WO2007076094A3 - Submersive doublet for high numerical aperture optical system - Google Patents

Submersive doublet for high numerical aperture optical system Download PDF

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Publication number
WO2007076094A3
WO2007076094A3 PCT/US2006/049190 US2006049190W WO2007076094A3 WO 2007076094 A3 WO2007076094 A3 WO 2007076094A3 US 2006049190 W US2006049190 W US 2006049190W WO 2007076094 A3 WO2007076094 A3 WO 2007076094A3
Authority
WO
WIPO (PCT)
Prior art keywords
doublet
numerical aperture
high numerical
submersive
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US2006/049190
Other languages
French (fr)
Other versions
WO2007076094A2 (en
Inventor
James E Webb
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Priority to EP06846034A priority Critical patent/EP1963901A2/en
Priority to JP2008547650A priority patent/JP2009521727A/en
Publication of WO2007076094A2 publication Critical patent/WO2007076094A2/en
Publication of WO2007076094A3 publication Critical patent/WO2007076094A3/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G02B9/04—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or - having two components only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/06—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of fluids in transparent cells

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)

Abstract

The invention features a doublet at one end of a high numerical aperture imaging system. The doublet includes two members coupled together by a fluid medium. The first member is arranged for receiving converging rays within a region of medium power density, and the second member further converges the rays through a region of higher power density. The second member can be made to withstand the higher power density by being made of a more durable material or in a form that is easily replaceable.
PCT/US2006/049190 2005-12-22 2006-12-22 Submersive doublet for high numerical aperture optical system Ceased WO2007076094A2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP06846034A EP1963901A2 (en) 2005-12-22 2006-12-22 Submersive doublet for high numerical aperture optical system
JP2008547650A JP2009521727A (en) 2005-12-22 2006-12-22 Immersion type doublet lens for high numerical aperture optical system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US59789705P 2005-12-22 2005-12-22
US60/597,897 2005-12-22

Publications (2)

Publication Number Publication Date
WO2007076094A2 WO2007076094A2 (en) 2007-07-05
WO2007076094A3 true WO2007076094A3 (en) 2008-05-22

Family

ID=38218700

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/049190 Ceased WO2007076094A2 (en) 2005-12-22 2006-12-22 Submersive doublet for high numerical aperture optical system

Country Status (4)

Country Link
US (1) US20070146904A1 (en)
EP (1) EP1963901A2 (en)
JP (1) JP2009521727A (en)
WO (1) WO2007076094A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005027880A1 (en) * 2005-06-09 2006-12-21 Karl Storz Gmbh & Co. Kg rod lens
US7972438B2 (en) * 2006-08-30 2011-07-05 Crystal Photonics, Incorporated High-index UV optical materials for immersion lithography
JP2008150276A (en) * 2006-11-21 2008-07-03 Canon Inc Glass composition for ultraviolet light and optical device using the same
JP2009120405A (en) * 2007-11-09 2009-06-04 Canon Inc Glass composition for ultraviolet light and optical device using the same
EP4707929A3 (en) * 2018-08-27 2026-04-29 Kla-Tencor Corporation Vapor as a protectant and lifetime extender in optical systems

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6038079A (en) * 1997-10-09 2000-03-14 Imagyn Medical Technologies, Inc. Sapphire objective system
US20050068499A1 (en) * 2003-05-30 2005-03-31 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
WO2005059617A2 (en) * 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4980922B2 (en) * 2004-11-18 2012-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー Microlithography projection exposure apparatus and method for correcting field curvature of a microlithography projection exposure apparatus
US20060198029A1 (en) * 2005-03-01 2006-09-07 Karl-Heinz Schuster Microlithography projection objective and projection exposure apparatus
JP2006309220A (en) * 2005-04-29 2006-11-09 Carl Zeiss Smt Ag Projection objective

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6038079A (en) * 1997-10-09 2000-03-14 Imagyn Medical Technologies, Inc. Sapphire objective system
US20050068499A1 (en) * 2003-05-30 2005-03-31 Carl Zeiss Smt Ag Microlithographic projection exposure apparatus
WO2005059617A2 (en) * 2003-12-15 2005-06-30 Carl Zeiss Smt Ag Projection objective having a high aperture and a planar end surface

Also Published As

Publication number Publication date
JP2009521727A (en) 2009-06-04
WO2007076094A2 (en) 2007-07-05
EP1963901A2 (en) 2008-09-03
US20070146904A1 (en) 2007-06-28

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