WO2006080534A3 - Illumination optical apparatus and optical apparatus - Google Patents

Illumination optical apparatus and optical apparatus Download PDF

Info

Publication number
WO2006080534A3
WO2006080534A3 PCT/JP2006/301593 JP2006301593W WO2006080534A3 WO 2006080534 A3 WO2006080534 A3 WO 2006080534A3 JP 2006301593 W JP2006301593 W JP 2006301593W WO 2006080534 A3 WO2006080534 A3 WO 2006080534A3
Authority
WO
WIPO (PCT)
Prior art keywords
light
optical apparatus
illumination
optical system
illumination optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2006/301593
Other languages
French (fr)
Other versions
WO2006080534A2 (en
WO2006080534B1 (en
Inventor
Masayuki Mizusawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Priority to JP2007533804A priority Critical patent/JP4815445B2/en
Priority to US11/883,087 priority patent/US7733574B2/en
Priority to EP06712736A priority patent/EP1844366B1/en
Priority to DE602006003865T priority patent/DE602006003865D1/en
Publication of WO2006080534A2 publication Critical patent/WO2006080534A2/en
Publication of WO2006080534A3 publication Critical patent/WO2006080534A3/en
Publication of WO2006080534B1 publication Critical patent/WO2006080534B1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microscoopes, Condenser (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection Apparatus (AREA)

Abstract

There are provided an illumination optical apparatus and an optical apparatus using this illumination optical apparatus that are capable of efficiently collecting light emitted from a light-emitting section (2) for illumination with less illumination nonuniformity, without having to employ a complicated structure. There are provided a light-emitting sections (2) ; a lens system (3) for converting a diverging beam emitted from the light-emitting section into a beam of collimated light; an afocal optical system (4a, 4b)for adjusting the cross-sectional area of a beam of collimated light obtained by the lens array (3) ; a fly-eye lens (6) for forming a plurality of light-source images (I) from the collimated light whose cross-sectional area is adjusted by the afocal optical system; and a Koehler illumination optical system that uses the plurality of light-source images (I) formed by the fly-eye lens (6) as a light source.
PCT/JP2006/301593 2005-01-31 2006-01-25 Illumination optical apparatus and optical apparatus Ceased WO2006080534A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007533804A JP4815445B2 (en) 2005-01-31 2006-01-25 Illumination optical device and optical device
US11/883,087 US7733574B2 (en) 2005-01-31 2006-01-25 Illumination optical apparatus and optical apparatus
EP06712736A EP1844366B1 (en) 2005-01-31 2006-01-25 Illumination optical apparatus and optical apparatus
DE602006003865T DE602006003865D1 (en) 2005-01-31 2006-01-25 OPTICAL LIGHTING DEVICE AND OPTICAL DEVICE

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005-023680 2005-01-31
JP2005023680 2005-01-31

Publications (3)

Publication Number Publication Date
WO2006080534A2 WO2006080534A2 (en) 2006-08-03
WO2006080534A3 true WO2006080534A3 (en) 2006-09-21
WO2006080534B1 WO2006080534B1 (en) 2006-11-09

Family

ID=36587293

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2006/301593 Ceased WO2006080534A2 (en) 2005-01-31 2006-01-25 Illumination optical apparatus and optical apparatus

Country Status (6)

Country Link
US (1) US7733574B2 (en)
EP (1) EP1844366B1 (en)
JP (1) JP4815445B2 (en)
CN (1) CN100517079C (en)
DE (1) DE602006003865D1 (en)
WO (1) WO2006080534A2 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100097802A1 (en) * 2008-10-20 2010-04-22 Robe Lighting S.R.O. Light collection system for an led luminaire
CN101988631A (en) 2009-07-31 2011-03-23 深圳市光峰光电技术有限公司 LED stage lighting device and method for improving color uniformity of LED stage lighting device
JP5429478B2 (en) * 2009-11-20 2014-02-26 スタンレー電気株式会社 Lamp
US9386286B2 (en) 2010-06-07 2016-07-05 Texas Instruments Incorporated Sparse source array for display pixel array illumination with rotated far field plane
CN101963747A (en) * 2010-09-19 2011-02-02 天津爱安特科技股份有限公司 LCD projector light source system using three LED lamp panels
CN102865467A (en) * 2011-07-08 2013-01-09 扬升照明股份有限公司 Lighting system and pattern projection lamp
JP5495334B2 (en) 2011-09-22 2014-05-21 Ｎｅｃエンジニアリング株式会社 Optical recording head and image forming apparatus
JP6089616B2 (en) 2012-11-20 2017-03-08 セイコーエプソン株式会社 Light source device and projector
CN103076677A (en) * 2013-02-01 2013-05-01 桂林电子科技大学 Double-telecentric Kohler illumination light path
JP6308523B2 (en) * 2014-03-11 2018-04-11 株式会社ブイ・テクノロジー Beam exposure equipment
JP6529809B2 (en) * 2015-04-14 2019-06-12 株式会社サーマプレシジョン Light irradiation apparatus and exposure apparatus
CN105158887B (en) * 2015-09-29 2017-09-22 南京理工大学 Multi-mode micro imaging method based on programmable LED array illumination
JP6315720B2 (en) * 2016-08-10 2018-04-25 横浜リーディングデザイン合資会社 Exposure illumination device
CN107976794B (en) * 2018-01-12 2021-01-26 苏州大学 Lighting system of light sheet lighting microscope capable of changing thickness and length of light sheet
CN110146973A (en) * 2019-05-05 2019-08-20 宁波永新光学股份有限公司 A kind of preposition microscopical lighting device
CN112230500B (en) * 2019-07-15 2021-10-08 青岛海信激光显示股份有限公司 A laser projection system and light source device
CN110989138B (en) * 2019-12-23 2021-03-19 中国科学院长春光学精密机械与物理研究所 Wide spectrum afocal optical system with large field of view

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851978A (en) * 1986-12-24 1989-07-25 Nikon Corporation Illumination device using a laser
US20020012164A1 (en) * 2000-06-23 2002-01-31 Nikon Corporation Illumination apparatus for microscope
JP2003090959A (en) * 2001-09-17 2003-03-28 Ricoh Co Ltd Laser illumination optical system, exposure apparatus using the optical system, laser processing machine, and projection apparatus
JP2003218017A (en) * 2001-11-16 2003-07-31 Ricoh Co Ltd Laser illumination optical system and exposure apparatus, laser processing apparatus, and projection apparatus using the same
EP1367442A2 (en) * 2002-05-27 2003-12-03 Nikon Corporation Illumination device
JP2004253750A (en) * 2002-12-27 2004-09-09 Nikon Corp Illumination light source, exposure apparatus and exposure method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3291839B2 (en) 1993-06-11 2002-06-17 株式会社ニコン Illumination optical device, exposure apparatus, and element manufacturing method using the exposure apparatus
US5815248A (en) * 1993-04-22 1998-09-29 Nikon Corporation Illumination optical apparatus and method having a wavefront splitter and an optical integrator
CN2535182Y (en) * 2002-01-22 2003-02-12 北京工业大学 Beam-averaging device of quasi-molecular laser micro-processing

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4851978A (en) * 1986-12-24 1989-07-25 Nikon Corporation Illumination device using a laser
US20020012164A1 (en) * 2000-06-23 2002-01-31 Nikon Corporation Illumination apparatus for microscope
JP2003090959A (en) * 2001-09-17 2003-03-28 Ricoh Co Ltd Laser illumination optical system, exposure apparatus using the optical system, laser processing machine, and projection apparatus
JP2003218017A (en) * 2001-11-16 2003-07-31 Ricoh Co Ltd Laser illumination optical system and exposure apparatus, laser processing apparatus, and projection apparatus using the same
EP1367442A2 (en) * 2002-05-27 2003-12-03 Nikon Corporation Illumination device
JP2004253750A (en) * 2002-12-27 2004-09-09 Nikon Corp Illumination light source, exposure apparatus and exposure method

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 07 3 July 2003 (2003-07-03) *
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 11 5 November 2003 (2003-11-05) *
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 12 5 December 2003 (2003-12-05) *

Also Published As

Publication number Publication date
WO2006080534A2 (en) 2006-08-03
US20080212173A1 (en) 2008-09-04
WO2006080534B1 (en) 2006-11-09
JP2008529037A (en) 2008-07-31
EP1844366A2 (en) 2007-10-17
DE602006003865D1 (en) 2009-01-08
EP1844366B1 (en) 2008-11-26
CN101107572A (en) 2008-01-16
JP4815445B2 (en) 2011-11-16
US7733574B2 (en) 2010-06-08
CN100517079C (en) 2009-07-22

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