WO2006045439A3 - A system and a method for generating periodic and/or quasi-periodic pattern on a sample - Google Patents

A system and a method for generating periodic and/or quasi-periodic pattern on a sample Download PDF

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Publication number
WO2006045439A3
WO2006045439A3 PCT/EP2005/010986 EP2005010986W WO2006045439A3 WO 2006045439 A3 WO2006045439 A3 WO 2006045439A3 EP 2005010986 W EP2005010986 W EP 2005010986W WO 2006045439 A3 WO2006045439 A3 WO 2006045439A3
Authority
WO
WIPO (PCT)
Prior art keywords
periodic
distance
sample
quasi
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2005/010986
Other languages
French (fr)
Other versions
WO2006045439A2 (en
Inventor
Harun H Solak
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Scherrer Paul Institut
Original Assignee
Scherrer Paul Institut
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=36228141&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2006045439(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from EP04025105A external-priority patent/EP1650602A1/en
Priority to EP05803386A priority Critical patent/EP1810085B1/en
Application filed by Scherrer Paul Institut filed Critical Scherrer Paul Institut
Priority to US11/665,323 priority patent/US8841046B2/en
Priority to CN2005800362815A priority patent/CN101052921B/en
Priority to JP2007537166A priority patent/JP4724183B2/en
Priority to AT05803386T priority patent/ATE502325T1/en
Priority to DE602005026968T priority patent/DE602005026968D1/en
Publication of WO2006045439A2 publication Critical patent/WO2006045439A2/en
Publication of WO2006045439A3 publication Critical patent/WO2006045439A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/22—Exposing sequentially with the same light pattern different positions of the same surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)

Abstract

It is the aim of this invention to provide a system and a method to achieve periodic and quasi-periodic patterns with periods in the 5-100 nm range in a cost effective way. Of course, the system has also general applicability to patterns periods outside this range. This aim is achieved by the present invention which discloses a system for generating periodic and/or quasi-periodic pattern on a sample by using an interference lithography technique; the system comprising: a) a photon source; b) a mask having a periodic or quasi-periodic pattern that corresponds to the desired pattern; said mask being disposed at a first distance from the photon source or after intermediate optical elements such as collimators, collectors, mirrors, lenses, filters and apertures; c) a sample holder for holding the sample being disposed in a second distance from the mask on the side opposite to the photon source, thereby the second distance is chosen to be in a range where the intensity distribution is substantially stationary and distance-invariant or the second distance is varied to obtain a desired average intensity distribution on the sample surface.
PCT/EP2005/010986 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample Ceased WO2006045439A2 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
DE602005026968T DE602005026968D1 (en) 2004-10-22 2005-10-13 SYSTEM AND METHOD FOR PRODUCING A PERIODIC AND / OR FASTER PERIODIC PATTERN ON A SAMPLE
AT05803386T ATE502325T1 (en) 2004-10-22 2005-10-13 SYSTEM AND METHOD FOR GENERATING A PERIODIC AND/OR NEAR-PERIODIC PATTERN ON A SAMPLE
EP05803386A EP1810085B1 (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample
US11/665,323 US8841046B2 (en) 2004-10-22 2005-10-13 System and a method for generating periodic and/or quasi-periodic pattern on a sample
CN2005800362815A CN101052921B (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample
JP2007537166A JP4724183B2 (en) 2004-10-22 2005-10-13 System and method for generating periodic and / or quasi-periodic patterns on a sample

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP04025105A EP1650602A1 (en) 2004-10-22 2004-10-22 A system and a method for generating periodic and /or quasi-periodic pattern on a sample
EP04025105.0 2004-10-22
EP05003271.3 2005-02-16
EP05003271 2005-02-16

Publications (2)

Publication Number Publication Date
WO2006045439A2 WO2006045439A2 (en) 2006-05-04
WO2006045439A3 true WO2006045439A3 (en) 2006-09-14

Family

ID=36228141

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2005/010986 Ceased WO2006045439A2 (en) 2004-10-22 2005-10-13 A system and a method for generating periodic and/or quasi-periodic pattern on a sample

Country Status (7)

Country Link
US (1) US8841046B2 (en)
EP (1) EP1810085B1 (en)
JP (1) JP4724183B2 (en)
CN (1) CN101052921B (en)
AT (1) ATE502325T1 (en)
DE (1) DE602005026968D1 (en)
WO (1) WO2006045439A2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9081193B2 (en) 2006-06-13 2015-07-14 The Arizona Board Of Regents On Behalf Of The University Of Arizona Interferometric systems and methods
CN111856636B (en) * 2020-07-03 2021-10-22 中国科学技术大学 A method for controllable fine-tuning of line density distribution of variable-pitch grating mask

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JP5606455B2 (en) * 2009-02-05 2014-10-15 パウル・シェラー・インスティトゥート Imaging apparatus for backprojection and method of operating the same
EP2499539B1 (en) 2009-11-13 2014-06-18 Eulitha AG Optimized mask design for fabricating periodic and quasi-periodic patterns
US9036133B2 (en) 2010-02-16 2015-05-19 Eulitha Ag Lithographic fabrication of general periodic structures by exposing a photosensitive layer to a range of lateral intensity distributions
US8368871B2 (en) 2010-02-16 2013-02-05 Eulitha Ag Lithographic fabrication of general periodic structures
US8524443B2 (en) * 2010-07-07 2013-09-03 Eulitha A.G. Method and apparatus for printing a periodic pattern with a large depth of focus
US9007566B2 (en) 2010-07-07 2015-04-14 Eulitha Ag Apparatus and method for printing a periodic pattern with a large depth of focus
US8525973B2 (en) 2010-10-13 2013-09-03 Eulitha A.G. Method and apparatus for printing periodic patterns
US20120092634A1 (en) * 2010-10-13 2012-04-19 Solak Harun H Method and apparatus for printing periodic patterns
KR101755758B1 (en) 2010-11-16 2017-07-07 유리타 아. 게. Method and apparatus for printing high-resolution two-dimensional periodic patterns
EP2656146B1 (en) * 2010-12-23 2015-03-25 Eulitha A.G. System and method for production of nanostructures over large areas
US9280056B2 (en) 2011-01-12 2016-03-08 Eulitha A.G. Method and system for printing high-resolution periodic patterns
JPWO2012157697A1 (en) * 2011-05-19 2014-07-31 株式会社日立ハイテクノロジーズ Diffraction grating manufacturing method, spectrophotometer, and semiconductor device manufacturing method
JP2014515501A (en) 2011-06-01 2014-06-30 ユーリタ アクチエンゲゼルシャフト Printing periodic patterns with multiple lasers
JP5757413B2 (en) * 2011-06-29 2015-07-29 大日本印刷株式会社 Phase modulation mask, exposure apparatus and exposure method
JP5838622B2 (en) * 2011-07-05 2016-01-06 大日本印刷株式会社 Exposure apparatus and exposure method
JP6218918B2 (en) * 2013-03-18 2017-10-25 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ Method and system for printing periodic patterns
WO2015008365A1 (en) * 2013-07-18 2015-01-22 ギガフォトン株式会社 Exposure device
JP5943886B2 (en) * 2013-08-20 2016-07-05 株式会社東芝 Pattern forming method and exposure mask
JP6356510B2 (en) * 2014-07-15 2018-07-11 東芝メモリ株式会社 Exposure method and exposure apparatus
WO2016103132A1 (en) 2014-12-22 2016-06-30 Eulitha A.G. Method for printing colour images
JP2016152318A (en) 2015-02-17 2016-08-22 株式会社東芝 Patterning method and exposure device
EP4063952A1 (en) 2015-10-13 2022-09-28 Micro Tau IP Pty Ltd Microstructure patterns
CN105242500B (en) * 2015-11-10 2017-07-11 中国科学院光电技术研究所 Photoetching system based on ultraviolet broad spectrum Talbot self-imaging
US10394984B2 (en) 2015-11-25 2019-08-27 International Business Machines Corporation Tool to provide integrated circuit masks with accurate dimensional compensation of patterns
JP6768067B2 (en) 2015-12-14 2020-10-14 ユーリタ アクチエンゲゼルシャフトＥｕｌｉｔｈａ Ａｇ Methods and systems for printing an array of geometric elements
CN106115681A (en) * 2016-07-11 2016-11-16 浙江工业大学 One realizes the patterned method of two-dimensional material
CN106054298B (en) * 2016-08-23 2019-02-26 京东方科技集团股份有限公司 A grating and 3D display device
DE102017115169A1 (en) 2017-07-06 2019-01-10 Temicon Gmbh Generation of exposed structures on a workpiece
WO2019202551A1 (en) 2018-04-19 2019-10-24 Eulitha A.G. Methods and systems for printing large periodic patterns by overlapping exposure fields
US11042098B2 (en) * 2019-02-15 2021-06-22 Applied Materials, Inc. Large area high resolution feature reduction lithography technique
JP7362763B2 (en) 2019-03-27 2023-10-17 ユーリタ アクチエンゲゼルシャフト Method and apparatus for printing periodic patterns with varying duty cycles
JP7587863B2 (en) * 2019-05-30 2024-11-21 マイクロタウ アイピー ピーティーワイ リミテッド Systems and methods for manufacturing microstructures - Patents.com
DE102019119790A1 (en) * 2019-07-22 2021-01-28 4Jet Microtech Gmbh Laser processing device
US20250053095A1 (en) 2021-12-22 2025-02-13 Eulitha A.G. A method and apparatus for improving the uniformity of exposure of a periodic pattern

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9081193B2 (en) 2006-06-13 2015-07-14 The Arizona Board Of Regents On Behalf Of The University Of Arizona Interferometric systems and methods
CN111856636B (en) * 2020-07-03 2021-10-22 中国科学技术大学 A method for controllable fine-tuning of line density distribution of variable-pitch grating mask

Also Published As

Publication number Publication date
JP4724183B2 (en) 2011-07-13
US20080186579A1 (en) 2008-08-07
CN101052921A (en) 2007-10-10
WO2006045439A2 (en) 2006-05-04
JP2008517472A (en) 2008-05-22
EP1810085A2 (en) 2007-07-25
EP1810085B1 (en) 2011-03-16
ATE502325T1 (en) 2011-04-15
US8841046B2 (en) 2014-09-23
DE602005026968D1 (en) 2011-04-28
CN101052921B (en) 2013-03-27

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