WO2008053464A3 - Nickel-cobalt alloys as current collectors and conductive interconnects and deposition thereof on transparent conductive oxides - Google Patents

Nickel-cobalt alloys as current collectors and conductive interconnects and deposition thereof on transparent conductive oxides Download PDF

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Publication number
WO2008053464A3
WO2008053464A3 PCT/IL2007/001298 IL2007001298W WO2008053464A3 WO 2008053464 A3 WO2008053464 A3 WO 2008053464A3 IL 2007001298 W IL2007001298 W IL 2007001298W WO 2008053464 A3 WO2008053464 A3 WO 2008053464A3
Authority
WO
WIPO (PCT)
Prior art keywords
nickel
transparent conductive
deposition
current collectors
cobalt alloys
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/IL2007/001298
Other languages
French (fr)
Other versions
WO2008053464A2 (en
Inventor
Arie Zaban
Larissa Grinis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bar Ilan University
Original Assignee
Bar Ilan University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bar Ilan University filed Critical Bar Ilan University
Priority to EP07827272A priority Critical patent/EP2092573A2/en
Priority to US12/513,222 priority patent/US9064985B2/en
Priority to JP2009535187A priority patent/JP2010508636A/en
Publication of WO2008053464A2 publication Critical patent/WO2008053464A2/en
Anticipated expiration legal-status Critical
Publication of WO2008053464A3 publication Critical patent/WO2008053464A3/en
Priority to US13/432,368 priority patent/US20120181573A1/en
Ceased legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/30—Electroplating: Baths therefor from solutions of tin
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D9/00—Electrolytic coating other than with metals
    • C25D9/04—Electrolytic coating other than with metals with inorganic materials
    • C25D9/08—Electrolytic coating other than with metals with inorganic materials by cathodic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
    • H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
    • H01G9/20—Light-sensitive devices
    • H01G9/2027—Light-sensitive devices comprising an oxide semiconductor electrode
    • H01G9/2031—Light-sensitive devices comprising an oxide semiconductor electrode comprising titanium oxide, e.g. TiO2
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/81—Electrodes
    • H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
    • H10K30/83—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes comprising arrangements for extracting the current from the cell, e.g. metal finger grid systems to reduce the serial resistance of transparent electrodes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/542—Dye sensitized solar cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Inorganic Chemistry (AREA)
  • Hybrid Cells (AREA)
  • Photovoltaic Devices (AREA)
  • Sustainable Development (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Sustainable Energy (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to nickel-cobalt alloys as current collectors and conductive interconnects, and to methods of deposition thereof on transparent conductive oxides. The invention further relates to transparent conductive oxides on which a nickel-cobalt alloy is deposited and to electrodes made of such transparent conductive oxides for photochemical applications, in particular, for dye-sensitized solar cells (DSSCs).
PCT/IL2007/001298 2006-11-01 2007-10-25 Nickel-cobalt alloys as current collectors and conductive interconnects and deposition thereof on transparent conductive oxides Ceased WO2008053464A2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP07827272A EP2092573A2 (en) 2006-11-01 2007-10-25 Nickel-cobalt alloys as current collectors and conductive interconnects and deposition thereof on transparent conductive oxides
US12/513,222 US9064985B2 (en) 2006-11-01 2007-10-25 Nickel-cobalt alloys as current collectors and conductive interconnects and deposition thereof on transparent conductive oxides
JP2009535187A JP2010508636A (en) 2006-11-01 2007-10-25 Nickel-cobalt alloys as current collectors and conductive wires, and their deposition on transparent conductive oxides
US13/432,368 US20120181573A1 (en) 2006-11-01 2012-03-28 Transparent conductive oxides having a nanostructured surface and uses thereof

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US85575306P 2006-11-01 2006-11-01
US60/855,753 2006-11-01

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/432,368 Continuation-In-Part US20120181573A1 (en) 2006-11-01 2012-03-28 Transparent conductive oxides having a nanostructured surface and uses thereof

Publications (2)

Publication Number Publication Date
WO2008053464A2 WO2008053464A2 (en) 2008-05-08
WO2008053464A3 true WO2008053464A3 (en) 2009-08-27

Family

ID=39344687

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IL2007/001298 Ceased WO2008053464A2 (en) 2006-11-01 2007-10-25 Nickel-cobalt alloys as current collectors and conductive interconnects and deposition thereof on transparent conductive oxides

Country Status (4)

Country Link
US (1) US9064985B2 (en)
EP (1) EP2092573A2 (en)
JP (2) JP2010508636A (en)
WO (1) WO2008053464A2 (en)

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KR101032925B1 (en) * 2009-03-13 2011-05-06 주식회사 티지에너지 Method and apparatus for manufacturing dye-sensitized solar cell
GB0915251D0 (en) * 2009-09-02 2009-10-07 Univ Bangor Low temperature platinisation for dye-sensitised solar cells
GB201007669D0 (en) 2010-05-07 2010-06-23 Epigem Ltd Composite electrode for molecular electronic devices and method of manufacture thereof
EP2683020B1 (en) * 2011-03-02 2019-07-24 Fujikura Ltd. Dye-sensitized solar cell module
GB201103810D0 (en) * 2011-03-04 2011-04-20 G24 Innovations Ltd Photovoltaic cell
WO2013073045A1 (en) * 2011-11-18 2013-05-23 三洋電機株式会社 Solar cell and production method for solar cell
US20130125968A1 (en) * 2011-11-18 2013-05-23 Sunpreme, Ltd. Low-cost solar cell metallization over tco and methods of their fabrication
US9783901B2 (en) 2014-03-11 2017-10-10 Macdermid Acumen, Inc. Electroplating of metals on conductive oxide substrates
US9428836B2 (en) * 2014-04-29 2016-08-30 Lam Research Corporation Electroless deposition of continuous cobalt layer using complexed Ti3+ metal ions as reducing agents
JP6616637B2 (en) * 2015-09-18 2019-12-04 石原ケミカル株式会社 Method for forming conductive film on transparent conductive film
JP7757022B2 (en) * 2016-02-25 2025-10-21 ニューサウス イノベーションズ ピーティーワイ リミテッド Method and apparatus for treating the surface of a TCO material in a semiconductor device
US10184189B2 (en) 2016-07-18 2019-01-22 ECSI Fibrotools, Inc. Apparatus and method of contact electroplating of isolated structures
DE102017121228A1 (en) * 2017-09-13 2019-03-14 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh A method of surface treating a sample having at least one surface of a metal oxide and treated surface metal oxide

Citations (5)

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Publication number Priority date Publication date Assignee Title
US4387116A (en) * 1981-12-28 1983-06-07 Exxon Research And Engineering Co. Conditioner for adherence of nickel to a tin oxide surface
US5474621A (en) * 1994-09-19 1995-12-12 Energy Conversion Devices, Inc. Current collection system for photovoltaic cells
US6306544B1 (en) * 1999-02-25 2001-10-23 Wilson Greatbatch Ltd. Cobalt-based alloys as positive electrode current collectors in nonaqueous electrochemical cells
US20050072458A1 (en) * 2003-01-12 2005-04-07 Orionsolar Ltd. Solar cell device
WO2005103340A1 (en) * 2004-04-19 2005-11-03 Mitsui Mining & Smelting Co., Ltd. Composite foil, method for producing same, current collector using such composite foil, electrode for nonaqueous electrolyte secondary battery, and nonaqueous electrolyte secondary battery

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JPS60141874A (en) * 1983-12-28 1985-07-26 Seiko Epson Corp Electroless plating method
JPS60245782A (en) 1984-05-21 1985-12-05 Mitsubishi Electric Corp Plating method onto transparent conductive film pattern
DE3536821A1 (en) * 1985-10-16 1987-04-16 Standard Elektrik Lorenz Ag METHOD FOR PRODUCING A CURRENTLY DEPOSITABLE, SOLBABLE METAL LAYER
JPH0697070A (en) * 1992-09-11 1994-04-08 Sanyo Electric Co Ltd Method for manufacturing polycrystalline silicon film
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US4387116A (en) * 1981-12-28 1983-06-07 Exxon Research And Engineering Co. Conditioner for adherence of nickel to a tin oxide surface
US5474621A (en) * 1994-09-19 1995-12-12 Energy Conversion Devices, Inc. Current collection system for photovoltaic cells
US6306544B1 (en) * 1999-02-25 2001-10-23 Wilson Greatbatch Ltd. Cobalt-based alloys as positive electrode current collectors in nonaqueous electrochemical cells
US6541158B2 (en) * 1999-02-25 2003-04-01 Wilson Greatbatch Ltd. Cobalt-based alloys as positive electrode current collectors in nonaqueous electrochemical cells
US20050072458A1 (en) * 2003-01-12 2005-04-07 Orionsolar Ltd. Solar cell device
WO2005103340A1 (en) * 2004-04-19 2005-11-03 Mitsui Mining & Smelting Co., Ltd. Composite foil, method for producing same, current collector using such composite foil, electrode for nonaqueous electrolyte secondary battery, and nonaqueous electrolyte secondary battery

Non-Patent Citations (2)

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Also Published As

Publication number Publication date
JP2010508636A (en) 2010-03-18
JP2014031583A (en) 2014-02-20
WO2008053464A2 (en) 2008-05-08
EP2092573A2 (en) 2009-08-26
US20100065101A1 (en) 2010-03-18
US9064985B2 (en) 2015-06-23

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