WO2007096485A2 - Coating on a metal substrate and a coated metal product - Google Patents
Coating on a metal substrate and a coated metal product Download PDFInfo
- Publication number
- WO2007096485A2 WO2007096485A2 PCT/FI2007/050106 FI2007050106W WO2007096485A2 WO 2007096485 A2 WO2007096485 A2 WO 2007096485A2 FI 2007050106 W FI2007050106 W FI 2007050106W WO 2007096485 A2 WO2007096485 A2 WO 2007096485A2
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- WIPO (PCT)
- Prior art keywords
- coating
- uniform surface
- coated
- surface area
- metal product
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
- B23K26/0821—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head using multifaceted mirrors, e.g. polygonal mirror
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/256—Heavy metal or aluminum or compound thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/266—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension of base or substrate
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/27—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.]
- Y10T428/273—Web or sheet containing structurally defined element or component, the element or component having a specified weight per unit area [e.g., gms/sq cm, lbs/sq ft, etc.] of coating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31678—Of metal
Definitions
- the invention relates generally to a method for coating metal products comprising large surface areas by ultra short pulsed laser ablation.
- the invention also relates to products manufactured by the method.
- the invention has many advantageous effects such as high coating production rate, excellent coating properties and low manufacturing costs.
- Metal products comprise typically large surface areas, thin sheets for example for construction and Interior products being produced for example In sizes like 1200 mm x 1500 mm, being then delivered to customer as plain or rolled sheets.
- electrolytic coating For example aluminum products are typically subjected to eloxation, i.e. electrolytic oxidation by either oxalic acid or nowadays - sulfuric add. Copper and many other metal products such as bras arc oxidized due to their chemical nature, the interior effect being the desired one. Being environmentally hazardous, the leakage of copper and several other metal oxides or other derivatives Is not desirable, and the problem should be solved by another protective coating simultaneously saving the
- both qualitative and production rate related problems associated with coating, thin film production as well as cutting/grooving/carving etc. has been approached by focusing on increasing laser power and reducing the spot size of the laser beam on the target. However, most of the power increase was consumed to noise. The qualitative and production rate related problems were still remaining although some laser manufacturers resolved the laser power related problem. Representative samples for both coating/thin film as well as cutting/grooving/carving etc. could be produced only with low repetition rates, narrow scanning widths and with long working time beyond industrial feasibility as such, highlighted especially for large bodies.
- the energy content of a pulse is kept constant, the power of the pulse increases in the decrease of the pulse duration, the problem with significance increases with the decreasing laser-pulse duration.
- the problems are significant even with the nanosecond-pulse lasers, although they are not applied as such in cold ablation methods.
- the pulse duration decrease further to femto or even to atto-second scale makes the problem almost irresolvable.
- the pulse energy should be 5 ⁇ J for a 10-30 ⁇ m spot, when the total power of the laser is 100 W and the repetition rate 20 MHz.
- Such a fibre to tolerate such a pulse is not available at the priority date of the current application according to the knowledge of the writer at the very date.
- the production rate is directly proportional to the repetition rate or repetition frequency.
- the known mirror-film scanners galvano-scanners or back and worth wobbling type of scanners
- the stopping of the mirror at the both ends of the duty cycle is somewhat problematic as well as the accelerating and decelerating related to the turning point and the related momentary stop, which all limit the utilizability of the mirror as scanner, but especially also to the scanning width.
- the acceleration and deceleration cause either a narrow scanning range, or uneven distribution of the radiation and thus the plasma at the target when radiation hit the target via accelerating and/or decelerating mirror.
- the present above mentioned known scanners direct the pulses to overlapping spot of the target area already at the low pulse repetition rates in kHz-range, in an uncontrolled way.
- such an approach results in release of particles from the target material, instead of plasma but at least in particle formation into plasma.
- the cumulative effect seems to erode the target material unevenly and can lead to heating of the target material, the advantages of cold ablation being thus lost.
- the same problems apply to nano-second range lasers, the problem being naturally even more severe because of the long lasting pulse with high energy.
- the target material heating occurs always, the target material temperature being elevated to approximately 5000 K.
- even one single nano-second range pulse erodes the target material drastically, with aforesaid problems.
- the target may not only ware out unevenly but may also fragment easily and degrade the plasma quality.
- the surface to be coated with such plasma also suffers the detrimental effects of the plasma.
- the surface may comprise fragments, plasma may be not evenly distributed to form such a coating etc. which are problematic in accuracy demanding application, but may be not problematic, with paint or pigment for instance, provided that the defects keep below the detection limit of the very application.
- the present methods ware out the target in a single use so that same target is not available for a further use from the same surface again.
- the problem has been tackled by utilising only a virgin surface of the target, by moving target material and/or the beam spot accordingly.
- the left-overs or the debris comprising some fragments also can make the cut-line un even and thus inappropriate, as the case could for instance in flow-control drillings.
- the surface could be formed to have a random bumpy appearance caused by the released fragments, which may be not appropriate in certain semiconductor manufacturing, for instance.
- the mirror-film scanners moving back and forth generate inertial forces that load the structure itself, but also to the bearings to which the mirror is attached and/or which cause the mirror movement. Such inertia little by little may loosen the attachment of the mirror, especially if such mirror were working nearly at the extreme range of the possible operational settings, and may lead to roaming of the settings in long time scale, which may be seen from uneven repeatability of the product quality. Because of the stoppings, as well as the direction and the related velocity changes of the movement, such a mirror-film scanner has a very limited scanning width so to be used for ablation and plasma production. The effective duty cycle is relatively short to compared the whole cycle, although the operation is anyway quite slow.
- the plasma production rate is in prerequisite slow, scanning width narrow, operation unstable for long time period scales, but yield also a very high probability to get involved with unwanted particle emission in to the plasma, and consequently to the products that are involved with the plasma via the machinery and/or coating.
- coating material to be ablated is long, typically over 50 cm, making the coating chambers large and vacuum pumping periods time- and energy-consuming. Such high-volume vacuumed chambers are also easily contaminated with coating
- An aim of the current invention is to solve or at least to mitigate the problems of the known techniques.
- a first object of this invention is to provide a new method how to solve a problem to coat a certain surface of a metal product by pulsed laser deposition that so that the uniform surface area to be coated comprises at least 0.2 dm 2 .
- a second object of this invention is to provide new metal products being coated by pulsed laser deposition so that the coated uniform surface area comprises at least 0.2 dm 2 .
- a third object of this invention is to provide at least a new method and/or related means to solve a problem how to provide available such fine plasma practically from any target to be used in coating of metal products, so that the target material do not form into the plasma any particulate fragments either at all, i.e. the plasma is pure plasma, or the fragments, if exist, are rare and at least smaller in size than the ablation depth to which the plasma is generated by ablation from said target.
- a fourth object of the invention is to provide at least a new method and/or related means to solve how to coat the uniform surface area of a metal product with the fine plasma without particulate fragments larger in size than the ablation depth to which the plasma is generated by ablation from said target, i.e. to coat substrates with pure plasma originating to practically any material.
- a fifth object of this invention is to is to provide a good adhesion of the coating to the uniform surface area of a metal product by said pure plasma, so that wasting the kinetic energy to particulate fragments is suppressed by limiting the existence of the particulate fragments or their size smaller than said ablation depth. Simultaneously, the particulate fragments because of their lacking existence in significant manner, they do not form cool surfaces that could influence on the homogeneity of the plasma plume via nucleation and condensation related phenomena.
- a sixth object of the invention is to provide at least a new method and/or related means to solve a problem how to provide a broad scanning width simultaneously with fine plasma quality and broad coating width even for large metal bodies in industrial manner.
- a seventh object of the invention is to provide at least a new method and/or related means to solve a problem how to provide a high repetition rate to be used to provide industrial scale applications in accordance with the objects of the invention mentioned above.
- An eighth object of the invention is to provide at least a new method and/or related means to solve a problem how to provide fine plasma for coating of uniform metal surfaces to manufacture products according to the first to seven objects, but still save target material to be used in the coating phases producing same quality coatings/thin films where needed.
- a further object of the invention is to use such method and means according previous objects to solve a problem how to cold- work and/or coat surfaces for coated products.
- the present Invention Is based on the surprising discovery that metal products comprising large surfaces can be coated with Industrial production rates and excellent qualities regarding one or more of technical features such as optical transparency, chemical and/or wear resistance, scratch-free -properties, thermal resistance and/or conductivity, coating adhesion, self-cleaning properties and possibly, tribological properties, partlculate-free coatings, plnhole-free coatings and electronic conductivity by employing ultra short pulsed laser deposition in a manner wherein pulsed laser beam is scanned with a rotating optical scanner comprising at least one mirror for reflecting said laser beam.
- the present method accomplishes the economical use of target materials, because they are ablated in a manner accomplishing the reuse of already subjected material with retained high coating results.
- the present invention further accomplishes the coating of metal products in low vacuum conditions with simultaneously high coating properties. Moreover, the required coating chamber volumes are dramatically smaller than in competing methods. Such features decrease dramatically the overall equipment cost and increase the coating production rate. In many preferable cases, the coating equipment can be fitted into production-line in online manner.
- the coating deposition rates with 2OW USPLD-apparatus are 2 mmVmin. While increasing the laser power to 80 W, the USPLD coating deposition rate is increased to 8 mmVmin, accordingly. According to the invention, the increase in deposition rate can now be fully employed to high quality coating production.
- coating means forming material of any thickness on a substrate. Coating can thus also mean producing thin films with thickness of e.g. ⁇ 1 ⁇ m.
- Fig 1. illustrates an exemplary galvano -scanner set-up comprising two galvano-scanners employed in state of the art cold ablation coating/thin-film production and in machining and other work-related applications.
- the number of galvano-scanners directing the laser beam varies but is typically limited to one single galvano- scanner,
- Fig 2. illustrates ITO-coating on polycarbonate sheet (-100 mm x 30 mm) produced by employing a prior art vibrating mirror (galvo-scanner), in different ITO thin-film thicknesses (30 nm, 60 nm and 90 nm).
- Fig 3. illustrates the situation wherein prior art galvanometric scanner is employed in scanning laser beam resulting in heavy overlapping of pulses with repetition rate of 2 Mhz.
- Fig 4. illustrates a copper oxide and ATO coated product according to invention.
- Fig 5. illustrates one possible turbine scanner mirror employed in method according to the invention
- Fig 6. illustrates the movement of the ablating beam achieved by each mirror in the example of Fig 5, Fig 7. illustrates beam guidance through one possible rotating scanner to be employed according to the invention
- Fig 8. illustrates beam guidance through one possible rotating scanner to be employed according to the invention
- Fig 9. illustrates beam guidance through one possible rotating scanner to be employed according to the invention
- Fig 10. illustrates one embodiment of coated product according to the invention
- Fig 11. illustrates one embodiment of coated product according to the invention
- Fig 12. illustrates some embodiments of coated product according to the invention
- Fig 13. illustrates one embodiment of coated product according to the invention
- Fig 14. illustrates one embodiment of coated product according to the invention
- Fig 15. illustrates one embodiment of coated product according to the invention
- Fig 16. illustrates one embodiment of coated product according to the invention
- Fig 17. illustrates one embodiment of coated product according to the invention
- Fig 18. illustrates one embodiment of coated product according to the invention
- Fig 19. illustrates one embodiment of coated product according to the invention
- Fig 20 illustrates one embodiment of coated product according to the invention
- Fig 21 illustrates one embodiment of coated product according to the invention
- Fig 22. illustrates one embodiment of coated product according to the invention
- Fig 23. illustrates one embodiment of coated product having two different coating layers according to the invention
- Fig 24. illustrates two embodiments of coated product according to the invention
- Fig 25 illustrates several embodiments of coated product according to the invention
- Fig 26 illustrates several embodiments of coated product according to the invention
- Fig 27 illustrates several embodiments of coated product according to the invention
- Fig 28. illustrates one embodiment of coated product according to the invention
- Fig 29. illustrates several embodiments of coated product according to the invention
- Fig 30. illustrates one embodiment of coated product according to the invention
- Fig 31 illustrates several embodiments of coated product according to the invention
- Fig 32a illustrates an embodiment according to the invention, wherein target material ablated by scanning the laser beam with rotating scanner (turbine scanner).
- Fig 32b illustrates an exemplary part of target material of Figure 32a.
- Fig 32c. illustrates an exemplary ablated area of target material of Figure 32b.
- Fig 33a illustrates an exemplary way according to the invention to scan and ablate target material with turbine scanner (rotating scanner).
- Fig 34a illustrates plasma-related problems of known techniques.
- Fig 34b illustrates plasma-related problems of known techniques.
- RECTSRED SHEET (RULE 91 ) 8SA/EP coated comprises at least 0.2 dm 2 and the coating is carried by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner comprising at least one mirror for reflecting said laser beam.
- metal products is hereby meant but not limited to metal products such as for construction as whole, interior and decorative use, for machinery, vehicles such as cars, trucks, motorcycles and tractors, airplanes, ships, boats, trains, rails, tools, medical products, electronic devices and their casings, lightning, profiles, frames, component parts, process equipment, pipes and tanks for various industries such as chemical industries, power and energy industries, space ships, plain metal sheets, military solutions, ventilation, mining, screws, baking equipment and bread cutting tools and knives, water pipes, drills and their parts etc.
- the metal product must not be necessarily of metal as such. According to the invention, all the products comprising metal surfaces regardless whether their metal content is 100 % or 1% can be coated with now presented method.
- Ultra Short Laser Pulsed Deposition is often shortened USPLD.
- Said deposition is also called cold ablation, in which one of the characteristic features is that opposite for example to competing nanosecond lasers practically no heat transfer takes place from the exposed target area to the surroundings of this area, the laser pulse energies being still enough to exceed ablation threshold of target material.
- the pulse lengths are typically under 50 ps, such as 5 - 30 ps. i.e. ultra short, the cold ablation being reached with pico-second, femto-second and atto-second pulsed lasers.
- the material evaporated from the target by laser ablation is deposited onto a substrate that is held near room temperature. Still, the plasma temperature reaches 1.000.000 K on exposed target area.
- said uniform surface area comprises at least 0.5 dm 2 .
- said uniform surface area comprises at least 1.0 dm 2 .
- the invention accomplishes easily also the coating of products comprising uniform coated surface areas larger than 0.5 m 2 , such as 1 m 2 and over. As the process is especially beneficial for coating large surfaces with high quality plasma, it meets an underserved or unserved market of several different metal products.
- the intensity of laser pulses In industrial applications, it is important to achieve high efficiency of laser treatment. In cold ablation, the intensity of laser pulses must exceed a predetermined threshold value in order to facilitate the cold ablation phenomenon. This threshold value depends on the target material. In order to achieve high treatment efficiency and thus, industrial productivity, the repetition rate of the pulses should be high, such as 1 MHz, preferably over 2 MHz and more preferably over 5 MHz. As mentioned earlier, it is advantageous not to direct several pulses into same location of the target surface because this causes a cumulating effect in the target material, with particle deposition leading to bad quality plasma and thus, bad quality coatings and thin-films, undesirable eroding of the target material, possible target material heating etc.
- the velocity of the beam at the surface of the target should generally be more than 10 m/s to achieve efficient processing, and preferably more than 50 m/s and more preferably more than 100 m/s, even such speeds as 2000 m/s.
- the moment of inertia prevents achieving sufficiently high angular velocity of the mirror.
- the obtained laser beam at the target surface is therefore just a few m/s, figure 1 illustrating an example of such vibrating mirror, also called galvano-scanner.
- the present coating methods employing galvano-scanners can produce scanning widths at most 10 cm, preferably less, the present invention also accomplishes much more broader scanning widths such as 30 cm and even over 1 meter with simultaneously excellent coating properties and production rates.
- rotating optical scanner is here meant scanners comprising at least one mirror for reflecting laser beam. Such a scanner and its applications are described in patent application FI20065867. According to another embodiment of the invention, rotating optical scanner comprises at least three mirrors for reflecting laser beam.
- in the coating method employs a polygonal prism illustrated in figure 5.
- a polygonal prism has faces 21, 22, 23, 24, 25, 26, 27 and 28.
- Arrow 20 indicates that the prism can be rotated around its axis 19, which is the symmetry axis of the prism.
- Fig. 5 are mirror faces, advantageously oblique in order to achieve scanning line, arranged such that each face in its turn will change, by means of reflection, the direction of radiation incident on the mirror surface as the prism is rotated around its axis, the prism is applicable in the method according to an embodiment of the invention, in its radiation transmission line, as part of a rotating scanner, i.e. turbine scanner.
- Fig. 5 shows 8 faces, but there may be considerably more faces than that, even dozens or
- Fig. 5 also shows that the mirrors are at the same oblique angle to the axis, but especially in an embodiment including several mirrors, the said angle may vary in steps so that, by means of stepping within a certain range, a certain stepped shift on the work spot is achieved on the target, illustrated in Fig. 6, among other things.
- the different embodiments of invention are not to be limited into various turbine scanner mirror arrangements regarding for example the size, shape and number of laser beam reflecting mirrors.
- the structure of the turbine scanner includes at least 2 mirrors, preferably more than 6 mirrors, e.g. 8 mirrors (21 to 28) positioned symmetrically around the central axis 19.
- the mirrors direct the radiation, a laser beam, for instance, reflected from spot 29, accurately onto the line-shaped area, always starting from one and the same direction (Fig. 6).
- the mirror structure of the turbine scanner may be non-tilted (Fig. 7) or tilted at a desired angle, e.g. Figs. 8 and 9.
- the size and proportions of the turbine scanner can be freely chosen. In one advantageous embodiment of the coating method it has a perimeter of 30 cm, diameter of 12 cm, and a height of 5 cm.
- the mirrors 21 to 28 of the turbine scanner are preferably positioned at oblique angles to the central axis 19, because then the laser beam is easily conducted into the scanner system.
- the mirrors 21 to 28 can deviate from each other in such a manner that during one round of rotational movement there are scanned as many line- shaped areas (Fig. 6) 29 as there are mirrors 21 to 28.
- the surface to be coated can comprise whole or a part of the metal product surface.
- thin metal sheets for various uses as in construction or interior finishing the whole sheet is coated in order to gain the preferred effect or effects of coating.
- One such representative product according to invention comprising a copper thin sheet of 1200 mm x 1500 mm with thickness of 1 mm and coated first with CuO 2 and finished with a protective coating of transparent ATO (aluminumtitanoxide) is illustrated in figure 4.
- ATO aluminumtitanoxide
- CuO 2 gives the interior effect, ATO giving wear resistance as well as preventing the leakage of harmful copper compound into nature.
- laser ablation is carried out under vacuum of 10 "1 to 10 "12 atmospheres.
- High vacuum conditions require quite long pumping times, and thus prolonged production times of coatings. With certain high end-products this is not so big problem, but with for example commodity products especially comprising larger surfaces this definitely is.
- chemically inert coatings, tribological coatings, thermally resistant and/or thermally conductive coatings, electrically conductive coatings and possibly simultaneously excellent transparencies there simply aren't any coating methods available for said products, neither from technological point of view and/or from economical point of view.
- the laser ablation is carried out under vacuum of 10 "1 to 10 "4 atmospheres.
- excellent coating/thin-film properties can be achieved already in low atmospheres, leading to dramatically decreased processing times and enhanced industrial applicability.
- the coating in a manner wherein the distance between the target material and said uniform surface area to be coated is under 25 cm, preferably under 15 cm and most preferably under 10 cm. This accomplishes the development of coating chambers with drastically diminished volumes, making the overall price of coating production lines lower and decreasing further the time required for vacuum pumping.
- the ablated surface of said target material can be repeatedly ablated in order to produce defect-free coating.
- the target material wears unevenly in a manner that the affected area cannot be reused for ablation and must thus be either discarded or sent for regeneration after certain use.
- the problem has been tackled by developing different techniques for feeding constantly new, non-ablated target surface for coating purposes by for example moving the target material in x/y-axis or by rotating a cylinder-formed target material.
- the present invention accomplishes simultaneously excellent coating properties and production rates as well as use of target material in a way wherein the good quality plasma retains its quality throughout the use of substantially whole piece of target material.
- more than 50% of the single target material weight is consumed to production of good quality plasma according to the invention.
- good quality plasma is hear meant plasma for producing defect-free coatings and thin-films, the high quality of plasma plume being maintained at high pulse frequencies and deposition rates.
- the average surface roughness of produced coating on said uniform surface area is less than 100 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). More preferably, the average surface roughness is less than 30 nm.
- AFM Atomic Force Microscope
- average surface roughness is here meant the average deviation from the centre line average curve fitted by a proper procedure, such as those available in AFM or profilemeter. The surface roughness affects amongst the other the wear- and scratch-free properties, tribological properties as well as the transparency of coating on metal products coated according to the invention.
- the optical transmission of produced coating on said uniform surface area is no less than 88%, preferably no less than 90% and most preferably no less than 92%. It can even be higher than 98%.
- the optical transparency of a coating in metal products is especially important in uses wherein the original metallic look is preferred in addition to other advantages gained by the coating according to invention.
- produced coating on said uniform surface area contains less than one pinhole per 1 mm 2 , preferably less than one pinhole per 1 cm 2 and most preferably no pinholes at said uniform surface area.
- Pinhole is a hole going through or substantially through the coating. Pinholes provide a platform for erosion of the originally coated material for example by chemical or environmental factors. Single pinhole in for instance coating of chemical reactor or tubing, medical implant, space ship, different parts of different vehicles and their mechanical parts or further, in metallic construction or interior structure leads easily to dramatically lowered life-time of said product.
- said uniform surface area is coated in a manner wherein the first 50% of said coating on said uniform surface area does not contain any particles having a diameter exceeding 1000 nm, preferably 100 nm and most preferably 30 nm. If the early stages of the coating manufacturing process produce micrometer size particles, such particles can cause open corrosion pathways in the next layers of produced coating. Moreover, due to irregular shape of particles, it is extremely difficult to seal the surface underneath such particles. Additionally, such particles increase surface roughness substantially. The present method allows even here increased lifetime and lowered maintenance cost of different metal products.
- the metal product itself can comprise virtually whichever metal, metal compound such as metal alloys, oxides, carbides, nitrides or composite materials of these.
- said uniform surface area of metal product is coated with metal, metal oxide, metal nitride, metal carbide or mixtures of these.
- metals include aluminum, molybdenum, titan, zirconium, copper, yttrium, magnesium, zinc, chromium, silver, gold, cobalt, tin, nickel, tantalum, gallium, manganese, vanadium, platinum and virtually whichever metal.
- especially advantageous metal oxides are for example aluminum oxide and its different composites such as aluminumtitanoxide (ATO), indiumtinoxide (ITO), yttrium stabilized zirconiumoxide.
- ATO aluminumtitanoxide
- ITO indiumtinoxide
- yttrium stabilized zirconiumoxide yttrium stabilized zirconiumoxide
- the coating can possess self-cleaning properties. Such properties are highly desired in order to accomplish the use and decrease the maintenance cost of several metal products in both interior and exterior use.
- the metal oxide coatings can be produced by either ablating metal or metals in active oxygen atmosphere or by ablating oxide-materials. Even in latter possibility, it is possible to enhance the coating quality and/or production rate by conducting the ablation in oxygen atmosphere. The same applies for nitrides as well.
- said uniform surface area of metal product is coated with carbon material comprising over 90 atomic-% of carbon, with more than 70% of sp 3 -bonding.
- carbon material comprising over 90 atomic-% of carbon, with more than 70% of sp 3 -bonding.
- Such materials include for example amorphous diamond, nano-crystalline diamond or even pseudo-monocrystalline diamond.
- Various diamond coatings give the metal product excellent tribological, wear- and scratch- free properties but increase also the heat-conductivity and -resistance.
- said uniform surface area of metal product is coated with material comprising carbon, nitrogen and/or boron in different ratios.
- materials include boron carbon nitride, carbon nitride (both C 2 N 2 and C 3 N 4 ), boron nitride, boron carbide or phases of different hybridizations of B-N, B-C and C-N phases.
- Said materials are diamond-like materials having low densities, are extremely wear-resistant, and are generally chemically inert.
- carbon nitrides can be employed to protect metal products against corrosive conditions, as coatings for medical devices and implants, battery electrodes, humidity and gas sensors, semiconductor applications, protecting computer hard disks, in solar cells, tools, etc.
- organic polymer material include but are not limited to chitosan and its derivatives, polysiloxanes, and different organic polymers.
- polysiloxanes are especially advantageous for manufacturing products with relatively high wear- resistance and scratch-free properties with simultaneously excellent optical transparencies.
- said uniform surface area is coated with inorganic material.
- materials include but are not limited to for instance stone and ceramic derived materials.
- different metal sheets and 3D-metal structures were coated by ablating a target material comprising pink agate resulting in colored but opaque coating result.
- said uniform surface of the metal product is coated with only one single coating.
- said uniform surface of the metal product is coated with multilayered coating.
- Several coatings can be produced in for different reasons. One reason might be to enhance the adhesion of certain coatings to metal product surfaced by manufacturing a first set of coating having better adhesion to metal surface and possessing such properties that the following coating layer has better adhesion to said layer than to metal surface itself.
- the multilayered coating can possess several functions not achievable without said structure.
- the present invention accomplishes the production of several coatings in one single coating chamber or in the adjacent chambers.
- the present invention further accomplishes the production of composite coatings to metal product surface by ablating simultaneously one composite material target or two or more target materials comprising one or more substances.
- the thickness of said coating on uniform surface of metal product is between 20 nm and 20 ⁇ m, preferably between 100 nm and 5 ⁇ m.
- the coating thicknesses must not be limited to those, because the present invention accomplishes the preparation of molecular scale coatings on the other hand, very thick coatings such as 100 ⁇ m and over, on the other hand.
- the present invention further accomplishes the preparation of 3D-structures employing the metal component as a scaffold for growing said 3D-structure.
- a metal product comprising a certain surface being coated by laser ablation wherein the coated uniform surface area comprises at least 0.2 dm 2 and that the coating has been carried by employing ultra short pulsed laser deposition wherein pulsed laser beam is scanned with a rotating optical scanner comprising at least one mirror for reflecting said laser beam.
- said uniform surface area comprises at least 0.5 dm 2 . In a more preferable embodiment of the invention said uniform surface area comprises at least 1.0 dm 2 .
- the invention accomplishes easily also the products comprising uniform coated surface areas larger than 0.5 m 2 , such as 1 m 2 and over.
- the average surface roughness of produced coating on said uniform surface area is less than 100 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). More preferably, the average surface roughness is less than 30 nm.
- AFM Atomic Force Microscope
- average surface roughness is here meant the average deviation from the centre line average curve fitted by a proper procedure, such as those available in AFM or profilemeter. The surface roughness affects amongst the other the wear- and scratch-free properties, tribological properties as well as the transparency of coating on metal products coated according to the invention.
- the optical transmission of produced coating on said uniform surface area is no less than 88%, preferably no less than 90% and most preferably no less than 92%. In some cases the optical transmission can exceed 98%.
- the optical transparency of a coating in metal products is especially important in uses wherein the original metallic look is preferred in addition to other gained advantages by the coating according to the invention.
- said produced coating on said uniform surface area contains less than one pinhole per 1 mm 2 , preferably less than one pinhole per 1 cm 2 and most preferably no pinholes at said uniform surface area.
- said uniform surface area is coated in a manner wherein the first 50% of said coating on said uniform surface area does not contain any particles having a diameter exceeding 1000 nm, preferably 100 nm and most preferably 30 nm.
- the metal product according to the invention can comprise virtually whichever metal, metal compound such as metal alloys, oxides, carbides, nitrides or composite materials of these.
- metal product in this connection must be understand in a manner, wherein the product comprises a certain metal surface, which has been coated according to now invented method.
- the metal content of the product scaffold (uncoated product) can thus vary everywhere between 0.1 to 100%.
- said uniform surface area of metal product is coated with metal, metal oxide, metal nitride, metal carbide or mixtures of these.
- the possible metals were described earlier in description of now invented coating method.
- said uniform surface area of metal product is coated with carbon material comprising over 90 atomic-% of carbon, with more than 70% of sp 3 -bonding.
- carbon material comprising over 90 atomic-% of carbon, with more than 70% of sp 3 -bonding.
- said uniform surface area of metal product is coated with material comprising carbon, nitrogen and/or boron in different ratios.
- material comprising carbon, nitrogen and/or boron in different ratios.
- said uniform surface area of metal product is coated with organic polymer material. Such materials were described earlier in more detail in description of now invented coating method. According one embodiment of the invention said uniform surface area is coated with inorganic material. Such materials were described earlier in more detail in description of now invented coating method.
- said uniform surface of metal product is coated with multilayered coating. According to another preferred embodiment of the invention said uniform surface of metal product is coated with single coating layer.
- the thickness of said coating on uniform surface of metal product is between 20 nm and 20 ⁇ m, preferably between 100 nm and 5 ⁇ m.
- the invention accomplishes also coated metal products comprising one or several atomic layer coatings and thick coatings such as exceeding 100 ⁇ m, for example 1 mm.
- the present invention further accomplishes the 3D-structures prepared by employing the metal component as a scaffold for growing said 3D-structure.
- Figure 2 represents the ITO-coating on polycarbonate sheet (-100 mm x 30 mm) produced by employing a prior art optical scanner, namely vibrating mirror (galvo- scanner), in different ITO thin-film thicknesses (30 nm, 60 nm and 90 nm).
- a prior art optical scanner namely vibrating mirror (galvo- scanner)
- ITO thin-film thicknesses (30 nm, 60 nm and 90 nm.
- the coating parameters have been selected in order to demonstrate the uneven distribution of ablated material due to the nature of employed scanner. If selecting the parameters appropriately, the film quality can be enhanced, problems becoming invisible but not excluded. Example to demonstrate known art problems -laser technology
- galvanometric scanners are used to scan a laser beam with a typical maximum speed of about 2-3 m/s, in practice about 1 m/s. This means that even 40- 60 pulses are overlapping with a repetition rate of 2 MHz (Fig. 3).
- Plasma related quality problems are demonstrated in Figure 34a and 34b, which indicate plasma generation according to known techniques.
- a laser pulse D 1114 hits a target surface 1111.
- the depth h and the beam diameter d are of the same magnitude, as the heat of the pulse 1114 also heat the surface at the hit spot area, but also beneath the surface 1111 in deeper than the depth h.
- the structure experiences thermal shock and tensions are building, which while breaking, produce fragments illustrated F.
- the plasma may be in the example quite poor in quality, there appears to be also molecules and clusters of them indicate by the small dots 1115, as in the relation to the reference by the numeral 1115 for the nuclei or clusters of similar structures, as formed from the gases 1116 demonstrated in the Figure 34b.
- the letter "o"s demonstrate particles that can form and grow from the gases and/or via agglomeration.
- the released fragments may also grow by condensation and/or agglomeration, which is indicated by the curved arrows from the dots to Fs and from the os to the Fs.
- Curved arrows indicate also phase transitions from plasma 1113 to gas 1116 and further to particles 1115 and increased particles 1117 in size.
- the ablation plume in Figure 34b can comprise fragments F as well as particles built of the vapours and gases, because of the bad plasma production, the plasma is not continuous as plasma region, and thus variation of the quality may be met within a single pulse plume.
- the target surface 1111 in Figure 34b is not any more available for a further ablations, and the target is wasted, although there were some material available.
- Figure 32a demonstrates a target material ablated with pico-second -range pulsed laser employing rotating scanner with speed accomplishing the ablation of target
- Figure 32b shows enlarged picture of one part of the ablated material, clearly demonstrating the smooth and controlled ablation of material on both x- and y-axis and thus, generation of high quality, particle-free plasma and further, high quality thin-films and coatings.
- Figure 32c demonstrates one example of possible x- and y-dimensions of one single ablation spot achieved by one or few pulses.
- the invention accomplishes the ablation of material in a manner wherein the width of the ablated spot is always much bigger than the depth of the ablated spot area.
- the possible particles could now have a maximum size of the spot depth.
- the rotating scanner now accomplishes the production of good quality, particle free plasma with great production rate, with simultaneously large scanning width, especially beneficial for substrates comprising large surface areas to be coated.
- the figures 32a, 32b and 32c clearly demonstrate that opposite to present techniques, the already ablated target material area can be
- Figure 33a demonstrates an example wherein coating is carried out by employing a pico-second USPLD-laser and scanning the laser pulses with turbine scanner.
- the scanning speed is 30 m/s, the laser spot-width being 30 ⁇ m.
- RECTIFIED SHEET (RULE 91) ISA/EP in the range of 10 "4 to 10 "1 mbar.
- the nitrogen pressure varied in the range of 10 "4 to 10 "1 mbar.
- the employed scanner was a rotating mirror scanner accomplishing tunable velocity of the beam at the surface of the target between 1 m/s to 350 m/s.
- the employed repetition rates varied between 1 to 52 MHz, clearly demonstrating the importance of both the scanner and high repetition rates when producing high quality coatings in industrial manner.
- Deposited films were characterized by confocal microscope, FTIR and Raman spectroscopy, AFM, optical transmission measurements, ESEM and in some cases, electrical measurements (University of Kuopio, Finland; ORC, Tampere, Finland and Corelase Oy, Tampere Finland).
- the employed spot sizes varied between 20 to 80 ⁇ m.
- the wear tests were carried out by employing pin on disk-method (University of Kuopio, Finland), the tests being carried out at room temperature 22 C and 50 % (AD-coatings) or 25 % (others) relative humidity (without lubrication) with loads in the range 10-125 g using a hardened steel ball (AISI 420), 6 mm in diameter, as a pin.
- AD-coatings the rotation speed was 300-600 rpm and for lenses 1 rpm. All the coatings possessed excellent wear properties as well as adhesions.
- a piece of mirror finish aluminium foil comprising 250 mm x 400 mm was coated by ablating sintered carbon with pulse repetition rate of 4 MHz, pulse energy 5 ⁇ J, pulse length 20 ps and the distance between the target material and surface to be coated was 4 mm.
- the vacuum level was 10 "5 atmospheres during the coating process.
- the process resulted in a uniform sky-blue coloured, transparent coating.
- the coating thickness was 200 nm and the average surface roughness was determined to be 8 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area.
- AFM Atomic Force Microscope
- a thin sheet of copper comprising 300 mm x 400 mm was coated by ablating copper oxide with pulse repetition rate of 4 MHz, pulse energy 5 ⁇ J, pulse length 17 ps and the distance between the target material and surface to be coated was 10 mm.
- the vacuum level was about 10 "1 atmospheres during the coating process.
- the process resulted in a uniform pale-green coloured, non-transparent coating.
- the coating thickness was 5 ⁇ m and the average surface roughness was determined to be 50 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM).
- AFM Atomic Force Microscope
- Example 3 The copper oxide coated sheet of copper of example 2 was coated by ablating aluminumtitan oxide (ATO) with pulse repetition rate of 15 MHz, pulse energy 5 ⁇ j, pulse length 20 ps and the distance between the target material and surface to be coated was 6 cm.
- the vacuum level was 10 "3 atmospheres during the coating process.
- the process resulted in a uniform pale-green coloured product, wherein ATO did not change the colour of original non-transparent copper oxide coating.
- the coating thickness was 420 nm and the average surface roughness was determined to be 40 nm as scanned from an area of 1 ⁇ m 2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of ATO-coating.
- ATO aluminumtitan oxide
- the vacuum level was 10 "2 atmospheres during the coating process.
- the process resulted in transparent coating possessing coating thickness of 50 nm.
- the average surface roughness was determined to be 3 nm as scanned from an area of 1 ⁇ m 2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of titan oxide-coating.
- the optical transmission of TiO 2 -coating was determined to be better than 98%.
- the vacuum level was 10 "5 atmospheres during the coating process.
- the process resulted in metallic titanium coating possessing coating thickness of 280 nm.
- the average surface roughness was determined to be better than as scanned from an area of 1 ⁇ m 2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of titan oxide-coating.
- AFM Atomic Force Microscope
- a thin sheet of steel (thickness 1.5 mm) comprising 500 mm x 600 mm was coated by ablating tantalum with pulse repetition rate of 20 MHz, pulse energy 5 ⁇ J, pulse length 20 ps and the distance between the target material and surface to be coated was 10 mm.
- the vacuum level was 10 "4 atmospheres during the coating process.
- the process resulted in metallic tantalum coating possessing coating thickness of 320 nm.
- the average surface roughness was determined to better than 3 nm as scanned from an area of 1 ⁇ m with Atomic Force Microscope (AFM). No pinholes were found on any measured area of tantalum coating.
- AFM Atomic Force Microscope
- the processes resulted in pink agate coloured, opaque coatings comprising thicknesses between 100 nm and 550 nm.
- the average surface roughness was determined to be better than 10 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of agate coating.
- AFM Atomic Force Microscope
- the vacuum level was 10 "5 atmospheres during the coating process.
- the process resulted in partially opaque coating possessing coating thickness of 250 nm.
- the average surface roughness was determined to better than 10 nm as scanned from an area of 1 ⁇ m 2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of polymer coating.
- AFM Atomic Force Microscope
- a bone screw made of stainless steel was coated by ablating hot-pressed graphite with pulse repetition rate of 20 MHz, pulse energy 4 ⁇ J, pulse length 15 ps and the distance between the target material and surface to be coated was 1 mm.
- the vacuum level was 10 ⁇ 5 atmospheres during the coating process.
- the coating thickness was measured to 1 ⁇ m.
- the average surface roughness was determined to be 3 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of diamond coating.
- the carbon content was measured to be over 98% and the degree of sp 3 - bonding was approximately 86%.
- a bone screw made of stainless steel was coated by ablating hot-pressed C 3 N 4 H x with pulse repetition rate of 20 MHz, pulse energy 5 ⁇ J, pulse length 20 ps and the distance between the target material and surface to be coated was 10 mm.
- the vacuum level was 10 "5 atmospheres during the coating process.
- the coating thickness was measured to 1 ⁇ m.
- the average surface roughness was determined to be under 3 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of carbon nitride coating.
- AFM Atomic Force Microscope
- a thin sheet of copper comprising 300 mm x 400 mm was coated by ablating ITO in oxide form (90 wt.% In 2 O 3 ; 10 wt.% SnO 2 ) with pulse repetition rate of 30 MHz, pulse energy 5 ⁇ J, pulse length 20 ps and the distance between the target material and surface to be coated was 10.2 cm.
- Oxygen pressure varied in the range of 10 "4 to 10 "1 mbar.
- the process resulted in a uniform, transparent coating.
- the coating thickness was measured to 110 nm and the average surface roughness was determined to be under 2 nm as scanned from an area of 1 ⁇ m 2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of ITO coating.
- AFM Atomic Force Microscope
- a thin sheet of copper comprising 300 mm x 400 mm was coated by ablating ITO from a metal target (90 wt.% In; 10 wt.% Sn) with pulse repetition rate of 27 MHz, pulse energy 5 ⁇ J, pulse length 20 ps and the distance between the target material and surface to be coated was 10.2 cm.
- Oxygen pressure varied in the range of 10 "4 to 10 "1 mbar.
- the coating thickness was 40 nm and the average surface roughness was determined to be under 2 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of the ITO coating.
- AFM Atomic Force Microscope
- a metal crasp according to figure 14 was coated with chromium metal by ablating chromium with pulse repetition rate of 4 MHz, pulse energy 5 ⁇ J, pulse length 24 ps and the distance between the target material and surface to be coated was 15 cm.
- the vacuum level was 10 "4 atmospheres during the coating process.
- the process resulted in a uniform, metallic coating.
- the coating thickness was measured to 320 nm and the average surface roughness was determined to be under 2 nm as scanned from an area of 1 ⁇ m with Atomic Force Microscope (AFM). No pinholes were found on any measured area of chromium coating.
- AFM Atomic Force Microscope
- Example 14 A metal crasp according to example 13 was coated with carbon nitride by ablating sintered C 3 N 4 H x -material with pulse repetition rate of 6 MHz, pulse energy 5 ⁇ J, pulse length 24 ps and the distance between the target material and surface to be coated was 5 cm.
- the vacuum level was 10 "4 atmospheres during the coating process.
- the process resulted in a uniform, metallic coating.
- the carbon nitride coating thickness was measured to 390 nm and the average surface roughness was determined to be under 2 nm as scanned from an area of 1 ⁇ m 2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of carbon nitride (C 3 N 4 ) coating.
- AFM Atomic Force Microscope
- a metallic motor valve according to figure 17 was coated with carbon nitride by ablating sintered C 3 N 4 H x -material with pulse repetition rate of 4 MHz, pulse energy 5 ⁇ J, pulse length 24 ps and the distance between the target material and surface to be coated was 3 cm. Nitrogen pressure varied in the range of 10 "4 to 10 "1 mbar. The process resulted in a uniform C 3 N 4 -coating.
- the carbon nitride coating thickness was measured to 500 nm and the average surface roughness was determined to be under 2 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of carbon nitride (C 3 N 4 ) coating.
- AFM Atomic Force Microscope
- a metallic cylinder of vehicle motor according to figure 15 was coated with aluminum oxide by ablating aluminium oxide in active oxygen atmosphere with pulse repetition rate of 26 MHz, pulse energy 5 ⁇ J, pulse length 20 ps and the distance between the target material and surface to be coated was 2.5 cm.
- Oxygen pressure varied in the range of 10 "4 to 10 "1 mbar. The process resulted in a uniform, transparent coating.
- the aluminium oxide coating thickness was measured to 2.3 ⁇ m and the average surface roughness was determined to be under 2 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of aluminum oxide coating.
- AFM Atomic Force Microscope
- a metallic faucet according to figure 20 was coated with titan oxide by ablating titan metal in active oxygen atmosphere with pulse repetition rate of 9 MHz, pulse energy 5 ⁇ J, pulse length 20 ps and the distance between the target material and surface to be coated was 2.5 cm.
- Oxygen pressure varied in the range of 10 "4 to 10 "1 mbar.
- the process resulted in a uniform, transparent coating.
- the aluminium oxide coating thickness was measured to 25 nm and the average surface roughness was determined to be under 2 nm as scanned from an area of 1 ⁇ m2 with Atomic Force Microscope (AFM). No pinholes were found on any measured area of aluminum oxide coating.
- the coated object was subjected to organic dirt after which it was subjected to light and certain humidity. The coating possessed self-cleaning properties.
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Abstract
Description
Claims
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008555823A JP5237125B2 (en) | 2006-02-23 | 2007-02-23 | Coatings on metal substrates and coated products |
| US12/280,650 US20090017318A1 (en) | 2006-02-23 | 2007-02-23 | Coating on a metal substrate and a coated metal product |
| EP20070704876 EP1993779A2 (en) | 2006-02-23 | 2007-02-23 | Coating on a metal substrate and a coated metal product |
| KR1020087023134A KR101395393B1 (en) | 2006-02-23 | 2007-02-23 | Coating on a metal substrate and a coated metal product |
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| Application Number | Priority Date | Filing Date | Title |
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| FI20060182 | 2006-02-23 | ||
| FI20060181A FI20060181L (en) | 2006-02-23 | 2006-02-23 | The method produces surfaces and material using laser ablation |
| FI20060178A FI20060178A7 (en) | 2006-02-23 | 2006-02-23 | Coating method |
| FI20060181 | 2006-02-23 | ||
| FI20060177 | 2006-02-23 | ||
| FI20060182A FI20060182L (en) | 2005-07-13 | 2006-02-23 | Surface treatment technology and surface treatment equipment related to ablation technology |
| FI20060177A FI20060177L (en) | 2006-02-23 | 2006-02-23 | The method produces good quality surfaces and a product with a good quality surface |
| FI20060178 | 2006-02-23 | ||
| FI20060357 | 2006-04-12 | ||
| FI20060357A FI124239B (en) | 2006-02-23 | 2006-04-12 | An element having an electrically conductive structure to produce a heating and / or cooling effect by means of electric current |
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| WO2007096485A2 true WO2007096485A2 (en) | 2007-08-30 |
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| PCT/FI2007/050103 Ceased WO2007096482A2 (en) | 2006-02-23 | 2007-02-23 | Coating on a plastic substrate and a coated plastic product |
| PCT/FI2007/050102 Ceased WO2007096481A1 (en) | 2006-02-23 | 2007-02-23 | Coating on a glass substrate and a coated glass product |
| PCT/FI2007/050107 Ceased WO2007096486A1 (en) | 2006-02-23 | 2007-02-23 | Solar cell and an arrangement and a method for producing a solar cell |
| PCT/FI2007/050101 Ceased WO2007096480A1 (en) | 2006-02-23 | 2007-02-23 | Coating on a fiber substrate and a coated fiber product |
| PCT/FI2007/050104 Ceased WO2007096483A2 (en) | 2006-02-23 | 2007-02-23 | Coating on a stone or ceramic substrate and a coated stone or ceramic product |
| PCT/FI2007/050108 Ceased WO2007096487A1 (en) | 2006-02-23 | 2007-02-23 | Semiconductor and an arrangement and a method for producing a semiconductor |
| PCT/FI2007/050106 Ceased WO2007096485A2 (en) | 2006-02-23 | 2007-02-23 | Coating on a metal substrate and a coated metal product |
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| Application Number | Title | Priority Date | Filing Date |
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| PCT/FI2007/050103 Ceased WO2007096482A2 (en) | 2006-02-23 | 2007-02-23 | Coating on a plastic substrate and a coated plastic product |
| PCT/FI2007/050102 Ceased WO2007096481A1 (en) | 2006-02-23 | 2007-02-23 | Coating on a glass substrate and a coated glass product |
| PCT/FI2007/050107 Ceased WO2007096486A1 (en) | 2006-02-23 | 2007-02-23 | Solar cell and an arrangement and a method for producing a solar cell |
| PCT/FI2007/050101 Ceased WO2007096480A1 (en) | 2006-02-23 | 2007-02-23 | Coating on a fiber substrate and a coated fiber product |
| PCT/FI2007/050104 Ceased WO2007096483A2 (en) | 2006-02-23 | 2007-02-23 | Coating on a stone or ceramic substrate and a coated stone or ceramic product |
| PCT/FI2007/050108 Ceased WO2007096487A1 (en) | 2006-02-23 | 2007-02-23 | Semiconductor and an arrangement and a method for producing a semiconductor |
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| US (6) | US20100221489A1 (en) |
| EP (7) | EP1993779A2 (en) |
| JP (5) | JP5237125B2 (en) |
| KR (5) | KR101395513B1 (en) |
| CN (1) | CN104167464A (en) |
| BR (1) | BRPI0707014A2 (en) |
| CA (1) | CA2642867A1 (en) |
| WO (7) | WO2007096482A2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009299112A (en) * | 2008-06-11 | 2009-12-24 | National Institute Of Advanced Industrial & Technology | Gold nanoparticle and dispersion thereof, method for producing gold nanoparticle and nanoparticle production system |
| US9062384B2 (en) | 2012-02-23 | 2015-06-23 | Treadstone Technologies, Inc. | Corrosion resistant and electrically conductive surface of metal |
| DE102024125027A1 (en) | 2024-09-02 | 2026-03-05 | Schaeffler Technologies AG & Co. KG | Electrical connector |
Families Citing this family (66)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080160217A1 (en) * | 2005-02-23 | 2008-07-03 | Pintavision Oy | Pulsed Laser Deposition Method |
| EP1993779A2 (en) * | 2006-02-23 | 2008-11-26 | Picodeon Ltd OY | Coating on a metal substrate and a coated metal product |
| WO2007096476A2 (en) * | 2006-02-23 | 2007-08-30 | Picodeon Ltd Oy | Coating on a medical substrate and a coated medical product |
| US9005751B2 (en) * | 2007-09-28 | 2015-04-14 | Venex Co., Ltd | Fibers comprising nanodiamond and platinum nanocolloid, and bedding formed thereby |
| US7993733B2 (en) | 2008-02-20 | 2011-08-09 | Applied Materials, Inc. | Index modified coating on polymer substrate |
| US20090238993A1 (en) * | 2008-03-19 | 2009-09-24 | Applied Materials, Inc. | Surface preheating treatment of plastics substrate |
| US8057649B2 (en) | 2008-05-06 | 2011-11-15 | Applied Materials, Inc. | Microwave rotatable sputtering deposition |
| US8349156B2 (en) | 2008-05-14 | 2013-01-08 | Applied Materials, Inc. | Microwave-assisted rotatable PVD |
| JP5382502B2 (en) * | 2009-01-23 | 2014-01-08 | 富士電機株式会社 | Laser processing apparatus and processing method for thin film solar cell |
| US8663754B2 (en) * | 2009-03-09 | 2014-03-04 | Imra America, Inc. | Pulsed laser micro-deposition pattern formation |
| US8427395B2 (en) * | 2009-04-02 | 2013-04-23 | GM Global Technology Operations LLC | Full-windshield hud enhancement: pixelated field of view limited architecture |
| US9061375B2 (en) | 2009-12-23 | 2015-06-23 | General Electric Company | Methods for treating superalloy articles, and related repair processes |
| US20110284508A1 (en) * | 2010-05-21 | 2011-11-24 | Kabushiki Kaisha Toshiba | Welding system and welding method |
| US9217731B2 (en) | 2010-05-21 | 2015-12-22 | Kabushiki Kaisha Toshiba | Welding inspection method and apparatus thereof |
| JP5393598B2 (en) * | 2010-06-03 | 2014-01-22 | キヤノン株式会社 | Galvano device and laser processing device |
| TWI423464B (en) * | 2010-07-26 | 2014-01-11 | Sunshine Pv Corp | Annealing device for a thin-film solar cell and annealing method for the same |
| DE102010038554A1 (en) * | 2010-07-28 | 2012-02-02 | Osram Ag | Optoelectronic semiconductor component and associated manufacturing method |
| JP5720879B2 (en) * | 2010-12-08 | 2015-05-20 | 株式会社リコー | Electro-mechanical conversion film and manufacturing method thereof, electro-mechanical conversion element, liquid discharge head, and liquid discharge apparatus |
| JP2014509744A (en) * | 2011-03-25 | 2014-04-21 | イムラ アメリカ インコーポレイテッド | Surface enhanced Raman scattering apparatus and method |
| WO2013028623A1 (en) * | 2011-08-24 | 2013-02-28 | Applied Materials, Inc. | High speed laser scanning system for silicon solar cell fabrication |
| DE102011122510A1 (en) * | 2011-12-29 | 2013-07-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Coating of optical waveguides |
| US9036781B1 (en) * | 2012-10-12 | 2015-05-19 | The Boeing Company | Amplified backscatter x-ray inspection system |
| KR101406847B1 (en) * | 2012-11-26 | 2014-06-16 | 이영희 | Coating method of plastics or metal substrate and coated plastics or metal body obtained thereby |
| DE102013214493A1 (en) * | 2013-07-24 | 2015-01-29 | Rolls-Royce Deutschland Ltd & Co Kg | Laser application device and method for producing a component by means of direct laser application |
| US20150064483A1 (en) * | 2013-09-03 | 2015-03-05 | University Of Southern California | Metal deposition using organic vapor phase deposition (vpd) system |
| EP2910664B1 (en) * | 2014-02-21 | 2019-04-03 | Solmates B.V. | Device for depositing a material by pulsed laser deposition and a method for depositing a material with the device |
| US9988707B2 (en) | 2014-05-30 | 2018-06-05 | Ppg Industries Ohio, Inc. | Transparent conducting indium doped tin oxide |
| US11499230B2 (en) | 2014-08-18 | 2022-11-15 | Dynetics, Inc. | Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors |
| US10167555B2 (en) | 2014-08-18 | 2019-01-01 | Dynetics, Inc. | Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors |
| FI126659B (en) | 2014-09-24 | 2017-03-31 | Picodeon Ltd Oy | Procedure for coating separator films for Li batteries and coated separator film |
| US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
| US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
| SG10202002601QA (en) | 2014-10-17 | 2020-05-28 | Applied Materials Inc | Cmp pad construction with composite material properties using additive manufacturing processes |
| US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
| US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
| FI126769B (en) * | 2014-12-23 | 2017-05-15 | Picodeon Ltd Oy | Lighthouse type scanner with a rotating mirror and a circular target |
| CN113103145B (en) | 2015-10-30 | 2023-04-11 | 应用材料公司 | Apparatus and method for forming polishing article having desired zeta potential |
| US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
| RU2614330C1 (en) * | 2015-11-09 | 2017-03-24 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Алтайский государственный университет" | Method for producing thin nanodiamond film on glass substrate |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| JP6670497B2 (en) * | 2016-03-02 | 2020-03-25 | 国立大学法人京都工芸繊維大学 | Method and apparatus for manufacturing crystalline film and amorphous thin film |
| KR102170135B1 (en) * | 2017-06-20 | 2020-10-27 | 제너럴 퓨전 아이엔씨. | Vacuum compatible electrical insulator |
| KR101925470B1 (en) * | 2017-06-27 | 2018-12-05 | 주식회사 엘지화학 | Decoration element and preparing method thereof |
| US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
| WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | Abrasive delivery polishing pads and manufacturing methods thereof |
| RU2691432C1 (en) * | 2017-12-29 | 2019-06-13 | федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технический университет имени Н.Э. Баумана (национальный исследовательский университет)" (МГТУ им. Н.Э. Баумана) | Monocrystalline films of metals |
| WO2020050932A1 (en) | 2018-09-04 | 2020-03-12 | Applied Materials, Inc. | Formulations for advanced polishing pads |
| CN109530934B (en) * | 2018-12-20 | 2021-06-08 | 中国航空制造技术研究院 | A method for reducing the thermal influence of low-power scribing on workpiece and laser cutting head |
| US11530478B2 (en) | 2019-03-19 | 2022-12-20 | Applied Materials, Inc. | Method for forming a hydrophobic and icephobic coating |
| JP7303053B2 (en) * | 2019-07-17 | 2023-07-04 | ファナック株式会社 | Adjustment aid and laser welding equipment |
| CN110539074B (en) * | 2019-10-18 | 2021-01-22 | 天津工业大学 | High-efficient multi freedom ultrasonic vibration assists two-sided laser beam machining device |
| FR3105044B1 (en) * | 2019-12-20 | 2022-08-12 | Saint Gobain | SUBSTRATE TREATMENT DEVICE |
| JP7383540B2 (en) * | 2020-03-23 | 2023-11-20 | キオクシア株式会社 | Pattern forming method, semiconductor device manufacturing method, and pattern forming material |
| EP3943197A1 (en) | 2020-07-20 | 2022-01-26 | The Provost, Fellows, Scholars and other Members of Board of Trinity College Dublin | Jet deposition using laser-produced dry aerosol |
| DE102020123790A1 (en) | 2020-09-11 | 2022-03-17 | Trumpf Laser- Und Systemtechnik Gmbh | Process for cutting a workpiece |
| KR102355767B1 (en) * | 2020-11-30 | 2022-02-07 | 경상국립대학교산학협력단 | Method for producing carbon-doped gold nanoparticle using pulse laser irradiation |
| US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
| US12194197B2 (en) * | 2021-03-10 | 2025-01-14 | University Of Central Florida Research Foundation, Inc. | Boron carbon nitride (BCN) nanocoatings on central venous catheters inhibit bacterial colonization |
| US20230193455A1 (en) * | 2021-12-16 | 2023-06-22 | Applied Materials, Inc. | Vacuum chamber, vacuum system and method for vacuum processing |
| FR3133946B1 (en) * | 2022-03-23 | 2025-06-20 | St Microelectronics Res & Dev Ltd | Method of cutting substrate elements |
| US12104885B2 (en) * | 2022-03-29 | 2024-10-01 | United States Of America As Represented By The Secretary Of The Navy | Laser induced plasma targets for use as an electromagnetic testbed |
| CN116145067B (en) * | 2022-09-09 | 2025-04-01 | 中核四0四有限公司 | A method for strengthening tantalum metal surface microcrystals |
| CN116043172B (en) * | 2023-01-10 | 2024-07-09 | 北京工业大学 | A pulsed laser deposition device and a method for preparing gradient component material using the same |
| CN118497676B (en) * | 2024-05-10 | 2025-08-22 | 西南交通大学 | Preparation method of chromium-containing metal thin coating and its application |
| CN119457452B (en) * | 2024-11-08 | 2025-09-16 | 中国工程物理研究院材料研究所 | Antifriction and wear-resistant coupling layer for metal surface and preparation method thereof |
| CN120590664A (en) * | 2025-06-03 | 2025-09-05 | 广东东方管业股份有限公司 | High-pressure resistant tailings pipe material and preparation method thereof |
Family Cites Families (102)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3485546A (en) * | 1967-02-02 | 1969-12-23 | Xerox Corp | Field flattener scanning means |
| GB1462875A (en) * | 1973-05-16 | 1977-01-26 | Ciba Geigy Ag | Method of scanning a surface |
| US4099830A (en) * | 1976-12-15 | 1978-07-11 | A. J. Bingley Limited | Optical systems including polygonal mirrors rotatable about two axes |
| US4701592A (en) * | 1980-11-17 | 1987-10-20 | Rockwell International Corporation | Laser assisted deposition and annealing |
| US4394236A (en) * | 1982-02-16 | 1983-07-19 | Shatterproof Glass Corporation | Magnetron cathode sputtering apparatus |
| JPS5993482A (en) * | 1982-11-19 | 1984-05-29 | Fuji Photo Film Co Ltd | Destaticization method |
| IT1179293B (en) * | 1984-03-22 | 1987-09-16 | Gd Spa | DEVICE FOR DRILLING PERFORATIONS IN BAR-SHAPED ITEMS |
| JPS62174370A (en) * | 1986-01-28 | 1987-07-31 | Mitsubishi Electric Corp | Ceramic coating device |
| US5411797A (en) * | 1988-04-18 | 1995-05-02 | Board Of Regents, The University Of Texas System | Nanophase diamond films |
| US5098737A (en) | 1988-04-18 | 1992-03-24 | Board Of Regents The University Of Texas System | Amorphic diamond material produced by laser plasma deposition |
| JPH05804A (en) * | 1990-08-01 | 1993-01-08 | Sumitomo Electric Ind Ltd | Large area complex oxide superconducting thin film deposition system |
| US5173441A (en) * | 1991-02-08 | 1992-12-22 | Micron Technology, Inc. | Laser ablation deposition process for semiconductor manufacture |
| US5242706A (en) * | 1991-07-31 | 1993-09-07 | The United States Of America As Represented By The Secretary Of The Navy | Laser-deposited biocompatible films and methods and apparatuses for producing same |
| US5231047A (en) * | 1991-12-19 | 1993-07-27 | Energy Conversion Devices, Inc. | High quality photovoltaic semiconductor material and laser ablation method of fabrication same |
| JPH05331632A (en) * | 1992-06-01 | 1993-12-14 | Matsushita Electric Ind Co Ltd | Laser ablation device and thin film forming method |
| JP2895683B2 (en) * | 1992-07-30 | 1999-05-24 | 住友電気工業株式会社 | Oxide superconducting film production equipment |
| JP3255469B2 (en) * | 1992-11-30 | 2002-02-12 | 三菱電機株式会社 | Laser thin film forming equipment |
| US5733609A (en) * | 1993-06-01 | 1998-03-31 | Wang; Liang | Ceramic coatings synthesized by chemical reactions energized by laser plasmas |
| JPH0770740A (en) * | 1993-09-01 | 1995-03-14 | Hitachi Zosen Corp | Method for forming conductive thin film |
| US5510163A (en) * | 1994-05-18 | 1996-04-23 | National Research Council Of Canada | Optical storage media having visible logos |
| JPH08225929A (en) * | 1995-02-23 | 1996-09-03 | Matsushita Electric Ind Co Ltd | Thin film forming method using laser ablation and laser ablation apparatus |
| JP2915321B2 (en) * | 1995-05-16 | 1999-07-05 | キヤノン株式会社 | Method for manufacturing series-connected photovoltaic element array |
| US5872051A (en) * | 1995-08-02 | 1999-02-16 | International Business Machines Corporation | Process for transferring material to semiconductor chip conductive pads using a transfer substrate |
| GB9605512D0 (en) * | 1996-03-15 | 1996-05-15 | British Nuclear Fuels Plc | Laser machining |
| USH1933H1 (en) * | 1996-04-08 | 2001-01-02 | The United States Of America As Represented By The Secretary Of The Air Force | Magnetron sputter-pulsed laser deposition system and method |
| JPH1032166A (en) * | 1996-07-16 | 1998-02-03 | Toyota Motor Corp | Method of forming crystalline thin film by laser ablation method |
| US5736709A (en) * | 1996-08-12 | 1998-04-07 | Armco Inc. | Descaling metal with a laser having a very short pulse width and high average power |
| JPH1087395A (en) * | 1996-09-09 | 1998-04-07 | Kagaku Gijutsu Shinko Jigyodan | Method for producing high quality diamond-like carbon thin film |
| US6368424B1 (en) * | 1997-01-24 | 2002-04-09 | Nippon Steel Corporation | Grain-oriented electrical steel sheets having excellent magnetic characteristics, its manufacturing method and its manufacturing device |
| NL1006827C2 (en) * | 1997-08-22 | 1999-02-23 | Free Energy Europ B V | A method of manufacturing solar cells, more particularly thin film solar cells and solar cells obtained by such a method. |
| AUPO912797A0 (en) * | 1997-09-11 | 1997-10-02 | Australian National University, The | Ultrafast laser deposition method |
| JPH11189472A (en) * | 1997-12-25 | 1999-07-13 | Hamamatsu Photonics Kk | Synthesis of carbon nitride |
| JPH11246965A (en) * | 1998-03-03 | 1999-09-14 | Sharp Corp | Method of forming thin film by laser vapor deposition method and laser vapor deposition apparatus used for the method |
| US6090207A (en) * | 1998-04-02 | 2000-07-18 | Neocera, Inc. | Translational target assembly for thin film deposition system |
| US6120857A (en) * | 1998-05-18 | 2000-09-19 | The Regents Of The University Of California | Low work function surface layers produced by laser ablation using short-wavelength photons |
| US6014397A (en) * | 1998-06-02 | 2000-01-11 | Cymer, Inc. | Laser chamber incorporating ceramic insulators coated with dielectric material |
| WO2000012775A1 (en) * | 1998-08-26 | 2000-03-09 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for coating substrates in a vacuum |
| JP3704258B2 (en) | 1998-09-10 | 2005-10-12 | 松下電器産業株式会社 | Thin film formation method |
| WO2000022184A1 (en) * | 1998-10-12 | 2000-04-20 | The Regents Of The University Of California | Laser deposition of thin films |
| JP2963901B1 (en) * | 1998-10-16 | 1999-10-18 | 株式会社東芝 | Manufacturing method of superconducting thin film |
| KR20000026066A (en) * | 1998-10-17 | 2000-05-06 | 윤종용 | Rotation reflective mirror and printing device using thereof |
| JP4480809B2 (en) * | 1999-03-30 | 2010-06-16 | Hoya株式会社 | Indium oxide thin film and manufacturing method thereof |
| US6876003B1 (en) | 1999-04-15 | 2005-04-05 | Sumitomo Electric Industries, Ltd. | Semiconductor light-emitting device, method of manufacturing transparent conductor film and method of manufacturing compound semiconductor light-emitting device |
| JP4397511B2 (en) * | 1999-07-16 | 2010-01-13 | Hoya株式会社 | Low resistance ITO thin film and manufacturing method thereof |
| US6428762B1 (en) * | 1999-07-27 | 2002-08-06 | William Marsh Rice University | Powder synthesis and characterization of amorphous carbon nitride, a-C3N4 |
| US6548370B1 (en) * | 1999-08-18 | 2003-04-15 | Semiconductor Energy Laboratory Co., Ltd. | Method of crystallizing a semiconductor layer by applying laser irradiation that vary in energy to its top and bottom surfaces |
| JP2001059162A (en) * | 1999-08-24 | 2001-03-06 | Sharp Corp | Method of forming Si thin film by laser vapor deposition method and photoelectric conversion element including the thin film as a component |
| US6472295B1 (en) * | 1999-08-27 | 2002-10-29 | Jmar Research, Inc. | Method and apparatus for laser ablation of a target material |
| JP2001140059A (en) * | 1999-11-12 | 2001-05-22 | Natl Research Inst For Metals Ministry Of Education Culture Sports Science & Technology | Laser deposition method |
| US6281471B1 (en) * | 1999-12-28 | 2001-08-28 | Gsi Lumonics, Inc. | Energy-efficient, laser-based method and system for processing target material |
| US7671295B2 (en) * | 2000-01-10 | 2010-03-02 | Electro Scientific Industries, Inc. | Processing a memory link with a set of at least two laser pulses |
| US6552301B2 (en) * | 2000-01-25 | 2003-04-22 | Peter R. Herman | Burst-ultrafast laser machining method |
| JP3398638B2 (en) * | 2000-01-28 | 2003-04-21 | 科学技術振興事業団 | LIGHT EMITTING DIODE, SEMICONDUCTOR LASER AND METHOD FOR MANUFACTURING THE SAME |
| JP2001254170A (en) * | 2000-03-09 | 2001-09-18 | Komatsu Ltd | Apparatus and method for forming amorphous carbon film |
| JP3531865B2 (en) * | 2000-07-06 | 2004-05-31 | 独立行政法人 科学技術振興機構 | Ultra-flat transparent conductive film and manufacturing method thereof |
| ES2319384T3 (en) * | 2000-09-26 | 2009-05-07 | Bridgestone Corporation | TIRE THAT INCLUDES A RUBBER-BASED COMPOSITE MATERIAL. |
| US6656539B1 (en) * | 2000-11-13 | 2003-12-02 | International Business Machines Corporation | Method and apparatus for performing laser CVD |
| KR100384892B1 (en) * | 2000-12-01 | 2003-05-22 | 한국전자통신연구원 | Fabrication method of erbium-doped silicon nano-dots |
| US6645843B2 (en) * | 2001-01-19 | 2003-11-11 | The United States Of America As Represented By The Secretary Of The Navy | Pulsed laser deposition of transparent conducting thin films on flexible substrates |
| JP2003062921A (en) * | 2001-06-11 | 2003-03-05 | Bridgestone Corp | Transparent composite film |
| JP4706010B2 (en) * | 2001-09-04 | 2011-06-22 | 独立行政法人産業技術総合研究所 | Method for forming diamond-like carbon thin film |
| KR100466825B1 (en) * | 2001-10-22 | 2005-01-24 | 학교법인조선대학교 | Fabricating Technology for Thin Film Deposition system using pulsed Laser |
| US6720519B2 (en) * | 2001-11-30 | 2004-04-13 | Matsushita Electric Industrial Co., Ltd. | System and method of laser drilling |
| US20030145681A1 (en) * | 2002-02-05 | 2003-08-07 | El-Shall M. Samy | Copper and/or zinc alloy nanopowders made by laser vaporization and condensation |
| AU2003222237A1 (en) * | 2002-03-01 | 2003-09-16 | Board Of Control Of Michigan Technological University | Method and apparatus for induction heating of thin films |
| JP4155031B2 (en) * | 2002-03-15 | 2008-09-24 | 株式会社豊田中央研究所 | Substrate surface modification method, modified substrate, and apparatus |
| DE10212639A1 (en) * | 2002-03-21 | 2003-10-16 | Siemens Ag | Device and method for laser structuring functional polymers and uses |
| US6933051B2 (en) * | 2002-08-17 | 2005-08-23 | 3M Innovative Properties Company | Flexible electrically conductive film |
| KR100565051B1 (en) * | 2002-09-16 | 2006-03-30 | 삼성전자주식회사 | Optical scanning unit and electrophotographic image forming apparatus employing the same |
| US6969897B2 (en) * | 2002-12-10 | 2005-11-29 | Kim Ii John | Optoelectronic devices employing fibers for light collection and emission |
| US20040121146A1 (en) * | 2002-12-20 | 2004-06-24 | Xiao-Ming He | Composite barrier films and method |
| JP4276444B2 (en) * | 2003-01-16 | 2009-06-10 | Tdk株式会社 | Iron silicide film manufacturing method and apparatus, photoelectric conversion element manufacturing method and apparatus, and photoelectric conversion apparatus manufacturing method and apparatus |
| US7397592B2 (en) | 2003-04-21 | 2008-07-08 | Semiconductor Energy Laboratory Co., Ltd. | Beam irradiation apparatus, beam irradiation method, and method for manufacturing a thin film transistor |
| JP4515136B2 (en) * | 2003-04-21 | 2010-07-28 | 株式会社半導体エネルギー研究所 | Laser beam irradiation apparatus and method for manufacturing thin film transistor |
| US7351241B2 (en) * | 2003-06-02 | 2008-04-01 | Carl Zeiss Meditec Ag | Method and apparatus for precision working of material |
| US20050005846A1 (en) | 2003-06-23 | 2005-01-13 | Venkat Selvamanickam | High throughput continuous pulsed laser deposition process and apparatus |
| US7115514B2 (en) * | 2003-10-02 | 2006-10-03 | Raydiance, Inc. | Semiconductor manufacturing using optical ablation |
| DE10343080A1 (en) * | 2003-09-17 | 2005-04-21 | Raylase Ag | Device for steering and focusing a laser beam in the direction of a target object comprises a focusing unit for focusing the laser beam, a rotating X-mirror, a rotating Y-mirror, and a stationary field mirror for receiving the deviated beam |
| JP4120873B2 (en) * | 2003-10-24 | 2008-07-16 | 株式会社豊田中央研究所 | Bonding method and bonding pretreatment method |
| US20050101160A1 (en) * | 2003-11-12 | 2005-05-12 | Diwakar Garg | Silicon thin film transistors and solar cells on plastic substrates |
| US6972431B2 (en) * | 2003-11-26 | 2005-12-06 | Trustees Of Princeton University | Multilayer organic photodetectors with improved performance |
| JP5215658B2 (en) * | 2004-03-24 | 2013-06-19 | ハー ツェー シュタルク インコーポレイテッド | Alpha tantalum film and microelectronic device with new microstructure controlled |
| JP2005307302A (en) * | 2004-04-23 | 2005-11-04 | Canon Inc | Deposition method |
| US7879410B2 (en) * | 2004-06-09 | 2011-02-01 | Imra America, Inc. | Method of fabricating an electrochemical device using ultrafast pulsed laser deposition |
| JP2006009072A (en) * | 2004-06-24 | 2006-01-12 | Toyota Central Res & Dev Lab Inc | Substrate surface modification method and substrate surface modification apparatus |
| US20060088984A1 (en) * | 2004-10-21 | 2006-04-27 | Intel Corporation | Laser ablation method |
| US7893384B2 (en) * | 2004-12-07 | 2011-02-22 | Chosen Technologies, Inc. | Systems and methods for laser material manipulation |
| US7642205B2 (en) * | 2005-04-08 | 2010-01-05 | Mattson Technology, Inc. | Rapid thermal processing using energy transfer layers |
| US7386019B2 (en) * | 2005-05-23 | 2008-06-10 | Time-Bandwidth Products Ag | Light pulse generating apparatus and method |
| EP1993779A2 (en) * | 2006-02-23 | 2008-11-26 | Picodeon Ltd OY | Coating on a metal substrate and a coated metal product |
| WO2007096476A2 (en) * | 2006-02-23 | 2007-08-30 | Picodeon Ltd Oy | Coating on a medical substrate and a coated medical product |
| FI20060177L (en) * | 2006-02-23 | 2007-08-24 | Picodeon Ltd Oy | The method produces good quality surfaces and a product with a good quality surface |
| FI20060181L (en) * | 2006-02-23 | 2007-08-24 | Picodeon Ltd Oy | The method produces surfaces and material using laser ablation |
| US7608308B2 (en) * | 2006-04-17 | 2009-10-27 | Imra America, Inc. | P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates |
| WO2007149460A2 (en) * | 2006-06-20 | 2007-12-27 | Chism William W | Method of direct coulomb explosion in laser ablation of semiconductor structures |
| US7795154B2 (en) * | 2006-08-25 | 2010-09-14 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device that uses laser ablation, to selectively remove one or more material layers |
| US20080187684A1 (en) * | 2007-02-07 | 2008-08-07 | Imra America, Inc. | Method for depositing crystalline titania nanoparticles and films |
| US8828506B2 (en) * | 2007-02-23 | 2014-09-09 | Picodeon Ltd Oy | Arrangement |
| US8541066B2 (en) * | 2007-11-26 | 2013-09-24 | University Of North Carolina At Charlotte | Light-induced directed self-assembly of periodic sub-wavelength nanostructures |
| WO2009085772A2 (en) * | 2007-12-20 | 2009-07-09 | The Regents Of The University Of California | Laser-assisted nanomaterial deposition, nanomanufacturing, in situ monitoring and associated apparatus |
| TWI431130B (en) * | 2008-12-19 | 2014-03-21 | Applied Materials Inc | Copper black copper iron ore transparent P-type semiconductor manufacturing and application method |
| WO2011000357A2 (en) * | 2009-06-30 | 2011-01-06 | Vascotec Gmbh | Method and device for the deposition of thin layers, particularly for producing multi-layer coatings, nanolayers, nanostructures and nanocomposites |
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2007
- 2007-02-23 EP EP20070704876 patent/EP1993779A2/en not_active Withdrawn
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2008
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2009299112A (en) * | 2008-06-11 | 2009-12-24 | National Institute Of Advanced Industrial & Technology | Gold nanoparticle and dispersion thereof, method for producing gold nanoparticle and nanoparticle production system |
| US9062384B2 (en) | 2012-02-23 | 2015-06-23 | Treadstone Technologies, Inc. | Corrosion resistant and electrically conductive surface of metal |
| DE102024125027A1 (en) | 2024-09-02 | 2026-03-05 | Schaeffler Technologies AG & Co. KG | Electrical connector |
| WO2026046463A1 (en) | 2024-09-02 | 2026-03-05 | Schaeffler Technologies AG & Co. KG | Electrical connector |
| DE102024125027B4 (en) | 2024-09-02 | 2026-03-12 | Schaeffler Technologies AG & Co. KG | Electrical connector |
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