WO2008156176A1 - フッ素化剤による酸化物ガラスの表面処理方法 - Google Patents

フッ素化剤による酸化物ガラスの表面処理方法 Download PDF

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Publication number
WO2008156176A1
WO2008156176A1 PCT/JP2008/061361 JP2008061361W WO2008156176A1 WO 2008156176 A1 WO2008156176 A1 WO 2008156176A1 JP 2008061361 W JP2008061361 W JP 2008061361W WO 2008156176 A1 WO2008156176 A1 WO 2008156176A1
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WO
WIPO (PCT)
Prior art keywords
oxide glass
fluorinating agent
fluorine
treatment
binding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/061361
Other languages
English (en)
French (fr)
Inventor
Chikaya Tamitsuji
Kunio Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to EP08765781A priority Critical patent/EP2172433A4/en
Priority to JP2009520566A priority patent/JP5359871B2/ja
Priority to CN2008800208977A priority patent/CN101679109B/zh
Publication of WO2008156176A1 publication Critical patent/WO2008156176A1/ja
Priority to US12/640,199 priority patent/US8656735B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/007—Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in gaseous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/12—Optical coatings produced by application to, or surface treatment of, optical elements by surface treatment, e.g. by irradiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/50—After-treatment
    • C03C2203/52—Heat-treatment
    • C03C2203/54—Heat-treatment in a dopant containing atmosphere
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2204/00—Glasses, glazes or enamels with special properties
    • C03C2204/08—Glass having a rough surface

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Surface Treatment Of Glass (AREA)
  • Glass Compositions (AREA)
  • Eyeglasses (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

　酸化物ガラスの表面を低コストで、かつ密着性に優れたフッ素化処理することができる、新規のフッ素化処理方法を提供することを課題とする。 　酸化物ガラスの表面にフッ素化剤のガスまたはフッ素化剤を不活性なガスで希釈した混合ガスを接触させる酸化物ガラスの表面処理方法であって、前記フッ素化剤が、フッ素単体、または、酸化物ガラスの骨格中の酸素原子と金属原子との結合を切断してフッ素原子と金属原子との結合を形成しうるフッ素化合物であり、前記フッ素化剤が接触している前記酸化物ガラス表面におけるフッ化水素濃度を１ｍｏｌ％以下に制御することを特徴とする酸化物ガラスの表面処理方法によって解決する。
PCT/JP2008/061361 2007-06-20 2008-06-20 フッ素化剤による酸化物ガラスの表面処理方法 Ceased WO2008156176A1 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP08765781A EP2172433A4 (en) 2007-06-20 2008-06-20 METHOD FOR TREATING THE SURFACE OF OXID GLASS WITH A FLUORIZING AGENT
JP2009520566A JP5359871B2 (ja) 2007-06-20 2008-06-20 フッ素化剤による酸化物ガラスの表面処理方法
CN2008800208977A CN101679109B (zh) 2007-06-20 2008-06-20 采用氟化剂的氧化物玻璃的表面处理方法
US12/640,199 US8656735B2 (en) 2007-06-20 2009-12-17 Method for treating surface of oxide glass with fluorinating agent

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007162921 2007-06-20
JP2007-162921 2007-06-20
JP2007-191009 2007-07-23
JP2007191009 2007-07-23

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/640,199 Continuation US8656735B2 (en) 2007-06-20 2009-12-17 Method for treating surface of oxide glass with fluorinating agent

Publications (1)

Publication Number Publication Date
WO2008156176A1 true WO2008156176A1 (ja) 2008-12-24

Family

ID=40156335

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/JP2008/061361 Ceased WO2008156176A1 (ja) 2007-06-20 2008-06-20 フッ素化剤による酸化物ガラスの表面処理方法
PCT/JP2008/061363 Ceased WO2008156177A1 (ja) 2007-06-20 2008-06-20 酸化物ガラスの表面処理方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061363 Ceased WO2008156177A1 (ja) 2007-06-20 2008-06-20 酸化物ガラスの表面処理方法

Country Status (5)

Country Link
US (1) US8656735B2 (ja)
EP (2) EP3225599A1 (ja)
JP (2) JP5343849B2 (ja)
CN (1) CN101679109B (ja)
WO (2) WO2008156176A1 (ja)

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JP2010189228A (ja) * 2009-02-19 2010-09-02 Asahi Glass Co Ltd ガラス基板表面を平滑化する方法
WO2012141311A1 (ja) 2011-04-15 2012-10-18 旭硝子株式会社 反射防止性ガラス基体
WO2013146439A1 (ja) * 2012-03-26 2013-10-03 旭硝子株式会社 化学強化時の反りを低減できるガラス板
WO2013146442A1 (ja) * 2012-03-26 2013-10-03 旭硝子株式会社 化学強化時の反りを低減できるガラス板
EP2416184A4 (en) * 2009-03-31 2014-09-03 Stella Chemifa Corp OPTICAL ELEMENT AND METHOD FOR THE PRODUCTION THEREOF
JPWO2014061612A1 (ja) * 2012-10-17 2016-09-05 旭硝子株式会社 導電性薄膜付きガラス基板、薄膜太陽電池、低放射ガラス基板、導電性薄膜付きガラス基板の製造方法
JP2018197176A (ja) * 2017-05-24 2018-12-13 Ａｇｃ株式会社 カバー部材、カバー部材の製造方法および表示装置
JP2025533168A (ja) * 2022-10-05 2025-10-03 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｖｕｖ波長範囲用の光学素子のためのフッ化物またはオキシフッ化物層を形成する方法ならびにデバイス、およびそのフッ化物層またはオキシフッ化物層を含む光学素子
JP2025536140A (ja) * 2022-10-05 2025-10-31 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｖｕｖ波長範囲用の光学系のためのフッ化物層の後処理方法ならびにデバイス、およびそのフッ化物層を含む光学素子

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TWI617437B (zh) 2012-12-13 2018-03-11 康寧公司 促進控制薄片與載體間接合之處理
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KR20160085251A (ko) * 2013-11-14 2016-07-15 아사히 가라스 가부시키가이샤 펜 입력 장치용의 커버 유리 및 그 제조 방법
JP6770432B2 (ja) 2014-01-27 2020-10-14 コーニング インコーポレイテッド 薄いシートの担体との制御された結合のための物品および方法
CN106457758B (zh) * 2014-04-09 2018-11-16 康宁股份有限公司 装置改性的基材制品及其制备方法
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CN109052977A (zh) * 2018-08-13 2018-12-21 中国人民解放军陆军防化学院 一种微纳米缺陷玻璃表面的构建方法
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See also references of EP2172433A4

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JP2010189228A (ja) * 2009-02-19 2010-09-02 Asahi Glass Co Ltd ガラス基板表面を平滑化する方法
EP2416184A4 (en) * 2009-03-31 2014-09-03 Stella Chemifa Corp OPTICAL ELEMENT AND METHOD FOR THE PRODUCTION THEREOF
JPWO2012141311A1 (ja) * 2011-04-15 2014-07-28 旭硝子株式会社 反射防止性ガラス基体
WO2012141311A1 (ja) 2011-04-15 2012-10-18 旭硝子株式会社 反射防止性ガラス基体
US9484473B2 (en) 2011-04-15 2016-11-01 Asahi Glass Company, Limited Anti-reflection glass substrate
CN104220393A (zh) * 2012-03-26 2014-12-17 旭硝子株式会社 能够减小化学强化时的翘曲的玻璃板
WO2013146442A1 (ja) * 2012-03-26 2013-10-03 旭硝子株式会社 化学強化時の反りを低減できるガラス板
CN104203860A (zh) * 2012-03-26 2014-12-10 旭硝子株式会社 能够减小化学强化时的翘曲的玻璃板
WO2013146440A1 (ja) * 2012-03-26 2013-10-03 旭硝子株式会社 化学強化時の反りを低減できるガラス板
JPWO2013146442A1 (ja) * 2012-03-26 2015-12-10 旭硝子株式会社 化学強化時の反りを低減できるガラス板
WO2013146439A1 (ja) * 2012-03-26 2013-10-03 旭硝子株式会社 化学強化時の反りを低減できるガラス板
US9663396B2 (en) 2012-03-26 2017-05-30 Asahi Glass Company, Limited Glass sheet capable of being inhibited from warping through chemical strengthening
JPWO2014061612A1 (ja) * 2012-10-17 2016-09-05 旭硝子株式会社 導電性薄膜付きガラス基板、薄膜太陽電池、低放射ガラス基板、導電性薄膜付きガラス基板の製造方法
JP2018197176A (ja) * 2017-05-24 2018-12-13 Ａｇｃ株式会社 カバー部材、カバー部材の製造方法および表示装置
JP2025533168A (ja) * 2022-10-05 2025-10-03 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｖｕｖ波長範囲用の光学素子のためのフッ化物またはオキシフッ化物層を形成する方法ならびにデバイス、およびそのフッ化物層またはオキシフッ化物層を含む光学素子
JP2025536140A (ja) * 2022-10-05 2025-10-31 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｖｕｖ波長範囲用の光学系のためのフッ化物層の後処理方法ならびにデバイス、およびそのフッ化物層を含む光学素子

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US20100089096A1 (en) 2010-04-15
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CN101679109A (zh) 2010-03-24
EP2172433A1 (en) 2010-04-07
JPWO2008156176A1 (ja) 2010-08-26
US8656735B2 (en) 2014-02-25
CN101679109B (zh) 2011-11-09
JP5359871B2 (ja) 2013-12-04
EP2172433A4 (en) 2012-12-19
JP5343849B2 (ja) 2013-11-13

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