WO2007118810A3 - Vorrichtung und verfahren zur galvanischen beschichtung - Google Patents

Vorrichtung und verfahren zur galvanischen beschichtung Download PDF

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Publication number
WO2007118810A3
WO2007118810A3 PCT/EP2007/053401 EP2007053401W WO2007118810A3 WO 2007118810 A3 WO2007118810 A3 WO 2007118810A3 EP 2007053401 W EP2007053401 W EP 2007053401W WO 2007118810 A3 WO2007118810 A3 WO 2007118810A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
electrically conductive
electroplating
cathode
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2007/053401
Other languages
English (en)
French (fr)
Other versions
WO2007118810A2 (de
Inventor
Rene Lochtman
Juergen Kaczun
Norbert Schneider
Juergen Pfister
Gert Pohl
Norbert Wagner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to EP07727869A priority Critical patent/EP2010700B1/de
Priority to US12/297,330 priority patent/US20090178930A1/en
Priority to JP2009505839A priority patent/JP2009534525A/ja
Priority to DE502007002680T priority patent/DE502007002680D1/de
Priority to CA002647969A priority patent/CA2647969A1/en
Priority to BRPI0710662-9A priority patent/BRPI0710662A2/pt
Application filed by BASF SE filed Critical BASF SE
Priority to AT07727869T priority patent/ATE455879T1/de
Publication of WO2007118810A2 publication Critical patent/WO2007118810A2/de
Publication of WO2007118810A3 publication Critical patent/WO2007118810A3/de
Priority to IL194505A priority patent/IL194505A0/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02—Tanks; Installations therefor
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/005—Contacting devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/06—Suspending or supporting devices for articles to be coated
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • C25D17/28—Apparatus for electrolytic coating of small objects in bulk with means for moving the objects individually through the apparatus during treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated
    • C25D7/06—Wires; Strips; Foils
    • C25D7/0614—Strips or foils
    • C25D7/0657—Conducting rolls

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

Die Erfindung betrifft eine Vorrichtung zur galvanischen Beschichtung mindestens eines elektrisch leitfähigen Substrates oder einer strukturierten oder vollflächigen elektrisch leitfähigen Oberfläche auf einem nicht leitfähigen Substrat, welche mindestens ein Bad, eine Anode und eine Kathode umfasst, wobei das Bad eine mindestens ein Metallsalz enthaltende Elektrolytlösung enthält, aus der Metallionen an elektrisch leitenden Oberflächen des Substrates unter Bildung einer Metallschicht abgeschieden werden, während die Kathode mit der zu beschichtenden Oberfläche des Substrates in Kontakt gebracht ist und das Substrat durch das Bad gefördert wird. Die Kathode umfasst mindestens zwei auf jeweils einer Welle (1, 5, 14) rotierbar gelagerte Scheiben (2, 4, 10), wobei die Scheiben (2, 4, 10) ineinander kämmen. Weiterhin betrifft die Erfindüng ein Verfahren zur galvanischen Beschichtung mindestens eines Substrates, welches in einer erfindungsgemäßen Vorrichtung durchgeführt wird. Schließlich betrifft die Erfindung auch eine Verwendung der erfindungsgemäßen Vorrichtung zur galvanischen Beschichtung von elektrisch leitenden Strukturen auf einem nicht elektrisch leitenden Träger.
PCT/EP2007/053401 2006-04-18 2007-04-05 Vorrichtung und verfahren zur galvanischen beschichtung Ceased WO2007118810A2 (de)

Priority Applications (8)

Application Number Priority Date Filing Date Title
US12/297,330 US20090178930A1 (en) 2006-04-18 2007-04-05 Electroplating device and method
JP2009505839A JP2009534525A (ja) 2006-04-18 2007-04-05 電解コーティング装置及び電解コーティング方法
DE502007002680T DE502007002680D1 (de) 2006-04-18 2007-04-05 Vorrichtung und verfahren zur galvanischen beschichtung
CA002647969A CA2647969A1 (en) 2006-04-18 2007-04-05 Electroplating device and method
BRPI0710662-9A BRPI0710662A2 (pt) 2006-04-18 2007-04-05 dispositivo e método para o revestimento eletrolìtico de pelo menos um susbtrato eletricamente condutivo ou uma superfìcie eletricamente condutiva, e, uso do dispositivo
EP07727869A EP2010700B1 (de) 2006-04-18 2007-04-05 Vorrichtung und verfahren zur galvanischen beschichtung
AT07727869T ATE455879T1 (de) 2006-04-18 2007-04-05 Vorrichtung und verfahren zur galvanischen beschichtung
IL194505A IL194505A0 (en) 2006-04-18 2008-10-02 Electroplating device and method

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06112724.7 2006-04-18
EP06112724 2006-04-18

Publications (2)

Publication Number Publication Date
WO2007118810A2 WO2007118810A2 (de) 2007-10-25
WO2007118810A3 true WO2007118810A3 (de) 2008-05-22

Family

ID=38236501

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/053401 Ceased WO2007118810A2 (de) 2006-04-18 2007-04-05 Vorrichtung und verfahren zur galvanischen beschichtung

Country Status (13)

Country Link
US (1) US20090178930A1 (de)
EP (1) EP2010700B1 (de)
JP (1) JP2009534525A (de)
KR (1) KR20080110658A (de)
CN (1) CN101426962A (de)
AT (1) ATE455879T1 (de)
BR (1) BRPI0710662A2 (de)
CA (1) CA2647969A1 (de)
DE (1) DE502007002680D1 (de)
IL (1) IL194505A0 (de)
RU (1) RU2008145105A (de)
TW (1) TW200813263A (de)
WO (1) WO2007118810A2 (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200829726A (en) * 2006-11-28 2008-07-16 Basf Ag Method and device for electrolytic coating
WO2009112573A2 (de) * 2008-03-13 2009-09-17 Basf Se Verfahren und dispersion zum aufbringen einer metallschicht auf einem substrat sowie metallisierbare thermoplastische formmasse
DE102010000211A1 (de) * 2010-01-26 2011-07-28 Atotech Deutschland GmbH, 90537 Vorrichtung zum Transport von plattenförmigen Substraten in einer Anlage zur chemischen und/oder elektrochemischen Behandlung
KR101103450B1 (ko) * 2010-07-27 2012-01-09 주식회사 케이씨텍 기판 도금 장치
EP2799939A1 (de) * 2013-04-30 2014-11-05 Universo S.A. Träger für die Behandlung von mikromechanischen Bauteilen
CN103343371A (zh) * 2013-07-09 2013-10-09 中国铝业股份有限公司 一种聚合物薄膜的连续电沉积方法
JP5967034B2 (ja) * 2013-08-20 2016-08-10 トヨタ自動車株式会社 金属被膜の成膜装置および成膜方法
US9847576B2 (en) * 2013-11-11 2017-12-19 Nxp B.V. UHF-RFID antenna for point of sales application
JP6197813B2 (ja) * 2015-03-11 2017-09-20 トヨタ自動車株式会社 金属皮膜の成膜装置およびその成膜方法
RU2643050C2 (ru) * 2015-11-09 2018-01-30 Фарит Фазитович Мухамедьянов Кислотный поверхностно-активный состав для обработки призабойной зоны нефтяных и газовых скважин
EP3884084A4 (de) * 2018-11-22 2022-08-24 A-Plas Genel Otomotiv Mamulleri Sanayi Ve Ticaret Anonim Sirketi Plattierbügel zum erzielen einer homogenen plattierung
CN114790565B (zh) * 2022-05-26 2024-06-18 江苏启威星装备科技有限公司 导电装置及水平电镀设备

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1437003A (en) * 1921-10-08 1922-11-28 American Nickeloid Company Electroplating apparatus and process
DE10234705A1 (de) * 2001-10-25 2003-05-28 Infineon Technologies Ag Galvanisiereinrichtung und Galvanisiersystem zum Beschichten von bereits leitfähig ausgebildeten Strukturen
DE10342512B3 (de) * 2003-09-12 2004-10-28 Atotech Deutschland Gmbh Vorrichtung und Verfahren zum elektrolytischen Behandeln von elektrisch gegeneinander isolierten, elektrisch leitfähigen Strukturen auf Oberflächen von bandförmigem Behandlungsgut

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003038158A2 (de) * 2001-10-25 2003-05-08 Infineon Technologies Ag Galvanisiereinrichtung und galvanisiersystem zum beschichten von bereits leitfähig ausgebildeten strukturen

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1437003A (en) * 1921-10-08 1922-11-28 American Nickeloid Company Electroplating apparatus and process
DE10234705A1 (de) * 2001-10-25 2003-05-28 Infineon Technologies Ag Galvanisiereinrichtung und Galvanisiersystem zum Beschichten von bereits leitfähig ausgebildeten Strukturen
DE10342512B3 (de) * 2003-09-12 2004-10-28 Atotech Deutschland Gmbh Vorrichtung und Verfahren zum elektrolytischen Behandeln von elektrisch gegeneinander isolierten, elektrisch leitfähigen Strukturen auf Oberflächen von bandförmigem Behandlungsgut

Also Published As

Publication number Publication date
IL194505A0 (en) 2009-08-03
CN101426962A (zh) 2009-05-06
EP2010700B1 (de) 2010-01-20
KR20080110658A (ko) 2008-12-18
JP2009534525A (ja) 2009-09-24
ATE455879T1 (de) 2010-02-15
DE502007002680D1 (de) 2010-03-11
TW200813263A (en) 2008-03-16
US20090178930A1 (en) 2009-07-16
WO2007118810A2 (de) 2007-10-25
BRPI0710662A2 (pt) 2011-08-16
RU2008145105A (ru) 2010-05-27
CA2647969A1 (en) 2007-10-25
EP2010700A2 (de) 2009-01-07

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