netherlands Bv | Imprint lithography apparatus and method. |
| US9625811B2 (en) | 2009-12-18 | 2017-04-18 | Asml Netherlands B.V. | Imprint lithography |
| KR101319353B1 (en) * | 2009-12-23 | 2013-10-16 | 엘지디스플레이 주식회사 | Apparatus and method of fabricating flat display device |
| NL2005735A (en) * | 2009-12-23 | 2011-06-27 | Asml Netherlands Bv | Imprint lithographic apparatus and imprint lithographic method. |
| NL2005865A (en) * | 2010-02-16 | 2011-08-17 | Asml Netherlands Bv | Imprint lithography. |
| NL2005975A (en) | 2010-03-03 | 2011-09-06 | Asml Netherlands Bv | Imprint lithography. |
| NL2005992A (en) * | 2010-03-22 | 2011-09-23 | Asml Netherlands Bv | Imprint lithography. |
| NL2006004A (en) * | 2010-03-25 | 2011-09-27 | Asml Netherlands Bv | Imprint lithography. |
| US8366431B2 (en) * | 2010-04-13 | 2013-02-05 | Sematech, Inc. | Partial die process for uniform etch loading of imprint wafers |
| NL2006454A (en) | 2010-05-03 | 2011-11-07 | Asml Netherlands Bv | Imprint lithography method and apparatus. |
| US20110272838A1 (en) * | 2010-05-06 | 2011-11-10 | Matt Malloy | Apparatus, System, and Method for Nanoimprint Template with a Backside Recess Having Tapered Sidewalls |
| NL2006747A (en) | 2010-07-26 | 2012-01-30 | Asml Netherlands Bv | Imprint lithography alignment method and apparatus. |
| US9864279B2 (en) | 2010-08-05 | 2018-01-09 | Asml Netherlands B.V. | Imprint lithography |
| US9310700B2 (en) | 2010-08-13 | 2016-04-12 | Asml Netherlands B.V. | Lithography method and apparatus |
| US9274441B2 (en) | 2010-08-16 | 2016-03-01 | Asml Netherlands B.V. | Inspection method for imprint lithography and apparatus therefor |
| WO2012025316A1 (en) | 2010-08-26 | 2012-03-01 | Asml Netherlands B.V. | Imprint lithography method and imprintable medium |
| US8845912B2 (en) | 2010-11-22 | 2014-09-30 | Microcontinuum, Inc. | Tools and methods for forming semi-transparent patterning masks |
| JP2012169503A (en) * | 2011-02-15 | 2012-09-06 | Bridgestone Corp | Imprint device |
| JP2012190877A (en) * | 2011-03-09 | 2012-10-04 | Fujifilm Corp | Nanoimprint method and nanoimprint device for use therein |
| US10131086B2 (en) | 2011-06-30 | 2018-11-20 | University Of Virginia Patent Foundation | Micro-structure and nano-structure replication methods and article of manufacture |
| CN102436141A (en) * | 2011-12-29 | 2012-05-02 | 苏州光舵微纳科技有限公司 | Nano hot stamping device |
| US9566722B2 (en) * | 2012-04-13 | 2017-02-14 | Nanogriptech, Inc. | Method of molding simple or complex micro and/or nanopatterned features on both planar or non-planar molded objects and surfaces and the molded objects produced using same |
| US9589797B2 (en) | 2013-05-17 | 2017-03-07 | Microcontinuum, Inc. | Tools and methods for producing nanoantenna electronic devices |
| JP5821909B2 (en) * | 2013-07-30 | 2015-11-24 | 大日本印刷株式会社 | Optical imprint mold and manufacturing method thereof |
| JP6429792B2 (en) * | 2013-11-22 | 2018-11-28 | 綜研化学株式会社 | Structure manufacturing method using step-and-repeat type imprint technology |
| TWI628062B (en) * | 2016-03-17 | 2018-07-01 | 欣興電子股份有限公司 | Method for manufacturing circuit board and piezochromic stamp |
| CN106681102A (en) * | 2016-12-13 | 2017-05-17 | 南方科技大学 | Nano-imprinting method |
| DE102017200635A1 (en) * | 2017-01-17 | 2018-07-19 | Carl Zeiss Smt Gmbh | Optical arrangement, in particular lithography system |
| US11262495B1 (en) | 2017-10-04 | 2022-03-01 | Facebook Technologies, Llc | Waveguides with high refractive index gratings manufactured by post-patterning infusion |
| US11035988B1 (en) * | 2018-05-22 | 2021-06-15 | Facebook Technologies, Llc | Tunable shrinkage process for manufacturing gratings |
| CN109143791B (en) * | 2018-08-29 | 2020-03-20 | 中国科学院光电技术研究所 | Vacuum attaching device for contact type photoetching of flexible film substrate |
| JP7299685B2 (en) * | 2018-10-11 | 2023-06-28 | キヤノン株式会社 | Film forming apparatus, film forming method, and article manufacturing method |
| JP2024087500A (en) * | 2022-12-19 | 2024-07-01 | キオクシア株式会社 | Imprint apparatus, pattern forming method, and semiconductor device manufacturing method |
| CN118083343B (en) * | 2024-04-07 | 2024-10-29 | 深圳市向实泵业科技有限公司 | High-precision photoresist supply device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6190929B1 (en) * | 1999-07-23 | 2001-02-20 | Micron Technology, Inc. | Methods of forming semiconductor devices and methods of forming field emission displays |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4054383A (en) * | 1976-02-02 | 1977-10-18 | International Business Machines Corporation | Jig and process for contact printing |
| NL177721B (en) | 1977-03-14 | 1985-06-03 | Philips Nv | METHOD FOR MANUFACTURING A PLASTIC INFORMATION CARRIER WITH LAYERED STRUCTURE AND AN APPARATUS FOR CARRYING OUT THE METHOD |
| NL7710555A (en) | 1977-09-28 | 1979-03-30 | Philips Nv | METHOD AND DEVICE FOR MANUFACTURING INFORMATION CONTAINING PLATES. |
| US4360266A (en) * | 1979-08-24 | 1982-11-23 | Dai Nippon Insatsu Kabushiki Kaisha | Contact printing method and apparatus |
| DE3737455A1 (en) * | 1986-11-06 | 1988-05-19 | Westinghouse Electric Corp | DEVICE AND METHOD FOR PRODUCING COLOR PATTERNS |
| DE3643817A1 (en) | 1986-12-20 | 1988-06-30 | Agfa Gevaert Ag | Contact copier |
| JPH02289311A (en) | 1989-01-25 | 1990-11-29 | Hoya Corp | Manufacture of stamper and board for information recording medium for which stamper is used |
| US5804017A (en) | 1995-07-27 | 1998-09-08 | Imation Corp. | Method and apparatus for making an optical information record |
| US6482742B1 (en) * | 2000-07-18 | 2002-11-19 | Stephen Y. Chou | Fluid pressure imprint lithography |
| US5866281A (en) * | 1996-11-27 | 1999-02-02 | Wisconsin Alumni Research Foundation | Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts |
| CA2286326C (en) * | 1997-04-04 | 2007-06-26 | Adam L. Cohen | Article, method, and apparatus for electrochemical fabrication |
| US6284345B1 (en) * | 1997-12-08 | 2001-09-04 | Washington University | Designer particles of micron and submicron dimension |
| JP3876510B2 (en) | 1997-12-25 | 2007-01-31 | ソニー株式会社 | Manufacturing method of optical recording medium |
| US5947027A (en) * | 1998-09-08 | 1999-09-07 | Motorola, Inc. | Printing apparatus with inflatable means for advancing a substrate towards the stamping surface |
| JP2000194142A (en) | 1998-12-25 | 2000-07-14 | Fujitsu Ltd | Pattern forming method and semiconductor device manufacturing method |
| US6334960B1 (en) | 1999-03-11 | 2002-01-01 | Board Of Regents, The University Of Texas System | Step and flash imprint lithography |
| US6873087B1 (en) * | 1999-10-29 | 2005-03-29 | Board Of Regents, The University Of Texas System | High precision orientation alignment and gap control stages for imprint lithography processes |
| SE515607C2 (en) * | 1999-12-10 | 2001-09-10 | Obducat Ab | Device and method for fabrication of structures |
| US6387778B1 (en) * | 2000-02-11 | 2002-05-14 | Seagate Technology Llc | Breakable tethers for microelectromechanical system devices utilizing reactive ion etching lag |
| US7635262B2 (en) | 2000-07-18 | 2009-12-22 | Princeton University | Lithographic apparatus for fluid pressure imprint lithography |
| CN100365507C (en) | 2000-10-12 | 2008-01-30 | 德克萨斯州大学系统董事会 | Templates for low-pressure micro- and nano-scoring lithography at room temperature |
| US6387787B1 (en) | 2001-03-02 | 2002-05-14 | Motorola, Inc. | Lithographic template and method of formation and use |
| DE10134763A1 (en) * | 2001-07-05 | 2003-01-16 | Micro Resist Technology Gmbh | Plastic stamp for the production of micro and nanostructures with imprint lithography |
| SE519573C2 (en) | 2001-07-05 | 2003-03-11 | Obducat Ab | Stamp with anti-adhesive layer as well as ways of making and ways to repair such a stamp |
| US6949199B1 (en) | 2001-08-16 | 2005-09-27 | Seagate Technology Llc | Heat-transfer-stamp process for thermal imprint lithography |
| JP3588633B2 (en) | 2001-09-04 | 2004-11-17 | 独立行政法人産業技術総合研究所 | Moving stage for imprint lithography |
| US20030071016A1 (en) * | 2001-10-11 | 2003-04-17 | Wu-Sheng Shih | Patterned structure reproduction using nonsticking mold |
| US7455955B2 (en) | 2002-02-27 | 2008-11-25 | Brewer Science Inc. | Planarization method for multi-layer lithography processing |
| JP3907504B2 (en) | 2002-03-14 | 2007-04-18 | 三菱電機株式会社 | Semiconductor device manufacturing method and semiconductor device manufacturing mold |
| US7144539B2 (en) * | 2002-04-04 | 2006-12-05 | Obducat Ab | Imprint method and device |
| US6916584B2 (en) * | 2002-08-01 | 2005-07-12 | Molecular Imprints, Inc. | Alignment methods for imprint lithography |
| CN1478642A (en) | 2002-08-30 | 2004-03-03 | 张哲豪 | Gas micro-hot stamping forming method |
| US6743740B2 (en) | 2002-10-18 | 2004-06-01 | Intel Corporation | Using sonic energy in connection with laser-assisted direct imprinting |
| US7750059B2 (en) * | 2002-12-04 | 2010-07-06 | Hewlett-Packard Development Company, L.P. | Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure |
| WO2005029179A2 (en) * | 2003-02-13 | 2005-03-31 | The Regents Of The University Of Michigan | Combined nanoimprinting and photolithography for micro and nano devices fabrication |
| US20050158419A1 (en) | 2004-01-15 | 2005-07-21 | Watts Michael P. | Thermal processing system for imprint lithography |
| US7435074B2 (en) | 2004-03-13 | 2008-10-14 | International Business Machines Corporation | Method for fabricating dual damascence structures using photo-imprint lithography, methods for fabricating imprint lithography molds for dual damascene structures, materials for imprintable dielectrics and equipment for photo-imprint lithography used in dual damascence patterning |
-
2004
- 2004-05-07 EP EP04445057.5A patent/EP1594001B1/en not_active Expired - Lifetime
- 2004-11-25 WO PCT/EP2004/053106 patent/WO2005109095A2/en not_active Ceased
- 2004-11-25 EP EP04804576A patent/EP1743217B1/en not_active Expired - Lifetime
- 2004-11-25 AT AT04804576T patent/ATE552532T1/en active
- 2004-11-25 JP JP2007511883A patent/JP4267675B2/en not_active Expired - Lifetime
- 2004-11-25 US US11/579,540 patent/US7972553B2/en active Active
- 2004-11-25 CN CN2004800429844A patent/CN101073034B/en not_active Expired - Lifetime
-
2005
- 2005-04-29 CN CN200510081756.4A patent/CN1700100A/en active Pending
- 2005-05-06 US US11/123,087 patent/US20050274693A1/en not_active Abandoned
-
2007
- 2007-09-27 US US11/905,036 patent/US7997890B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6190929B1 (en) * | 1999-07-23 | 2001-02-20 | Micron Technology, Inc. | Methods of forming semiconductor devices and methods of forming field emission displays |
Non-Patent Citations (4)
| Title |
|---|
| BENDER M ET AL: "Fabrication of Nanostructures using a UV-based imprint technique", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 53, no. 1-4, June 2000 (2000-06-01), pages 233 - 236, XP004237761, ISSN: 0167-9317 * |
| REANO R M ET AL: "Stability of functional polymers after plasticizer-assisted imprint lithography", J VAC SCI TECHNOL B MICROELECTRON NANOMETER STRUCT; JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY B: MICROELECTRONICS AND NANOMETER STRUCTURES NOVEMBER/DECEMBER 2004, vol. 22, no. 6, November 2004 (2004-11-01), pages 3294 - 3299, XP002377834 * |
| RESNICK D J ET AL: "Imprint lithography for integrated circuit fabrication", JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B: MICROELECTRONICS PROCESSING AND PHENOMENA, AMERICAN VACUUM SOCIETY, NEW YORK, NY, US, vol. 21, no. 6, November 2003 (2003-11-01), pages 2624 - 2631, XP002310218, ISSN: 0734-211X * |
| WISSEN M ET AL: "UV curing of resists for warm embossing", MICROELECTRONIC ENGINEERING, ELSEVIER PUBLISHERS BV., AMSTERDAM, NL, vol. 73-74, June 2004 (2004-06-01), pages 184 - 189, XP004564597, ISSN: 0167-9317 * |
Also Published As
| Publication number | Publication date |
|---|---|
| US7997890B2 (en) | 2011-08-16 |
| CN1700100A (en) | 2005-11-23 |
| EP1743217A2 (en) | 2007-01-17 |
| CN101073034A (en) | 2007-11-14 |
| CN101073034B (en) | 2011-08-10 |
| ATE552532T1 (en) | 2012-04-15 |
| EP1743217B1 (en) | 2012-04-04 |
| JP4267675B2 (en) | 2009-05-27 |
| US7972553B2 (en) | 2011-07-05 |
| US20050274693A1 (en) | 2005-12-15 |
| EP1594001A1 (en) | 2005-11-09 |
| WO2005109095A2 (en) | 2005-11-17 |
| US20080030700A1 (en) | 2008-02-07 |
| EP1594001B1 (en) | 2015-12-30 |
| US20070164487A1 (en) | 2007-07-19 |
| JP2007536750A (en) | 2007-12-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2005109095A3 (en) | Method for imprint lithography at constant temperature | |
| WO2006060758A3 (en) | Methods of exposure for the purpose of thermal management for imprint lithography processes | |
| Lee et al. | Nano-scale patterning using the roll typed UV-nanoimprint lithography tool | |
| EP1959299A3 (en) | Pattern replication with intermediate stamp | |
| JP2007103924A5 (en) | ||
| ATE433134T1 (en) | IMPRINT LITHOGRAPHY METHOD, DEVICE THEREFOR, AND METHOD FOR PRODUCING A SEMICONDUCTOR CHIP | |
| JP2009516222A5 (en) | ||
| TW200507175A (en) | Pattern forming method, and manufacturing method for semiconductor device | |
| JP2007502715A5 (en) | ||
| TW200737157A (en) | Imprinting method and imprinting apparatus | |
| JP2005205914A5 (en) | ||
| WO2001036171A3 (en) | A method and apparatus using printer means for manufacturing an item | |
| JP2016535318A5 (en) | ||
| TW200613144A (en) | Apparatus and method for thermally developing flexographic printing elements | |
| PL2214056T3 (en) | Method of making a lithographic printing plate | |
| KR101426463B1 (en) | Apparatus for manufacturing film used micro size pattern and method using the same | |
| ATE468222T1 (en) | METHOD FOR PRODUCING A PLANT PLATE PRINTING PLATE | |
| KR101166278B1 (en) | Method for imprint lithography at constant temperature | |
| Park et al. | Nanoscale patterning with the double-layered soft cylindrical stamps by means of UV-nanoimprint lithography | |
| EP1470914A3 (en) | Image forming method and image exposure device | |
| WO2007012023A3 (en) | Method and apparatus for processing flexographic printing plates | |
| ATE411164T1 (en) | METHOD AND APPARATUS FOR PRINTING USING CONTROLLED RADIATION VALVES FOR STRUCTURING | |
| TW200608575A (en) | Preparation method of thin film transistor and its structure | |
| TWI328693B (en) | Method of manufacturing light guide plate of keypad | |
| KR101299919B1 (en) | Nano-imprinting apparatus and nano-imprinting method for using the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
| AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
| 121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
| WWE | Wipo information: entry into national phase |
Ref document number: 5315/DELNP/2006 Country of ref document: IN |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2004804576 Country of ref document: EP Ref document number: 2007511883 Country of ref document: JP |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 2007164487 Country of ref document: US Ref document number: 11579540 Country of ref document: US |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 200480042984.4 Country of ref document: CN |
|
| NENP | Non-entry into the national phase |
Ref country code: DE |
|
| WWW | Wipo information: withdrawn in national office |
Ref document number: DE |
|
| WWE | Wipo information: entry into national phase |
Ref document number: 1020067025662 Country of ref document: KR |
|
| WWP | Wipo information: published in national office |
Ref document number: 2004804576 Country of ref document: EP |
|
| WWP | Wipo information: published in national office |
Ref document number: 1020067025662 Country of ref document: KR |
|
| WWP | Wipo information: published in national office |
Ref document number: 11579540 Country of ref document: US |