WO2009001924A1 - 樹脂基板 - Google Patents

樹脂基板 Download PDF

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Publication number
WO2009001924A1
WO2009001924A1 PCT/JP2008/061726 JP2008061726W WO2009001924A1 WO 2009001924 A1 WO2009001924 A1 WO 2009001924A1 JP 2008061726 W JP2008061726 W JP 2008061726W WO 2009001924 A1 WO2009001924 A1 WO 2009001924A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
resin
surface layer
nitrogen concentration
resin substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/061726
Other languages
English (en)
French (fr)
Inventor
Tetsushi Fujinaga
Makiko Takagi
Masanori Hashimoto
Shin Asari
Ryuji Oyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Ube Corp
Original Assignee
Ube Industries Ltd
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd, Ulvac Inc filed Critical Ube Industries Ltd
Priority to US12/667,021 priority Critical patent/US20100330363A1/en
Priority to EP08790691A priority patent/EP2168763A4/en
Priority to CN200880022450.3A priority patent/CN101687389A/zh
Publication of WO2009001924A1 publication Critical patent/WO2009001924A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/345—Silicon nitride
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Liquid Crystal (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

　本発明の樹脂基板は、樹脂層と、この樹脂層の表面に表面層を有し、前記表面層は、化学気相成長法により成膜された窒化ケイ素を主成分とする層であり、前記樹脂層と前記表面層との界面において、前記表面層中の窒素濃度の最大値と樹脂層中の窒素定常濃度の差分を１００％としたときに、８０％から２０％に遷移する界面領域の厚みが２５ｎｍ以下であり、且つ前記表面層の平均表面粗さＲａが１ｎｍ以下である。この樹脂基板は、水蒸気バリア性と平坦性を兼ね備える。
PCT/JP2008/061726 2007-06-27 2008-06-27 樹脂基板 Ceased WO2009001924A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/667,021 US20100330363A1 (en) 2007-06-27 2008-06-27 Resin substrate
EP08790691A EP2168763A4 (en) 2007-06-27 2008-06-27 RESIN SUBSTRATE
CN200880022450.3A CN101687389A (zh) 2007-06-27 2008-06-27 树脂基底

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-169658 2007-06-27
JP2007169658A JP2009006568A (ja) 2007-06-27 2007-06-27 樹脂基板

Publications (1)

Publication Number Publication Date
WO2009001924A1 true WO2009001924A1 (ja) 2008-12-31

Family

ID=40185733

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/061726 Ceased WO2009001924A1 (ja) 2007-06-27 2008-06-27 樹脂基板

Country Status (6)

Country Link
US (1) US20100330363A1 (ja)
EP (1) EP2168763A4 (ja)
JP (1) JP2009006568A (ja)
KR (1) KR20100021521A (ja)
CN (1) CN101687389A (ja)
WO (1) WO2009001924A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013237188A (ja) * 2012-05-15 2013-11-28 Toray Ind Inc ガスバリア性フィルム

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2422976B1 (de) * 2010-07-30 2017-03-08 Ems-Patent Ag Photovoltaikmodul-Mehrschichtrückfolie sowie deren Herstellung und Verwendung bei der Produktion photovoltaischer Module
CA2817987A1 (en) * 2011-02-24 2012-08-30 Felix N. Nguyen Reinforced interphase and bonded structures thereof
JP5706777B2 (ja) * 2011-07-25 2015-04-22 麒麟麦酒株式会社 ガスバリア性プラスチック成形体
JP5730235B2 (ja) * 2012-03-29 2015-06-03 富士フイルム株式会社 ガスバリアフィルムおよびガスバリアフィルムの製造方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004111201A (ja) 2002-09-18 2004-04-08 Asahi Glass Co Ltd 発光素子用基板、発光素子用透明導電膜付き基板および発光素子
JP2004292877A (ja) 2003-03-26 2004-10-21 Ishikawa Seisakusho Ltd 窒化シリコン膜及びその製造方法
JP2005342898A (ja) * 2004-05-31 2005-12-15 Keiwa Inc 高バリア性シート
JP2005342975A (ja) 2004-06-02 2005-12-15 Toppan Printing Co Ltd 透明バリアフィルム
JP2006057121A (ja) * 2004-08-18 2006-03-02 Kuraray Co Ltd 窒化シリコン膜の製造方法及び表示装置用フィルム
JP2006351523A (ja) 2005-05-20 2006-12-28 Semiconductor Energy Lab Co Ltd 発光素子、発光装置、および発光素子の作製方法
JP2007062305A (ja) * 2005-09-02 2007-03-15 Japan Advanced Institute Of Science & Technology Hokuriku 透明ガスバリア基板

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6630980B2 (en) * 2001-04-17 2003-10-07 General Electric Company Transparent flexible barrier for liquid crystal display devices and method of making the same
US20040121146A1 (en) * 2002-12-20 2004-06-24 Xiao-Ming He Composite barrier films and method
US7229703B2 (en) * 2003-03-31 2007-06-12 Dai Nippon Printing Co. Ltd. Gas barrier substrate
JP4291682B2 (ja) * 2003-12-10 2009-07-08 大日本印刷株式会社 バリアフィルムの製造方法
US7511418B2 (en) * 2005-05-20 2009-03-31 Semiconductor Energy Laboratory Co., Ltd. Light emitting element, light emitting device and manufacturing method of light emitting element

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004111201A (ja) 2002-09-18 2004-04-08 Asahi Glass Co Ltd 発光素子用基板、発光素子用透明導電膜付き基板および発光素子
JP2004292877A (ja) 2003-03-26 2004-10-21 Ishikawa Seisakusho Ltd 窒化シリコン膜及びその製造方法
JP2005342898A (ja) * 2004-05-31 2005-12-15 Keiwa Inc 高バリア性シート
JP2005342975A (ja) 2004-06-02 2005-12-15 Toppan Printing Co Ltd 透明バリアフィルム
JP2006057121A (ja) * 2004-08-18 2006-03-02 Kuraray Co Ltd 窒化シリコン膜の製造方法及び表示装置用フィルム
JP2006351523A (ja) 2005-05-20 2006-12-28 Semiconductor Energy Lab Co Ltd 発光素子、発光装置、および発光素子の作製方法
JP2007062305A (ja) * 2005-09-02 2007-03-15 Japan Advanced Institute Of Science & Technology Hokuriku 透明ガスバリア基板

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP2168763A4

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013237188A (ja) * 2012-05-15 2013-11-28 Toray Ind Inc ガスバリア性フィルム

Also Published As

Publication number Publication date
CN101687389A (zh) 2010-03-31
US20100330363A1 (en) 2010-12-30
KR20100021521A (ko) 2010-02-24
EP2168763A1 (en) 2010-03-31
EP2168763A4 (en) 2010-09-29
JP2009006568A (ja) 2009-01-15

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