WO2008012094A3 - Ionenquelle zur erzeugung negativ geladener ionen - Google Patents

Ionenquelle zur erzeugung negativ geladener ionen Download PDF

Info

Publication number
WO2008012094A3
WO2008012094A3 PCT/EP2007/006645 EP2007006645W WO2008012094A3 WO 2008012094 A3 WO2008012094 A3 WO 2008012094A3 EP 2007006645 W EP2007006645 W EP 2007006645W WO 2008012094 A3 WO2008012094 A3 WO 2008012094A3
Authority
WO
WIPO (PCT)
Prior art keywords
ion source
combustion chamber
negatively charged
tubular section
charged ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/EP2007/006645
Other languages
English (en)
French (fr)
Other versions
WO2008012094A2 (de
Inventor
Jens Peters
Hans-Hinrich Sahling
Ingo Hansen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Deutsches Elektronen Synchrotron DESY
Original Assignee
Deutsches Elektronen Synchrotron DESY
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Deutsches Elektronen Synchrotron DESY filed Critical Deutsches Elektronen Synchrotron DESY
Priority to EP07786360A priority Critical patent/EP2047497A2/de
Priority to US12/374,789 priority patent/US7947965B2/en
Publication of WO2008012094A2 publication Critical patent/WO2008012094A2/de
Anticipated expiration legal-status Critical
Publication of WO2008012094A3 publication Critical patent/WO2008012094A3/de
Ceased legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/028—Negative ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0213—Avoiding deleterious effects due to interactions between particles and tube elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0815—Methods of ionisation
    • H01J2237/0817—Microwaves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

Dargestellt und beschrieben ist eine Ionenquelle zur Erzeugung negativ geladener Ionen mit einer Abschlussplatte, in der eine Austrittsöffnung vorgesehen ist, mit einer einen Brennraum umgebenden Wandung, wobei die Wandung einen rohrförmigen Abschnitt, der sich von der Austrittsöffnung erstreckt und aus einem Isolatormaterial gebildet ist, und eine Rückwand aufweist, wobei die Rückwand an dem Ende des rohrförmigen Abschnitts angeordnet ist, das der Austrittsöffnung gegenüber liegt, und den Brennraum abschließt, mit einer Koppelspule, deren Wicklungen um den rohrförmigen Abschnitt der Wandung außerhalb des Brennraumes angeordnet sind, und mit einem Filterfeldmagneten. Die Aufgabe, eine Ionenquelle zur Erzeugung negativ geladener Ionen bereitzustellen, die eine erhöhte Ausbeute liefert und geeignet ist, auch aus lediglich gasförmig verfügbaren Stoffen Ionen zur erzeugen, wird dadurch gelöst, dass die Rückwand aus einem Isolatormaterial gebildet ist und eine Einlassöffnung aufweist und dass der Filterfeldmagnet auf der von dem Brennraum abgewandten Seite des rohrförmigen Abschnitts angeordnet ist.
PCT/EP2007/006645 2006-07-28 2007-07-26 Ionenquelle zur erzeugung negativ geladener ionen Ceased WO2008012094A2 (de)

Priority Applications (2)

Application Number Priority Date Filing Date Title
EP07786360A EP2047497A2 (de) 2006-07-28 2007-07-26 Ionenquelle zur erzeugung negativ geladener ionen
US12/374,789 US7947965B2 (en) 2006-07-28 2007-07-26 Ion source for generating negatively charged ions

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102006034988A DE102006034988B4 (de) 2006-07-28 2006-07-28 Ionenquelle zur Erzeugung negativ geladener Ionen
DE102006034988.1 2006-07-28

Publications (2)

Publication Number Publication Date
WO2008012094A2 WO2008012094A2 (de) 2008-01-31
WO2008012094A3 true WO2008012094A3 (de) 2009-04-30

Family

ID=38859391

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/006645 Ceased WO2008012094A2 (de) 2006-07-28 2007-07-26 Ionenquelle zur erzeugung negativ geladener ionen

Country Status (4)

Country Link
US (1) US7947965B2 (de)
EP (1) EP2047497A2 (de)
DE (1) DE102006034988B4 (de)
WO (1) WO2008012094A2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9437341B2 (en) * 2012-03-30 2016-09-06 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for generating high current negative hydrogen ion beam
RU2615756C1 (ru) * 2013-07-09 2017-04-11 Феникс Нуклеа Лэбс Ллс Высоконадежный, с большим сроком службы источник отрицательно заряженных ионов
US9030659B2 (en) 2013-07-23 2015-05-12 Massachusetts Institute Of Technology Spark-induced breakdown spectroscopy electrode assembly
JP6430264B2 (ja) * 2015-01-19 2018-11-28 住友重機械工業株式会社 負イオン源装置
US9899193B1 (en) 2016-11-02 2018-02-20 Varian Semiconductor Equipment Associates, Inc. RF ion source with dynamic volume control

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040104683A1 (en) * 2002-05-22 2004-06-03 Ka-Ngo Leung Negative ion source with external RF antenna

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3935451A (en) * 1973-02-02 1976-01-27 Jersey Nuclear-Avco Isotopes, Inc. Method and apparatus for separating laser ionized particles from background ions
US5051600A (en) * 1990-08-17 1991-09-24 Raychem Corporation Particle beam generator
GB9503305D0 (en) * 1995-02-20 1995-04-12 Univ Nanyang Filtered cathodic arc source
US5838002A (en) * 1996-08-21 1998-11-17 Chem-Space Associates, Inc Method and apparatus for improved electrospray analysis
JP3599564B2 (ja) * 1998-06-25 2004-12-08 東京エレクトロン株式会社 イオン流形成方法及び装置
US6765216B2 (en) * 2002-03-04 2004-07-20 Atomic Hydrogen Technologies Ltd. Method and apparatus for producing atomic flows of molecular gases
NZ553332A (en) * 2004-09-08 2010-12-24 Honeywell Int Inc Colorant treated ion exchange resins, method of making, heat transfer systems and assemblies containing the same, and method of use
US7742167B2 (en) * 2005-06-17 2010-06-22 Perkinelmer Health Sciences, Inc. Optical emission device with boost device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040104683A1 (en) * 2002-05-22 2004-06-03 Ka-Ngo Leung Negative ion source with external RF antenna

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
MOEHS, D.P., PETERS, J., SHERMAN, J.: "Negative Hydrogen Sources for Accelerators", IEEE TRANSACTIONS ON PLASMA SCIENCE, vol. 33, no. 6, 2005, pages 1786 - 1798, XP002517589 *
PETERS J: "New developments in rf-driven multicusp H- ion sources", REVIEW OF SCIENTIFIC INSTRUMENTS, AIP, MELVILLE, NY, US, vol. 77, no. 3, 21 March 2006 (2006-03-21), pages 3A528 - 03A528, XP012092870, ISSN: 0034-6748 *

Also Published As

Publication number Publication date
DE102006034988A1 (de) 2008-01-31
US20090314952A1 (en) 2009-12-24
EP2047497A2 (de) 2009-04-15
WO2008012094A2 (de) 2008-01-31
US7947965B2 (en) 2011-05-24
DE102006034988B4 (de) 2008-10-30

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