WO2006095472A1 - レタープレス印刷用感光性積層印刷原版および該レタープレス印刷用感光性積層印刷原版を用いたレタープレス印刷版の製造方法 - Google Patents
レタープレス印刷用感光性積層印刷原版および該レタープレス印刷用感光性積層印刷原版を用いたレタープレス印刷版の製造方法 Download PDFInfo
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- WO2006095472A1 WO2006095472A1 PCT/JP2005/021906 JP2005021906W WO2006095472A1 WO 2006095472 A1 WO2006095472 A1 WO 2006095472A1 JP 2005021906 W JP2005021906 W JP 2005021906W WO 2006095472 A1 WO2006095472 A1 WO 2006095472A1
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- printing
- ultraviolet
- water
- photosensitive
- dye
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
- G03F7/0955—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer one of the photosensitive systems comprising a non-macromolecular photopolymerisable compound having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
Definitions
- the present invention relates to a photosensitive laminated printing original plate for letter press printing and a method for producing a letter press printing plate using the photosensitive laminated printing original plate for letter press printing, and in particular, by changing the developing solution without contaminating the developing solution.
- High-quality photosensitive laminated printing original plate for letter press printing suitable for letter press printing that suppresses cost increase and eliminates complications, and manufacture of letter press printing plate using the photosensitive laminated printing original plate for letter press printing It is about the method.
- Letter press printing is a type of relief printing that develops with water or a mixture of water and alcohol. Since letter press printing is water development, it is excellent in terms of economy, versatility, environmental non-contamination, etc., so it has been reevaluated and, in conjunction with its improved printing accuracy, has recently received attention. Collecting.
- the plate Since the plate has a convex shape, it can be printed on a flat and non-smooth printing object such as cardboard, and the printing force can be printed relatively quickly and inexpensively.
- Letter press printing is water development, so it is inexpensive and less polluting than the solvent development type.
- letterpress printing is an old printing technique
- letterpress printing and conventional power are both conventional printing techniques, and it is well known that it has various advantages as described above.
- the ratio of use to the entire printed material was not high.
- Letter press printing plates have long been manufactured by using metal or hard resin plates as constituent materials, and engraving on the hard layer to form negative images of characters and pictures to be printed.
- photosensitive resin has been used.
- This photosensitive resin was generally composed of an elastomeric binder, at least one monomer and a photoinitiator.
- a printing original plate using this photosensitive resin is a plate-like member in which at least the photosensitive resin layer is provided on a support.
- the negative mask is also composed of negative film force, so its dimensions are likely to change due to changes in temperature and humidity. Therefore, even if the same negative mask is used, if the pattern formation process that also exposes and develops the photosensitive resin layer is performed at different times or in different environments, a printing plate with the same accuracy can be obtained. In some cases, it will disappear.
- Patent Documents 1 and 2 Recently, several types of printing original plates having a new configuration have been developed in order to solve the enormous problems (Patent Documents 1 and 2).
- a common characteristic configuration of these recent printing originals is that at least an infrared sensitive material layer is formed on the photosensitive resin layer, and this infrared sensitive material layer serves as a conventional negative mask. Is configured to be possible.
- This infrared sensitive material layer is opaque to chemical radiation that photocures the photosensitive resin, and is sensitive to infrared rays.
- This infrared sensitivity means so-called abrasion that evaporates or Z and decomposes by exposure with infrared laser light. Therefore, the infrared sensitive layer is also called an infrared ablation layer.
- printed image information can be directly recorded on a printing plate for letter press printing using an infrared laser beam, and the conventional negative film strength is also obtained.
- the mask film can be omitted.
- the printed image information can be produced, stored, modified, and output as digital information by a computer.
- a letterpress printing plate is produced by a configuration in which an infrared ablation layer is provided, a conventional mask film is used. It was possible to significantly reduce the image information processing cost required at the time.
- the infrared ablative layer is finely dispersed in a water-soluble or water-dispersible binder or a water-alcohol-soluble or dispersible binder.
- a water-soluble or water-dispersible binder or a water-alcohol-soluble or dispersible binder.
- Any compound that absorbs ultraviolet radiation can be used to make actinic radiation opaque as needed.
- Examples of the infrared absorbing substance and all the compounds that absorb ultraviolet rays include dyes and pigments. Specific examples include phthalocyanine, substituted phthalocyanine derivatives, cyanine, and merocyanine dyes, and pigments. As polymethine dye. Carbon black, graphite, acid-chromium, and iron oxide are listed.
- Patent Document 2 includes an IR-absorbing metal layer as the infrared ablation layer.
- Patent Document 1 Japanese Patent No. 3429634
- Patent Document 2 Japanese Patent Application Laid-Open No. 2004-101751
- the present invention has been made in view of the above-described prior art, and includes a photosensitive laminated printing original plate for letter press printing and a method for producing a letter press printing plate using the photosensitive laminated printing original plate for letter press printing.
- a high-quality photosensitive original plate for letterpress printing that does not contaminate the developer, suppresses the cost increase due to the replacement of the developer, and eliminates complications, and a letterpress printing plate using the photosensitive original plate for letterpress printing It is to provide a manufacturing method.
- the present inventors have intensively studied a mask material layer corresponding to the above-described infrared sensitive material layer.
- the mask material layer absorbs non-ultraviolet rays.
- a non-ultraviolet-absorbing substance and an ultraviolet-absorbing substance have compatibility with the binder, and a soluble or dispersible binder is contained in water or a mixture of water and alcohol.
- a uniform waste solution without contamination of the image sludge and the like was obtained in the developer, and that no contamination of the developer sludge and the like was found on the filter during drainage, and the present invention was made.
- the photosensitive laminated printing original plate for letter press printing comprises a photosensitive resin layer developable with water or a mixture of water and alcohol having sensitivity to ultraviolet rays on a support, and a non-ultraviolet ray.
- a photosensitive resin layer developable with water or a mixture of water and alcohol having sensitivity to ultraviolet rays on a support, and a non-ultraviolet ray.
- the non-ultraviolet-absorbing substance and the ultraviolet-absorbing substance are compatible with the binder in the photosensitive laminated printing original plate for letterpress printing.
- the non-ultraviolet absorbing organic dye includes a nitrosoid compound and a metal complex salt thereof, a polymethine dye, a squarylium dye, a thiol nickel complex salt, a phthalocyanine dye, a triethanolmethane dye, an immonium dye, a diimonium dye, Naphthoquinone dyes and anthraquinone dyes are preferably at least one selected. Further, it is preferable that the ultraviolet ray absorbing organic dye is at least one selected from an azo dye and a methine dye.
- a pattern using actinic radiation for the photosensitive resin layer of the printing original plate in which at least the photosensitive resin layer is formed on a support is produced by irradiating light and then developing with water or a developer that also has a mixture of water and alcohol to form a resin layer having a convex pattern for printing on the support.
- the above-mentioned photosensitive laminated printing original for letterpress printing is used as an original for letterpress printing, and the mask material layer of the photosensitive laminated printing original for letterpress printing is used.
- Irradiating with non-ultraviolet light sublimating the irradiated portion of the mask material layer by the irradiation to change to a mask image layer having become an ultraviolet transmissive region, and using the mask image layer as a mask Said photosensitive ⁇
- the process of irradiating the oil layer with ultraviolet light, the mask material layer remaining without being irradiated with the non-ultraviolet light, and the ultraviolet light non-irradiated region of the photosensitive resin layer in an uncured state without being irradiated with the ultraviolet light are developed. And a step of removing both with a liquid.
- infrared light infrared laser light
- partially visible light can be used as the non-ultraviolet light.
- the visible light to be used the visible light in the entire wavelength range is a part of visible light from the infrared region, and Ar laser light and YAG second harmonic laser light are suitable.
- a mask image layer having a high contrast can be formed, a high-quality letter press printing plate can be provided, and development sludge is not generated.
- contamination of the developer during development can be prevented, cost increase due to developer replacement can be suppressed, and complexity can be eliminated.
- the photosensitive laminated printing original plate for letter press printing comprises a photosensitive resin layer that can be developed with water or a mixture of water and alcohol having ultraviolet photosensitivity on a support, a non-ultraviolet absorbing material. And a mask material layer that can be removed with water or a mixture of water and alcohol containing at least a binder that is soluble or dispersible in water or a mixture of water and alcohol.
- the non-ultraviolet-absorbing substance and the ultraviolet-absorbing substance are compatible with the binder in the photosensitive laminated printing original plate for letterpress printing. To do.
- the mask material layer By configuring the mask material layer in this way, it is possible to provide a high-quality letterpress printing plate and prevent development sludge from being generated, thereby preventing contamination of the developer during development and increasing the cost by changing the developer. It is possible to suppress the complexity.
- the mask material layer when the mask material layer is irradiated with non-ultraviolet light, the non-ultraviolet absorbing substance in the mask material layer absorbs non-ultraviolet light, and the mask material layer sublimates and disappears by this absorbed energy.
- an ultraviolet transmissive region is formed in the mask material layer in the shape of the mask image layer. By passing ultraviolet rays through the ultraviolet transmissive region, the lower photosensitive resin layer is exposed to form a crosslink.
- the part of the mask material layer that has not been irradiated with non-ultraviolet rays remains without sublimation, and the UV-absorbing organic dye absorbs UV rays when exposed to ultraviolet rays in the photosensitive resin layer. Prevents the formation of cross-linking by UV exposure of the underlying photosensitive resin layer. Therefore, development can remove the non-irradiated portion of the mask material layer and the uncrosslinked photosensitive resin layer under the non-irradiated portion. Finally, the crosslinked photosensitive resin layer located in the lower layer of the non-ultraviolet irradiation portion in the mask material layer forms the convex portion of the letterpress printing plate. Note that sublimation in this application is used as a synonym for burn-off and ablation.
- the mask material layer does not contain carbon black, metal, or alloy, so that these substances do not migrate to the developer, and development by condensation of carbon black, metal, or alloy. It does not cause developer contamination such as sludge. Therefore, when the photosensitive original plate for letter press printing according to the present invention is used, there is no contamination of the developing solution at the time of development, so that an increase in cost due to the replacement of the developing solution can be suppressed and complexity can be eliminated.
- the mask material layer in the photosensitive original plate for letter press printing of the present invention contains at least a non-ultraviolet-absorbing organic dye and an ultraviolet-absorbing organic dye, water or a noinder that can be dissolved or dispersed in water and a mixture of water and alcohol. Alternatively, it is a mask material layer that can be removed with a mixture of water and alcohol, wherein the non-ultraviolet absorbing substance and the ultraviolet absorbing substance are compatible with the binder.
- the non-ultraviolet absorbing organic dye include visible light or infrared absorbing organic dyes. Of these, an infrared absorbing organic dye having strong absorption in the range of 750 to 20,000 nm is preferable.
- any material can be used as long as the mask material layer by non-ultraviolet rays sublimes and no residue remains.
- nitrosoid compounds and their metal complexes which are preferred for organic dyes that absorb infrared rays, polymethine dyes (cyanine dyes), squarylium dyes, thiol nickel complex salts, phthalocyanine dyes, triarylenemethane dyes, It is preferably at least one selected from indium dyes, di-in dyes, naphthoquinone dyes, and anthraquinone dyes.
- phthalocyanine dyes such as poly (substituted) phthalocyanine compounds; cyanine dyes; squarylium dyes; chalcogenopyryl arylidene dyes; bis (chalcogenopyryl) -polymethine dyes; oxyindolizine dyes; bis (aminoaryl) -polymers
- Metal-free pigments such as tin pigments; merocyanine pigments; croconium pigments; and quinoid pigments are preferred.
- any material can be used as long as it prevents transmission of UV light that sensitizes the photosensitive resin layer, and the mask material layer sublimes by non-UV light and no residue remains. be able to.
- organic dyes that absorb ultraviolet light or visible light examples include azo dyes such as benzene dyes, naphthalene dyes, and heterocyclic azo dyes, and polymethine dyes. And methine dyes such as azomethine dyes. Of these, azo dyes are preferred.
- the binder is not particularly limited as long as it has a film-forming ability and is substantially transparent to ultraviolet rays.
- the binder is incompatible or substantially incompatible with the photosensitive resin layer. Is good.
- a binder that is soluble in water or a mixture of water and alcohol is preferred.
- a resin having a hydroxyl group or a carboxyl group is preferred.
- polyvinyl butyral, polybulacetal, epoxy resin, cellulose derivative, polyalkyleneoxide derivative, polyurethane derivative and the like can be mentioned.
- cellulose derivative examples include methylcellulose, hydroxycellulose, and hydroxypropylcellulose.
- Examples of the polyalkyleneoxide derivative include compounds represented by the following general formulas (1) to (8).
- examples of the polyurethane derivative include compounds represented by the following general formula (9).
- R 1, R 2 and R are a hydrogen atom or an alkyl group
- R 1 and R 2 are C H (where m is an integer of 1 or more, H may be substituted), and R
- H is optionally substituted), and is an integer greater than or equal to n.
- the binder of the mask material layer in the present invention is constituted using the various binder materials
- the binder materials may be used singly or in combination of a plurality of types.
- the content of the non-UV-absorbing organic dye in the mask material layer is preferably 50 to 50% by mass in the total solid content.
- the content of the non-ultraviolet absorbing organic dye is 5% by mass or more, it is preferable because sublimation necessary for non-ultraviolet irradiation can be obtained.
- the content of the non-ultraviolet absorbing organic dye is 50% by mass or less, the non-ultraviolet absorbing substance is preferably compatible with the binder.
- the content of the UV-absorbing substance is preferably 5 to 50% by mass in the total solid content.
- the content of the ultraviolet-absorbing organic dye is 5% by mass or more, it is preferable because the ultraviolet-absorbing ability required as a mask material layer upon irradiation with ultraviolet rays can be obtained.
- the content of the ultraviolet absorbing organic dye is 50% by mass or less, it is preferable because the ultraviolet absorbing organic dye is sufficiently compatible with the binder.
- the content of the binder in the mask material layer is preferably 10 to 90% by mass in the total solid content.
- the content of the binder is 10% by mass or more, the mask material layer has a necessary film forming ability, so that a good mask material layer can be formed.
- the content of the binder is 90% by mass or less, it is preferable because sublimation and ultraviolet absorbing ability sufficient for the mask material layer can be obtained.
- the components constituting the mask material layer are dissolved in an organic solvent, and after coating on the photosensitive resin layer, the organic solvent is volatilized.
- a mask layer should be formed.
- the organic solvent include ethers such as dibutyl ether, isopropyl ether, dioxane, tetrahydrofuran, and ketones such as acetone, diethyl ketone, methyl ethyl ketone, methyl isobutyl ketone, methyl propyl ketone, and cyclohexanone.
- the thickness of the mask material layer is 3 to 20 ⁇ m, preferably 3 to LO ⁇ m.
- the photosensitive resin layer in the photosensitive laminated printing original plate for letter press printing of the present invention is
- a photosensitive resin layer that can be developed with water sensitive to ultraviolet light or a mixture of water and alcohol, and containing an elastomeric binder, one or more monomers, and an initiator sensitive to ultraviolet radiation.
- Any photosensitive resin composition that is formed of a photosensitive resin composition and is usually suitable for letterpress printing can be used.
- Such an elastomeric binder is preferably a water-soluble or a binder that dissolves in water or a mixture of water and alcohol.
- Examples of the elastomeric binder include, for example, JP-A-4-240644, JP-A-53-2082, JP-A-61-17148, JP-A-62-187848, JP-A-63-8735, JP-A-63-10150, JP-A-1-274132 Partially saponified polyvinyl acetate resin and derivatives thereof, as described in JP-A-1-287671, JP-A-2-39048, JP-A-2-73810, and JP-A-4-240855.
- Copolymers of acid ester and maleic acid, alkyd resin, polyethylene oxide, water-soluble or alcohol-soluble polyamide resin, ethylene acetate copolymer, polystyrene resin, phenol resin, polyester resin, epoxy resin, Polypropylene terephthalate can be used, but partial or complete ken-vinyl alcohol and (meth) acrylic acid, (meth) acrylamide, N-methylol (meth) acrylic , Styrene, propylene, maleic anhydride, (meth) acrylonitrile, a copolymer of (meth) acrylic acid ester as a monomer, or methylol (meth) acrylamide, ethylol (meth) acrylamide, etc.
- Diamines such as those obtained by reaction with lower alkylol (meth) acrylamide, and N, N, monobis (aminomethyl) monopiperazine, N, N, monobis (j8-aminoethyl) monopiperazine, Dicarboxylic acids such as N, N, monobis (carboxymethyl) monopiperazine, N, N, monobis (carboxymethyl) monomethylbiperazine and their lower alkyl esters or acid halides, N (aminoethyl) -N, Water-soluble polyamide, sulfo, polymerized with ⁇ -amino acid such as mono (carboxymethyl) -piperazine as monomer
- a polyamide resin having an nate group or a base component is preferably used.
- the one or more monomers contained in the photosensitive resin layer include (meth) acrylic acid, (meth) acrylic acid ester, (meth) acrylamide having at least one photopolymerizable alkenyl group. , (Meth) acrylonitrile, styrene glycidyl (meth) acrylate, allyl (meth) acrylate, trimethylol propane tri (meth) acrylate, allyl compounds, butyl ether compounds, butyl ester compounds and the like are preferable.
- examples thereof include those diesterified with an acid.
- the monomer is 5 to 30 parts by mass based on 100 parts by mass of the binder of the photosensitive resin layer.
- the range of 10 to 20 parts by mass is preferable. If the monomer content is less than the above range, the wear resistance of the coating after UV radiation exposure curing is reduced, and if it exceeds the above range, the elastomeric property of the photosensitive resin layer is reduced, and letter plate printing is performed. It is not preferable as a plate.
- Examples of the initiator include aromatic ketones such as benzophenone; benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, a-methylol benzoin methyl ether, ⁇ -methoxybenzoin methyl ether, 2, 2-jetyl.
- aromatic ketones such as benzophenone; benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, a-methylol benzoin methyl ether, ⁇ -methoxybenzoin methyl ether, 2, 2-jetyl.
- Benzoin ethers such as sif-acetophenone, methoxy-phenacetophenone (2,2-dimethoxy-1,2-diphenyl-1-one), 2-benzyl-2-dimethylamino- 1- (4 morpholinophenol) -butanone 1; substitution And the unsubstituted polynuclear quinones; and other initiators disclosed
- the initiator is preferably contained in a range of 0.001 to 10 mass% with respect to the total mass of the photosensitive resin layer.
- additives such as a sensitizer, a thermal polymerization inhibitor, a plasticizer, and a color former may be used in the photosensitive resin composition for forming the photosensitive resin layer according to the required properties. it can.
- Various methods can be used as a method for preparing the photosensitive resin composition.
- the raw material to be blended is a suitable solvent, for example, a solvent such as black mouth form, tetrachloroethylene, methyl ethyl ketone, or toluene. It can be dissolved and mixed in, cast into a mold to evaporate the solvent, and can be used as it is.
- the photosensitive resin layer has a thickness of 0.3 to 3 mm, preferably 0.43 to 2.84 mm.
- a support in the photosensitive original plate for letter press printing of the present invention known supports used for letter press printing plates such as ordinary letter press printing satisfying physical properties such as mechanical strength required for printing conditions to be used. All supports in the form of metals, plastic films, paper and their composite forms can be used. These include addition polymerization poly Polymer films such as those formed by polymers and linear condensation polymers, transparent foams and fabrics, non-woven fabrics such as glass fiber fabrics, and steel, iron, aluminum, zinc, copper, brass, stainless steel, etc. Metal is included.
- the support is preferably transparent to non-infrared rays so that back exposure is easy.
- More preferred supports include those obtained by molding polyethylene terephthalate (PET), nylon, polyethylene, polypropylene, attalinole coconut or polyester into a plate or film.
- PET polyethylene terephthalate
- polyester resin polyurethane resin, epoxy resin, acrylic ester resin, ethylene-acetic acid described in JP-A-61-17148
- bulle-based rosin and the like polybulal alcohol-based rosin
- cellulose-based rosin as the main component are preferably used.
- a cover sheet can be provided on the upper layer. Further, a cap layer may be provided on the surface of the mask material layer, and the cover sheet may be provided on the cap layer.
- cover sheet all known cover sheets of metal, plastic film, paper, and their composite form, which are usually used for letterpress printing plates, can be used. These include polymeric films, transparent foams and fabrics, such as formed by addition polymerization polymers and linear condensation polymers, nonwoven fabrics such as glass fiber nonwoven fabrics, and metals such as steel, aluminum, zinc, copper, brass, and stainless steel Is included. Examples of films that can be used include polyamides, polyesters, polyolefins, and polychlorinated butyls. Preferably, a film such as polyethylene terephthalate (PET), nylon, polyethylene, polypropylene, acrylic resin or polyester, or a laminate of these films is used. As this cover sheet, a film is suitable. The thickness is 10 to 500 ⁇ m, preferably 20 to 200 ⁇ m.
- cover sheet and the mask material layer may be covered with a release layer.
- a release layer By providing the release layer, it is possible to facilitate peeling of the cover sheet before the mask material layer is exposed to pattern light, and to prevent surface roughness of the mask material layer due to peeling.
- a photosensitive resin composition prepared by mixing an elastomeric binder, monomer, initiator and other components is formed into a hot melt and calendered to a desired thickness, or extruded.
- the photosensitive resin composition is melted, mixed, degassed and filtered using a machine, then extruded between a support and a temporary cover sheet, and calendered to a desired thickness.
- a photosensitive resin layer is formed on the support layer by a method such as placing a support and a cover sheet in a mold and injecting a photosensitive resin composition between them.
- a resin composition (mask material) containing a binder having a film-forming ability, a non-ultraviolet-absorbing organic dye, and an ultraviolet-absorbing organic dye is directly applied onto the photosensitive resin layer to form a mask material layer.
- the said resin composition (mask material) is apply
- Laminate with Z or pressure to make a photosensitive laminated printing original for letter press printing In the production described above, it can also be produced by sequentially laminating a mask material layer, a photosensitive resin layer and a support layer on the cover sheet.
- a letterpress printing plate using the photosensitive laminated printing original plate for letterpress printing obtained by the above-described manufacturing method is applied with infrared laser light or non-ultraviolet light such as the above-mentioned partially visible light according to the image pattern for printing.
- the mask material layer By irradiating the mask material layer, the mask material layer is changed to a mask image layer in which the irradiated portion has sublimated and disappeared, and the photosensitive resin layer is irradiated with ultraviolet actinic radiation using the mask image layer as a mask,
- the mask material layer remaining without being irradiated with the non-ultraviolet rays and the ultraviolet radiation non-irradiated region of the photosensitive resin layer that has not been irradiated with the ultraviolet actinic radiation and is in an uncured state are removed with a developer and printed. Manufactured by forming a plate material image.
- infrared laser light with a wavelength of 700-20, OOOnm is suitable.
- Various lasers such as dye, nitrogen, metal vapor, semiconductor, and YAG are used, and those suitable for the required conditions should be selected. Above all, 750-880nm semiconductor laser and 1060nm Nd—YAG laser The one is preferred.
- the generation unit and drive system unit of this infrared laser are controlled by a computer, and digitized image information is directly applied to the photosensitive laminated printing original for letterpress printing.
- light in the visible light region is light with a wavelength peak in the 450 to 700 nm range, as described above.
- YAG second harmonic laser light with a wavelength peak around 532 nm is preferred
- the ultraviolet ray suitable for irradiating the photosensitive resin layer in the present invention has a shorter wavelength than the infrared ray, or light in the visible region near the Ar laser beam and the YAG second harmonic laser beam.
- Electromagnetic waves preferably electromagnetic waves in the visible and ultraviolet range shorter than the wavelength of 488 nm of the Ar laser light, preferably electromagnetic waves having a wavelength peak at 300 to 450 nm, more preferably 350 to 400 nm.
- Means electromagnetic waves. Examples of such ultraviolet light sources include high-pressure mercury lamps, ultraviolet fluorescent lamps, carbon arc lamps, and xenon lamps.
- any one of an organic solution, water, an aqueous solution or a semi-aqueous solution may be used as long as it has a property of dissolving, swelling, or dispersing the photosensitive resin layer. Even so, the choice of developer depends on the chemical nature of the resin to be removed.
- Suitable organic solvent developers include aromatic or aliphatic hydrocarbons and aliphatic or aromatic halohydrocarbon solvents or mixtures of these solvents with suitable alcohols.
- the semi-aqueous developer contains water or an organic solvent miscible with water and an alkaline material.
- aqueous developer examples include water, esters such as heptyl acetate and 3-methoxybutyl acetate, hydrocarbons such as petroleum fractions, toluene and decalin, chlorinated solvents such as tetrachloroethylene, and monoethanol.
- esters such as heptyl acetate and 3-methoxybutyl acetate
- hydrocarbons such as petroleum fractions, toluene and decalin
- chlorinated solvents such as tetrachloroethylene
- monoethanol examples thereof include amines such as amine, diethanolamine, and triethanolamine, and aqueous solutions such as sodium hydroxide, lithium hydroxide, sodium carbonate, and ammonia. It is also possible to use a mixture of these solvents with alcohols such as propanol, butanol and pentanol.
- any method such as immersion, spraying from a nozzle, brushing with a brush, etc. can be employed.
- the letterpress printing photosensitive laminated original plate is attached to a drum in a cylindrical shape, irradiated with non-ultraviolet rays and ultraviolet rays in order, and developed to produce a printing plate material. The characteristics are further improved.
- Polybulu alcohol used as a binder (hereinafter referred to as “PVA”) (trade name: PV A405, manufactured by Kuraray Co., Ltd.) dissolved in pure water Z isopropyl alcohol (hereinafter referred to as “IPA”) (2: 1) by to obtain a homogeneous binder solution of 10 weight 0/0.
- IPA isopropyl alcohol
- To this mixed solution was added 1.5 g of an ultraviolet absorbing azo dye (trade name: Sumilite Supra Yellow, manufactured by Sumitomo Chemical Co., Ltd.) to prepare a uniform mask material solution.
- the above mask material solution was applied onto a PET film (cover sheet (D)) having a thickness of 100 ⁇ m so that the coating film thickness after drying was 5 / zm, and 100 ° C. And dried for 5 minutes to form a mask material layer (C).
- the optical density of this mask material layer (C) with respect to 370 nm (ultraviolet rays) was measured using a spectrophotometer (trade name U-2000, manufactured by Hitachi, Ltd.). It was confirmed to block.
- the photosensitive product was obtained as follows. Dissolve 0.25 parts by mass of methylhydroquinone in 10 parts by mass of water, and add 74 parts by mass of dimethylol ether, N-methylol acrylate. 202 parts by mass of Mido and 2 parts by mass of salt ammonia were added and heated to 80 ° C. and stirred for 2 hours. Next, this reactive organism was poured into 1000 parts by mass of acetone, and the precipitate was removed by filtration to obtain the photosensitive product as a polymer condensate.
- the (C) layer was adhered to the surface of the photosensitive layer.
- the exposed layer (C) is irradiated according to the pattern using a semiconductor infrared laser beam (non-ultraviolet) with a wavelength of 830 nm and an output of 600 mW so that the mask pattern has a resolution of 100 lines Zmm and an irradiation energy of 3 jZcm 2 , C) Layer was selectively sublimated.
- This mask material layer (C) is formed by receiving a pattern image of an infrared laser as described above, and a mask image layer (c,) having a pattern latent image due to transmission of ultraviolet rays and Z transmission.
- This mask image layer (C ') is irradiated with infrared laser light, that is, the optical density of the sublimation part of (C) layer with respect to 370 nm (ultraviolet) is measured with a spectrophotometer (trade name U 2000, manufactured by Hitachi, Ltd.). ) was measured to be 0.2, and it was confirmed that ultraviolet rays could be easily transmitted.
- the photosensitive resin layer (B) is irradiated with ultraviolet pattern light in accordance with the latent image pattern of the mask image layer (C ′), and the region irradiated with the ultraviolet rays undergoes a crosslinking reaction. And harden. Therefore, an aromatic hydrocarbon developer (trade name FDO S2, Tokyo Ohka Kogyo Co., Ltd.) is used to remove the region by crosslinking the mask image layer (C) and the photosensitive resin layer (B). Development was carried out at a liquid temperature of 35 ° C. for 2 minutes using a developer manufactured by Kogyo Co., Ltd. as a developer. As a result, the photosensitive resin was cured according to the target image, and a convex image made of a cured resin was formed on the support plate layer (A).
- an aromatic hydrocarbon developer trade name FDO S2, Tokyo Ohka Kogyo Co., Ltd.
- the image edge portion was also sharp and showed good image reproducibility.
- a printing test was performed using this letterpress printing plate, a good printed matter was printed.
- the printing medium used at this time was coated paper.
- this letterpress printing plate was developed so that the total development area was 100 m 2 , development sludge was not generated in the developer, and the developer became a uniform solution, and the sludge was not in the filter during drainage. The remaining power.
- PVA (trade name: PVA405, manufactured by Kuraray Co., Ltd.) used as a noda is dissolved in pure water Z-isopropyl alcohol (hereinafter referred to as “IPA”) (2: 1), and 10% by mass uniform A Norder solution was obtained.
- IPA Z-isopropyl alcohol
- Carbon black (trade name: NOMICRON K black # 7360, manufactured by Mikuni Dye Co., Ltd.) 1. Og was added to 50 g of this binder solution and stirred to prepare a uniform mask material solution.
- the mask material solution was applied onto a PET film (cover sheet (D)) having a thickness of 100 ⁇ m so that the coating film thickness after drying was 3 / zm, and 100 ° C. And dried for 5 minutes to form a mask material layer (C).
- the optical density of this mask material layer (C) with respect to 370 nm (ultraviolet rays) was measured using a spectrophotometer (trade name U-2000, manufactured by Hitachi, Ltd.). It was confirmed to block.
- PVA used as a Noinda (trade name: PVA405, manufactured by Kuraray Co., Ltd.) It was dissolved in sopropyl alcohol (hereinafter referred to as “IPA”) (2: 1) to obtain a 10% by mass uniform binder solution.
- IPA sopropyl alcohol
- the binder solution was applied onto a PET film (cover sheet (D)) having a thickness of 100 ⁇ m so that the coating film thickness after drying was 3 m, and the coating was performed at 100 ° C for 5 minutes.
- aluminum was vapor-deposited to a thickness of 1 ⁇ m on this coating film surface by a vacuum vapor deposition method to form a mask material layer (C).
- the optical density of this mask material layer (C) with respect to 370 nm (ultraviolet rays) was measured using a spectrophotometer (trade name U-2000, manufactured by Hitachi, Ltd.), which was 4.5. It was confirmed to block.
- the photosensitive laminated printing original plate for letter press printing has a photosensitive resin layer sensitive to ultraviolet rays on a support, a non-ultraviolet absorbing material and an ultraviolet ray absorbing property.
- a mask material layer containing at least a substance, and a non-UV-absorbing substance is a non-UV-absorbing organic dye, and the UV-absorbing substance is a UV-absorbing organic dye.
- the mask image layer is formed as a letterpress printing original plate that does not roughen the surface of the underlying photosensitive resin layer and has excellent contrast;
- a method for producing a letterpress printing plate using the letterpress printing original plate can be provided, and in particular, the developer is not contaminated, the cost increase due to the developer exchange can be suppressed, and the complexity can be eliminated. .
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
Claims
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05811727A EP1865376A4 (en) | 2005-03-11 | 2005-11-29 | LIGHT-SENSITIVE LAMINATED ORIGINAL PRINTING PANEL FOR BOOK PRINTING AND PROCESS FOR MAKING A BOOK PRINTING PANEL USING THE LIGHT-SENSITIVE LAMINATED ORIGINAL PRESSURE PLATE |
| CN2005800489801A CN101137935B (zh) | 2005-03-11 | 2005-11-29 | 显影凸版印刷用感光性层合印刷原版及使用该印刷原版的显影凸版印刷版的制造方法 |
| US11/908,061 US7998659B2 (en) | 2005-03-11 | 2005-11-29 | Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate |
| TW094143784A TW200632535A (en) | 2005-03-11 | 2005-12-12 | Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005069307A JP4225979B2 (ja) | 2005-03-11 | 2005-03-11 | レタープレス印刷用感光性積層印刷原版および該レタープレス印刷用感光性積層印刷原版を用いたレタープレス印刷版の製造方法 |
| JP2005-069307 | 2005-03-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2006095472A1 true WO2006095472A1 (ja) | 2006-09-14 |
Family
ID=36953078
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/021906 Ceased WO2006095472A1 (ja) | 2005-03-11 | 2005-11-29 | レタープレス印刷用感光性積層印刷原版および該レタープレス印刷用感光性積層印刷原版を用いたレタープレス印刷版の製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7998659B2 (ja) |
| EP (1) | EP1865376A4 (ja) |
| JP (1) | JP4225979B2 (ja) |
| KR (1) | KR100926855B1 (ja) |
| CN (1) | CN101137935B (ja) |
| TW (1) | TW200632535A (ja) |
| WO (1) | WO2006095472A1 (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009150703A1 (ja) * | 2008-06-11 | 2009-12-17 | 東洋紡績株式会社 | 感光性フレキソ印刷原版 |
| WO2010007707A1 (ja) * | 2008-07-16 | 2010-01-21 | 東洋紡績株式会社 | 感光性凸版印刷原版 |
| JP2022031428A (ja) * | 2014-06-06 | 2022-02-18 | 大日本印刷株式会社 | 蒸着マスク、フレーム付き蒸着マスク、蒸着マスク準備体、蒸着マスクの製造方法、有機半導体素子の製造方法、及びパターンの形成方法 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009058901A (ja) * | 2007-09-03 | 2009-03-19 | Tokyo Ohka Kogyo Co Ltd | 凸版印刷版製造用多層積層体及び凸版印刷版の製造方法 |
| DE102008013073B4 (de) | 2008-03-06 | 2011-02-03 | Leonhard Kurz Stiftung & Co. Kg | Verfahren zur Herstellung eines Folienelements und Folienelement |
| TWI382914B (zh) * | 2010-05-21 | 2013-01-21 | Univ Nat Cheng Kung | 滾印模具之製造方法 |
| CN102998912A (zh) * | 2012-12-21 | 2013-03-27 | 珠海天威飞马打印耗材有限公司 | 显影设备及显影方法 |
| CN106675030A (zh) * | 2016-12-26 | 2017-05-17 | 海宁市佳峰彩印包装有限公司 | 一种高速数码显影凸版彩印用材料及其生产技术 |
| KR102930217B1 (ko) | 2024-07-02 | 2026-02-25 | 주식회사 아비커스 | 선박을 자동으로 접안하는 방법 및 장치 |
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| JPH09171247A (ja) * | 1995-10-02 | 1997-06-30 | Basf Lacke & Farben Ag | 感光性重合体による凸版印刷板の製造法およびこれにより得られる凸版印刷板 |
| JPH10509254A (ja) * | 1994-11-18 | 1998-09-08 | イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー | フレキソ印刷板の製造方法 |
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| DE112004001662B4 (de) * | 2003-09-12 | 2013-08-08 | Eastman Kodak Co. (N.D.Ges.D. Staates New Jersey) | Verfahren zur Erzeugung einer Reliefdruckplatte |
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2005
- 2005-03-11 JP JP2005069307A patent/JP4225979B2/ja not_active Expired - Fee Related
- 2005-11-29 WO PCT/JP2005/021906 patent/WO2006095472A1/ja not_active Ceased
- 2005-11-29 EP EP05811727A patent/EP1865376A4/en not_active Withdrawn
- 2005-11-29 CN CN2005800489801A patent/CN101137935B/zh not_active Expired - Fee Related
- 2005-11-29 US US11/908,061 patent/US7998659B2/en not_active Expired - Fee Related
- 2005-11-29 KR KR1020077018876A patent/KR100926855B1/ko not_active Expired - Fee Related
- 2005-12-12 TW TW094143784A patent/TW200632535A/zh unknown
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009150703A1 (ja) * | 2008-06-11 | 2009-12-17 | 東洋紡績株式会社 | 感光性フレキソ印刷原版 |
| US8313888B2 (en) | 2008-06-11 | 2012-11-20 | Toyo Boseki Kabushiki Kaisha | Photosensitive flexographic printing original plate |
| WO2010007707A1 (ja) * | 2008-07-16 | 2010-01-21 | 東洋紡績株式会社 | 感光性凸版印刷原版 |
| US8850978B2 (en) | 2008-07-16 | 2014-10-07 | Toyo Boseki Kabushiki Kaisha | Photosensitive letterpress printing original plate |
| JP2022031428A (ja) * | 2014-06-06 | 2022-02-18 | 大日本印刷株式会社 | 蒸着マスク、フレーム付き蒸着マスク、蒸着マスク準備体、蒸着マスクの製造方法、有機半導体素子の製造方法、及びパターンの形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070095424A (ko) | 2007-09-28 |
| KR100926855B1 (ko) | 2009-11-13 |
| CN101137935B (zh) | 2010-12-22 |
| TW200632535A (en) | 2006-09-16 |
| US20090023094A1 (en) | 2009-01-22 |
| EP1865376A1 (en) | 2007-12-12 |
| JP4225979B2 (ja) | 2009-02-18 |
| EP1865376A4 (en) | 2010-07-21 |
| CN101137935A (zh) | 2008-03-05 |
| JP2006251500A (ja) | 2006-09-21 |
| US7998659B2 (en) | 2011-08-16 |
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